Termination of two-dimensional metallic conduction near the metal-insulator transition in a Si/SiGe quantum well

We report in this Letter our recent low-temperature transport results in a Si/SiGe quantum well with moderate peak mobility. An apparent metal-insulating transition is observed. Within a small range of densities near the transition, the conductivity σ displays a nonmonotonic temperature dependence. After an initial decrease at high temperatures, σ first increases with decreasing temperature T, showing a metallic behavior. As T continues decreasing, a downturn in σ is observed. This downturn shifts to a lower T at higher densities. More interestingly, the downturn temperature shows a power-law dependence on the mobility at the downturn position, suggesting that a similar downturn is also expected to occur deep in the apparent metallic regime at albeit experimentally inaccessible temperatures. This thus hints that the observed metallic phase in 2D systems might be a finite temperature effect.     

Specific heat of neutron-compensated heavily doped Si:P near the metal-insulator transition

The specific heat of neutron-irradiated heavily doped Si:P (3.3·10¹⁸ cm^–3Nd7.3·10¹⁸ cm^–3) was measured between 0.07 and 3K and in magnetic fields between 0 and 6T. The compensation ratio was varied systematically by isochronal annealing. Characterization was done by temperature dependent measurements of Hall coefficient and electrical resistivity. The specific heat displays a minimum of the linear coefficient at the carrier concentration where the P impurity band is starting to be occupied. The concentration dependence of localized moments inferred from Schottky anomalies can be interpreted in terms of localized magnetic moments arising from the defect structure introduced by the irradiation and from P-derived electrons. As in uncompensated Si:P, local moments survive on the metallic side of the transition.     

Flicker noise in degenerately doped Si single crystals near the metal-insulator transition

In this paper we report some of the important results of experimental investigations of the flicker noise near the metal-insulator (MI) transition in doped silicon single crystals. This is the first comprehensive work to study low-frequency noise in heavily doped Si over an extensive temperature range (2 K<T<500 K). The measurements of conductance fluctuations (flicker noise) were carried out in the frequency range 10⁻²<f<4 × 10¹ Hz in single crystalline Si across the MI transition by doping with phosphorous and boron. The magnitude of noise in heavily doped Si is much larger than that seen in lightly doped Si over the whole temperature range. The extensive temperature range covered allowed us to detect two distinct noise mechanisms. At low temperatures (T<100 K) universal conductance fluctuations (UCF) dominate and the spectral dependence of the noise is determined by dephasing the electron from defects with two-levels (TLS). At higher temperatures (T>200 K) the noise arises from activated defect dynamics. As the MI transition is approached, the 1/f spectral power, typical of the metallic regime, gets modified by the presence of discrete Lorentzians which arise from generation-recombination process which is the characteristic of a semiconductor.     

Phase diagram of coulomb interactions across the metal-insulator transition in Si:B

Measurements of the single-particle density of states (DOS) near T=0 K in Si:B are used to construct an energy-density phase diagram of Coulomb interactions across the critical density n(c) of the metal-insulator transition. Insulators and metals are found to be distinguishable only below a phase boundary epsilon*(|n/n(c)-1|) determined by the Coulomb energy. Above epsilon* is a mixed state where metals and insulators equidistant from n(c) cannot be distinguished from their DOS structure. The data imply a diverging screening radius at n(c), which may signal an interaction-driven thermodynamic state change.     

Features of the conductivity and magnetoresistance of doped two-dimensional structures near a metal-insulator transition

Theoretical and experimental studies of the conductivity and magnetoresistance of selectively doped structures of GaAs/AlGaAs quantum well structures near a metal-insulator phase transition have been reviewed. Special attention is focused on the role of the structure of impurity bands, which are narrow in the absence of intentional compensation and, in the case of doping of barriers, include the partially filled upper Hubbard band. It has been shown that the indicated structures exhibit (i) specific mixed conductivity, which can, in particular, include the contribution from delocalized states in the impurity band; (ii) the virtual Anderson transition, which is suppressed with an increase in disorder owing to compensation or with an increase in the concentration of a dopant; (iii) slow relaxations of the hopping magnetoresistance caused by the Coulomb glass effects, including, in particular, the states of the upper Hubbard band; and (iv) the suppression of the negative interference magnetoresistance owing to the spin effects.     

Electronic properties and superconductivity of amorphous Si1-xAux alloys near the metal-insulator transition

We report on specific-heat and resistivity measurements on quench-condensed Si_1-xAu_x films for 0.11 ⩽ x 0.36 in the temperature range 0.35 K ⩽ T ⩽ 6 K. A distinct increase of the specificheat derived electronic density of states at the Fermi level is observed at x_b ≈ 0.2, i.e., in the vicinity of the metal-insulator transition occurring for our samples at x_c = 0.16. This suggests a different type of bonding between Au and Si for x < x_b and x > x_b. While resistive transitions to superconductivity are observed for x⩾0.21, the absence of a specific-heat anomaly at the transition points to filamentary superconductivity except for × = 0.35 where a sizable anomaly is seen. The difference in various electronic properties between differently prepared samples of these metastable alloys, in particular the influence of different preparation and annealing temperatures is emphasized. It is suggested that these differences are caused by incipient phase separation in the room-temperature prepared samples.     

Coherent backscattering near the two-dimensional metal-insulator transition

We have studied corrections to conductivity due to the coherent backscattering in low-disordered two-dimensional electron systems in silicon for a range of electron densities including the vicinity of the metal-insulator transition, where the dramatic increase of the spin susceptibility has been observed earlier. We show that the corrections, which exist deeper in the metallic phase, weaken upon approaching the transition and practically vanish at the critical density, thus suggesting that the localization is suppressed near and at the transition even in zero field.     

Unexpected behavior of the local compressibility near the B = 0 metal-insulator transition

We have measured the local electronic compressibility of a two-dimensional hole gas as it crosses the B = 0 metal-insulator transition. In the metallic phase, the compressibility follows the mean-field Hartree-Fock (HF) theory and is found to be spatially homogeneous. In the insulating phase it deviates by more than an order of magnitude from the HF predictions and is spatially inhomogeneous. The crossover density between the two types of behavior agrees quantitatively with the transport critical density, suggesting that the system undergoes a thermodynamic change at the transition.