掺有K4Fe(CN)6/K3IrCl6/K4Ru(CN)6的AgClBr微晶的光电子时间分辨谱

微波吸收介电谱检测技术具有很高的时间分辨率 ,可用于固体中电子输运特性的无接触测量 ,是研究晶体中光生载流子寿命及其迁移行为的有效方法。本文利用高时间分辨的微波吸收薄膜介电谱检测装置 ,测量了掺杂K4Fe(CN) 6,K3 IrCl6和K4Ru(CN) 6的AgClBr晶体在 35ps超短脉冲激光曝光后的光电子衰减的时间分辨谱。得到了不同的掺杂剂对AgClBr乳剂的自由光电子和浅俘获光电子的时间特性的影响关系。试验结果表明 ,对于所用的 3种乳剂 ,在掺杂量为 1× 10 -6、掺杂位置为 30 %时 ,掺杂K4Fe(CN) 6的AgClBr乳剂的自由光电子衰减时间相对较短 ,感光度相对较高。利用此方法可进一步研究乳剂光电子时间特性与掺杂剂、颗粒形状、颗粒结构、光谱增感和化学增感剂等参数的依赖关系。     

AgX:I微晶的光电子衰减时间分辨谱测量

利用高时间分辨的微波吸收薄膜介电谱测量技术,采用自行设计的光电子时间分辨谱测量装置(时间分辨率达到1 ns),精确地测量了不同Agx:I材料在35 ps超短脉冲激光曝光后产生的自由光电子和浅俘获光电子随时间衰减的光电子衰减时间分辨谱,分析了不同的[I-]掺杂条件对材料光电子时间特性的影响关系,得到了影响Agx:I微晶光电子时间特性的最佳[I-]掺杂条件。对立方体AgCl乳剂来说,[I-]含量0.5％,掺杂位置80％Ag处时,乳剂的光电子寿命最长。而对T-颗粒AgBr乳剂而言,[I-]含量3％时,乳剂的光电子寿命最长。碘化物对光电子寿命增大的影响是由于碘化物离子可以作为缺陷电子陷阱,这就使得银簇上的反应减小,当碘化物大于3％时,这一效应由于碘化物团簇的形成而消失。     

光谱增感剂对AgBr微晶光电子衰减时间特性的影响

本工作利用高时间分辨的微波吸收薄膜介电谱测量技术,测量了菁染料光谱增感后的AgBr晶体在35ps超短脉冲激光曝光后产生的自由光电子和浅俘获光电子随时间衰减的光电子衰减时间分辨谱,分析了不同的染料增感条件对材料光电子时间特性的影响关系,实验验证了吸附在T-颗粒(111)晶面上的染料比吸附在立方体(100)晶面上的染料更有效、更有助于形成潜影的论据。     

激光等离子体软x光辐射的时间分辨测量

采用透射光栅和软x光条纹相机测量了铜激光等离子体软x光发射的时间分辨光谱。通过比较时间分辨谱和时间积分光谱,从实验上考查了条纹相机在软x光区域的响应特性。文中也给出了激光等离子体软x光不同谱带及波长发射的时间过程。     

光电导过程中陷阱的影响

从理论上提出光折变材料中光电导过程的陷阱作用机制，给出了载流子的光激发，复合及俘获过程的动力学方程，得到了陷阱作用下的光生量子效率的解析表达式，实验上，对掺杂不同浓度的Ｃ６０（Ｃ７０）的ＰＶＫ薄膜的光生载流子量子效率随光强度的变化关系进行了测量，得到了与理论预测相一致的结果。     

不同增感对AgCl乳剂中光电子时间行为的影响

借助微波吸收介电谱检测技术,对AgCl立方体乳剂中光电子的时间行为进行了检测,同时获得了自由光电子与浅束缚光电子在不同增感条件下的时间分辨谱。实验结果表明：化学增感时由于硫加金增感中心的浅电子陷阱作用有效地抑制了空穴与光电子之间的复合,化学增感使得光电子的衰减相对未增感的减缓、衰减时间得到延长;光谱增感时由于染料J聚集体增加了卤化银晶体中添隙银离子的浓度、促进了光电子与添隙银离子之间的结合,光谱增感使得光电子的衰减相对未增感的加剧、衰减时间变短;化学与光谱共同增感使光电子的衰减时间在光谱增感的基础上得到了延长,且硫加金化学增感中心的浅电子陷阱效应在光谱增感的基础上更明显。     

GaAs间隔层厚度对InAs/GaAs量子点分子光学性质的影响

采用光致荧光发射谱(PL)和时间分辨荧光发射谱(TRPL)研究了GaAs间隔层厚度对自组装生长的双层InAs/GaAs量子点分子光学性质的影响.首先,测量低温下改变激发强度的PL谱,底层量子点和顶层量子点的PL强度比值随激发强度发生变化,表明两层量子点之间的耦合作用和层间载流子的转移随着间隔层厚度变大而变弱.接着测量改变温度的PL谱,量子点荧光光谱峰值位置(Emax)、半峰全宽及积分强度随温度发生变化,表明GaAs间隔层厚度直接影响到量子点内载流子的动力学过程和量子点发光的热淬灭过程.最后,TRPL测量发现60mL比40mL间隔层厚度样品的载流子隧穿时间有明显延长.     

感绿光谱增感染料在氯化银微晶表面的电子陷阱效应

光谱增感技术可使卤化银感光材料实现对全波段感光，同时光谱增感技术在现代光信息记录与存储、光电器件、太阳能转换与存储等领域具有重要的应用.应用微波吸收介电谱技术研究了立方体氯化银吸附感绿菁染料后的光电子衰减特性，建立了氯化银光电子衰减动力学模型，根据此模型结合光电子衰减实验结果对光谱增感染料吸附在卤化银表面的电子陷阱效应进行了分析.研究结果表明：当染料以单分子态吸附在卤化银表面时，染料起浅电子陷阱效应；染料以J聚集体吸附在卤化银表面时，染料起到了深电子陷阱效应.浅电子陷阱与深电子陷阱效应的临界浓度为每40g 关键词： 感绿染料 氯化银 光电子衰减 电子陷阱效应     

长寿命吸收过程对超快动力学过程测量的影响

使用飞秒时间分辨抽运-探测透射光谱技术,实验研究了GaAs体材料中光激发载流子的超快弛豫动力学的波长依赖.在相同的光激发载流子浓度和抽运/探测比时,发现760 nm和780 nm两中心波长处的瞬态透射变化延迟扫描信号出现负的和振荡的信号.与模拟计算结果对比,判定该实验瞬态信号是错误的.分析探测器输出波形,发现是由于反相波形导致的,而引起反相波形的原因在于样品中存在长寿命的吸收过程.指出通过提高探测器上的抽运/探测比能够矫正反相波形,从而获得正确的瞬态透射变化动力学.提高探测器上的抽运/探测比与目前的应尽量减小抽运光对探测器的散射贡献的观点是对立的.文章的研究结果对应用抽运-探测时间分辨光谱技术正确地测量超快瞬态动力学过程具有重要的参考价值. 关键词： 时间分辨抽运-探测透射光谱 饱和吸收 吸收增强 GaAs体材料     

卤化银微晶中光电子衰减谱的特性

光电子在卤化银材料潜影形成过程中发挥着重要的作用 ,光电子衰减行为在很大程度上决定于卤化银的晶体结构。采用光学与微波双共振技术 ,测量了自由光电子和浅俘获光电子的衰减谱 ,得到了卤化银中电子陷阱的密度和深度分布。以自由光电子寿命为纽带 ,通过分析掺杂卤化银晶体中电子陷阱的分布情况 ,可以确定浅电子陷阱掺杂剂的最佳掺杂浓度。     

Studying the charge carrier properties in CuInS_2 films via femtosecond transient absorption and nanosecond transient photocurrents

The carrier behavior in CuInS_2 thin films at femtosecond and microsecond time scales is discussed in detail. Transient absorption data suggests that the photo-generated carriers relax rapidly accompanied by a change in energy. The photogenerated charge carriers are extracted by a bias electric field E in the nanosecond transient photocurrent system. An applied E improves the efficiency of photon conversion to charge carriers and enhances the velocity of the extracted charge carriers. In addition, there exists a threshold of illumination intensity in the extraction process of charge carriers in the CuInS_2 thin film, above which carrier recombination occurs. The corresponding loss further increases with illumination intensity and the recombination rate is almost independent of E. Our results provide useful insights into the characteristics of carriers in the CuInS_2 thin film and are important for the operation of optoelectronic devices realized with these films.     

Charge-carrier dynamics in polythiophene films studied by in-situ measurement of flash-photolysis time-resolved microwave conductivity (FP-TRMC) and transient optical spectroscopy (TOS)

An in-situ measurement system for flash-photolysis time-resolved microwave conductivity (FP-TRMC) and transient optical spectroscopy (TOS) has been developed to perform simultaneous measurements of photo-induced changes in conductivity and charge-carrier density in an organic thin film. The electric field in the resonant cavity designed for the present system was analysed by electrostatic simulation. Using the present system and the simulated electric field, the photoconductivity and transient absorption in a regioregular poly(3-hexyl thiophene) film were measured using one particular geometry under photon excitation energies of 6.39, 4.98, 3.48, and 2.34?eV. The dynamics of photogenerated charge carriers is discussed in terms of the excitation energy and incident photon intensity. The transient absorption spectrum induced by 3.48?eV light is presented and compared with the TRMC transient.     

微波吸收法研究Mn,Cu掺杂对ZnS:Mn,Cu光生载流子复合过程的影响

采用微波吸收法，测量了ZnS:Mn,Cu粉末材料受到超短脉冲激光激发后，其光生电子和浅束缚态电子的衰减过程.发现Mn,Cu的浓度对导带电子的寿命有明显的影响，提高掺杂浓度会使光生电子的寿命大大缩短，还研究了掺杂浓度对光致发光强度的影响. 关键词： 发光材料 硫化锌 光电子 微波吸收技术     

Investigation of photoelectron temporal characteristics in silver halide microcrystals using the microwave absorption technique

The free photoelectron lifetime reflects to a large extent the latent image formation efficiency and sensitivity of silver halide material. The microwave absorption dielectric-spectrum technique enables measurement of the photoelectron decay process of silver halide emulsion exposed to 35ps laser pulse. For T-grain AgBr emulsion, the relationship between exciting energy and photoelectron action has been obtained, and the influence of iodide dopants on photoelectron lifetime was measured and analysed. The photoelectron lifetime of dye-sensitized AgBr emulsion with tabular grains is shorter than that with cubic grains, and the latent image formation efficiency of the former is higher than the latter.     

掺杂的AgCl微晶在化学增感条件下的光电子衰减特性

利用微波吸收介电谱技术研究了K₄Fe(CN)₆浅电子陷阱掺杂剂和S+Au增感剂对立方体AgCl微晶光生电子衰减时间分辨特性的影响。结果表明,掺杂浓度为10-8～10-7 mol·mol-1Ag时,在增感之前,掺杂位置越接近表面时,光电子衰减过程会变慢,即衰减时间增加;S+Au增感后的掺杂乳剂中光电子衰减变快,说明了增感中心起深电子陷阱作用,当掺杂位置接近表面90%Ag时,光电子衰减时间突然减小,说明表面掺杂中心和增感中心可能发生了某些反应。     

The influence of trapping centres on the photoelectron decay in silver halide

Photoelectron is the foundation of latent image formation, the decay process of photoelectrons is influenced by all kinds of trapping centres in silver halide. By analysing the mechanism of latent image formation it is found that electron trap, hole trap, and one kind of recombination centre where free electron and trapped hole recombine are the main trapping centres in silver halide. Different trapping centres have different influences on the photoelectron behaviour. The effects of all kinds of typical trapping centres on the decay of photoelectrons are systematically investigated by solving the photoelectron decay kinetic equations. The results are in agreement with those obtained in the microwave absorption dielectric spectrum experiment.     

Entanglement Dynamics of Three Superconducting Charge Qubits Coupled to a Cavity

We investigate the entanglement dynamics of a quantum system consisting of three superconducting charge qubits (SCQs) interacting with a microwave field. For separable and entangled states of the SCQs, the evolutions are studied under various photon numbers of cavity field. The results show that the amplitude and period of the bipartite entanglement square concurrences can be controlled by the choice of initial states of SCQs and photon numberof cavity field, respectively. This simple model of a quantum register allows us to understand the dynamic process of the quantum storage of information carried by charge qubit.     

Microwave conductivity studies on some semiconductors

The cavity perturbation technique is employed for the characterisation of semiconductors at microwave frequency for its conductivity. Temperature variation of microwave conductivity studies provide the information regarding the band gap, scattering parameter and impurity ionization energy. Change in the real part of the dielectric permittivity with conductivity indicates the change in the momentum relaxation time.