Selective Oxidation of Toluene with Hydrogen Peroxide Catalyzed by V-Mo-based Catalyst

The selective catalytic oxidation of toluene with hydrogen peroxide over V-Mo-based catalysts under mild conditions was studied.The promotion effect of Mo on the catalysts was studied with V/Al2O3 and Mo/Al2O3 as reference samples.The catalysts were characterized by XRD,TPR,and XPS techniques.The results show that the addition of Mo to V/Al2O3 may change the distribution of V species on Al2O3 surface.Over V-Mo/Al2O3 catalyst,highly dispersed amorphous V species facilitates benzaldehyde formation,and crystalline V2O5 species increases the conversion of toluene but decreases the selectivity to benzaldehyde,while AlVMoO7 species favors both the conversion of toluene and the formation of cresols.The yield of benzaldehyde depends remarkably on the surface O/Al and Mo/V atomic ratios,and gets to a maximum value of 13.2% with a selectivity of 79.5% at an O/Al atomic ratio of 3.0 and Mo/V atomic ratio of 0.7.     

GaAs(100)表面氧化的XPS研究

X-ray photoelectron spectroscopy（XPS）was used to study two different oxidation treatments on the GaAs（100）surface———the thermal oxidation in the air,and the ultraviolet-light oxidation in the UV-ozone. A series of properties including the oxide composition,chemical states,the surface Ga/As atomic ratio and the thickness of the oxide layer grown on GaAs surface were compared. The results indicate that the oxide composition,the surface Ga / As atomic ratio and the thickness of the oxide layer oxide on GaAs surface are different for different oxidation methods. The oxides on GaAs surface grown by thermal oxidation in the air are composed of Ga2O3,As2O5,As2O3 and elemental As;and the Ga/As atomic ratio is drifted off the stoichiometry far away. The Ga/As atomic ratio of oxide layer on GaAs surface is increases with the thickness of oxide. However,the oxides on GaAs surface grown by UV-ozone are made up of only Ga2O3 and As2O3,As2O5 and elemental As are not detected,the Ga/As atomic ratio is close to unity. The thickness of oxide layer on GaAs can be controlled by the UV exposing time. The mechanism of oxidation of GaAs is also discussed. The UV-light radiation not only causes the oxygen molecular excited forming atomic oxygen,but also induces the valence electrons of the GaAs excited from the valence band,and then the reactivity of Ga and As atom increase,and they can easily react with the excited atomic oxygen at the same reactive velocity.     

Oxidation of methanol to formaldehyde on supported vanadium oxide catalysts compared to gas phase molecules

The oxidation of methanol to formaldehyde on silica supported vanadium oxide is studied by density functional theory. For isolated vanadium oxide species silsesquioxane-type models are adopted. The first step is dissociative adsorption of methanol yielding CH3O(O=)V(O-)2 surface complexes. This makes the O=V(OCH3)3 molecule a suited model system. The rate-limiting oxidation step involves hydrogen transfer from the methoxy group to the vanadyl oxygen atom. The transition state is biradicaloid and needs to be treated by the broken-symmetry approach. The activation energies for O=V(OCH3)3 and the silsesquioxane surface model are 147 and 154 kJ/mol. In addition, the (O=V(OCH3)3)(2) dimer (a model for polymeric vanadium oxide species) and the O=V(OCH3)3(*+) radical cation are studied. For the latter the barrier is only 80 kJ/mol, indicating a strong effect of the charge on the energy profile of the reaction and questioning the significance of gas-phase cluster studies for understanding the activity of supported oxide catalysts.     

Particle size dependent adsorption and reaction kinetics on reduced and partially oxidized Pd nanoparticles

Combining scanning tunneling microscopy (STM), IR reflection absorption spectroscopy (IRAS) and molecular beam (MB) techniques, we have investigated particle size effects on a Pd/Fe(3)O(4) model catalyst. We focus on the particle size dependence of (i) CO adsorption, (ii) oxygen adsorption and (iii) Pd nanoparticle oxidation/reduction. The model system, which is based on Pd nanoparticles supported on an ordered Fe(3)O(4) film on Pt(111), is characterized in detail with respect to particle morphology, nucleation, growth and coalescence behavior of the Pd particles. Morphological changes upon stabilization by thermal treatment in oxygen atmosphere are also considered. The size of the Pd particles can be varied roughly between 1 and 100 nm. The growth and morphology of the Pd particles on the Fe(3)O(4)/Pt(111) film were characterized by STM and IRAS of adsorbed CO as a probe molecule. It was found that very small Pd particles on Fe(3)O(4) show a strongly modified adsorption behavior, characterized by atypically weak CO adsorption and a characteristic CO stretching frequency around 2130 cm(-1). This modification is attributed to a strong interaction with the support. Additionally, the kinetics of CO adsorption was studied by sticking coefficient experiments as a function of particle size. For small particles it is shown that the CO adsorption rate is significantly enhanced by the capture zone effect. The absolute size of the capture zone was quantified on the basis of the STM and sticking coefficient data. Finally, oxygen adsorption was studied by means of MB CO titration experiments. Pure chemisorption of oxygen is observed at 400 K, whereas at 500 K partial oxidation of the particles occurs. The oxidation behavior reveals strong kinetic hindrances to oxidation for larger particles, whereas facile oxidation and reduction are observed for smaller particles. For the latter, estimates point to the formation of oxide layers which, on average, are thicker than the surface oxides on corresponding single crystal surfaces.     

Water formation on Pd(111) by reaction of oxygen with atomic and molecular hydrogen

In this work we have studied the steady-state reaction of molecular and atomic hydrogen with oxygen on a Pd(111) surface at a low total pressure (<10(-7) mbar) and at sample temperatures ranging from 100 to 1100 K. Characteristic features of the water formation rate Phi(pH2; pO2; TPd) are presented and discussed, including effects that are due to the use of gas-phase atomic hydrogen for exposure. Optimum impingement ratios (OIR) for hydrogen and oxygen for water formation and their dependence on the sample temperature have been determined. The occurring shift in the OIR could be ascribed to the temperature dependence of the sticking coefficients for hydrogen (SH2) and oxygen (SO2) on Pd(111). Using gas-phase atomic hydrogen for water formation leads to an increase of the OIR, suggesting that hydrogen abstraction via hot-atom reactions competes with H2O formation. The velocity distributions of the desorbing water molecules formed on the Pd(111) surface have been measured by time-of-flight spectroscopy under various conditions, using either gas-phase H atoms or molecular H2 as reactants. In all cases, the desorbing water flux could be represented by a Maxwellian distribution corresponding to the surface temperature, thus giving direct evidence for a Langmuir-Hinshelwood mechanism for water formation on Pd(111).     

Initial oxidation of the Rh(110) surface: ordered adsorption and surface oxide structures

The initial oxidation of the Rh(110) surface was studied by scanning tunneling microscopy, core level spectroscopy, and density functional theory. The experiments were carried out exposing the Rh(110) surface to molecular or atomic oxygen at temperatures in the 500-700 K range. In molecular oxygen ambient, the oxidation terminates at oxygen coverage close to a monolayer with the formation of alternating islands of the (10x2) one-dimensional surface oxide and (2x1)p2mg adsorption phases. The use of atomic oxygen facilitates further oxidation until a structure with a c(2x4) periodicity develops. The experimental and theoretical results reveal that the c(2x4) structure is a "surface oxide" very similar to the hexagonal O-Rh-O trilayer structures formed on the Rh(111) and Rh(100) substrates. Some of the experimentally found adsorption phases appear unstable in the phase diagram predicted by thermodynamics, which might reflect kinetic hindrance. The structural details, core level spectra, and stability of the surface oxides formed on the three basal planes are compared with those of the bulk RhO2 and Rh2O3.     

Synergetic effect of surface and subsurface Ni species at Pt-Ni bimetallic catalysts for CO oxidation

Various well-defined Ni-Pt(111) model catalysts are constructed at atomic-level precision under ultra-high-vacuum conditions and characterized by X-ray photoelectron spectroscopy and scanning tunneling microscopy. Subsequent studies of CO oxidation over the surfaces show that a sandwich surface (NiO(1-x)/Pt/Ni/Pt(111)) consisting of both surface Ni oxide nanoislands and subsurface Ni atoms at a Pt(111) surface presents the highest reactivity. A similar sandwich structure has been obtained in supported Pt-Ni nanoparticles via activation in H(2) at an intermediate temperature and established by techniques including acid leaching, inductively coupled plasma, and X-ray adsorption near-edge structure. Among the supported Pt-Ni catalysts studied, the sandwich bimetallic catalysts demonstrate the highest activity to CO oxidation, where 100% CO conversion occurs near room temperature. Both surface science studies of model catalysts and catalytic reaction experiments on supported catalysts illustrate the synergetic effect of the surface and subsurface Ni species on the CO oxidation, in which the surface Ni oxide nanoislands activate O(2), producing atomic O species, while the subsurface Ni atoms further enhance the elementary reaction of CO oxidation with O.     

Structural and redox properties of VOx and Pd/VOx thin film model catalysts studied by TEM and SAED

The oxidation of pure V(2)O(3) and Pd/V(2)O(3) films was studied by Transmission Electron Microscopy (TEM) and Selected Area Electron Diffraction (SAED) in the temperature range 673-773 K. Thin films of V(2)O(3) were prepared by reactive deposition of V metal in 10(-2) Pa O(2) on NaCl(001) cleavage faces. Pd particles were epitaxially grown on NaCl(001) and subsequently embedded in V(2)O(3). Oxidation of both pure V(2)O(3) and Pd/V(2)O(3) at 673 K transforms V(2)O(3) into a platelet-like V(2)O(5) structure. At temperatures T>or= 773 K, a reconstruction of the platelet-like V(2)O(5) structure into an array of oblong and needle-type V(2)O(5) nanocrystals of different size occurs. Subsequent reduction of the so-prepared structures in 1 bar H(2) at 573-673 K results in the formation of the cubic VO phase, whereby the external shape of the original crystals is partially maintained. Upon oxidation at 723 K, Pd is transformed into PdO, but its formation is suppressed in comparison with Pd supported on Al(2)O(3) and occurs only at an about 100 K higher temperature than on Pd/Al(2)O(3). The Pd particles are stabilized against oxidation up to 673 K, PdO decomposes upon reduction in hydrogen between 573 and 673 K.     

Initial oxidation of a Rh(110) surface using atomic or molecular oxygen and reduction of the surface oxide by hydrogen

The formation conditions, morphology, and reactivity of thin oxide films, grown on a Rh(110) surface in the ambient of atomic or molecular oxygen, have been studied by means of laterally resolved core level spectroscopy, scanning tunneling microscopy and low energy electron diffraction. Exposures of Rh(110) to atomic oxygen lead to subsurface incorporation of oxygen even at room temperature and facile formation of an ordered, laterally uniform surface oxide at approximately 520 K, with a quasi-hexagonal structure and stoichiometry close to that of RhO(2). In the intermediate oxidation stages, the surface oxide coexists with areas of high coverage adsorption phases. After a long induction period, the reduction of the Rh oxide film with H(2) is very rapid and independent of the coexisting adsorption phases. The growth of the oxide film by exposure of a Rh(110) surface to molecular oxygen requires higher pressures and temperatures. The important role of the O(2) dissociation step in the oxidation process is reflected by the complex morphology of the oxide films grown in O(2) ambient, consisting of microscopic patches of different Rh and oxygen atomic density.     

钒钼复合氧化物表面上激光促进异丁烷选择氧化制甲基丙烯酸

表面反应;钒钼复合氧化物表面上激光促进异丁烷选择氧化制甲基丙烯酸     

Effects of bulk impurity concentration on the reactivity of metal surface: sticking of hydrogen molecules and atoms to polycrystalline Nb containing oxygen

Nonmetallic impurities segregated onto metal surfaces are able to drastically decrease the chemical reactivity of metals. In the present paper, effects of bulk impurities on the reactivity of metallic surfaces were investigated in a wide temperature range on an example of the sticking of hydrogen molecules and atoms to Nb [polycrystalline, with mainly (100)] containing solute oxygen. At all the investigated surface temperatures, T(S) (300-1400 K), we found the bulk oxygen concentration C(O) to have a strong effect on the integral probability, alpha(H(2) ), of dissociative sticking of H(2) molecules followed by hydrogen solution in the metal lattice: alpha(H(2) ) monotonically decreased by orders of magnitude with increasing C(O) from 0.03 to 1.5 at. %. The sticking coefficient alpha(H(2) ) was found to depend on T(S) but not on the gas temperature. The effect of C(O) on alpha(H(2) ) is explained by the presence of oxygen-free sites (holes in coverage) serving as active centers of the surface reaction in the oxygen monolayer upon Nb. In contrast to H(2) molecules, H atoms were found to stick to, and be dissolved in, oxygen-covered Nb with a probability comparable to 1, depending neither on C(O) nor on T(S). This proves that, unlike H(2) molecules, H atoms do stick to be dissolved mainly through regular surface sites covered by oxygen and not through the holes in coverage.     

Oxidation of nitrided si(100) by gaseous atomic and molecular oxygen

The nitridation of Si(100) by ammonia and the subsequent oxidation of the nitrided surface by both gaseous atomic and molecular oxygen was investigated under ultrahigh vacuum (UHV) conditions using X-ray photoelectron spectroscopy (XPS). Nitridation of Si(100) by the thermal decomposition of NH3 results in the formation of a subsurface nitride and a decrease in the concentration of surface dangling bond sites. On the basis of changes in the N1s spectra obtained after NH3 adsorption and decomposition, we estimate that the nitride resides about four to five layers below the vacuum-solid interface and that the concentration of surface dangling bonds after nitridation is only 59% of its value on Si(100)-(2 x 1). Oxidation of the nitrided surface is found to produce an oxide phase that remains in the outer layers of the solid and interacts only weakly with the underlying nitride for oxygen coverages up to 2.5 ML. Slight changes in the N1s spectra observed after oxidizing at 300 K are suggested to arise primarily from the introduction of strain within the nitride, and by the formation of a small amount of Si2=N-O species near the nitride-oxide interface. The nitrogen bonding environment changes negligibly after oxidizing at 800 K, which is indicative of greater phase separation at elevated surface temperature. Nitridation is also found to significantly reduce the reactivity of the Si(100) surface toward both atomic and molecular oxygen. A comparison of the oxygen uptake on the clean and nitrided surfaces shows quantitatively that the decrease in dangling bond concentration is responsible for the reduced activity of the nitrided surface toward oxidation, and therefore that dangling bonds are the initial adsorption site for both gaseous oxygen atoms and molecules. Increasing the surface temperature is found to promote the uptake of oxygen when O2 is used as the oxidant, but brings about only a small enhancement in the uptake of gaseous O-atoms. The different effects of surface temperature on the uptake of O versus O2 are interpreted in terms of the efficiency at which dangling bond pairs are regenerated on the surface at elevated temperature and the different site requirements for the adsorption of O and O2.     

Selective oxidation of propane to acrylic acid over mixed metal oxide catalysts

The effects of metal atomic ratio, water content, oxygen content, and calcination temperature on the catalytic performances of MoVTeNbO mixed oxide catalyst system for the selective oxidation of propane to acrylic acid have been investigated and discussed. Among the catalysts studied, it was found that the MoVTeNbO catalyst calcined at a temperature of 600 ℃ showed the best performance in terms of propane conversion and selectivity for acrylic acid under an atmosphere of nitrogen. An effective MoVTeNbO oxide catalyst for propane selective oxidation to acrylic acid was obtained with a combination of a preferred metal atomic ratio （Mo1V0.31Te0.23Nb0.12）. The optimum reaction condition for the selective oxidation of propane was the molar ratio of C3H8 ：O2 ： H2O ： N2 = 4.4： 12.8 ： 15.3 ： 36.9. Under such conditions, the conversion of propane and the maximum yield of acrylic acid reached about 50% and 21%, respectively.     

Fe-K/AC催化氧化脱硫剂制备及反应机理研究

采用正交实验法制备了负载铁、钾的活性炭(Fe-K/AC)热煤气催化氧化脱硫剂,考察了活性组分铁、钾含量、二价铁和三价铁比例、煅烧温度对催化氧化脱硫反应活性的影响。由正交实验极差分析可知,各因素影响程度依次为:钾含量>铁含量>煅烧温度> Fe²⁺/Fe³⁺,最优制备条件为,铁含量0.5%、钾含量5.0%、煅烧温度600 ℃、Fe²⁺/Fe³⁺比0.5。通过对脱硫剂的孔隙结构和表面形貌分析可知,活性炭表面负载的铁金属氧化物具有催化氧化硫化氢生成单质硫的活性,碱金属氧化物具有协同作用,可以改变表面酸碱性,促进硫化氢的催化转化,但过高的金属氧化物负载量会阻塞孔道,减小反应比表面积,从而降低脱硫剂的反应活性。     

Interaction of vanadium oxide cluster anions with water: an experimental and theoretical study on reactivity and mechanism

Vanadium oxide cluster anions (V(x)O(y)(-), x = 2-3; y = 3-7) are produced by laser ablation and reacted with water in a fast flow reactor. A time-of-flight mass spectrometer is used to detect the cluster distribution before and after the reactions. Reaction channels of molecular hydrogen elimination (for V(2,3)O(3)(-)), water association (for V(2)O(5)(-) and V(3)O(6,7)(-)) and the coexistence of both channels (for V(2)O(4)(-) and V(3)O(4,5)(-)) are observed. V(2)O(6)(-) and V(3)O(8)(-) are nearly inert toward water. Density functional theory (DFT) calculations are performed to study the reaction mechanism of V(2)O(3)(-) in different spin states with water and the results support the experimental observation. The reaction mechanism of V(2)O(3)(+) with water is also studied, which is in agreement with the experimental report in previous literature [Eur. J. Inorg. Chem., 2008, 4961] that molecular hydrogen elimination is a minor reaction channel for V(2)O(3)(+) + H(2)O. The influence of cluster charge states and oxidation states of vanadium atoms on the cluster reactivity are presented based on the experimental and theoretical studies.     

A comparative XPS and UPS study of VOx layers on mineral TiO2(001)‐anatase supports

Four vanadium oxide layers on mineral TiO₂(001)‐anatase supports with different thickness (3–33 Å) were prepared with reactive d.c. magnetron sputtering and were extensively studied with photoelectron spectroscopy. Al Kα radiation and 150 eV synchrotron radiation were used as excitation sources. The evolution of the 2p, 3s and 3p core level line shapes of V and Ti as a function of the vanadium oxide thickness was studied, as well as the O1s and O2s core lines and the valence band. All the V2p spectra of the deposited vanadium oxide layers consist of at least 60% V⁵⁺, the rest being V⁴⁺. The V3p region is complicated by multiplet splitting, which prevents the determination of the vanadium oxidation state. The V3p multiplet splitting is different for the two excitation energies. No reduction of the titania support surface due to the vanadium oxide deposition was observed. Copyright © 2006 John Wiley & Sons, Ltd.     

添加钒对Pd/Al2O3-TiO2 催化剂上醇醛催化氧化性能及表面特性的影响

采用浸渍法分别制备了Pd/Al₂O₃-TiO₂、V/Al₂O₃-TiO₂和不同钒含量的V-Pd/Al₂O₃-TiO₂催化剂,并对乙醇、乙醛的完全催化氧化性能进行了测试。结果表明,添加适量的钒组分(1%~3%)能够有效地提高催化剂的深度氧化活性。采用XRD、NH₃-TPD、N₂吸附等技术分析研究催化剂的表面特性与催化活性之间的关系,发现Pd/Al₂O₃-TiO₂催化剂添加适量钒组分后,调变了催化剂的表面酸性、比表面积和孔容,使得V组分和Pd组分与载体之间产生较强的相互作用,双金属组分的协同效应提高了催化剂对乙醇、乙醛的深度氧化活性。     

Effects of Adsorbed Polyaniline on Redox Processes on As(2)O(3) Surfaces

Polyaniline deposited on As(2)O(3) surface resulted in a new material, which was characterized by infrared spectoscopy, thermogravimetry, differential scanning calorimetry, scanning electron microscopy, X-ray diffraction, and cyclic voltammetry. The mass percentage of polymer deposited on oxide surface is approximately 13%. The scanning electron microscopy images as well as the X-ray diffraction patterns provided conclusive evidence that the oxide surface is coated by the polymer. The cyclic voltammograms of the polyaniline adsorbed on As(2)O(3) surface showed that the adsorbate exerts remarkable effects on redox processes on this oxide. The pure oxide exhibited two oxidation/reduction peaks at 0.25/-0.06 and 0.47/-0.25 V attributed tentatively to the processes As(2)O(3)(s)+6H(+)+6e(-)=2As(s)+3H(2)O and As(s)+3H(+)+3e(-)=AsH(3)(g), respectively. The polyaniline-coated sample exhibited a better-defined voltammogram in which the first oxidation peak of the oxide had its intensity increased about four times. Copyright 2000 Academic Press.     

Palladium nanoparticles and nanowires deposited electrochemically: AFM and electrochemical characterization

Palladium nanoparticles and nanowires electrochemically deposited onto a carbon surface were studied using cyclic voltammetry, impedance spectroscopy and atomic force microscopy. The ex situ and in situ atomic force microscopy (AFM) topographic images showed that nanoparticles and nanowires of palladium were preferentially electrodeposited to surface defects on the highly oriented pyrolytic graphite surface and enabled the determination of the Pd nanostructure dimensions on the order of 50–150 nm. The palladium nanoparticles and nanowires electrochemically deposited onto a glassy carbon surface behave differently with respect to the pH of the electrolyte buffer solution. In acid or mild acid solutions under applied negative potential, hydrogen can be adsorbed/absorbed onto/into the palladium lattice. By controlling the applied negative potential, different quantities of hydrogen can be incorporated, and this process was followed, analysing the oxidation peak of hydrogen. It is also shown that the growth of the Pd oxide layer begins at negative potentials with the formation of a pre-monolayer oxide film, at a potential well before the hydrogen evolution region. At positive potentials, Pd(0) nanoparticles undergo oxidation, and the formation of a mixed oxide layer was observed, which can act as nucleation points for Pd metal growth, increasing the metal electrode surface coverage. Depending on thickness and composition, this oxide layer can be reversibly reduced. AFM images confirmed that the PdO and PdO₂ oxides formed on the surface may act as nucleation points for Pd metal growth, increasing the metal electrode surface coverage. Dedicated to Professor Dr. Algirdas Vaskelis on the occasion of his 70th birthday.     

Interaction of atomic and molecular deuterium with a nonporous amorphous water ice surface between 8 and 30 K

Molecular and atomic interactions of hydrogen on dust grains covered with ice at low temperatures are key mechanisms for star formation and chemistry in dark interstellar clouds. We have experimentally studied the interaction of atomic and molecular deuterium on nonporous amorphous water ice surfaces between 8 and 30 K, in conditions compatible with an extrapolation to an astrophysical context. The adsorption energy of D(2) presents a wide distribution, as already observed on porous water ice surfaces. At low coverage, the sticking coefficient of D(2) increases linearly with the number of deuterium molecules already adsorbed on the surface. Recombination of atomic D occurs via a prompt reaction that releases molecules into the gas phase. Part of the newly formed molecules are in vibrationally excited states (v=1-7). The atomic recombination efficiency increases with the presence of D(2) molecules already adsorbed on the water ice, probably because these increase the sticking coefficient of the atoms, as in the case of incident D(2). We have measured the atomic recombination efficiency in the presence of already absorbed D(2), as it is expected to occur in the interstellar medium. The recombination efficiency decreases rapidly with increasing temperature and is zero at 13 K. This allows us to estimate an upper limit to the value of the atom adsorption energy E(a) approximately 29 meV, in agreement with previous calculations.