Fabrication and performance characterization of Al/Ni multilayer energetic films

Al/Ni multilayer bridge films, which were composed of alternate Al and Ni layers with bilayer thicknesses of 50, 100 and 200 nm, were prepared by RF magnetron sputtering. In each bilayer, the thickness ratio of Al to Ni was maintained at 3:2 to obtain an overall 1:1 atomic composition. The total thickness of Al/Ni multilayer films was 2 μm. XRD measurements show that the compound of AlNi is the final product of the exothermic reactions. DSC curves show that the values of heat release in Al/Ni multilayer films with bilayer thicknesses of 50, 100 and 200 nm are 389.43, 396.69 and 409.92 J?g^?1, respectively. The temperatures of Al/Ni multilayer films were obviously higher than those of Al bridge film and Ni bridge film. Al/Ni multilayer films with modulation of 50 nm had the highest electrical explosion temperature of 7000 K. The exothermic reaction in Al/Ni multilayer films leads to a more intense electric explosion. Al/Ni multilayer bridge films with modulation period of 50 nm explode more rapidly and intensely than other bridge films because decreasing the bilayer thickness results in an increased reaction velocity.     

Structural characterization of mixed Ta–Re oxide films

Thin films of mixed Ta and Re oxides have been produced by reactive dc magnetron co-sputtering of pure Ta and Re metal targets in Ar–O₂ atmosphere. The structural evolution of these films has been studied as a function of the composition, starting from a pure tantalum oxide film up to about 82% rhenium content. The composition and the structure of the films have been investigated by using X-ray diffraction and micro-Raman spectroscopy. For low Re content (20%), islands of a well crystallized phase, based on ReO₄ groups, appear in the films still composed by pure amorphous tantalum oxide, while a mixed disordered solid phase is found for the highest Re concentration (82%).     

微型平面复合薄膜电爆炸开关的设计和研究

开关技术是影响爆炸箔起爆系统可靠作用、微型化、低能化、集成化的关键技术。电爆炸平面开关是利用强脉冲电流使触发极金属桥箔发生电爆炸,产生高温高压等离子体,使爆炸桥区两侧的电极导通。基于微加工技术,采用Al/CuO复合薄膜材料作为触发电极,设计制造了微型平面复合薄膜电爆炸开关。采用扫描电子显微镜、差示扫描量热法和光谱谱线测温研究了触发极Al/CuO复合薄膜的形貌、反应性和电爆炸等离子体温度,通过放电电流测试研究了开关性能。结果表明,在主回路电压2000 V时,开关输出电流峰值约为1938 A,上升时间390 ns,性能优于仅以铜薄膜为触发电极的电爆炸平面开关。     

微型平面复合薄膜电爆炸开关的设计和研究

开关技术是影响爆炸箔起爆系统可靠作用、微型化、低能化、集成化的关键技术。电爆炸平面开关是利用强脉冲电流使触发极金属桥箔发生电爆炸,产生高温高压等离子体,使爆炸桥区两侧的电极导通。基于微加工技术,采用Al/CuO复合薄膜材料作为触发电极,设计制造了微型平面复合薄膜电爆炸开关。采用扫描电子显微镜、差示扫描量热法和光谱谱线测温研究了触发极Al/CuO复合薄膜的形貌、反应性和电爆炸等离子体温度,通过放电电流测试研究了开关性能。结果表明,在主回路电压2000 V时,开关输出电流峰值约为1938 A,上升时间390 ns,性能优于仅以铜薄膜为触发电极的电爆炸平面开关。     

Reflection characterization of multilayer surface films

The reflection of linearly polarized light from a multilayer system of ultrathin dielectric surface films is investigated both analytically in the long-wavelength limit and numerically by the standard way of calculating the reflection characteristics for the layered medium. The second-order approximate formulas for reflection coefficients and characteristic reflection angles are derived and their accuracy is estimated. It is shown that approximate expressions obtained for reflection parameters of multilayer system in the long-wavelength limit are of immediate interest to the solution of the inverse problem for ultrathin layered surface structures. Innovative possibilities for optical diagnostics are generated by means of polarizing and principal angles. For determining the parameters of multiple surface layers an appropriate method is found by combining differential reflectance with ellipsometry.     

Structural and magnetic properties of Co-C composite films and Co/C multilayer films

CoC composite films and Co/C multilayer films have been prepared by a method incorporating ion beam sputtering and plasma chemical vapor deposition. It has been found that the structure and magnetic properties of both the Co-C composite and the Co/C multilayer films depend strongly on the substrate temperature during deposition. The Co-C composite film deposited at room temperature is amorphous, with relatively low saturation magnetization and coercivity. On the other hand, the film deposited at 250 °C is composed of fine Co crystallites separated by amorphous C or Co-C phase. As a result, both the saturation magnetization and coercivity are increased compared with the film deposited at room temperature. When deposited at room temperature, the Co/C multilayer film exhibits good periodicity, with a period of 70 nm (Co: 40 nm, C: 30 nm) and sharp and flat Co-C interfaces. High magnetization (602 emu/cm³) and low coercivity (1.6 Oe) are obtained for such a film. However, increasing the substrate temperature to 250 °C was found to be detrimental to the magnetic properties due to the formation of cobalt carbide at the Co-C interface. Received: 11 July 2000 / Accepted: 13 July 2000 / Published online: 30 November 2000     

Structural ordering and self-organization effects in multilayer Pd/Fe films

The structural features of the distribution of Pd and Fe atoms in multilayer films derived via Penning-discharge sputtering are studied. The preparation of films is a highly nonequilibrium process; at the same time, it is relatively simple in terms of possible structural implementations, which are shown during the self-organization of sputtered atoms through the formation of clusters with an individual ordered structure. It is important that the “dynamic chaos” that appears during sputtering is stabilized during crystallization, which makes it possible to study the resulting structures using nondestructive inspection methods with fairly wide possibilities. Therefore, it is of interest to study self-organization during the sputtering of multilayer films in order to reveal the mechanisms of cluster formation and to simulate them. It is also shown that the self-organization during sputtering and subsequent crystallization is accompanied not only by the ordering in the form of clusters, buts also by an ordered arrangement of these clusters.     

Au/SiO2纳米多层薄膜的制备及其性质表征

利用多靶磁控溅射技术制备了Au/SiO2纳米颗粒分散氧化物多层复合薄膜.研究了在保持Au单层颗粒膜沉积时间一定时薄膜厚度一定、变化SiO2的沉积时间及SiO2的沉积时间一定而改变薄膜厚度时,多层薄膜在薄膜厚度方向的微观结构对吸收光谱的影响.研究结果表明:具有纳米层状结构的Au/SiO2多层薄膜在560nm波长附近有明显的表面等离子共振吸收峰,吸收峰的强度随Au颗粒的浓度增加而增强,在Au颗粒浓度相同的情况下,复合薄膜光学吸收强度随薄膜厚度的增加而增强.但当金属颗粒的浓度增加到一定程度时,金属颗粒相互接触,没有观察到纳米层状结构,薄膜不显示共振吸收峰特征.用修正后的M-G(Maxwell-Garnett)理论对吸收光谱进行了模拟,得到了与实验一致的结果.     

Mo/Si多层膜小角X射线衍射结构表征

为了实现对Mo/Si多层膜的结构表征,测量了多层膜样品的小角X射线衍射谱。介绍了小角X射线衍射谱的分析方法,包括Bragg峰值拟合法,傅里叶变换法,反射谱拟合法。Bragg峰值拟合法和反射谱拟合法得到多层膜的周期厚度为7.09nm,两种模型的反射谱拟合法得到界面的粗糙度(扩散长度)为0.40～0.41nm(Si在Mo上),0.52～0.70nm(Mo在Si上),前者要比后者小,这与透射电镜法(TEM)得到的结果0.40nm(Si在Mo上),0.6～0.65nm(Mo在Si上)是一致的。通过基于扩散模型的反射谱拟合法得到的折射率剖面也与由高倍率透射电镜(HRTEM)积分得到的灰度值剖面在趋势上是一致的。通过X射线衍射谱和TEM图像对Mo/Si多层膜进行综合表征,得到了多层膜的精细结构信息,这对多层膜制备工艺的优化具有十分重要的意义。     

Microstructure and properties of Nb/Ta multilayer films irradiated by a high current pulse electron beam

Nb/Ta multilayer films deposited on Ti6Al4V substrate with Nb and Ta monolayer thicknesses of 30 nm, 120 nm, and 240 nm were irradiated by a high current pulse electron beam (HCPEB) to prepare Nb-Ta alloyed layers. The microstructure and the composition of the outmost surface of melted alloyed layers were investigated using a transmission electron microscope (TEM) equipped with an X-ray energy dispersive spectrometer (EDS) attachment. The Ta content of the alloyed surface layer prepared from the monolayer of thickness 30 nm, 120 nm, and 240 nm was ～ 27.7 at.%, 6.37 at.%, and 0 at.%, respectively. It was found that the Ta content in the alloyed layer plays a dominant role in the microstructure of the films. The hardness and the wear rate of the alloyed layers decrease with the increasing content of Ta in the surface layer.     

Au/SiO2纳米多层薄膜的制备及其性质表征

利用多靶磁控溅射技术制备了Au/SiO₂纳米颗粒分散氧化物多层复合薄膜.研究了在保持Au单层颗粒膜沉积时间一定时薄膜厚度一定、变化SiO₂的沉积时间及SiO₂的沉积时间一定而改变薄膜厚度时，多层薄膜在薄膜厚度方向的微观结构对吸收光谱的影响.研究结果表明：具有纳米层状结构的Au/SiO₂多层薄膜在560 nm波长附近有明显的表面等离子共振吸收峰，吸收峰的强度随Au颗粒的浓度增加而增强，在Au颗粒浓度相同的情况下，复合薄膜 关键词： 2纳米复合薄膜')" href="#">Au/SiO₂纳米复合薄膜 多靶磁控溅射 吸收光谱 有效介质理论     

Optical characterization of porous silicon films and multilayer filters

Porous silicon (PS) has a great potential in optical applications due to the tunability of its refractive index. However, the electrochemical formation parameters of porous silicon have a great influence both on porosity and pore morphology and, hence, on the optical properties of the PS layers. In the present work, the optical constants of PS layers are determined in the visible-wavelength range for different electrolyte compositions and for a wide range of formation-current densities. Thus, the interval of refractive indices that can be achieved for each electrolyte composition is studied, for the further development of interference filters. In particular, it is demonstrated that a higher ethanol concentration in the electrolyte leads to a considerably higher tunability of the refractive index of PS while reducing absorption losses. In addition, the performance of PS-based multilayer interference filters is shown to improve when formed with an electrolyte of higher ethanol concentration, especially in the blue region of the visible spectrum. PACS 78.20.Ci; 78.40.-q; 78.55.Mb     

Fabrication and characterization of Pt intermediate transparent and conducting ITO/Pt/ITO multilayer films

Platinum intermediate transparent and conducting ITO/metal/ITO (IMI) multilayered films were deposited by RF and DC magnetron sputtering on polycarbonate substrates without intentional substrate heating. Changes in the microstructure and optoelectrical properties of the films were investigated with respect to the thickness of the intermediate Pt layer in the IMI films. The thickness of Pt film was varied from 5 to 20 nm.In XRD measurements, neither ITO single-layer films nor IMI multilayer films showed any characteristic diffraction peaks for In₂O₃ or SnO₂. Only a weak diffraction peak for Pt (1 1 1) was obtained in the XRD spectra. Thus, it can be concluded that the Pt-intermediated films in the IMI films did not affect the crystallinity of the ITO films. However, equivalent resistivity was dependent on the presence and thickness of the Pt-intermediated layer. It decreased as low as 3.3×10⁻⁴ Ω cm for ITO 50 nm/Pt 20 nm/ITO 30 nm films. Optical transmittance was also strongly influenced by the Pt-intermediated layer. As Pt thickness in the IMI films increased, optical transmittance decreased to as low as 30% for ITO 50 nm/Pt 20 nm/ITO 30 nm films.     

Fabrication and characterization of Ag intermediate transparent and conducting TiON/Ag/TiON multilayer films

Silver (Ag) intermediate transparent and conducting TiON/Ag/TiON (TAgT) films were deposited by RF and DC magnetron sputtering on glass substrates. Changes in the optoelectrical properties of the films were investigated as a function of Ag thickness. The thickness of the Ag film varied from 5 to 20 nm.In XRD patterns, the TAgT films showed characteristic diffraction peaks for Ag (111), (200), (220), and (311) planes, while peaks for TiON were not observed. Thus, it was concluded that the Ag interlayer did not affect the crystalline structures of the upper TiON films. However, electrical resistivity was dependent on the thickness of the Ag interlayer. For TiON 50/Ag 20/TiON 30 nm films, electrical resistivity decreased to as low as 3.3 × 10^− 4 Ωcm. The optical transmittance was also influenced by the Ag interlayer. As the Ag thickness increased, the optical transmittance decreased to as low as 45% for TiON 50/Ag 20/TiON 30 nm films. From observed figure of merit and work function, it is concluded that a TAgT film with a 5 nm-thick Ag interlayer is a good candidate for use as a transparent electrode in OLEDs and flat panel displays.     

Pulsed laser deposition and characterization of multilayer metal-carbon thin films

Cobalt-DLC multilayer films were deposited with increasing content of cobalt, keeping carbon content constant by pulsed laser deposition technique. A cobalt free carbon film was also deposited for comparison. Excimer laser was employed to ablate the materials onto silicon substrate, kept at 250 °C, while post-deposition annealing at 400 °C was also performed in situ. The formation of cobalt grains within the carbon matrix in Co-DLC films can be seen through scanning electron and atomic force micrographs while no grains on the surface of the cobalt-free DLC film were observed. Raman spectra of all the films show D- and G-bands, which is a confirmation that the films are DLC in nature. According to Vibrating sample magnetometer (VSM) measurements, the DLC films with cobalt revealed ferromagnetic behaviour whereas the cobalt free DLC film exhibited diamagnetic behaviour. The pure DLC film also shows ferromagnetic nature when diamagnetic background is subtracted. Spectroscopic Ellipsometry (SE) analysis showed that the optical band gaps, refractive indices and extinction coefficients of Co-DLC films can be effectively tuned with increasing content of cobalt.     

Preparation and characterization of the ZnO:Al/Fe65Co35/ZnO:Al multifunctional films

The ferromagnetic transparent conducting film is a multifunctional film which has high visible transmittance, low resistivity and room-temperature ferromagnetism, simultaneously. In this article, ferromagnetic transparent conducting ZnO:Al/Fe₆₅Co₃₅/ZnO:Al multilayer films were fabricated by inserting a middle magnetic Fe₆₅Co₃₅ layer into aluminum-doped zinc oxide (ZnO:Al) matrix using a magnetron sputtering apparatus at substrate temperature ranging from room temperature (RT) to 400^∘C. The total film thickness was about 400 nm and the middle Fe₆₅Co₃₅ alloy layer was 4 nm. The influences of substrate temperature (T _s ) on the structural, electrical, optical and magnetic properties of the multilayer films were systemically investigated. The results showed that the microstructure and performance of the composite multilayer films strongly depended on the substrate temperature. The present results also showed that the inserted middle Fe₆₅Co₃₅ alloy thin layer played an important role in providing the RT ferromagnetism and decreasing the resistivity of the multilayer films. Therefore, it is possible to obtain a multifunctional film material with the combination of good optical transparency, high electrical conductivity and RT ferromagnetism.     

Magnetooptical properties of Fe/Pd multilayer films

Multilayer films of Fe(x)/Pd(30 Å) (6≤x≤30 Å) are investigated with the help of the transversal Kerr effect (TKE) with incident light in the energy range 1.3–3.6 eV. Oscillations of the TKE depending on the thickness of the iron layer are revealed. The off-diagonal element of the dielectric tensor ? ₂ ^′ is calculated using themeasured values of the TKE for two incidence angles of light and the optical constants of all samples. It is shown that the quantity ? ₂ ^′ ω² (where ω is the frequency of incident light), which is proportional to the interband density of states, also oscillates, and its oscillations are similar in character to oscillations of the Kerr effect. The observed oscillatory dependence of the TKE and of the interband density of states are related to the manifestation of quantum confinement effects.     

Spin-wave resonance in multilayer FeNiP/Pd films

Ferromagnetic and spin wave resonances are studied in FeNiP/Pd multilayer films obtained via chemical vapor deposition. The partial exchange interaction constant of polarized Pd films is found to be A _Pd ≈ 1 × 10^?7 erg/cm.