Zn adsorption on Pd(111): ZnO and PdZn alloy formation

The adsorption and thermal desorption of Zn and ZnO on Pd(111) was studied in the temperature range between 300 and 1300 K with TDS, LEED, and CO adsorption measurements. At temperatures below 400 K, multilayer growth of Zn metal on the Pd(111) surface takes place. At a coverage of 0.75 ML of Zn, a p(2 x 2)-3Zn LEED structure is observed. Increasing the coverage to 3 ML results in a (1 x 1) LEED pattern arising from an ordered Zn multilayer on Pd(111). Thermal desorption of the Zn multilayer state leads to two distinct Zn desorption peaks: a low-temperature desorption peak (400-650 K) arising from upper Zn layers and a second peak (800-1300 K) originating from the residual 1 ML Zn overlayer, which is more strongly bound to the Pd(111) surface and blocks CO adsorption completely. Above 650 K, this Zn adlayer diffuses into the subsurface region and the surface is depleted in Zn, as can be deduced from an increased amount of CO adsorption sites. Deposition of >3 ML of Zn at 750 K leads to the formation of a well-ordered Pd-Zn alloy exhibiting a (6 x 4 square root 3/3)rect. LEED structure. CO adsorption measurements on this surface alloy indicate a high Pd surface concentration and a strong reduction of the CO adsorption energy. Deposition of Zn at T > 373 K in 10(-6) mbar of O2 leads to the formation of an epitaxial (6 x 6) ZnO overlayer on Pd(111). Dissociative desorption of ZnO from this overlayer occurs quantitatively both with respect to Zn and O2 above 750 K, providing a reliable calibration for both ZnO, Zn, and oxygen coverage.     

Sensitivity of methyl thiolate desulfurization selectivity to reaction temperature and hydroxyl coverage

The adsorption and reaction of methanethiol (CH3SH) and dimethyl disulfide (CH3SSCH3) on Mo(110)-(1 x 6)-O have been studied using temperature-programmed reaction spectroscopy and reflection-absorption infrared spectroscopy over the temperature range of 110-550 K. The S-H bond is broken upon adsorption to form adsorbed OH, water, and methyl thiolate (CH3S-) at low temperature. Water is evolved at 210 and 310 K via molecular desorption and disproportionation of OH, respectively. Some hydroxyl remains on the surface up to 350 K. Methyl thiolate is also formed from CH3SSCH3 on Mo(110)-(1 x 6)-O. Methyl thiolate undergoes C-S cleavage above 300 K, yielding methane and methyl radicals. There is also a minor amount of nonselective decomposition leading to the formation of carbon and hydrogen. Methane production is promoted by adsorbed hydroxyl. As the hydroxyl coverage increases, the yield of methyl radicals relative to methane diminishes. Accordingly, there is more methane produced from methanethiol reaction than from dimethyl disulfide, since S-H dissociation in CH3SH produces OH. The maximum coverage of the thiolate is approximately 0.5 monolayers, based on the amount of sulfur remaining after reaction measured by Auger electron spectroscopy. In contrast to cyclopropylmethanethiol (c-C3H5CH2SH), for which alkyl transfer from sulfur to oxygen is observed, there is no evidence for transfer of the methyl group of methyl thiolate to oxygen on the surface. Specifically, there is no evidence for methoxy (CH3O-) in infrared spectroscopy or temperature-programmed reaction experiments.     

Racemic versus enantiopure alanine on Cu(110): an experimental study

The adsorption of racemic alanine on the Cu(110) surface has been compared to that of enantiopure alanine using low-energy electron diffraction (LEED), reflection absorption infrared spectroscopy (RAIRS), and scanning tunneling microscopy (STM). No evidence of chiral resolution at the surface was observed for the racemic system, indicating that the formation of separate enantiopure areas is not preferred. Also, in contrast to the enantiopure system, no chirally organized phase was observed for the racemic system. LEED shows that both systems display a common (3 x 2) phase at high coverage. However, the pathway and kinetic barriers to this phase differ markedly for the racemic and the enantiopure systems, with the racemic (3 x 2) appearing at a temperature that is more than 100 K below that required for the enantiopure system. In addition, we report intriguing complexities for the (3 x 2) LEED structure that is ubiquitous in amino acid/Cu(110) systems. First, a common (3 x 2) pattern with a zigzag distortion can be associated with both the racemic and enantiopure systems. For the racemic system, the coverage can be increased further to give a "true" (3 x 2) LEED pattern, which is a transformation that is impossible to enact for the enantiopure system. Most importantly, STM images of the "distorted" and "true" (3 x 2) structures created in the racemic system show subtle differences with neither arrangement being fully periodic over distances greater than a few molecules. Thus, the (3 x 2) phase appears to be more complicated than at first indicated and will require more complex models for a full interpretation.     

The reactive chemisorption of alkyl iodides at Cu(110) and Ag(111) surfaces: a combined STM and XPS study

The chemisorption of methyl and phenyl iodide has been studied at Cu(110) and Ag(111) surfaces at 290 K with STM and XPS. At both surfaces dissociative adsorption of both molecules leads to chemisorbed iodine, with the STM showing c(2 x 2) and (square root 3 x square root 3)R30 structures at the Cu(110) and Ag(111) surfaces, respectively. At the Cu(110) surface a comparison of coexisting c(2 x 2) I(a) and p(2 x 1) O(a) domains shows the iodine adatoms to be chemisorbed in hollow sites with evidence at low coverage for diffusion in the (110) direction. In the case of methyl iodide no carbon adsorption is observed at either the silver or the copper surfaces, but chemisorbed phenyl groups are imaged at the Cu(110) surface after exposure to phenyl iodide. The STM images show the phenyl groups as bright features approximately 0.7 nm in diameter and 0.11 nm above the iodine adlayer, reaching a maximum surface concentration after approximately 6 Langmuir exposure. However, the phenyl coverage decreases with subsequent exposures to PhI and is negligible by approximately 1000 L exposure, consistent with the formation and desorption of biphenyl. The adsorbed phenyls are located above hollow sites in the substrate, they are stabilized at the top and bottom of step edges and in paired chains (1.1 nm apart) on the terraces with a regular interphenyl spacing within the chains of 1.0 nm in the (110) direction. The interphenyl ring spacing and diffusion of individual phenyls from within the chains shows that the chains do not consist of biphenyl species but may be a precursor to their formation. Although the XPS data shows carbon present at the Ag(111) surface after exposure to PhI, no features attributable to phenyl groups were observed by STM.     

Calcium adsorption on MgO(100): energetics, structure, and role of defects

The adsorption of Ca on the MgO(100) surface at 300 K has been studied using microcalorimetry, in combination with LEED, AES, ISS, work function, sticking probability measurements, and density functional theory (DFT) calculations. The MgO(100) thin films (approximately 4 nm thick) were grown epitaxially on a 1 microm thick Mo(100) single-crystal. The sticking probability of Ca on MgO(100) at 300 K is unity. On the basis of AES and ISS measurements, it was determined that Ca grows mainly as 3D particles on the MgO(100) surface with a density of approximately 1 x 10(12) islands/cm2. Ca adsorbs initially at defect sites with a very high heat of adsorption (approximately 410 kJ/mol). DFT calculations attribute this high initial heat to Ca binding to kink sites (376 kJ/mol), step sites (205 kJ/mol), and lower concentrations of stronger binding sites. The heat of adsorption decreases rapidly with coverage, reaching a minimum of 162 kJ/mol at approximately 0.3 ML, where Ca is mainly adding to small 3D Ca clusters. Afterward, it increases to the value of bulk Ca heat of sublimation (178 kJ/mol) at approximately 1.2 ML, attributed to the increase in stability with increasing Ca particle size. A 1.0 eV decrease of the work function with Ca coverage from 0 to 0.3 ML indicates that Ca adsorbed at defects is cationic, in agreement with calculations showing that Ca donates electron density to the MgO. Light ion sputtering of the MgO(100) surface generates point defects, but these do not change the heat of adsorption versus coverage, implying that they do not nucleate Ca particles. Oxygen vacancies are a likely candidate; DFT calculations show that F and F+ center vacancies bind Ca more weakly than terrace sites. More extensive sputtering creates extended defects (such as steps and kinks) that adsorb Ca with heats of adsorption up to approximately 400 kJ/mol, similar to that at the intrinsic defect sites.     

Imaging adsorbate O-H bond cleavage: methanol on TiO2(110)

We investigated methanol adsorption and dissociation on bridge-bonded oxygen vacancies of the TiO2(110)-(1x1) surface using in situ scanning tunneling microscopy. We provide the first direct evidence that methanol dissociates on oxygen vacancies via O-H bond scission rather than C-O scission. For CH3OH coverages lower than the oxygen vacancy concentration, stationary methoxy-hydroxyl pairs form. At CH3OH coverages close to the oxygen vacancy concentration undissociated mobile CH3OH interacts with methoxy-hydroxyl pairs and facilitates the movement of hydroxyl away from the methoxy group.     

Two-site adsorption model for the (square root 3 x square root 3)-R30 degrees dodecanethiolate lattice on Au(111) surfaces

The surface structure of dodecanethiolate self-assembled monolayers (SAMs) on Au(111) surfaces, formed from the liquid phase, have been studied by grazing incidence X-ray diffraction (GIXRD), scanning tunneling microscopy (STM), and electrochemical techniques. STM images show that the surface structure consists of (square root 3 x square root 3)-R30 degrees domains with only a few domains of the c(4 x 2) lattice. The best fitting of GIXRD data for the (square root 3 x square root 3)-R30 degrees lattice is obtained with alkanethiolate adsorption at the top sites, although good fittings are also obtained for the fcc and hcp hollow sites. On the basis of this observation, STM data, electrochemical measurements, and previously reported data, we propose a two-site model that implies the formation of incoherent domains of alkanethiolate molecules at top and fcc hollow sites. This model largely improves the fitting of the GIXRD data with respect to those observed for single adsorption sites and, also, for the other possible two-site combinations. The presence of alkanethiolate molecules adsorbed at the less favorable top sites could result from the adsorption pathway that involves an initial physisorption step which, for steric reasons, takes place at on top sites. Once the molecules are chemisorbed, the presence of energy barriers for alkanethiolate surface diffusion, arising mostly from chain-chain interactions, "freezes" some of them at the on top sites, hindering their movement toward fcc hollow sites. By considering the length of the hydrocarbon chain and the adsorption time, the two-site model could be a tool to explain most of the controversial results on this matter reported in the literature.     

Chemisorption and reaction characteristics of methyl radicals on Cu(110)

Methyl radicals are generated by pyrolysis of azomethane, and the condition for achieving neat adsorption on Cu(110) is described for studying their chemisorption and reaction characteristics. The radical-surface system is examined by X-ray photoemission spectroscopy, ultraviolet photoemission spectroscopy, temperature-programmed desorption, low-energy electron diffraction (LEED), and high-resolution electron energy loss spectroscopy under ultrahigh vacuum conditions. It is observed that a small fraction of impinging CH3 radicals decompose into methylene possibly on surface defect sites. This type of CH2 radical has no apparent effect on CH3(ads) surface chemistry initiated by dehydrogenation to form active CH2(ads) followed by chain reactions to yield high-mass alkyl products. All thermal desorption products, such as H2, CH4, C2H4, C2H6, and C3H6, are detected with a single desorption peak near 475 K. The product yields increase with surface coverage until saturation corresponding to 0.50 monolayer of CH3(ads). The mass distribution is, however, invariant with initial CH3(ads) coverage, and all desorbed species exhibit first-order reaction kinetics. LEED measurement reveals a c(2 x 2) adsorbate structure independent of the amount of gaseous exposure. This strongly suggests that the radicals aggregate into close-packed two-dimensional islands at any exposure. The islanding behavior can be correlated with the reaction kinetics and is deemed to be essential for the chain propagation reactions. Some relevant aspects of the CH3/Cu(111) system are also presented. The new results are compared with those of prior studies employing methyl halides as radical sources. Major differences are found in the product distribution and desorption kinetics, and these are attributed to the influence of surface halogen atoms present in those earlier investigations.     

Tellurium adatoms as an in-situ surface probe of (111) two-dimensional domains at platinum surfaces

Irreversibly adsorbed tellurium has been studied as a probe to quantify ordered domains in platinum electrodes. The surface redox process of adsorbed tellurium on the Pt(111) electrode and Pt(111) stepped surfaces takes place around 0.85 V in a well-defined peak. The behavior of this redox process on the Pt(111) vicinal surfaces indicates that the tellurium atoms involved in the redox process are only those deposited on the (111) terrace sites. Moreover, the corresponding charge density is proportional to the number of sites on (111) ordered domains (terraces) that are, at least, three atoms wide. Hence, this charge density can be used to measure the number of (111) terrace sites on any given platinum sample. Structural information about tellurium adsorption is obtained from atomic-resolution STM images for the Pt(111) and Pt(10, 10, 9) electrodes. A rectangular structure (2 x radical 3) and a compact hexagonal structure (11 x 8) were identified. However, the redox peak for adsorbed tellurium on (100) domains at 1.03 V overlaps with peaks arising from steps and (110) sites. Therefore, it cannot be used without problems for the determination of (100) sites on a platinum sample. On the (100) terraces, the surface structure of the adsorbed tellurium is c(2 x 2), as revealed by STM. Finally, tellurium irreversible adsorption has been used to estimate the number of (111) ordered domains terrace sites on different polycrystalline platinum samples, and the results are compared to those obtained with bismuth irreversible adsorption.     

CO在YBa2Cu3Ox薄膜上吸附与加氢的研究

ＹＢａ２Ｃｕ３Ｏｘ（ｘ＝６－７）薄膜被合成在ＹＳＺ基底上，用ＦＴＩＲ，ＸＰＳ，ＸＲＤ等手段原位研究ＣＯ在薄膜上的吸附及加氢行为。ＣＯ吸附在Ｃｕ位置上，与ＹＢＣＯ体相中的Ｏ作用，生成表面ＣＯ２或－ＣＯＯ基团，导致ＹＢＣＯ中生产氧空位，使ＹＢＣＯ发生昌型转变，Ｃｕ＾２＋被还原为Ｃｕ＾＋或Ｃｕ＾０．ＹＢＣＯ中的氧空位有利于ＣＯ、ＣＯ２及Ｈ２的吸附。ＣＯ、ＣＯ２在ＹＢＣＯ膜上的加氢产物为ＣＨ３ＯＨ、ＣＨ３     

Coverage-dependent adsorption of atomic sulfur on Fe(110): a DFT study

Adsorption of atomic sulfur at different coverages on the Fe(110) surface is examined using density functional theory (DFT) in order to investigate the effect that adsorbate-adsorbate interactions may have on the surface properties. S is adsorbed in the high-symmetry adsorption sites: 4-fold hollow, bridge, and atop sites in the following surface arrangements: c(2 x 2) and p(1 x 1) which correspond to coverages of 1/2 and 1 monolayer, respectively. The binding energy, work function change, adsorption geometry, charge density distribution, magnetic properties, and density of states are examined and compared to our previous study of S adsorbed at 1/4 monolayer coverage and p(2 x 2) arrangement [Spencer et al. Surf. Sci. 2003, 540, 420]. It was found that S forms polar covalent bonds to the surface. The bonding goes from being S-Fe dominated at the low coverages to being S-S dominated at the higher coverages where the S atoms are located closer together on the surface and interact with each other.     

The nature of alkanethiol self-assembled monolayer adsorption on sputtered gold substrates

A detailed study of the self-assembly and coverage by 1-nonanethiol of sputtered Au surfaces using molecular resolution atomic force microscopy (AFM) and scanning tunneling microscopy (STM) is presented. The monolayer self-assembles on a smooth Au surface composed predominantly of [111] oriented grains. The domains of the alkanethiol monolayer are observed with sizes typically of 5-25 nm, and multiple molecular domains can exist within one Au grain. STM imaging shows that the (4 x 2) superlattice structure is observed as a (3 x 2) structure when imaged under noncontact AFM conditions. The 1-nonanethiol molecules reside in the threefold hollow sites of the Au[111] lattice and aligned along its [112] lattice vectors. The self-assembled monolayer (SAM) contains many nonuniformities such as pinholes, domain boundaries, and monatomic depressions which are present in the Au surface prior to SAM adsorption. The detailed observations demonstrate limitations to the application of 1-nonanethiol as a resist in atomic nanolithography experiments to feature sizes of approximately 20 nm.     

Formation of hydrogen-bridged cytosine dimers on Cu(110)

Cytosine was adsorbed onto a Cu(110) surface under UHV conditions. Annealing to 370 K resulted in the formation of a (6 x 6)gg low energy electron diffraction (LEED) pattern, even at submonolayer coverages. Examination of this structure with scanning tunneling microscopy (STM) revealed islands of zigzag chains at low coverages and large ordered domains at monolayer saturation. Further annealing to 480 K initiated a phase transition to a (6 x 2)gg structure observed both by LEED and STM. High resolution electron energy loss spectroscopy spectra for both overlayer structures exhibited mainly in-plane modes suggesting upright/tilted species on the surface. Based on the experimental data and supported by density functional theory calculations, a model is proposed for the (6 x 2)gg structure, which involves the formation of deprotonated hydrogen bridge-bonded cytosine dimers, adsorbed through the oxygen atoms.     

Direct and indirect causes of Fermi level pinning at the SiO/GaAs interface

The correlation between atomic bonding sites and the electronic structure of SiO on GaAs(001)-c(2x8)/(2x4) was investigated using scanning tunneling microscopy (STM), scanning tunneling spectroscopy (STS), and density functional theory (DFT). At low coverage, STM images reveal that SiO molecules bond Si end down; this is consistent with Si being undercoordinated and O being fully coordinated in molecular SiO. At approximately 5% ML (monolayer) coverage, multiple bonding geometries were observed. To confirm the site assignments from STM images, DFT calculations were used to estimate the total adsorption energies of the different bonding geometries as a function of SiO coverage. STS measurements indicated that SiO pins the Fermi level midgap at approximately 5% ML coverage. DFT calculations reveal that the direct causes of Fermi level pinning at the SiO GaAs(001)-(2x4) interface are a result of either local charge buildups or the generation of partially filled dangling bonds on Si atoms.     

Surface structure and interface dynamics of alkanethiol self-assembled monolayers on Au(111)

Scanning tunneling microscopy (STM) and high-resolution electron energy loss spectroscopy (HREELS) were used to examine the structural transitions and interface dynamics of octanethiol (OT) self-assembled monolayers (SAMs) caused by long-term storage or annealing at an elevated temperature. We found that the structural transitions of OT SAMs from the c(4 x 2) superlattice to the (6 x square root 3) superlattice resulting from long-term storage were caused by both the dynamic movement of the adsorbed sulfur atoms on several adsorption sites of the Au(111) surface and the change of molecular orientation in the ordered layer. Moreover, it was found that the chemical structure of the sulfur headgroups does not change from monomer to dimer by the temporal change of SAMs at room temperature. Contrary to the results of the long-term-stored SAMs, it was found that the annealing process did not modify either the interfacial or chemical structures of the sulfur headgroups or the two-dimensional c(4 x 2) domain structure. Our results will be very useful for a better understanding of the interface dynamics and stability of sulfur atoms in alkanethiol SAMs on Au(111) surfaces.     

Coverage‐Dependent Variation of Adsorption Configurations of Methionine on Ge(100)

The adsorption configurations of methionine molecules on the Ge(100) surface have been studied by using DFT calculations, core‐level photoemission spectroscopy (CLPES), and low‐energy electron diffraction (LEED) to scrutinize the adsorption structure as a function of coverage. At first, we obtained two important and stable structures. One is the most stable structure between these structures described as an “O H dissociated‐N dative‐S dative‐bonded structure” and the other is a less stable adsorption structure of these indicating an “O H dissociated‐S dative‐bonded structure” by using DFT calculations. We also performed CLPES to clarify our DFT calculation results. Through the spectral analysis of the S 2p, C 1s, N 1s, and O 1s core‐level spectra, we acquired the reasonable results that also revealed quite different bonding configurations depending on the methionine coverage. At low coverage (ca. 0.30 ML), a single type of sulfur and charged nitrogen peaks, which indicate an “O H dissociated‐N dative‐S dative‐bonded structure”, were observed. On the other hand, two types of sulfur peaks with thiol formation and two nitrogen peaks with neutralized and charged characteristics were monitored at a higher coverage (0.60 ML and above), which can be described as an “O H dissociated‐S dative‐bonded structure”. Hence, we can clearly demonstrate that our results obtained from CLPES spectra and DFT calculations are matched well with each other. Moreover, we additionally confirmed that the relative population of the two types of thiols and amines being included in methionine in between half monolayer induces a surface reorientation in the ordering from 2×1 to 1×1 employing LEED. This interesting variation of the methionine adsorbed on the Ge(100) surface by coverage dependence will be precisely discussed by using DFT calculations, CLPES, and LEED.     

Dissociation of CH3I on the Al111 surface--an STM and density functional theory study

The reaction of methyl iodide with the Al(111) surface was studied by room-temperature scanning tunneling microscopy (STM) and by first principles calculations. It was found that at 300 K methyl iodide decomposes on the Al(111) surface, forming methyl (CH(3)), methylidyne (CH), and adsorbed iodine. Methyl groups are observed to occupy atop sites by STM. The occupation of the hollow site by methylidyne was observed in STM measurements. Total energy density functional theory calculations have shown that methyl species occupy atop Al sites (E(A) = 45.3 kcal/mol), methylidyne species adsorb on fcc hollow sites (E(A) = 155.0 kcal/mol), while individual iodine atoms can bind on both on-top or hollow sites with adsorption energies between 54 and 56 kcal/mol.     

In situ scanning tunneling microscopy investigation of sulfur oxidative underpotential deposition on Ag(100) and Ag(110)

Underpotential (UPD) deposition of sulfur from Na(2)S solution in 0.1 M NaOH was studied on Ag(100) and Ag(110) using in situ scanning tunneling microscopy (STM). The cyclic voltammogram on Ag(100) presents two broad peaks, whereas three partial overlapping peaks and a sharper one are observed on Ag(110). STM measurements carried out during the whole UPD process show that progressively more compact structures are formed as the applied potential is scanned toward more positive potentials. More precisely, p(2×2), c(2×6), and c(2×2) were found on Ag(100) at E = -1.25, -1.0, and -0.9 V, respectively. Less definite conclusions can be drawn for the structures of S overlayers on Ag(110). However, the experimental findings are consistent with an incomplete p(2×1) at potentials preceding the sharp peak, and with a c(2×2) structure at E = -0.9 V vs Ag/AgCl, KCl(sat). The coverage values calculated on the basis of the hypothesized structures have been compared with the values obtained from chronocoulometric measurements at the most positive potentials investigated. Thus, the experimental coverage θ = 0.5 coincides with the coverage calculated for the c(2×2) structure found on Ag(110) at E = -0.9 V by STM, whereas the experimental coverage θ = 0.42 suggests that a mixture of structures c(2×6) and c(2×2) is formed on Ag(100).     

Formation of ordered self-assembled monolayers by adsorption of octylthiocyanates on Au(111)

Self-assembled monolayers (SAMs) were formed by the spontaneous adsorption of octythiocyanate (OTC) on Au(111) using both solution and ambient-pressure vapor deposition methods at room temperature and 50 degrees C. The surface structures and adsorption characteristics of the OTC SAMs on Au(111) were characterized by scanning tunneling microscopy (STM) and X-ray photoelectron spectroscopy (XPS). The STM observation showed that OTC SAMs formed in solution at room temperature have unique surface structures including the formation of ordered and disordered domains, vacancy islands, and structural defects. Moreover, we revealed for the first time that the adsorption of OTC on Au(111) in solution at 50 degrees C led to the formation of SAMs containing small ordered domains, whereas the SAMs formed by vapor deposition at 50 degrees C had long-range ordered domains, which can be described as (radical3 x 2 radical19)R5 degrees structures. XPS measurements of the peaks in the S 2p and N 1s regions for the OTC SAMs showed that vapor deposition is the more effective method as compared to solution deposition for obtaining high-quality SAMs by adsorption of OTC on gold. The results obtained will be very useful in understanding the SAM formation of organic thiocyanates on gold surfaces.     

Surface chemistry on bimetallic alloy surfaces: adsorption of anions and oxidation of CO on Pt3Sn(111)

The microscopic structure of the Pt(3)Sn(111) surface in an electrochemical environment has been studied by a combination of ex situ low-energy electron diffraction (LEED), Auger electron spectroscopy (AES), and low-energy ion scattering (LEIS) and in situ surface X-ray scattering (SXS) and Fourier transform infrared (FTIR) spectroscopy. In ultrahigh vacuum (UHV) the clean-annealed surface produces a p(2 x 2) LEED pattern consistent with the surface composition, determined by LEIS, of 25 at. % Sn. SXS results show that the p(2 x 2) structure can be "transferred" from UHV into 0.5 M H(2)SO(4) and that the surface structure remains stable from 0.05 to 0.8 V. At 0.05 V the expansion of Pt surface atoms, ca. +2% from the bulk lattice spacing, is induced by adsorption of underpotential-deposited (UPD) hydrogen. At 0.5 V, where Pt atoms are covered by (bi)sulfate anions, the topmost layer is contracted relative to 0.05 V, although Sn atoms expand significantly, ca. 8.5%. The p(2 x 2) structure is stable even in solutions containing CO. In contrast to the Pt(111)-CO system, no ordered structures of CO are formed on the Pt(3)Sn(111) surface and the topmost layer expands relatively little (ca. 1.5%) from the bulk lattice spacing upon the adsorption of CO. The binding site geometry of CO on Pt(3)Sn(111) is determined by FTIR. In contrast to the near invariant band shape of a-top CO on Pt(111), changes in band morphology (splitting of the band) and vibrational properties (increase in the frequency mode) are clearly visible on the Pt(3)Sn(111) surface. To explain the line shape of the CO bands, we suggest that in addition to alloying effects other factors, such as intermolecular repulsion between coadsorbed CO and OH species, are controlling segregation of CO into cluster domains where the local CO coverage is different from the coverage expected for the CO-CO interaction on an unmodified Pt(111) surface.