p型导电掺In的SnO2薄膜的制备及表征

采用溶胶-凝胶提拉法成功地制备了p型导电掺In的SnO2薄膜.x射线衍射测试结果表明，掺In的SnO2薄膜保持SnO2的金红石结构.吸收谱测试结果表明，掺In的SnO2禁带宽度为3.8eV.霍尔测量结果表明，空穴浓度与热处理温度有很大的关系，525℃为最佳热处 理的温度.铟锡原子比在0.05—0.20范围内，空穴的浓度与In的含量有直接的关系，并随In含量的增加而增加. 关键词： SnO2 溶胶-凝胶法 p型导电     

Cu掺杂SnO_2/TiO_2复合薄膜的制备及性能研究

制备Cu掺杂的纳米Sn O2/Ti O2溶胶,采用旋涂法在载玻片上镀膜,经干燥、煅烧制得Cu掺杂的Sn O2/Ti O2薄膜,通过对比实验探讨掺杂比例、条件、复合形式等对结构和性能的影响。采用XRD、SEM、EDS、UVVis等测试手段对样品进行表征,并以甲基橙为探针考察了其光催化降解性能。XRD测试结果显示薄膜的晶型为锐钛矿型,结晶度较高。SEM谱图显示薄膜表面无明显开裂,粒子分布均匀,粒径约为20 nm。EDS测试结果表明薄膜材料中含有Cu元素,谱形一致。UV-Vis吸收光谱表明Cu掺杂以及Sn O2/Ti O2的复合使得在近紫外区的光吸收比纯Ti O2明显增强。光催化实验表明Cu掺杂后使得Sn O2/Ti O2复合薄膜对甲基橙的光催化降解效率进一步提高,Sn O2/Ti O2复合薄膜的光催化活性在10%Cu掺杂时达到最高。     

Ni/SnO_2复合薄膜的制备与光电性能

采用旋涂法将溶胶-凝胶法制备的Ni/Sn O2凝胶在玻璃基底上镀膜,得到了Ni/Sn O2复合薄膜,探讨了镍掺杂量、煅烧温度对薄膜结构和形貌的影响。通过X射线衍射、红外光谱、扫描电子显微镜等测试手段对Ni/Sn O2复合膜的结构和形貌进行表征。结果显示,500℃下煅烧的薄膜样品的结晶度较高,粒径小,颗粒分布均匀。用紫外-可见分光光度计和四探针电阻仪对其进行光学、电学性能测试,结果显示:适量的Ni掺杂可以提高Sn O2薄膜在近紫外光区的吸收,Ni/Sn O2薄膜在近紫外光区的吸收随着Ni2+掺杂摩尔分数从5%增加到10%而逐渐减小。当Ni2+掺杂摩尔分数为6%时,Ni/Sn O2复合薄膜的导电性能最好。     

Zn,Cu共掺杂的TiO_2:SnO_2薄膜的制备及性能研究

用溶胶-凝胶法制得Zn,Cu共掺杂的TiO_2∶SnO_2凝胶,旋转法于玻璃基底镀膜,制备出Zn,Cu共掺杂的TiO_2∶SnO_2薄膜,探讨了掺杂比例、煅烧温度对其结构、形貌和性能的影响。采用XRD、FTIR、FESEM、PL等测试技术对薄膜进行表征,并考察了其对甲基橙的光催化降解性能。结果表明:600℃时,薄膜粒子的结晶度较高,粒径小,分布均匀,表面平整且无明显裂痕;紫外-可见光谱(UV-Vis)表明:该薄膜在可见光区和紫外区都有很强的吸收;光催化性能测试表明:与纯相TiO_2对比,该样品对甲基橙的光催化降解率有较大提高,在最佳掺杂量比为n(Ti)∶n(Sn)∶n(Zn)∶n(Cu)=10∶3∶1∶1时,光催化降解率最高。     

溶胶-凝胶法制备Li-N双掺p型ZnO薄膜的结构、光学和电学性能

采用溶胶-凝胶法在n型Si(100)衬底上沉积Li-N双掺杂ZnO薄膜,经X射线衍射和扫描电镜图片分析,所制备薄膜具有多晶纤锌矿结构和高的c轴择优取向.室温下霍尔效应测试结果显示Li-N双掺杂ZnO薄膜具有p型导电特性.在Li掺杂量为15.0at%,Li/N（摩尔比）为1∶1,700℃退火等优化条件下得到的最佳电学性能结果是：电阻率为0.34 Ω·cm,霍尔迁移率为16.43 cm²/V·s,载流子浓度为2.79×10¹⁹ cm^{-3关键词： Li-N双掺 p型ZnO薄膜 溶胶-凝胶 性能}     

掺铁TiO2纳米薄膜的制备及光催化性能研究

采用溶胶-凝胶提拉法制备了掺铁改性TiO2纳米材料镀膜玻璃,研究了掺铁、PEG用量、镀膜层数等因素对TiO2纳米膜透光率和光催化降解性的影响,并对相关机理进行了探讨。研究发现,掺铁能提升TiO2纳米膜的光催化活性,催化降解速率为不掺铁时的1．38倍;溶胶前驱体中PEG用量为0．1g（0．13wt％）时制取的薄膜具有最佳的光催化活性和较好的透光率,低于或超过这个值,催化降解效果都不理想;镀膜层数为2～5层时,均有较高的透光率,光催化活性依次递增,其中综合效果最佳的为2层镀膜。纳米TiO2镀膜玻璃是一种性能优异的新型自净节能环保材料,在高楼建筑、灯具制造、城市照明系统等领域具有潜在的广泛用途。     

p型透明导电氧化物CuCr1-xCaxO2的制备与光电性质研究

系统报道了铜铁矿CuCrl-xCaxO2单相多晶材料的制备和光电性质研究结果、X光衍射(XRD)以及电导的测量．结果表明，适当的Ca^2取代Cr^3+不改变材料的晶体结构，但能显著提高材料的导电性能，χ=0．06的原始Ca^2+掺杂样品在室温的电导率达到3．2×10^-2S／cm，几乎比不掺杂样品的电导率提高了近3个数量级．所有掺杂样品的电导率随温度的变化曲线在200～300K，很好地符合Arrhenius关系，其Seebeek常数均为很大的正数，这表明所有样品均为典型的P型半导体，其热激活能为0．27～0．36eV.     

溶剂对溶胶-凝胶法制备的掺铝氧化锌透明导电薄膜性质的影响

采用溶胶-凝胶法在玻璃基底上制备得到了高透光率,高导电性的掺铝氧化锌薄膜。研究了溶剂对薄膜晶体结构,薄膜厚度,表面形貌,光学性质和电学性质的影响,结果表明:在相同的制备条件下,薄膜的厚度随溶剂沸点的升高而降低;低沸点溶剂制备的薄膜由c轴择优取向的六角纤锌矿结构的晶体构成,且比较致密;所有薄膜可见光区的透光率在85%以上;乙二醇独甲醚为溶剂制备的薄膜电阻率最低,为3.0×1-0 4Ωm。     

纳米掺N TiO2的制备及光谱分析

以钛酸四丁酯(TBT)及乙二胺(EDA)为前驱体,乙醇为溶剂,冰醋酸为抑制剂,通过溶胶-凝胶法制备了纳米掺NTiO2,并对其结构及光谱性质进行了表征,根据差热-热重分析(TG-DTA)确定了所制备样品的晶型转换温度及最佳的煅烧温度;根据紫外-可见漫反射光谱(UV-Vis/DRS)表征了其光谱吸收特性;根据X射线衍射光谱(XRD)确定了其粒径及晶相结构;根据X射线光电子能谱(XPS)分析了其表面组成。实验考察了光谱吸收带红移程度与乙二胺、钛酸四丁酯的配比及煅烧温度的关系。研究结果表明,制备的纳米掺NTiO2为锐钛矿相,其光谱吸收带发生了明显的红移,乙二胺与钛酸四丁酯的配比及煅烧温度对其光谱吸收有明显的影响。当乙二胺与钛酸四丁酯的摩尔比为1:10,煅烧温度为600℃时,所制备样品对可见光的吸收最强。     

Nb/SnO2复合薄膜的制备、结构及光电性能

用溶胶-凝胶旋涂法在玻璃基底上制备出Nb/SnO₂复合透明导电薄膜,利用XRD,SEM,紫外—可见分光光度计,四探针电阻仪等测试方法对Nb/SnO₂复合薄膜的结构和物性进行了研究.结果表明: 当Nb含量小于0.99at%时,Nb/SnO₂复合薄膜为较纯的四方金红石结构;复合薄膜中晶粒分布均匀,平均尺寸在5—7 nm.当Nb含量小于0.99at%时,Nb/SnO₂复合薄膜的电阻率先减小后增大,当Nb含量为0.37at%时 关键词： 溶胶-凝胶法 2复合薄膜')" href="#">Nb/SnO₂复合薄膜 结构表征 光电性能     

Epitaxial Bi2Sr2CuOy thin films as p-type transparent conductors

Development of p-type transparent conducting thin films is tireless due to the trade-off issue between optical transparency and conductivity. The rarely concerned low normal state resistance makes Bi-based superconducting cuprates the potential hole-type transparent conductors, which have been realized in Bi₂Sr₂CaCu₂O_y thin films. In this study, epitaxial superconducting Bi₂Sr₂CuO_y and Bi₂Sr_1.8Nd_0.2CuO_y thin films with superior normal state conductivity are proposed as p-type transparent conductors. It is found that the Bi₂Sr_1.8Nd_0.2CuO_y thin film with thickness 15 nm shows an average visible transmittance of 65% and room-temperature sheet resistance of 650 Ω/sq. The results further demonstrate that Bi-based cuprate superconductors can be regarded as potential p-type transparent conductors for future optoelectronic applications.     

溶胶-凝胶法MgF2紫外增透膜的制备和性能研究

采用溶胶-凝胶法,以醋酸镁和氟化氢为原料,以甲醇为溶剂制备了MgF2溶胶,利用浸渍提拉法在洁净石英基片上镀膜,考察了反应温度对溶胶微结构、薄膜结构和性能的影响。样品采用激光动态光散射、透射电镜、X射线粉体衍射仪、紫外-可见光谱仪、原子力显微镜进行表征。结果表明：通过该方法制备的表面平整的低折射率MgF2薄膜,在紫外区具有很好的增透性能,同时在紫外波长355 nm激光的辐照下（脉宽6 ns）,薄膜具有较高的抗激光损伤性能,激光损伤阈值达10.85 J·cm-2。     

Optoelectronic properties of SnO_2 thin films sprayed at different deposition times

This article presents the elaboration of tin oxide(SnO_2) thin films on glass substrates by using a home-made spray pyrolysis system. Effects of film thickness on the structural, optical, and electrical film properties are investigated. The films are characterized by several techniques such as x-ray diffraction(XRD), atomic force microscopy(AFM), ultravioletvisible(UV–Vis) transmission, and four-probe point measurements, and the results suggest that the prepared films are uniform and well adherent to the substrates. X-ray diffraction(XRD) patterns show that SnO_2 film is of polycrystal with cassiterite tetragonal crystal structure and a preferential orientation along the(110) plane. The calculated grain sizes are in a range from 32.93 nm to 56.88 nm. Optical transmittance spectra of the films show that their high transparency average transmittances are greater than 65% in the visible region. The optical gaps of SnO_2 thin films are found to be in a range of 3.64 e V–3.94 e V. Figures of merit for SnO_2 thin films reveal that their maximum value is about 1.15 × 10-4-1?atλ = 550 nm. Moreover, the measured electrical resistivity at room temperature is on the order of 10-2?·cm.     

Preparation and characterization of Mg-doped ZnO thin films by sol-gel method

Undoped and Mg-doped ZnO thin films were deposited on Si(1 0 0) and quartz substrates by the sol-gel method. The thin films were annealed at 873 K for 60 min. Microstructure, surface topography and optical properties of the thin films have been measured by X-ray diffraction (XRD), atomic force microscope (AFM), UV-vis spectrophotometer, and fluorophotometer (FL), respectively. The XRD results show that the polycrystalline with hexagonal wurtzite structure are observed for the ZnO thin film with Mg:Zn = 0.0, 0.02, and 0.04, while a secondary phase of MgO is evolved for the thin film with Mg:Zn = 0.08. The ZnO:Mg-2% thin film exhibits high c-axis preferred orientation. AFM studies reveal that rms roughness of the thin films changes from 7.89 nm to 16.9 nm with increasing Mg concentrations. PL spectra show that the UV-violet emission band around 386-402 nm and the blue emission peak about 460 nm are observed. The optical band gap calculated from absorption spectra and the resistivity of the ZnO thin films increase with increasing Mg concentration. In addition, the effects of Mg concentrations on microstructure, surface topography, PL spectra and electrical properties are discussed.     

N离子注入富氧ZnO薄膜的p型导电及拉曼特性研究

采用射频磁控溅射法在富氧环境下制备ZnO薄膜, 继而结合N离子注入及热退火实现薄膜的N掺杂及p 型转变, 借助霍尔测试和拉曼光谱研究了N离子注入富氧ZnO薄膜的p型导电及拉曼特性. 结果表明, 在 600 ℃温度下退火120 min可获得性能较优的p-ZnO: N薄膜, 其空穴浓度约为2.527×10¹⁷ cm^-3. N离子注入ZnO引入了三个附加拉曼振动模, 分别位于274.2, 506.7和640.4 cm^-1. 结合电学及拉曼光谱的分析发现, 退火过程中施主缺陷与N受主之间的相互作用对p-ZnO的形成产生重要影响.     

溶胶-凝胶法制备纳米多孔SiO2薄膜

以正硅酸乙酯(TEOS)为原料，采用旋转涂敷的方法，结合溶胶-凝胶技术在硅衬底上制备超低介电常数多孔SiO₂薄膜.采用两种不同的改性方法对薄膜表面进行改性，傅里 叶变换红外光谱分析发现改性后薄膜中含有大量的—CH₃键，从而减少了孔洞塌陷.用扫 描电子显微镜观察薄膜的表面形貌，发现薄膜内孔洞尺寸在70—80 nm之间.调节溶胶pH值，发现pH值越小凝胶时间越长.对改性样品热处理的结果表明，在300 ℃时介电常数最低达2.05. 关键词： 2')" href="#">多孔SiO₂ 低介电常数 溶胶-凝胶     

p型ZnO薄膜的制备及特性

采用射频磁控溅射在Si片上制备ZnO薄膜，通过离子注入对样品进行N掺杂，在不同温度下进行退火并实现了p型转变.用扫描电子显微镜、X射线衍射和Hall测量对薄膜进行了表征，结果表明薄膜具有良好的表面形貌和高度c轴择优取向，退火后p型ZnO薄膜的最高载流子浓度和最低电阻率分别为1.68×10¹⁶cm^-3和41.5Ω·cm.讨论并分析了退火温度和时间对ZnO薄膜p型转变的影响.     

p-type ZnO thin films grown by RF plasma beam assisted Pulsed Laser Deposition

The high exciton binding energy and band gap energy of ZnO thin films open the prospect of fabricating semiconductor lasers in the ultraviolet spectral range. A prerequisite for laser diode fabrication is highly p-doped ZnO which was not reproducibly obtained up to now. Without intentional doping ZnO exhibits n-type conduction. ZnO thin films have been obtained by radio-frequency assisted pulsed laser deposition. A metallic Zn target was used for ablation in an oxygen and nitrogen RF discharge. The electrical and morphological properties of the films grown on Si were studied by Atomic Force Microscopy (AFM), X-ray diffraction (XRD), Transmission Electron Microscopy (TEM), optical absorption and Hall Effect measurements for different ratios between the nitrogen and oxygen content. The AFM images of the as-grown ZnO films reveal high quality surfaces with low values for the surface roughness and a sharp distribution of grains sizes as an effect of the RF discharge. The XRD patterns for all samples exhibit only (002) and (004) peaks indicating that the c-axis is always oriented normal to the substrate surface. The films present p-type conductivity with different carrier concentration and mobility depending on the nitrogen/oxygen ratio.