Advances in LEC growth of InP crystals

By reducing the temperature gradients in the vicinity of the crystal-melt interface, 35-mm-diameter InP boules with much reduced dislocation densities have been grown by the liquid-encapsulated Czochralski technique. A reduction in the residual donor concentration of InP grown by this technique has been achieved by using In-rich charges prepared by adding elemental In to polycrystalline InP ingot material. Nominally undoped crystals with carrier concentrations as low as 1–2 x₄ 10¹⁵ Cm − 1 and 77 K mobilities as high as 7.0 × 10 cm² V⁻¹ s⁻¹ have been obtained. By growing doped crystals at increased seed or crucible rotation rates, short-range longitudinal variations in dopant concentration have been reduced to a few per cent, as determined by optical absorption measurements with a scanning CO₂ laser.     

InP晶片位错密度分布测量

采用国际通用的方法,测定了不同类型的用高压LEC法生长的InP单晶样品的整片位错分布,直观显示位错密度在晶片上的分布情况,分析了EPD分布结果和原因,说明单晶生长工艺和掺杂剂等因素对其产生影响.从数值看,一般掺S的材料位错密度较低,随着掺杂浓度的增加位错密度明显降低,晶片的均匀性也越好.掺Fe的材料位错密度一般,但随着...     

碲锌镉表面腐蚀坑所对应缺陷的特性研究

文中通过使用Nakagawa、Everson、EAg1和EAg2四种常用腐蚀剂对碲锌镉材料的腐蚀 坑空间分布特性进行研究,结果显示, 20μm厚的(111)晶片A、B面上的腐蚀坑在空间位置上不存在对应关系,这表明腐蚀坑所对应的缺陷不是具有穿越特性的位错。腐蚀坑的空间局限性特征和热处理后腐蚀坑密度(EPD)减少等实验结果表明,腐蚀坑更有可能对应某种微沉淀物缺陷,将目前常用腐蚀剂的EPD作为碲锌镉材料的位错密度是缺乏实验依据的。     

异质外延碲镉汞薄膜的位错抑制技术

本文简述了MBE异质外延碲镉汞薄膜位错形成机理、位错在外延层中的演化过程以及位错抑制理论,总结了国内外CdTe缓冲层的位错抑制技术、HgCdTe薄膜的位错抑制技术,分析了热循环退火技术各个要素与位错密度变化之间的关系.     

Cr/In掺杂对用Te溶剂温度梯度溶液法（TGSG）生长的ZnTe晶体质量的影响

对比了用温度梯度溶液法生长的未掺杂、Cr和In掺杂的ZnTe晶体的性能。Cr及In掺杂后ZnTe的吸收边都发生了红移。Cr掺杂在晶体中引入两个特征吸收峰,一个位于约1750 nm,而另一个位于紧挨吸收边的低能一侧。但是本征吸收区域的反射光谱对掺杂并不敏感。未掺杂,Cr掺杂和In掺杂晶体的电阻率分别为10^2 Ω·cm ,103 Ω·cm和10^8 Ω·cm。只有In掺杂的晶体在500-4000 cm^-1范围内红外透过率高于60%。但是Cr掺杂晶体的红外透过率随波数的增加而快速下降,这是因为Cr在ZnTe晶体中的固溶度很低,Cr掺杂后在晶体中会引入一些结构缺陷会对红外光造成散射。     

Ta2O5单晶激光法生长及其介电性质研究

Ta2O5 single crystals have been grown by the laser heated pedestal growth (LHPG) technique up to several centimeters length with diameter of 1.1 mm. The crystal, characterized by X-ray diffraction, dielectric measurement, and thermal expansion analysis, has Htri-Wa2O5 symmetry. Dielectric permittivity, loss tangent along [001] and [110] direction were investigated over the temperature range from -180℃ to 100℃. Large dielectric anisotropy in 2O5 single crystal was observed. At room temperature, the dielectric permittivities (1 MHz) along [001] and [110] are 33.2 and 231.9, respectively. The reason of dielectric enhancement in Ta2O5 crystal grown by LHPG was also discussed.     

Growth and dielectric properties of Ta_2O_5 single crystals grown by laser heated pedestal growth technique

Ta2O5 single crystals have been grown by the laser heated pedestal growth (LHPG) technique up to several centimeters length with diameter of 1.1 mm. The crystal, characterized by X-ray diffraction, dielectric measurement, and thermal expansion analysis, has Htri-Ta2O5 symmetry. Dielectric permittivity, loss tangent along [001] and [110] direction were investigated over the temperature range from -80 ℃ to 100 ℃. Large dielectric anisotropy in Ta2O5 single crystal was observed. At room temperature, the dielectric permittivities (1 MHz) along [001] and [110] are 33.2 and 231.9, respectively. The reason of dielectric enhancement in Ta2O5 crystal grown by LHPG was also discussed.     

Crystal anomaly at the center of S doped InP wafers grown by the LEC method

Crystal quality of 2′ Φ S doped InP substrates grown by the conventional liquid encapsulated Czochralski method was studied by the photoluminescence mapping technique and double crystal x-ray diffraction method. Dark currents of InGaAs/InP PIN-photodiodes (PIN-PDs) fabricated on them showed the existence of an anomaly at the center of the substrate. Photoluminescence intensity abruptly decreased at the center of the substrate. An abnormal curvature of the lattice plane was found at the center of the substrate by the double crystal x-ray diffraction measurement. We discuss the correlation between crystal quality of the substrate and dark currents of PIN-PDs.     

Growth characteristics of CdZnTe layers grown by metalorganic vapor phase epitaxy using dimethylzinc, dimethylcadmium, diethyltelluride, and dimethyltelluride as precursors

Growth characteristics of (100)-oriented CdZnTe layers grown by atmospheric-pressure metalorganic vapor phase epitaxy have been studied using dimethylzinc (DMZn), dimethylcadmium (DMCd), diethyltelluride (DETe), and dimethyltelluride (DMTe) as precursors. Variations of Zn composition and layer growth rate were examined by changing the DMZn supply ratio, defined as DMZn/(DMCd+DMZn), where the precursors are expressed in appropriate units of flow rate, from 0 (no DMZn) to 1.0 (no DMCd), while keeping the total group II supply rate constant. The growth rate of CdZnTe layers was found to decrease monotonically with increase of the DMZn supply ratio. On the other hand, the Zn composition x of grown layers increased gradually up to x=0.04 with increase of the DMZn supply ratio from 0 to 0.8, beyond which the Zn composition increased abruptly to ZnTe. The abrupt transition of Zn composition was suppressed by increasing the VI/II ratio. The growth mechanism of CdZnTe layers was studied based on the observed growth characteristics of CdTe and ZnTe. A higher desorption rate from the growth surface for Zn species than for Cd species, and a higher rate of CdTe formation than ZnTe formation are believed to cause the observed growth characteristics. CdZnTe layers with high crystal quality were grown in a wide range of Zn compositions. The full-width at half-maximum values for x-ray double-crystal rocking-curve measurements were lower than 320 arc-sec for x<0.3 and x>0.75.     

Selective Growth of CdTe on Si(211): First-Principle Calculations

The adsorption of CdTe layers on clean and As-passivated Si(211) substrates has been simulated by first-principle calculations in this study. Based on the simulation results, we theoretically show the important roles of the As₄ passivation during the epitaxial growth. Arsenic can saturate part of the dangling bonds and weaken the surface states. The partial passivation finally induces the B-face polarity selection automatically. This conclusion can provide further explanations for the successful growth of large area high-quality CdTe(211)B layers on the Si(211) substrates.     

Molecular beam epitaxial growth of Cd<Subscript>1−y</Subscript>Zn<Subscript>y</Subscript>Se<Subscript>x</Subscript>Te<Subscript>1−x</Subscript> on Si(211)

We report on the first successful growth of the quaternary alloy Cd_1−yZn_ySe_xTe_1−x(211) on 3-in. Si(211) substrates using molecular beam epitaxy (MBE). The growth of CdZnSeTe was performed using a compound CdTe effusion source, a compound ZnTe source, and an elemental Se effusion source. The alloy compositions (x and y) of the Cd_1−yZn_ySe_xTe_1−x quaternary compound were controlled through the Se/CdTe and ZnTe/CdTe flux ratios, respectively. Our results indicated that the surface morphology of CdZnSeTe improves as the Zn concentration decreases, which fits well with our previous observation that the surface morphology of CdZnTe/Si is poorer than that of CdSeTe/Si. Although the x-ray full-width at half-maximums (FWHMs) of CdZnSeTe/Si with 4% of Zn + Se remain relatively constant regardless of the individual Zn and Se concentrations, etched-pit density (EPD) measurements exhibit a higher dislocation count on CdZnSeTe/Si layers with about 2% Zn and Se incorporated. The enhancement of threading dislocations in these alloys might be due to an alloy disorder effect between ZnSe and CdTe phases. Our results indicate that the CdZnSeTe/Si quaternary material with low Zn or low Se concentration (less than 1.5%) while maintaining 4% total Zn + Se concentration can be used as lattice-matching composite substrates for long-wavelength infrared (LWIR) HgCdTe as an alternative for CdZnTe/Si or CdSeTe/Si.     

Analysis of CZT crystals and detectors grown in russia and the ukraine by high-pressure bridgman methods

Sandia National Laboratories (SNL) is leading an effort to evaluate vertical high pressure Bridgman (VHPB) Cd_1−xZn_xTe (CZT) crystals grown in the former Soviet Union (FSU) (Ukraine and Russia), in order to study the parameters limiting the crystal quality and the radiation detector performance. The stoichiometry of the CZT crystals, with 0.04<x<0.25, has been determined by methods such as proton-induced x-ray emission (PIXE), x-ray diffraction (XRD), microprobe analysis and laser ablation ICP mass spectroscopy (LA-ICP/MS). Other methods such as triaxial double crystal x-ray diffraction (TADXRD), infrared transmission spectroscopy (IR), atomic force microscopy (AFM), thermoelectric emission spectroscopy (TEES) and laser induced transient charge technique (TCT) were also used to evaluate the material properties. We have measured the zinc distribution in a CZT ingot along the axial direction and also its homogeneity. The (Cd+Zn)/Te average ratio measured on the Ukraine crystals was 1.2, compared to the ratio of 0.9–1.06 on the Russian ingots. The IR transmission showed highly decorated grain boundaries with precipitates and hollow bubbles. Microprobe elemental analysis and LA-ICP/MS showed carbon precipitates in the CZT bulk and carbon deposits along grain boundaries. The higher concentration of impurities and the imperfect crystallinity lead to shorter electron and hole lifetimes in the range of 0.5–2 and 0.1 μs, respectively, compared to 3–20 and 1–7 μs measured on U.S. spectrometer grade CZT detectors. These results are consistent with the lower resistivity and worse crystalline perfection of these crystals, compared to U.S.-grown CZT. However, recently grown CZT from FSU exhibited better detector performance and good response to alpha particles.     

Basic studies of gallium nitride growth on sapphire by metalorganic chemical vapor deposition and optical properties of deposited layers

We have studied the growth of gallium nitride on c-plane sapphire substrates. The layers were grown in a horizontal metalorganic chemical vapor deposition reactor at atmospheric pressure using trimethylgallium (TMG) and ammonia (NH₃). Variation of the V/III ratio (150–2500) shows a distinct effect on the growth rate. With decreasing V/III ratio, we find an increasing growth rate. Variation of the growth temperature (700–1000°C) shows a weak increase in growth rate with temperature. Furthermore, we performed secondary ion mass spectroscopy measurements and find an increasing carbon incorporation in the GaN films with decreasing ammonia partial pressure and a growing accumulation of carbon at the substrate interface. Photoluminescence measurements show that samples with high carbon content show a strong yellow luminescence peaking at 2.2 eV and a near band gap emission at 3.31 eV. With increasing carbon content, the intensity of the 3.31 eV line increases suggesting that a carbon related center is involved.