Improvement of photoluminescence properties of porous silicon by silica passivation

Porous silicon (PS) was passivated by silica film using a sol-gel method; the photoluminescence (PL) properties were significantly improved; namely, PL intensity and stability increased and PL peak shifted to shorter wavelength. Scanning electron microscope (SEM) and Fourier transformed infrared spectroscope (FTIR) results indicated that silica passivation produced a compact film on the PS surface and modified the surface state of PS. The number of stable surface bonds (HSiO₃, HSiSiO₂ and H₂SiO₂) increased due to the oxidation of SiH back-bonds during the gelation process, and thus the PL intensity and stability were improved. Moreover, the blue-shift of PL peak was determined due to the increase in the ratio of SiO/SiH.     

Si-nanostructures formation in amorphous silicon nitride SiNx:H deposited by remote PECVD

The formation of silicon nanoclusters embedded in amorphous silicon nitride (SiN_x:H) can be of great interest for optoelectronic devices such as solar cells. Here amorphous SiN_x:H layers have been deposited by remote microwave-assisted chemical vapor deposition at 300 °C substrate temperature and with different ammonia [NH₃]/silane [SiH₄] gas flow ratios (R=0.5−5). Post-thermal annealing was carried out at 700 °C during 30 min to form the silicon nanoclusters. The composition of the layers was determined by Rutherford back scattering (RBS) and elastic recoil detection analysis (ERDA). Fourier transform infrared spectroscopy (FTIR) showed that the densities of SiH (2160 cm⁻¹) and NH (3330 cm⁻¹) molecules are reduced after thermal annealing for SiN:H films deposited at flow gas ratio R>1.5. Breaking the SiH bonding provide Si atoms in excess in the bulk of the layer, which can nucleate and form Si nanostructures. The analysis of the photoluminescence (PL) spectra for different stoichiometric layers showed a strong dependence of the peak characteristics (position, intensity, etc.) on the gas flow ratio. On the other hand, transmission electron microscopy (TEM) analysis proves the presence of silicon nanoclusters embedded in the films deposited at a gas flow ratio of R=2 and annealed at 700 °C (30 min).     

Controlling surface states and photoluminescence of porous silicon by low-energy-ion irradiation

Porous silicon (PS) was irradiated by three kinds of low-energy ions with different chemical activity, namely argon ions, nitrogen ions and oxygen ions. The chemical activity of ions has significant effect on the surface states and photoluminescence (PL) properties of PS, The photoluminescence quenching after argon ions and nitrogen ions irradiation is ascribed to the broken Si-Si bonds, while the PL recovery is attributed to the oxidation of Si-H back bonds. Oxygen ions irradiation leads to the formation of a SiO_x layer with oxygen defects and PS shows different PL evolution than PS irradiated by argon ions and nitrogen ions.     

Structural and optical evaluation of WOxNy films deposited by reactive magnetron sputtering

Thin films of tungsten oxynitrides were deposited on substrates preheated at 300 °C from metallic tungsten target using reactive pulsed d.c. magnetron sputtering. The deposition was carried out at different nitrogen to total reactive gas partial pressures ratios. The energy dispersive analysis of X-ray showed that significant incorporation of nitrogen occurred only when the nitrogen partial pressure exceeded 74% of the total reactive gas pressure. X-ray diffraction analysis revealed that the formation of a specific crystalline phase is affected by the composition and the possibility of competitive growth of different phases. The increase of nitrogen content into the films increases the optical absorption and decreases the optical band gap. The refractive index was determined from the transmittance spectra using Swanepoel's method. It was found that the refractive index increases with increasing nitrogen content over the entire spectral range. The values of the tungsten effective coordination number, N_c, was estimated from the analysis of the dispersion of the refractive index, and an increase in N_c with increasing nitrogen content was observed.     

Electrical and optical properties of thin film of amorphous silicon nanoparticles

Electrical and optical properties of thin film of amorphous silicon nanoparticles (a-Si) are studied. Thin film of silicon is synthesized on glass substrate under an ambient gas (Ar) atmosphere using physical vapour condensation system. We have employed Field Emission Scanning Electron Microscopy (FESEM), Transmission Electron Microscopy (TEM) and Atomic Force Microscopy (AFM) to study the morphology and microstructure of this film. It is observed that this silicon film contains almost spherical nanoparticles with size varying between 10 and 40 nm. The average surface roughness is about 140 nm as evident from the AFM image. X-ray diffraction analysis is also performed. The XRD spectrum does not show any significant peak which indicates the amorphous nature of the film. To understand the electrical transport phenomena, the temperature dependence of dc conductivity for this film is studied over a temperature range of (300-100 K). On the basis of temperature dependence of dc conductivity, it is suggested that the conduction takes place via variable range hopping (VRH). Three-dimensional Mott's variable range hopping (3D VRH) is applied to explain the conduction mechanism for the transport of charge carriers in this system. Various Mott's parameters such as density of states, degree of disorder, hopping distance, hopping energy are estimated. In optical properties, we have studied Fourier transform infra-red spectra and the photoluminescence of this amorphous silicon thin film. It is found that these amorphous silicon nanoparticles exhibits strong Si-O-Si stretching mode at 1060 cm⁻¹, which suggests that the large amount of oxygen is adsorbed on the surface of these a-Si nanoparticles. The photoluminescence observed from these amorphous silicon nanoparticles has been explained with the help of oxygen related surface state mechanism.     

Quantum confinement and interface structure of Si nanocrystals of sizes 3–5 nm embedded in a-SiO2

Spectroscopic ellipsometry and Monte Carlo simulations are employed to answer the fundamental question whether the energy gaps of Si nanocrystals with sizes in the range of 3–5 nm, which are embedded in amorphous silica, follow or deviate from the quantum confinement model, and to examine their interfacial structure. It is shown that the optical properties of these nanocrystals are well described by the Forouhi–Bloomer interband model. Analysis of the optical measurements over a photon-energy range of 1.5–5 eV shows that the gap of embedded nanocrystals with a mean size of 3.9 nm follows closely quantum confinement theory. A large band gap expansion (0.65 eV) compared to bulk Si is observed. The Monte Carlo simulations reveal a non-abrupt interface and a large fraction of interface oxygen bonds. This, in conjunction with the experimental observations, indicates that oxygen states and the chemical disorder at the interface have a negligible influence on the optical properties of the material in this size regime.     

Effect of aluminium doping and annealing on structural and optical properties of cerium oxide nanocrystals

Nanocrystalline fluorite-like structures of Ce_1−xAl_xO_2−δ compounds were prepared by the chemical precipitation method using cerium chloride and aluminium chloride as precursors. The prepared samples were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM) and diffuse reflectance spectroscopy (DRS). The effects of aluminium doping concentration and annealing on particle size, lattice parameter and band gap energies were investigated. The particle size of Al-doped CeO₂ samples were found to decrease with Al concentration and it increases from 6 to 20 nm as annealing temperature increases to 900 °C.     

Effect of iron doping and annealing on structural and optical properties of cerium oxide nanocrystals

Nanocrystalline fluorite-like structures of Ce_1−xFe_xO_2−δ compounds were prepared by chemical precipitation method using cerium chloride and iron chloride as precursors. The prepared samples were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM) and diffuse reflectance spectroscopy (DRS). The effects of iron doping concentration and annealing on particle size, lattice parameter and band gap energies were investigated. The particle size of Fe-doped CeO₂ samples were found to decrease with iron concentration and it increases from 9 to 26 nm as annealing temperature increases to 900 °C.     

Composition and thermal-induced effects on the optical constants of Ge20Se80−xBix thin films

 The effects of composition and thermal annealing near crystallization temperature, T_c on the optical and structural properties of Ge₂₀Se_80−xBi_x (x=0, 2.5, 5 and 7.5 at%) was investigated. The influence of incorporation Bi content in Ge₂₀Se_80−xBi_x system results in a gradual decrease in the indirect optical gap from 1.89 to 1.44 eV, this behavior can be explained as increased tailing. On annealing, the optical band gap E_g decreases gradually for the crystallized films while the refractive index increases, this behavior can be attributed to transformation from amorphous to crystalline and was explained in the light of dangling bond model. The refractive index n of as-prepared and annealed films has been analyzed according to the Wwmple–DiDominico single oscillator model and the values of E_o and E_d were determined. The effect of annealing on the nature and degree of crystallization has been investigated by studying the structure using transmission electron microscope, X-ray diffraction and scanning electron microscope.     

Ab initio study of structural, electronic and optical properties of Ca1−xSrxS compounds

Full-potential linearized augmented plane wave method (FP-LAPW) within density functional theory has been used to calculate structural, electronic and optical properties of Ca_1−xSr_xS, an alkali earth chalcogenide, with varying compositional parameter x in the range 0<x<1. Whereas the structural properties are discussed in terms of charge transfer between the two cations, calculated electronic band structure and density of states have been analyzed in terms of contribution from the S p, Ca d and Sr d states. Furthermore, we have calculated some optical properties such as real and imaginary parts of dielectric constant, ε(ω), and the calculated results have been discussed in comparison with the existing experimental data and other theoretical calculations.     

Effects of magnesium film thickness and annealing temperature on formation of Mg2Si films on silicon (1 1 1) substrate deposited by magnetron sputtering

Magnesium films of various thicknesses were first deposited on silicon (1 1 1) substrates by magnetron sputtering method and then annealed in annealing furnace filled with argon gas. The effects of the magnesium film thickness and the annealing temperature on the formation of Mg₂Si films were investigated by means of X-ray diffraction (XRD) and scanning electron microscopy (SEM). The Mg₂Si thin films thus obtained were found to be polycrystalline and the Mg₂Si (2 2 0) orientation is preferred regardless of the magnesium film thickness and annealing temperature. XRD results indicate that high quality magnesium silicide films are produced if the magnesium/silicon samples are annealed at 400 °C for 5 h. Otherwise, the synthesized films annealed at annealing temperatures lower than 350 °C or higher than 450 °C contain magnesium crystallites or magnesium oxide. SEM images have revealed that microstructure grains in the polycrystalline films are about 1-5 μm in dimensions, and the texture of the Mg₂Si films becomes denser and more homogeneous as the thickness of the magnesium film increases.     

嵌埋Ni颗粒的BaTiO_3/SrTiO_3薄膜的相变特性

采用高温X射线原位衍射和变温介电谱对SrTiO3基底上外延生长的BaTiO3(嵌埋Ni颗粒)薄膜进行了相变特性分析。从X射线衍射和介电谱的分析结果得出,BaTiO3的相变温度点转变为弥散的温度区间。在这个弥散的相变温度区间内,由于基底和薄膜之间的失配,以及嵌埋Ni颗粒的应力作用,薄膜的介电响应弥散剧烈,并偏离德拜弛豫。分析Cole-Cole图获知,BaTiO3薄膜在四方相转变为立方相的相变过程中同时存在几种极化机制,在高温状态下介电损耗随温度增大而增大。降温过程中,薄膜没有立即恢复四方相,可能是基底和Ni颗粒的共同作用影响了相变弛豫。     

Preparation and characterization of superionic materials in a new mixed system (Cu(1−x)AgxI)–(Ag2O)–(P2O5), (0.05≤x≤0.25)

In this paper attempts have been made to prepare superionic glassy electrolytes in the mixed system 30(Cu_(1−x)Ag_xI)–46.66(Ag₂O)–23.33(P₂O₅), where x=0.05, 0.1, 0.15, 0.2 and 0.25, respectively, using the melt quenching process. The solid samples were characterized by X-ray diffraction (XRD), differential scanning calorimetry (DSC), Fourier transform infrared (FT-IR) spectroscopy and silver ionic transport number studies. XRD analysis and FT-IR spectroscopic results have provided details regarding the various phases present in the new system and also indicated the formation of composite materials consisting of glassy and crystalline phases. The transport number measurements have indicated the formation of superionic solids having Ag⁺ ions as the mobile species in the present system.     

Modifications induced in the polycarbonate Makrofol KG polymer by Li (50 MeV) ion irradiation

Swift heavy ions interact predominantly through inelastic scattering while traversing any polymer medium and produce excited/ionized atoms. Here samples of the polycarbonate Makrofol of approximate thickness 20 μm, spin coated on GaAs substrate were irradiated with 50 MeV Li ion (+3 charge state). Build-in modifications due to irradiation were studied using FTIR and XRD characterizations. Considerable changes have been observed in the polymer while varying the fluence from 1E11 ion/cm² to 1E13 ion/cm² Li ions. AFM images of the surface modifications caused by ion irradiation on the polymer are also presented.      

Chemical spray pyrolysis deposition and characterization of p-type CuCr1−xMgxO2 transparent oxide semiconductor thin films

A chemical spray pyrolysis technique for deposition of p-type Mg-doped CuCrO₂ transparent oxide semiconductor thin films using metaloorganic precursors is described. As-deposited films contain mixed spinel CuCr₂O₄ and delafossite CuCrO₂ structural phases. Reduction in spinel CuCr₂O₄ fraction and formation of highly crystalline films with single phase delafossite CuCrO₂ structure is realized by annealing at temperatures ?700 °C in argon. A mechanism of synthesis of CuCrO₂ films involving precursor decomposition, oxidation and reaction between constituent oxides in the spray deposition process is presented. Post-annealed CuCr_0.93Mg_0.07O₂ thin films show high (?80%) visible transmittance and sharp absorption at band gap energy with direct and indirect optical band gaps 3.11 and 2.58 eV, respectively. Lower (∼450 °C) substrate temperature formed films are amorphous and yield lower direct (2.96 eV) and indirect (2.23 eV) band gaps after crystallization. Electrical conductivity of CuCr_0.93 Mg_0.07O₂ thin films ranged 0.6-1 S cm⁻¹ and hole concentration ∼2×10¹⁹ cm⁻³ determined from Seebeck analysis. Temperature dependence of conductivity exhibit activation energies ∼0.11 eV in 300-470 K and ∼0.23 eV in ?470 K region ascribed to activated conduction and grain boundary trap assisted conduction, respectively. Heterojunction diodes of the structure Au/n-(ZnO)/p-(CuCr_0.93Mg_0.07O₂)/SnO₂ (TCO) were fabricated which show potential for transparent wide band gap junction device.     

On the optical properties of amorphous Ge-Ga-Se-KBr films prepared by pulsed laser deposition

Amorphous thin films (1 − x)(4GeSe₂-Ga₂Se₃)-xKBr (x = 0, 0.1, 0.2, 0.3) were prepared by the pulsed laser deposition (PLD) technique. The optical parameters were calculated using the Swanepoel method from the optical transmission spectra. The optical band gap () of the studied films increased while the index of refraction decreased when increased the content of KBr. The Tauc slopes were discussed as an indicator of the degree of structural randomness of amorphous semiconductors. The index of refraction decreased and increased after annealing of as-deposited films below the glass transition temperature. The thermal-bleaching and thermal- contraction effects were observed, which are discussed in relation to the reduction in the density of homopolar bonds confirmed by the Raman spectra analysis and the decreased amount of fragments of the as-deposited films, respectively.     

The influence of CHx coating on the optical properties of porous silicon

In this work, we report a study on the influence of CH_x thickness layer on optical properties of CH_x/PS/Si structures. The hydrocarbon groups were deposited by plasma of methane–argon mixture.The properties of these structures are investigated by photoluminescence (PL), reflection and spectral response measurements from where a different behavior depending on CH_x layer thickness has been observed.The entire total reflection spectrum is modulated by Fabry–Pérot fringes that are a result of thin film interference. As the CH_x layer thickness increases, the amplitude of the interferences decreases and a positive shift of the maximum peak is observed.The PL spectra from CH_x/PS samples with two CH_x layer thicknesses show more intense luminescence than that observed from PS sample and the existence of an optimum thickness CH_x that gives the maximum PL intensity. The spectral response spectra show the presence of an intense peak at 450 nm. Finally, the results point out the importance of CH_x coating in optoelectronic applications.     

尿液pH变化与尿液中纳米微晶组分的关系

采用X射线衍射(XRD)和傅里叶变换红外光谱(FTIR)研究了尿液pH变化与尿液中纳米微晶组分的关系。不但尿pH差异大的不同人尿液中微晶组分存在差异,而且同一人的尿pH发生变化时,其尿微晶亦发生变化。尿pH值较低(如pH＜5.8)时,主要为尿酸、酸式磷酸盐和草酸钙等;尿pH值较高(如pH＞6.2)时,主要为尿酸盐、磷酸盐、磷酸铵镁和草酸钙等。联合运用XRD和FTIR两种方法,可以更好地检测尿液中晶体组分,有助于了解尿石症的成因。     

Investigation on the effect of Zr doping in ZnO thin films by spray pyrolysis

Zirconium doped zinc oxide thin films with enhanced optical transparency were prepared on Corning 1737 glass substrates at the substrate temperature of 400 °C by spray pyrolysis method for various doping concentrations of zirconium (IV) chloride in the spray solution. The X-ray diffraction studies reveal that the films exhibit hexagonal crystal structure with polycrystalline grains oriented along (0 0 2) direction. The crystalline quality of the films is found to be deteriorating with the increase of doping concentration and acquires amorphous state for higher concentration of 8 at.% in precursor solution. The average transmittance for 5 at.% (solution) zirconium doped ZnO film is significantly increased to ∼92% in the visible region of 500-800 nm. The room temperature photoluminescence (PL) spectra of films show a band edge between 3.41 and 3.2 eV and strong blue emission at 2.8 eV irrespective of doping concentration and however intensity increases consistently with doping levels. The vacuum annealing at 400 °C reduced the resistivity of the films significantly due to the coalescence of grains and the lowest resistivity of 2 × 10⁻³ Ω cm is observed for 3 at.% (solution) Zr doped ZnO films which envisages that it is a good candidate for stable TCO material.     

Growth Kinetics of Silicon Carbide Film Prepared by HeatingPolystyrene/Si(111)

在不同的温度下热处理用sol-gel法制的PS/Si(111)叠层凝胶膜制备出了SiC薄膜．用XRD、SEM、XPS、FTIR等分析方法研究了SiC薄膜的结构、组成和表面形貌等．根据FTIR光谱计算了不同温度下得到的SiC薄膜的厚度,并研究了PS/Si(111)热解法生长SiC薄膜的生长动力学．结果表明,随着生长温度的增加,SiC薄膜生长速率变化趋势为：1200～1250 oC生长速率增加缓慢是2D生长机制,1250～1270 oC生长速率快速增加是3D生长机制,1270～1300 oC生长速率为负增长是由于SiC薄膜生长与Si和C原子的挥发共同作用所致．由速率变化求得各段表观生长激活能分别是122.5、522.5、-127.5 J/mol．