Study of single event effect for the InP-based HEMT with In0.53Ga0.47As/In0.3Ga0.7As/In0.7Ga0.3As composite channel

In this study, the single event effects in In_0.53Ga_0.47As/In_0.3Ga_0.7As/In_0.7Ga_0.3As composite channel InP-based HEMT are investigated using TCAD simulation for the first time. Due to the higher conduction band difference between bottom In_0.7Ga_0.3As channel and InAlAs buffer, the electrons in the buffer layer induced by ions strike cannot enter the channel, led to reduce the peak concentration in the composite channel and significantly weakened the drain current for composite channel device. Meanwhile, higher barrier height under the gate for composite channel InP-based HEMT is formed after particle strike, and further attenuate the drain current. Therefore, the single event effects can be effectively reduced by designing channel structure. In addition, drain voltage and incident position also show significant impact drain current. With the increase in the drain voltage, the drain current increase and the most sensitive incident position is the gate electrode for the device.     

Annealing of ion-implanted Ga0.47In0.53As

We have investigated annealing of ion-implanted GaInAs using transmission electron microscopy. We have found that the best condition for the post-implantation anneals for GalnAs is a 30 second anneal at a temperature of 700–800°C. This produces a material similar in character to the untreated GaInAs. Anneals for longer than 30 seconds produce crystal defects becoming increasingly complex with time for similar temperatures.     

Weak localization in Al0.25Ga0.75As/In0.2Ga0.8As/GaAs wires

The phase coherence length L_Ø, its temperature dependence and the spin-orbit scattering length L_SO in Al_0.25Ga_0.75As/In_0.2Ga_0.8As/GaAs wires fabricated by electron-beam lithography and CH₄/H₂ Reactive Ion Etching (RIE), were extracted by fitting a 1-dimensional weak localization theory to two-terminal measurements in the temperature range between 2 K and 50 K. The scattering mechanism was found to be Nyquist (electron-electron collisions with small energy transfer).     

应力导致InAs/In0.15Ga0.85As量子点结构中 In0.15Ga0.85As阱层的合金分解效应研究

利用固源分子束外延技术,在In0.15Ga0.85As/GaAs量子阱生长了两个InAs/In0.15Ga0.85As量子点(DWELL)样品.通过改变其中一个InAs DWELL样品中的In0.15Ga0.85As阱层的厚度和生长温度,获得了量子点尺寸增大而且尺寸分布更均匀的结果.结合光致发光光谱(PL)和压电调制光谱(PzR)实验结果,发现该样品量子点的光学性质也同时得到了极大的优化.基于有效质量近似的数值计算结果表明:量子点后生长过程中应力导致In0.15Ga0.85As阱层合金分解机理是导致量子点尺寸和光学性质得到优化的主要原因.     

Investigation of barrier tunneling characteristics of symmetrical double quantum well in In0.25Ga0.75As/GaAs/In0.25Ga0.75As heterostructure

The optical and electrophysical properties of the GaAs/In_0.25Ga_0.75As heterostructure with a symmetric double quantum well have been investigated. The influence of tunneling electrons and holes through an internal barrier of the quantum well on the shift and splitting of the quantum levels is analyzed. The theoretical estimates are compared with the results of the photoluminescence and photoconductivity measurements. The Hall measurements indicate that the barrier strongly affects the mobility of charge carriers.     

Characterization of Zn-Doped Ga0.86In0.14As0.13Sb0.87

Controlled doping of quaternary alloys of Ga_0.86In_0.14As_0.13Sb_0.87 with zinc is fundamental to obtain the p-type layers needed for the development of optoelectronic devices based on p–n heterojunctions. GaInAsSb epitaxial layers were grown by liquid phase epitaxy, and Zn doping was obtained by incorporating small Zn pellets in the growth melt. The chemical composition was obtained by X-ray dispersive energy microanalysis (EDX). The chemical composition homogeneity of the films was demonstrated by Raman scattering. Low-temperature photoluminescence (LT-PL) spectroscopy was used to study the influence of the Zn acceptor levels on optical properties of the epilayers. For the undoped sample, the LT-PL spectrum showed a narrow exciton-related peak centered at around 648 meV with a full width at half maximum (FWHM) of about 7 meV, which is evidence of the good crystalline quality of the layers. For higher Zn-doping, the LT-PL spectra show the presence of band-to-band and donor-to-acceptor transitions, which overlap as the Zn concentration increases. The band-to-band radiative transition (E _M) shifts to lower energies as Zn doping increases due to a band-filling effect as the Fermi level enters into the valence band, which might be used to estimate the hole concentration in the grown samples.     

Optical properties of laser-processed In x Ga1−x As

Various spots in GaAs, In-diffused with the 1.064 μm line of pulsed Nd:YAG laser with several energy densities, have been characterized and compared with samples prepared by the conventional rapid thermal annealing method. Of the energy densities used, the spot processed with an energy density of 7 J/cm² shows In _x Ga_1?x As phases with an indium concentration of 60% and below. An abrupt boundary in the indium concentration is observed at the edge of the laser-annealed spot. The diffusion depth is found to be less than 1000 Å. The spot processed with an energy density of 14 J/cm² shows considerable damage from the irradiation resulting in strain in the lattice. The samples prepared by the thermal annealing method show similar results to the laser-diffused samples. However, these thermally annealed samples suffer from arsenic loss unlike the laser-processed samples. It can be concluded that laser-induced alloying of indium into GaAs can be achieved with less arsenic loss than the thermal annealing method.     

Two-dimensional electronic transport in In0.53Ga0.47As quantum Wells

Transport properties of the electrons itinerant two dimensionality in a square quantum well of In_0.53Ga_0.47As are studied in the framework of Fermi-Dirac statistics including the relevant scattering mechanisms. An iterative solution of the Boltzmann equation shows that the ohmic mobility is controlled by LO phonon scattering at room temperature, but below 130 K alloy scattering is predominant. The calculated mobilities with a suitable value of the alloy scattering potential agree with the experimental results over a range of lattice temperature. For lattice temperatures below 25 K where the carrier energy loss is governed by the deformation potential acoustic scattering, the warm electron coefficient is found to be negative. Its magnitude decreases with increasing lattice temperature and is greater for larger channel widths. Values of the small-signal AC mobility of hot electrons at a lattice temperature of 4.2 K are obtained for different sheet carrier densities and channel widths. Cut-off frequencies around 100 GHz are indicated.Dedicated to H.-J. Queisser on the occasion of his 60th birthday     

Nonuniform composition profile in In0.5Ga0.5As alloy quantum dots

We use cross-sectional scanning tunneling microscopy to examine the shape and composition distribution of In0.5Ga0.5As quantum dots (QDs) formed by capping heteroepitaxial islands. The QDs have a truncated pyramid shape. The composition appears highly nonuniform, with an In-rich core having an inverted-triangle shape. Thus the electronic properties will be drastically altered, relative to the uniform composition generally assumed in device modeling. Theoretical analysis of the QD growth suggests a simple explanation for the unexpected shape of the In-rich core.     

In0.53Ga0.47AS/In0.52Al0.48As量子阱中的正磁电阻效应

在低温强磁场条件下,对In0.53 Ga0.47 As/In0.52AI0.48As量子阱中的二维电子气进行了磁输运测试.在低磁场范围内观察到正磁电阻效应,在高磁场下这一正磁电阻趋于饱和,分析表明这一现象与二维电子气中的电子占据两个子带有关.在考虑了两个子带之间的散射效应后,通过分析低磁场下的正磁电阻,得到了每个子带电子的迁移率,结果表明第二子带电子的迁移率高于第一子带电子的迁移率.进一步分析表明,这主要是由两个子带之间的散射引起的.     

High-field transport properties of In0.765Ga0.235As0.5P0.5

Monte-Carlo results on the velocity-field characteristics, ac diffusion-constant and thermal-noise voltages are presented for In_0.765Ga_0.235As_0.5P_0.5 at 300K. Recently available values of physical constants have been used in the calculations. The values of diffusion constants are close to those of InP but the thermal noise voltages are found to increase faster with the field. The peak velocity is 1.9 × 10⁷ cm/s and the threshold field for negative differential mobility is about 6 kV/cm.     

Recombination in tensile-strained In0.3Ga0.7As quantum well on InP

Photoluminescence (PL) measurements under different excitation powers were carried out at low temperature on tensile-strained In_0.3Ga_0.7As single wells of 6 nm with InGaAs barriers lattice matched to InP substrate. PL measurements taken at 2 K show a main emission band at 0.762 eV probably originating from a type-II transition. The insertion of an ultrathin InAs layer at In_0.3Ga_0.7As on In_0.53Ga_0.47As interface reveals an additional feature at 0.711 eV as well as an excited-state luminescence emission at high pump powers. The InAs insertion improves heterointerface quality, which was confirmed by an increase in PL intensity.