Two and three‐dimensional numerical modeling of induction heating in oxide Czochralski systems

In this article we report on a set of two‐dimensional and three‐dimensional numerical calculations for three different oxide Czochralski configurations in order to compare the results of the electromagnetic fields and the heat generation distribution. Two configurations without and with a gap between the crucible and active afterheater have axisymmetric conditions while the configuration with an open observation window in the afterheater is characterized by a non‐axisymmetric geometry. It has been found that in the non‐axisymmetric configuration under the influence of the observation window is located at the crucible side wall after a short distance behind the window cut out. Besides this influence the volumetric distribution of heat generation in the system is about symmetric. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical investigation of heat transport and fluid flow during the seeding process of oxide Czochralski crystal growth Part 1: non‐rotating seed

For the seeding process of oxide Czochralski crystal growth, the flow and temperature field of the system as well as the seed‐melt interface shape have been studied numerically using the finite element method. The configuration usually used initially in a real Czochralski crystal growth process consists of a crucible, active afterheater, induction coil with two parts, insulation, melt, gas and non‐rotating seed crystal. At first the volumetric distribution of heat inside the metal crucible and afterheater inducted by the RF coil was calculated. Using this heat source the fluid flow and temperature field were determined in the whole system. We have considered two cases with respect to the seed position: (1) before and (2) after seed touch with the melt. It was observed that in the case of no seed rotation (ω_seed = 0), the flow pattern in the bulk melt consists of a single circulation of a slow moving fluid. In the gas domain, there are different types of flow motion related to different positions of the seed crystal. In the case of touched seed, the seed‐melt interface has a deep conic shape towards the melt. It was shown that an active afterheater and its location with respect to the crucible, influences markedly the temperature and flow field of the gas phase in the system and partly in the melt. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical investigation of heat transport and fluid flow during the seeding process of oxide Czochralski crystal growth Part 2: rotating seed

In this paper, the role of seed rotation on the characteristics of the two‐dimensional temperature and flow field in the oxide Czochralski crystal growth system has been studied numerically for the seeding process. Based on the finite element method, a set of two‐dimensional quasi‐steady state numerical simulations were carried out to analyze the seed‐melt interface shape and heat transfer mechanism in a Czochralski furnace with different seed rotation rates: ω_seed = 5‐30 rpm. The results presented here demonstrate the important role played by the seed rotation for influencing the shape of the seed‐melt interface during the seeding process. The seed‐melt interface shape is quite sensitive to the convective heat transfer in the melt and gaseous domain. When the local flow close to the seed‐melt interface is formed mainly due to the natural convection and the Marangoni effect, the interface becomes convex towards the melt. When the local flow under the seed‐melt interface is of forced convection flow type (seed rotation), the interface becomes more concave towards the melt as the seed rotation rate (ω_seed) is increased. A linear variation of the interface deflection with respect to the seed rotation rate has been found, too. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical modelling of instability and supercritical oscillatory states in a Czochralski model system of oxide melts

The motivation for this study is the need for accurate numerical models of melt flow instabilities during Czochralski growth of oxides. Such instabilities can lead to undesirable spiralling shapes of the bulk crystals produced by the growing process. The oxide melts are characterized by Prandtl numbers in the range 5<Pr <20, which makes the oxide melt flow qualitatively different from the intensively studied flows of semiconductors characterized by smaller Prandtl numbers Pr <0.1. At the same time, these flows can be modelled experimentally by many transparent test fluids (e.g. water, silicon oils, salt melts), which have similar Prandtl numbers, but allow one to avoid the extremely high melting‐point temperatures of the oxide materials. Most previous studies of melt instabilities for Prandtl numbers larger than unity suffer from a lack of accuracy that is caused by the use of coarse grids. Recent convergence studies made for a series of simplified problems and for a hydrodynamic model of Czochralski growth showed that for a second order finite volume method reliable stability results can be obtained on grids having at least 100 nodes in the shortest spatial direction. The obvious numerical difficulties call for an extensive benchmark exercise, which is proposed here on the basis of recently published experimental and numerical data, as well as some preliminary results of this study. The calculations presented are performed by two independent numerical approaches, which are based on second‐order finite volume and finite element discretizations. We start our comparison from the steady states, whose parametric dependencies sometimes exhibit turning points and multiplicity. We then compare the critical temperature differences corresponding to the onset of instability, and finally compare calculated supercritical oscillatory states and phase plots. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Influence of the crucible bottom shape on the heat transport and fluid flow during the seeding process of oxide Czochralski crystal growth

For the seeding process of oxide Czochralski crystal growth, influence of the crucible bottom shape on the heat generation, temperature and flow field of the system and the seed‐melt interface shape have been studied numerically using the finite element method. The configuration usually used in a real Czochralski crystal growth process consists of a crucible, active afterheater, induction coil with two parts, insulation, melt, gas and seed crystal. At first, the volumetric distribution of heat inside the metal crucible and afterheater inducted by the RF‐coil was calculated. Using this heat generation in the crucible wall as a source the fluid flow and temperature field of the entire system as well as the seed‐melt interface shape were determined. We have considered two cases, flat and rounded crucible bottom shape. It was observed that using a crucible with a rounded bottom has several advantages such as: (i) The position of the heat generation maximum at the crucible side wall moves upwards, compared to the flat bottom shape. (ii) The location of the temperature maximum at the crucible side wall rises and as a result the temperature gradient along the melt surface increases. (iii) The streamlines of the melt flow are parallel to the crucible bottom and have a curved shape which is similar to the rounded bottom shape. These important features lead to increasing thermal convection in the system and influence the velocity field in the melt and gas domain which help preventing some serious growth problems such as spiral growth. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Simulation of temperature and flow fields in an inductively heated melt growth system

The goal of the research presented here is to apply a global analysis of an inductively heated Czochralski furnace for a real sapphire crystal growth system and predict the characteristics of the temperature and flow fields in the system. To do it, for the beginning stage of a sapphire growth process, influence of melt and gas convection combined with radiative heat transfer on the temperature field of the system and the crystal‐melt interface have been studied numerically using the steady state two‐dimensional finite element method. For radiative heat transfer, internal radiation through the grown crystal and surface to surface radiation for the exposed surfaces have been taken into account. The numerical results demonstrate that there are a powerful vortex which arises from the natural convection in the melt and a strong and large vortex that flows upwards along the afterheater side wall and downwards along the seed and crystal sides in the gas part. In addition, a wavy shape has been observed for the crystal‐melt interface with a deflection towards the melt. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical investigation of carbon and silicon carbide contamination during the melting process of the Czochralski silicon crystal growth

Carbon contamination in single crystalline silicon is detrimental to the minority carrier lifetime, one of the critical parameters for electronic wafers. In order to study the generation and accumulation of carbon contamination, transient global modeling of heat and mass transport was performed for the melting process of the Czochralski silicon crystal growth. Carbon contamination, caused by the presence of carbon monoxide in argon gas and silicon carbide in the silicon feedstock, was predicted by the fully coupled chemical model; the model included six reactions taking place in the chamber. A simplified model for silicon carbide generation by the reaction between carbon monoxide and solid silicon was proposed using the closest packing assumption for the blocky silicon feedstock. The accumulation of carbon in the melted silicon feedstock during the melting and stabilization stages was predicted. Owing to this initial carbon content in the melt, controlling carbon contamination before the growth stage becomes crucial for reducing the carbon incorporation in a growing crystal.     

Influence of active afterheater on the induction heating process in oxide Czochralski systems

Different shapes and orientations of an active afterheater for oxide Czochralski crystal growth systems are considered and corresponding results of electromagnetic field and volumetric heat generation have been computed using a finite element method (Flex‐PDE package). For the calculations, the eddy current in the induction coil (i.e. the self‐inductance effect) has been taken into account. The calculation results show the importance of an active afterheater, its shape as well as its geometry and position with respect to the crucible on the heat generation distribution in a CZ growth system. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

The role of inner and internal radiation on the melt growth of sapphire crystal

In this paper, for an inductively heated Czochralski furnace used to grow sapphire single crystal, influence of the inner (wall‐to‐wall) and crystal internal (bulk) radiation on the characteristics of the growth process such as temperature and flow fields, structure of heat transfer and crystal‐melt interface has been studied numerically using the 2D quasi‐steady state finite element method. The obtained results of global analysis demonstrate a strong dependence of thermal field, heat transport structure and crystal‐melt interface on both types of radiative heat transfer within the growth furnace.     

Influence of internal radiation on the heat transfer during growth of YAG single crystals by the Czochralski method

Heat and mass transfer taking place during growth of Y₃Al₅O₁₂ (YAG) crystals by the Czochralski method, including inner radiation, is analyzed numerically using a Finite Element Method. For inner radiative heat transfer through the crystal the band approximation model and real transmission characteristics, measured from obtained crystals, are used. The results reveal significant differences in temperature and melt flow for YAG crystals doped with different dopands influencing the optical properties of the crystals. When radiative heat transport through the crystal is taken into account the melt‐crystal interface shape is different from that when the radiative transport is not included. Its deflection remains constant over a wide range of crystal rotation rates until it finally rapidly changes in a narrow range of rotation rates. (© 2003 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical Simulation of Temperature and Flow Field in the Melt for the Vapour‐pressure‐ controlled Czochralski Growth of GaAs

The influence of the melt flow on the temperature field and interface during the vapour‐pressure‐controlled growth of GaAs was studied numerically with the commercial general‐purpose program FIDAP^TM. The thermal boundary conditions for the domain of seed, crystal, boron oxide and crucible were taken from a global calculation for an equipment used at the IKZ to grow 6″ crystals. Due to the large melt volume the buoyancy forces become rather strong and have to be counteracted by reasonable rotation rates. Preliminary results have been obtained for iso‐ and counter‐rotation showing that the flow field exhibits structures on small scales. High rotation rates are needed to counteract the buoyancy flow efficiently and to achieve a smooth flat interface. Even if the the flow structure is not resolved in detail, the interface shape can be deduced form the calculations.     

Numerical investigation of induction heating and heat transfer in a SiC growth system

A global simulation model is applied for a silicon carbide growth system heated by induction coils. A finite‐volume method (FVM) and a global model are applied to solve the equations for electromagnetic field, conductive and radiative heat transfer. The growth rate is predicted by Hertz‐Knudsen equation and one‐dimensional mass transfer equation. Further, simulations for five different coil positions are carried out to investigate the effects of coil position on temperature distribution in the furnace. The numerical results reveal that the variation of temperature in the radial direction along the substrate surface and the temperature difference between the powder and substrate are greatly affected by the coil position. The predicted growth rate along the substrate surface for five coil positions is also studied. Finally, a reasonable range of coil positions maintaining a balance between large‐diameter crystal, high growth rate, temperature limitation of material and lower electrical power consumption is obtained. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Three‐dimensional study of the pressure field and advantages of hemispherical crucible in silicon Czochralski crystal growth

The effects of several growth parameters in cylindrical and spherical Czochralski crystal process are studied numerically and particularly, we focus on the influence of the pressure field. We present a set of three‐dimensional computational simulations using the finite volume package Fluent in two different geometries, a new geometry as cylindro‐spherical and the traditional configuration as cylindro‐cylindrical. We found that the evolution of pressure which is has not been studied before; this important function is strongly related to the vorticity in the bulk flow, the free surface and the growth interface. It seems that the pressure is more sensitive to the breaking of symmetry than the other properties that characterize the crystal growth as temperature or velocity fields. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Transient and quasi‐stationary simulation of heat and mass transfer in Czochralski silicon crystal growth

The formation of grown‐in defects in silicon crystals is controlled by the concentration of intrinsic point defects. Under steady state conditions the type of the prevailing point defect species is linked to the ratio of pull rate and temperature gradient in the crystal at the solidification front. It has been shown that this ratio as well as computed point defect distributions are in good agreement with experimental data. In this paper we compare a coupled transient heat transfer and transient point defect transport model with quasi steady state simulations at various time steps. Both simulations show the same qualitative results, quantitative differences in temperature are less than 1 %. But already for constant pull rates the defect distributions show qualitative differences between transient and quasi steady state simulations. Therefore, for a detailed understanding how defects are related to growth conditions, the thermal history should not be neglected.     

Thermocapillary‐buoyancy flow of silicon melt in a shallow annular pool

In order to understand the nature of surface spoke patterns on silicon melt in industrial Czochralski furnaces, a series of unsteady three‐dimensional numerical simulations were conducted for thermocapillary‐buoyancy flow of silicon melt in annular pool (inner radius r_i = 15 mm, outer radius r_o = 50 mm, depth d = 3 mm). The pool is heated from the outer cylindrical wall and cooled at the inner wall. Bottom and top surfaces either are adiabatic or allow heat transfer in the vertical direction. Results show that a small temperature difference in the radial direction generates steady roll‐cell thermocapillary‐buoyancy flow. With large temperature difference, the simulation can predict three‐dimensional oscillatory flow, which is characterized by spoke patterns traveling in the azimuthal direction. The small vertical heat flux (3 W/cm²) does not have significant effects on the characteristics of this oscillatory flow. Details of the flow and temperature disturbances are discussed and the critical conditions for the onset of the oscillatory flow are determined. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Using a Phase‐field‐like Approach for the Calculation of Melt Flow and Interface Shape during Czochralski Growth

A phase‐field‐like approach is introduced into the commercial general‐purpose program FIDAP^TM to calculate the melt‐crystal interface for a quasi‐stationary approach of the Czochralski growth. Temperature and flow field are solved using the segregated solver of the FIDAP^TM software.     

Global simulation of a Czochralski furnace for silicon crystal growth against the assumed thermophysical properties

In order to understand the effects of the thermophysical properties of the melt on the transport phenomena in the Czochralski (Cz) furnace for the single crystal growth of silicon, a set of global analyses of momentum, heat and mass transfer in small Cz furnace (crucible diameter: 7.2 cm, crystal diameter: 3.5 cm, operated in a 10 Torr argon flow environment) was carried out using the finite‐element method. The global analysis assumed a pseudosteady axisymmetric state with laminar flow. The results show that different thermophysical properties will bring different variations of the heater power, the deflection of the melt/crystal interface, the axial temperature gradient in the crystal on the center of the melt/crystal interface and the average oxygen concentration along the melt/crystal interface. The application of the axial magnetic field is insensitive to this effect. This analysis reveals the importance of the determination of the thermophysical property in numerical simulation. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical investigation of crystal growth process of bulk Si and nitrides – a review

Heat and mass transfer during crystal growth of bulk Si and nitrides by using numerical analysis was studied. A three‐dimensional analysis was carried out to investigate temperature distribution and solid‐liquid interface shape of silicon for large‐scale integrated circuits and photovoltaic silicon. The analysis enables prediction of the solid‐liquid interface shape of silicon crystals. The result shows that the interface shape became bevel like structure in the case without crystal rotation. We also carried out analysis of nitrogen transfer in gallium melt during crystal growth of gallium nitride using liquid‐phase epitaxy. The result shows that the growth rate at the center was smaller than that at the center. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical analysis of heat transfer for the modified markov method

In this work, we present a theoretical analysis of the behaviour of the temperature profile for the Modified Markov Method. We have assumed different materials and different thicknesses for the insulating element. Comparison of preliminary results with experimental evidences, demonstrate us the reliability of our model. Discussion among our calculated results are provided and future outlooks for the experimental work are fixed. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)