Numerical study of radial temperature distribution in the AlN sublimation growth system

A large radial temperature gradient in the AlN sublimation growth system would lead to non‐uniform growth rate along the radial direction and introduce thermal stress in the as grown crystal. In this paper, we have numerically studied the radial thermal uniformity in the crucible of a AlN sublimation growth system. The temperature difference on the source top surface is insignificant while the radial temperature gradient on the lid surface is too large to be neglected. The simulation results showed that the crucible material with a large thermal conductivity is beneficial to obtain a uniform temperature distribution on the lid surface. Moreover, it was found that the temperature gradient on the lid surface decreases with increased lid thickness and decreased top window size.     

Influence of active afterheater on the induction heating process in oxide Czochralski systems

Different shapes and orientations of an active afterheater for oxide Czochralski crystal growth systems are considered and corresponding results of electromagnetic field and volumetric heat generation have been computed using a finite element method (Flex‐PDE package). For the calculations, the eddy current in the induction coil (i.e. the self‐inductance effect) has been taken into account. The calculation results show the importance of an active afterheater, its shape as well as its geometry and position with respect to the crucible on the heat generation distribution in a CZ growth system. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Two and three‐dimensional numerical modeling of induction heating in oxide Czochralski systems

In this article we report on a set of two‐dimensional and three‐dimensional numerical calculations for three different oxide Czochralski configurations in order to compare the results of the electromagnetic fields and the heat generation distribution. Two configurations without and with a gap between the crucible and active afterheater have axisymmetric conditions while the configuration with an open observation window in the afterheater is characterized by a non‐axisymmetric geometry. It has been found that in the non‐axisymmetric configuration under the influence of the observation window is located at the crucible side wall after a short distance behind the window cut out. Besides this influence the volumetric distribution of heat generation in the system is about symmetric. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Three‐dimensional numerical investigation of the effects of an open window on the convective heat transfer of an oxide Czochralski system

A three‐dimensional numerical analysis was carried out for a real Czochralski crystal growth furnace containing only gas and without any melt and crystal in order to investigate the effects of a small observation window on the temperature and flow field of the system. For this approach, the induction heating equations, the Navier‐Stokes equation with Boussinesq approximation, the continuity and energy equations have been solved in cylindrical coordinates using the finite element method. It has been found that the flow and thermal fields in the system are obviously three‐dimensional and non‐axisymmetric. The gas enters the system through the window is directed towards the opposite side wall where it is divided into two parts of vertical direction as well as expands in horizontal direction. Consequently, there is a spiral gas flow in the crucible and afterheater which rotates upwards in azimuthal direction along the walls. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

PVT法SiC单晶生长传热分析

研究了PVT法生长SiC过程中的传热行为,以优化生长条件、获得高质量单晶.该研究是针对坩埚盖(籽晶粘附于坩埚盖上)和炉盖之间的传热行为进行的.研究认为,坩埚盖上部石墨毡开孔形状和大小对坩埚盖的径向温度场有很大影响.采用本文简化的模型可以估算坩埚在不同位置下、不同的石墨毡开孔形状和大小时坩埚盖和炉盖之间总的辐射热阻和传热量.对影响坩埚盖和炉盖之间传热的因素进行了讨论.另外,讨论了在生长过程中动态调整坩埚盖散热条件的可行性.     

Numerical investigation of crystal growth process of bulk Si and nitrides – a review

Heat and mass transfer during crystal growth of bulk Si and nitrides by using numerical analysis was studied. A three‐dimensional analysis was carried out to investigate temperature distribution and solid‐liquid interface shape of silicon for large‐scale integrated circuits and photovoltaic silicon. The analysis enables prediction of the solid‐liquid interface shape of silicon crystals. The result shows that the interface shape became bevel like structure in the case without crystal rotation. We also carried out analysis of nitrogen transfer in gallium melt during crystal growth of gallium nitride using liquid‐phase epitaxy. The result shows that the growth rate at the center was smaller than that at the center. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical modelling of instability and supercritical oscillatory states in a Czochralski model system of oxide melts

The motivation for this study is the need for accurate numerical models of melt flow instabilities during Czochralski growth of oxides. Such instabilities can lead to undesirable spiralling shapes of the bulk crystals produced by the growing process. The oxide melts are characterized by Prandtl numbers in the range 5<Pr <20, which makes the oxide melt flow qualitatively different from the intensively studied flows of semiconductors characterized by smaller Prandtl numbers Pr <0.1. At the same time, these flows can be modelled experimentally by many transparent test fluids (e.g. water, silicon oils, salt melts), which have similar Prandtl numbers, but allow one to avoid the extremely high melting‐point temperatures of the oxide materials. Most previous studies of melt instabilities for Prandtl numbers larger than unity suffer from a lack of accuracy that is caused by the use of coarse grids. Recent convergence studies made for a series of simplified problems and for a hydrodynamic model of Czochralski growth showed that for a second order finite volume method reliable stability results can be obtained on grids having at least 100 nodes in the shortest spatial direction. The obvious numerical difficulties call for an extensive benchmark exercise, which is proposed here on the basis of recently published experimental and numerical data, as well as some preliminary results of this study. The calculations presented are performed by two independent numerical approaches, which are based on second‐order finite volume and finite element discretizations. We start our comparison from the steady states, whose parametric dependencies sometimes exhibit turning points and multiplicity. We then compare the critical temperature differences corresponding to the onset of instability, and finally compare calculated supercritical oscillatory states and phase plots. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical analysis of heat transfer for the modified markov method

In this work, we present a theoretical analysis of the behaviour of the temperature profile for the Modified Markov Method. We have assumed different materials and different thicknesses for the insulating element. Comparison of preliminary results with experimental evidences, demonstrate us the reliability of our model. Discussion among our calculated results are provided and future outlooks for the experimental work are fixed. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Transient and quasi‐stationary simulation of heat and mass transfer in Czochralski silicon crystal growth

The formation of grown‐in defects in silicon crystals is controlled by the concentration of intrinsic point defects. Under steady state conditions the type of the prevailing point defect species is linked to the ratio of pull rate and temperature gradient in the crystal at the solidification front. It has been shown that this ratio as well as computed point defect distributions are in good agreement with experimental data. In this paper we compare a coupled transient heat transfer and transient point defect transport model with quasi steady state simulations at various time steps. Both simulations show the same qualitative results, quantitative differences in temperature are less than 1 %. But already for constant pull rates the defect distributions show qualitative differences between transient and quasi steady state simulations. Therefore, for a detailed understanding how defects are related to growth conditions, the thermal history should not be neglected.     

Simulation of temperature and flow fields in an inductively heated melt growth system

The goal of the research presented here is to apply a global analysis of an inductively heated Czochralski furnace for a real sapphire crystal growth system and predict the characteristics of the temperature and flow fields in the system. To do it, for the beginning stage of a sapphire growth process, influence of melt and gas convection combined with radiative heat transfer on the temperature field of the system and the crystal‐melt interface have been studied numerically using the steady state two‐dimensional finite element method. For radiative heat transfer, internal radiation through the grown crystal and surface to surface radiation for the exposed surfaces have been taken into account. The numerical results demonstrate that there are a powerful vortex which arises from the natural convection in the melt and a strong and large vortex that flows upwards along the afterheater side wall and downwards along the seed and crystal sides in the gas part. In addition, a wavy shape has been observed for the crystal‐melt interface with a deflection towards the melt. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical simulation of a new SiC growth system by the dual-directional sublimation method

A new SiC growth system using the dual-directional sublimation method was investigated in this study. Induction heating and thermal conditions were computed and analyzed by using a global simulation model, and then the values of growth rate and shear stress in a growing crystal were calculated and compared with those in a conventional system. The results showed that the growth rate of SiC single crystals can be increased by twofold by using the dual-directional sublimation method with little increase in electrical power consumption and that thermal stresses can be reduced due to no constraint of the crucible lid and low temperature gradient in crystals.     

Numerical investigation of carbon and silicon carbide contamination during the melting process of the Czochralski silicon crystal growth

Carbon contamination in single crystalline silicon is detrimental to the minority carrier lifetime, one of the critical parameters for electronic wafers. In order to study the generation and accumulation of carbon contamination, transient global modeling of heat and mass transport was performed for the melting process of the Czochralski silicon crystal growth. Carbon contamination, caused by the presence of carbon monoxide in argon gas and silicon carbide in the silicon feedstock, was predicted by the fully coupled chemical model; the model included six reactions taking place in the chamber. A simplified model for silicon carbide generation by the reaction between carbon monoxide and solid silicon was proposed using the closest packing assumption for the blocky silicon feedstock. The accumulation of carbon in the melted silicon feedstock during the melting and stabilization stages was predicted. Owing to this initial carbon content in the melt, controlling carbon contamination before the growth stage becomes crucial for reducing the carbon incorporation in a growing crystal.     

Numerical simulation of heat conduction for the growth of anisotropic layered GaSe crystals

In this report, we present the usage of a second rank cylindrical conductivity tensor which we derived to simulate the crystal growth processes of a layered compound GaSe in a cylindrical enclosure by directional solidification. Use of such a tensor is inevitable in the simulations of the growth of highly anisotropic crystals having layered structure, since the crystallographic orientation of the grown material is not necessarily aligned with the ampoule symmetry. Using the finite difference control volume approach in 3D, we solved transient heat conduction equation for a highly anisotropic solid in a cylindrical enclosure. We obtained sloped thermal fields and isothermal surfaces and the magnitudes of the slopes are strong functions of both azimuthal angle and growth orientation. The results showed that the orientation of the crystallographic axes of GaSe in the enclosure is quite effective in the steady and the transient fields, isotherms, and axial and radial temperature gradient within the material. Increase of Bi number decreases the magnitude of the slope of isothermal surface. Anisotropy of the conductivity seems to be effective in the orientation of the growth direction of the resulting crystal within the cylindrical ampoule. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical investigation of heat transport and fluid flow during the seeding process of oxide Czochralski crystal growth Part 2: rotating seed

In this paper, the role of seed rotation on the characteristics of the two‐dimensional temperature and flow field in the oxide Czochralski crystal growth system has been studied numerically for the seeding process. Based on the finite element method, a set of two‐dimensional quasi‐steady state numerical simulations were carried out to analyze the seed‐melt interface shape and heat transfer mechanism in a Czochralski furnace with different seed rotation rates: ω_seed = 5‐30 rpm. The results presented here demonstrate the important role played by the seed rotation for influencing the shape of the seed‐melt interface during the seeding process. The seed‐melt interface shape is quite sensitive to the convective heat transfer in the melt and gaseous domain. When the local flow close to the seed‐melt interface is formed mainly due to the natural convection and the Marangoni effect, the interface becomes convex towards the melt. When the local flow under the seed‐melt interface is of forced convection flow type (seed rotation), the interface becomes more concave towards the melt as the seed rotation rate (ω_seed) is increased. A linear variation of the interface deflection with respect to the seed rotation rate has been found, too. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Numerical study of induction heating in melt growth systems—Frequency selection

A set of 2D finite element numerical simulation of induction heating process for an oxide Czochralski crystal growth system has been made for a range of f=1–100 kHz applied frequency of driving current. It was shown that the frequency selection has a marked effect in all basic induction phenomena, including electromagnetic field distribution, skin depth, coil efficiency, and intensity and structure of heating in the growth setup.     

Influence of crucible geometry and position on the induction heating process in crystal growth systems

A series of 2D finite element numerical simulations of induction heating process for an oxide Czochralski crystal growth system has been done for different shapes and locations of a metal crucible. Comparison between the computational results shows the importance of crucible shape, geometry and its position with respect to the RF-coil on the electromagnetic field and heat generation distribution in the growth setup.     

Numerical investigation of heat transport and fluid flow during the seeding process of oxide Czochralski crystal growth Part 1: non‐rotating seed

For the seeding process of oxide Czochralski crystal growth, the flow and temperature field of the system as well as the seed‐melt interface shape have been studied numerically using the finite element method. The configuration usually used initially in a real Czochralski crystal growth process consists of a crucible, active afterheater, induction coil with two parts, insulation, melt, gas and non‐rotating seed crystal. At first the volumetric distribution of heat inside the metal crucible and afterheater inducted by the RF coil was calculated. Using this heat source the fluid flow and temperature field were determined in the whole system. We have considered two cases with respect to the seed position: (1) before and (2) after seed touch with the melt. It was observed that in the case of no seed rotation (ω_seed = 0), the flow pattern in the bulk melt consists of a single circulation of a slow moving fluid. In the gas domain, there are different types of flow motion related to different positions of the seed crystal. In the case of touched seed, the seed‐melt interface has a deep conic shape towards the melt. It was shown that an active afterheater and its location with respect to the crucible, influences markedly the temperature and flow field of the gas phase in the system and partly in the melt. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Initial stages of SiC crystal growth by PVT method

Initial stages of SiC crystal growth by Physical Vapor Transport method were investigated. The following features were observed: (a) many nucleation crystallization centres appeared on the seed surface during the initial stage of the growth, (b) at the same places many separate flat faces generated on the crystallization front, (c) the number of facets was dependent on the shape of the crystallization front and decreased during growth, (d) appearance of many facets lead to decrease of structural quality of crystals due to degradation of regions where crystallization steps from independent centres met. The results revealed that the optimal crystallization front should be slightly convex, which permits the growth of crystals with single nucleation centre and evolution of single facet on the crystallization front. The subjects of study were the shape and the morphology of growth interface. Defects in the crystallization fronts and wafers cut from the crystals were studied by optical microscopy, atomic force microscopy (AFM) combined with KOH etching and X‐ray diffraction. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Effect of AlN doping on the growth morphology of SiC

AlN doped SiC films were deposited on on‐axis Si‐face 4H‐SiC (0001) substrates by the physical vapor transport (PVT) method. Thick film in the range of 20 μm range was grown and morphology was characterized. Films were grown by physical vapor deposition (PVD) in a vertical geometry in the nitrogen atmosphere. We observed that nucleation occurred in the form of discs and growth occurred in hexagonal geometry. The X‐ray studies showed (001) orientation and full width of half maxima (FWHM) was less than 0.1° indicating good crystallinity. We also observed that film deposited on the carbon crucible had long needles with anisotropic growth very similar to that of pure AlN. Some of the needles grew up to sizes of 200 μm in length and 40 to 50 μm in width. It is clear that annealing of SiC‐AlN powder or high temperature physical vapor deposition produces similar crystal structure for producing AlN‐SiC solid solution. SEM studies indicated that facetted hexagons grew on the top of each other and coarsened and merged to form cm size grains on the substrate. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

SiC泡沫陶瓷的凝胶注模制备与表征

以高分子多糖明胶为胶凝剂,采用凝胶注模工艺制备SiC泡沫陶瓷.测量了分散剂加入前后浆料的ζ电位的变化.研究了分散剂四甲基氢氧化铵(TMAH)、明胶加入量、固含量等对SiC浆料流变性能的影响.结果表明:分散剂的加入对SiC颗粒的动力学行为有显著影响.在碱性范围内,ζ电位绝对值随TMAH加入量的增加而增大;明胶的加入明显提高了浆料的粘度;固含量为65;~74;时,为使浆料具有好的稳定性和流动性,同时保证明胶的成胶性能,TMAH和明胶的加入量应分别控制在2.5;左右及5;~7;为宜.制备的泡沫陶瓷由相互贯通的球形孔室构成,孔隙率最高可达到92;,其孔径分布取决于泡沫体孔隙率,对于孔隙率为76;和90;的样品,其孔径分别达到120 μm 和200 μm.泡沫陶瓷的抗弯强度随相对密度增大而提高,相对密度达到25;时,其抗弯强度可达到25.2 MPa.