Recombination centers in phosphorous doped hydrogenated amorphous silicon

Optical absorption below the mobility gap of a-SiH_x:P films is derived from photoconductivity measurements and interpreted in terms of optical transitions from occupied localized states in the exponential valence band tail and dangling bond states 0.8 eV above the valence band edge to unoccupied free electron conduction band states. Collection efficiency measurements of Schottky barrier structures indicate that P doping introduces centers with large capture cross-section for holes.     

Dispersive transport and trap saturation in doped hydrogenated amorphous silicon

Transient photocurrent measurements in arsenic-doped hydrogenated amorphous silicon show trap-controlled dispersive transport interrupted by trap saturation in an exponential band tail. A nonlinear temperature dependence of the dispersion parameter α is observed at low temperatures, indicating that the density of shallow traps (～0.1 eV below the mobility edge) is only weakly energy dependent.     

Spectroscopic determination of the position of the ferm-level in doped amorphous hydrogenated silicon

The variation of the Fermi energy E_F of _a-Si:H with boron or phosphorus doping has been determined by means of photoelectron spectroscopy. The results are shown to be consistent with those obtained from the activation energy of the conductivity. The p-type charge carriers are concentrated in a region 0.3 eV above the spectroscopically determined valence band edge.     

Nitrogen doping in hydrogenated amorphous silicon

A direct evidence of substitutional doping in ion beam deposited amorphous hydrogenated silicon by nitrogen is presented. From the analysis of infrared (IR) absorption spectra and Si-2p core level shape, measured with X-ray photoelectron spectroscopy (XPS), the preferential tendency of nitrogen to go in for three-fold coordination at higher concentration and tetrahedral bonding at lower concentration (⩽4 at %) is established. XPS technique has been used for the first time to deduce the upper limit for substitutional solid solubility of the impurity.     

Persistent photoconductivity in hydrogenated amorphous silicon

The persistent photoconductivity (PPC) has been observed in undoped, phosphorus-doped, and boron-doped hydrogenated amorphous silicon (a-Si: H) films. As the annealing temperature is raised for these films the decay of residual conductivity is accelerated and the PPC disappears almost completely after annealing at 500°C. These experimental results rule out the mechanism requiring the phosphorus-boron complexes or the deep defects. The PPC is found to be related with the sample inhomogeneity from the experimental observation that the decay of residual conductivity is closely correlated with the microstructure. A model is proposed to explain the PPC in a-Si: H films.     

Nanoindentation of hydrogenated amorphous silicon

Nanoindentation was carried out on thin films of hydrogenated amorphous silicon (a-Si:H) prepared by plasma-enhanced chemical vapor deposition. The composite values of elastic (Young's) modulus, E _c, and hardness, H _c, of the film/substrate system were evaluated from the load–displacement curves using the Oliver–Pharr approach. The film-only parameters were obtained employing the extrapolation of the depth profiles of E _c and H _c. Scanning probe microscopy was employed to image the nanoindenter impressions and to estimate the effect of film roughness and material pile-up on the testing results. It was established that the elastic modulus of thin a-Si:H films is in the range 117–131 GPa, which is lower than for crystalline silicon. In contrast, the values of hardness are in the range 12.2–12.7 GPa, which is comparable to crystalline silicon and higher than for hydrogen-free amorphous silicon. It is suggested that the plastic deformation of a-Si:H proceeds through plastic flow and it is the presence of hydrogen in the amorphous matrix that leads to a higher hardness.     

Extended-state mobility in hydrogenated amorphous silicon

We use the results of time-of-flight experiments in conjunction with recent conclusions about the behavior of the density of localized states below the conduction-band mobility edge to calculate the mobility of electrons moving in extended states in a-Si:H. We find that the extended-state mobility is considerably larger than previous estimates, which were based on the assumption that the exponential behavior responsible for dispersive transport extends all the way to the mobility edge. Using a recent estimate for the density of localized states, we find that the extended state mobility in a-Si:H is about 500 cm²/V-s, a value consistent with the results deduced from high-level injection experiments on p-i-n structures.     

Radiative recombination in hydrogenated amorphous silicon

Hydrogenated amorphous silicon exhibits efficient optical transitions across a gap larger than that of crystalline Si. Hydrogen passivates the dangling bonds and endows the material with a reduced number of non-radiative recombination centers. A gap widening has been observed in other hydrogenated semiconductors.Research reported herein was supported by the Department of Energy, Division of Solar Technology, under Contract No. EY-76-C-03-1286 and by RCA Laboratories, Princeton, NJ 08540.     

Alternating space-charge-limited currents in hydrogenated amorphous silicon

Space-charge-limited currents in n⁺-i-n⁺ sandwich samples of hydrogenated amorphous silicon have been investigated under alternating current (AC) conditions. When the voltage sweeping rate exceeds the release rate of carriers from deep traps, the AC current-voltage characteristics differ markedly from the direct current (DC) characteristics. This is attributed to the remaining space charge in the samples which acts as a potential barrier and reduces the current. A simple model is proposed to describe the time-dependence of this injection-induced barrier.     

Dynamics of hydrogen in hydrogenated amorphous silicon

The problem of hydrogen diffusion in hydrogenated amorphous silicon (a-Si:H) is studied semiclassically. It is found that the local hydrogen concentration fluctuations-induced extra potential wells, if intense enough, lead to the localized electronic states in a-Si:H. These localized states are metastable. The trapping of electrons and holes in these states leads to the electrical degradation of the material. These states also act as recombination centers for photo-generated carriers (electrons and holes) which in turn may excite a hydrogen atom from a nearby Si-H bond and breaks the weak (strained) Si-Si bond thereby apparently enhancing the hydrogen diffusion and increasing the light-induced dangling bonds.     

Anomalous surface photoconductivity in hydrogenated amorphous silicon

The intensity and time dependence of the source-drain photocurrent is measured on hydrogenated amorphous silicon (a-Si:H) field effect transistors as a function of gate bias. The photocurrent increases rapidly, becomes weakly dependent on excitation intensity, and exhibits long decay times. A model in which the relaxation of the space charge dominates the photocurrent quantitatively predicts the experimental data. The results show that anomalous surface photoconductivity is often the dominant photoresponse of a-Si:H.     

Oxidation studies of hydrogenated amorphous silicon

Hydrogenated amorphous silicon surfaces, atomically clean and subsequently oxidized to up to 20 Å oxide thickness, were studied using AES and UPS. The oxidation was made in O₂ in the pressure range 10^?9 Torr to 5 atm and at 23 and 300°C. The oxidation rate at 23°C was found to be the same as that of crystalline silicon while at 300°C it was appreciably faster. Changes in the d $\text{N(E)}\text{dE}$ AES Si LVV line shape near 80 eV upon oxidation could be correlated to changes in the silicon-oxygen bonding level observed in UPS. The detailed line shape of the AES Si LVV transition indicates that at 300°C a more homogeneous oxide is produced than at 23°C.     

Thermal conductivity of hydrogenated amorphous silicon

The thermal conductivity of amorphous silicon thin films is measured in one dimension steady state condition. The experimental method is based on heating the sample front surface and monitoring the temperatures at its two sides. The experiments were carried out in conditions ensuring one-direction heat flow from top to bottom throughout the sample thickness. Sputtered a-Si:H films prepared with different conditions are used in order to investigate the dependence of thermal conductivity on material properties (i.e. hydrogen content and microstructure). The results show that, firstly, amorphous silicon is a very bad thermal conductor material. Secondly, the disorder in the film network plays an important role in thermal conduction. The highly disordered film exhibits the lowest thermal conductivity.     

Metastability and microstructural changes in hydrogenated amorphous silicon

The effects of prolonged illumination and subsequent thermal treatment, on the valence band density of states in hydrogenated amorphous silicon have been investigated. Significant reversible changes are observed upon light soaking and annealing sequences. A microscopic model consistent with the experimental observations is proposed for the light-induced generation and thermal recovery of defects in a-Si:H.     

Temperature dependence of photodegradation in amorphous hydrogenated silicon

Measurements of steady-state photoconductivity with respect to light-induced defect generation in amorphous hydrogenated silicon (a-Si: H) show that the power index of the time evolution (long-term observation) of the photodegradation is determined by the exposure temperature and the material.