Discrete tunneling of holes in porous silicon

It is pointed out that in the partial oxidation of porous silicon (PS) formed on heavily doped crystals, the topology of the pores can result in the formation of an anisotropic material with strings of nanometersized silicon granules embedded in insulating silicon dioxide SiO₂. In this range of granule sizes the correlation effects in the tunneling of electrons (holes) are strong on account of their Coulomb interaction. This should be manifested as discrete electron and hole tunneling at temperatures comparable to room temperature. The room-temperature current-voltage characteristics of n ⁺-PSp ⁺-p ⁺ diode structures with a PS interlayer on p ⁺-Si, which exhibit current steps on the forward and reverse branches, are presented. The current steps are attributed to discrete hole tunneling along the silicon strings in SiO₂. Pis’ma Zh. éksp. Teor. Fiz. 67, No. 10, 794–797 (25 May 1998)     

The enhanced electron injection by fluorinated tris-(8-hydroxy-quinolinato) aluminum derivatives in high efficient Si-anode OLEDs

Fabrication of organic light-emitting diodes (OLEDs) and lasers on silicon substrates is a feasible route to integrate microelectronic chips with optical devices for telecommunications. However, the efficiency of Si-anode based OLEDs is restricted by the imbalance of hole-electron injection because a p-type Si anode owns better hole injection ability than ITO. We have used fluorinated tris-(8-hydroxy-quinolinato) aluminum (FAlq₃) derivatives to prepare Si-anode based OLEDs. We observed that, when tris-(5-fuloro-8-hydroxyquinolinato) aluminum (5FAlq₃) is used as the electron-transporting material instead of Alq₃, the cathode electron injection is enhanced due to its lower lowest unoccupied molecular orbital (LUMO) compared to the Alq₃. The device can keep the relative carrier balance even when a Si anode capable of stronger hole injection was used. Further optimization of the device structure by introducing 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline (BCP) as a hole blocking layer showed significant increase in the device power efficiency from 0.029 to 0.462 lm/W. This indicates that use of fluorinated Alq₃ derivatives is an effective way to improve the performance of Si-anode based OLEDs.     

Highly efficient bipolar connecting layers for tandem organic light-emitting devices

A highly efficient tandem organic light-emitting device (OLED) has been fabricated by using an effective bipolar connecting layer structure. The connecting layers were made up of a layer of magnesium (Mg): 2,7-dipyrenyl-9,9-diphenyl fluorene (N-DPF) and a layer of tungsten trioxide (WO₃). Such a connecting layer structure permits efficient opposite holes and electrons flowing into two adjacent emitting units. The current efficiency of the two-unit tandem device can be dramatically enhanced by more than four times compared with that of the conventional single-unit device. At 60 mA/cm², the current efficiency of the tandem OLED using the connecting layers of Mg: N-DPF/WO₃ was about 8.15 cd/A. The results can be marked as a breakthrough approach to improve the current efficiency and brightness of OLEDs. Furthermore, a model of the carrier tunneling into light-emitting units is proposed based on carrier balance and field-assisted tunneling. It indicates that the connecting layer structure functions as the origin of high efficiency for the tandem OLEDs.     

Organic light-emitting diode performance enhancement via indium tin oxide glass surface modification

A self-assembly monolayer (SAM), with phenyl-triethoxysilane (PTES), was used to modify the indium tin oxide anode for an organic light-emitting diode (OLED) in order to improve the OLED performance. The enhancement of OLED performance is attributed to the blockage of excessive hole injection by PTES, balancing the hole and electron injection numbers. The result indicates that the SAM process reaction time duration greatly affects the OLED performance outcomes. If the reaction time is too long, it will impact on the optical efficiency due to molecular aggregates accumulated on the SAM layers, thus reducing the performance of the OLEDs. The electrical and optical characteristics of the OLEDs are modeled by using the modified Shockley equation. Modified Shockley parameters are extracted to interpret the experimental data with excellent accuracy. Those parameters, both electrical and optical, can be used as the DC level modeling parameters for OLED product design simulations.     

Properties of magnesium silicate doped with chromium in porous silicon

Forsterite doped with Cr⁴⁺ ions is prepared in silicon-based structures according to a simple technique. These structures are of interest due to the characteristic luminescence in the near-IR range. Forsterite is synthesized by impregnation of porous silicon layers on n⁺-Si and p⁺-Si substrates with subsequent annealing in air. A photoluminescence response at a wavelength of 1.15 μm is observed at room temperature in porous silicon layers doped with magnesium and chromium for which the optimum annealing temperature is close to 700°C. The photoluminescence spectrum of porous silicon on the p⁺-Si substrate contains a broad band at a wavelength of approximately 1.2 μm. This band does not depend on the annealing temperature and the magnesium and chromium content and is most likely associated with the presence of dislocations in silicon. The experimental EPR data and eletrical properties of the structures are discussed. It is found that layers of pure porous silicon and chromium-doped porous silicon on n⁺-Si subtructures exhibit indications of discrete electron tunneling.     

EPR investigation of the accumulation of F+ centers in irradiated MgO:Mn crystals

According to electron paramagnetic resonance spectra of MgO:Mn crystals irradiated in a reactor, the dependences of the concentration of F⁺ centers on the irradiation dose and on the content of impurities have been obtained. The strong influence of paramagnetic Mn²⁺ ions on the efficiency of the accumulation of F⁺ centers is determined.     

Tandem organic light-emitting diode with molybdenum tri-oxide thin film interconnector layer

A 10-nm thickness molybdenum tri-oxide (MoO₃) thin film was used as the interconnector layer in tandem organic light-emitting devices (OLEDs). The tandem OLEDs with two identical emissive units consisting of N,N'-bis(naphthalen-1-yl)-N,N'-bis(phenyl)-benzidine (NPB)/tris(8-hydroxyquinoline) aluminum (Alq₃) exhibited current efficiency-current density characteristics superior to the conventional single-unit devices. At 20 mA/cm², the current efficiency of the tandem OLEDs using the interconnector layers of MoO₃ thin film was about 4.0 cd/A, which is about twice of that of the corresponding conventional single-unit device (1.8 cd/A). The tandem OLED showed a higher power efficiency than the conventional single-unit device for luminance over 1200 cd/m². The experimental results demonstrated that a MoO₃ thin film with a proper thickness can be used as an effective interconnector layer in tandem OLEDs. Such an interconnector layer can be easily fabricated by simple thermal evaporation, greatly simplifying the device processing and fabrication processes required by previously reported interconnector layers. A possible explanation was proposed for the carrier generation of the MoO₃ interconnector layer.     

Probing charge carrier compensation in high energy ion irradiated III–V semiconductor by Raman spectroscopy and Hall measurements

Raman spectroscopy and Hall measurements have been carried out to investigate the differences in near‐surface charge carrier modulation in high energy (~100 MeV) silicon ion (Si⁸⁺) and oxygen ion (O⁷⁺) irradiated n‐GaAs. In the case of O ion irradiation, the observed decrease in carrier concentration with increase in ion fluence could be explained in the view of charge compensation by possible point defect trap centers, which can form because of elastic collisions of high energy ions with the target nuclei. In Si irradiated n‐GaAs one would expect the carrier compensation to occur at a fluence of 2.5 × 10¹³ ions/cm², if the same mechanism of acceptor state formation, as in case of O irradiation, is considered. However, we observe the charge compensation in this system at a fluence of 5 × 10¹² ions/cm². We discuss the role of the complex defect states, which are formed because of the interaction of the primary point defects, in determining carrier concentration in a Si irradiated n‐GaAs wafer. The above results are combined with the reported data from the literature for high energy silver ion irradiated n‐GaAs, in order to illustrate the effect of both electronic and nuclear energy loss on trap creation and charge compensation. Copyright © 2016 John Wiley & Sons, Ltd.     

Improving efficiency of organic light-emitting devices by optimizing the LiF interlayer in the hole transport layer

The efficiency of organic light-emitting devices (OLEDs) based on N,N'-bis(1-naphthyl)-N,N'-diphenyl-N,1'-biphenyl-4,4'-diamine (NPB) (the hole transport layer) and tris(8-hydroxyquinoline) aluminum (Alq₃) (both emission and electron transport layers) is improved remarkably by inserting a LiF interlayer into the hole transport layer. This thin LiF interlayer can effectively influence electrical performance and significantly improve the current efficiency of the device. A device with an optimum LiF layer thickness at the optimum position in NPB exhibits a maximum current efficiency of 5.96 cd/A at 215.79 mA/cm², which is about 86% higher than that of an ordinary device (without a LiF interlayer, 3.2 cd/A). An explanation can be put forward that LiF in the NPB layer can block holes and balance the recombination of holes and electrons. The results may provide some valuable references for improving OLED current efficiency.     

Numerical and experimental studies of mixed-host organic light emitting diodes

Electrical characteristic and luminance of three mixed-host organic light emitting diodes (OLEDs): namely the uniformly mixed, step-wise graded and mixed, and continuously graded and mixed, were compared with the conventional hetero-junction OLED in both numerical and experimental studies. These mixed-host OLEDs were fabricated by a mixed-source thermal evaporation process, and half-cell devices were also fabricated to provide some input parameters for OLED simulations. The current efficiencies were largely influenced by their device structures and strongly agreed with the computed current balance factors. The improved mixed-host OLED performances can be discussed with aid from simulations, which include spatial distributions of electron and hole, carrier mobility, electric field profiles, the total recombination rates in the light emitting layer.     

Enhanced brightness of organic light-emitting diodes based on Mg:Ag cathode using alkali metal chlorides as an electron injection layer

Different thicknesses of cesium chloride (CsCl) and various alkali metal chlorides were inserted into organic light-emitting diodes (OLEDs) as electron injection layers (EILs). The basic structure of OLED is indium tin oxide (ITO)/N,N′-diphenyl-N,N′-bis(1-napthyl-phenyl)-1.1′-biphenyl-4.4′-diamine (NPB)/tris-(8-hydroxyquinoline) aluminum (Alq₃)/Mg:Ag/Ag. The electroluminescent (EL) performance curves show that both the brightness and efficiency of the OLEDs can be obviously enhanced by using a thin alkali metal chloride layer as an EIL. The electron injection barrier height between the Alq₃ layer and Mg:Ag cathode is reduced by inserting a thin alkali metal chloride as an EIL, which results in enhanced electron injection and electron current. Therefore, a better balance of hole and electron currents at the emissive interface is achieved and consequently the brightness and efficiency of OLEDs are improved.     

Structural and optical properties of porous silicon prepared from a p +-epitaxial layer on n-Si(111)

The structural and optical properties of porous silicon prepared by anodic etching of an n-Si(111) wafer with a p ⁺-homoepitaxial layer on one side are studied by scanning electron microscopy and multiple-crystal X-ray diffraction. A considerable difference between the microstructures on the sides of the wafer is found. Upon aging for 4.5 months, diffraction peaks of the por-Si structures shift from that of the substrate by δθ = ?42″ for the n-Si porous layer and ?450″ for the p ⁺-Si porous layer. The photoluminescence band associated with the p ⁺-layer is twice as narrow as the band associated with the n-layer and is shifted toward shorter wavelengths (higher energies) by 0.4 eV, with the intensities of the bands being the same.     

Co50Fe50-xSix合金的结构相变和磁性

利用实验测量和理论计算相结合的方法,研究了介于B2结构CoFe低有序合金和L2₁结构Co₂FeSi高有序合金之间的Co₅₀Fe_50-xSi_x合金的结构相变、磁相变、分子磁矩和居里温度.采用考虑Coulomb相互作用的广义梯度近似(GGA+U)方法计算了合金的能带结构.研究发现,合金出现较强的原子有序倾向,表现出较强的共价成相作用.合金的晶格常数、磁矩、居里温度随Si含量的增加而线性地降低,极限成分Co₂FeSi合金的分子磁矩和居里温度分别达到5.92μ_B和777 ℃.原子尺寸效应导致合金晶格发生变化,但并未成为居里温度和分子磁矩变化的主导因素.分子磁矩的变化符合Slater-Pauling原理,但发现原子磁矩的变化并非线性,据此提出了共价成相对磁性影响的观点.采用Stearns理论解释了居里温度的变化趋势,排除了原子间距对居里温度的主导影响作用.能带计算的结果还表明,Co₂FeSi作为半金属材料并非十分完美,可能在实际应用中会出现自旋极化率降低的问题.发现该系列合金的结构相变和磁相变随着成分的变化聚集在窄小的成分和温度范围内. 关键词： 磁性 Heusler合金 结构相变     

渐变带隙氢化非晶硅锗薄膜太阳能电池的优化设计

利用一维微电子-光电子结构分析软件(AMPS-1D)在AM1.5G(100 mW/cm2)、室温条件下模拟和比较了有、无渐变带隙氢化非晶硅锗(a-SiGe:H)薄膜太阳能电池的各项性能.计算结果表明:渐变带隙结构电池具有较高的开路电压(V oc)和较好的填充因子(FF),转换效率(E ff)比非渐变带隙电池提高了0.477%.研究了氢化非晶硅(a-Si:H)、氢化非晶碳化硅(a-SiC:H)和氢化纳米晶硅(nc-Si:H)三种不同材料的窗口层对a-SiGe:H薄膜太阳能电池性能的影响.结果显示:在以nc-Si:H为窗口层的电池能带中,费米能级E F已经进入价带,使得窗口层电导率及电池开路电压有所提高,又由于ITO与p-nc-Si:H的接触势垒较低,使得接触处的电场降低,更有利于载流子的收集.另一方面,窗口层与a-SiGe:H薄膜之间存在较大的带隙差,在p/i界面由于能带补偿作用形成了价带势垒(带阶)?E v,阻碍了空穴的迁移,因此我们在p/i界面引入缓冲层,使得能带补偿作用得到释放,更有利于空穴的迁移和收集,得到优化后单结渐变带隙a-SiGe:H薄膜结构太阳能电池的转换效率达到了9.104%.     

NPB:CBP复合空穴传输层对黄色有机电致发光器件的影响

采用N, N'-diphenyl-N, N'-bis(1-naphthyl-pheny1)-1, 1'-biphenyl-4, 4'-diamine (NPB):4, 4'-N, N'-dicarbazole-biphenyl (CBP) 掺杂体系为复合空穴传输层,制备了结构为indium-tin oxide (ITO)/NPB:CBP/CBP:bis iridium (acetylacetonate) /2, 9-dimethyl-4, 7-diphenyl-p 关键词： 有机电致发光器件(OLEDs) 复合空穴传输层 NPB:CBP 器件性能     

ITO‐free top emitting organic light emitting diodes with enhanced light out‐coupling

Bottom emitting organic light emitting diodes (OLEDs) can suffer from lower external quantum efficiencies (EQE) due to inefficient out‐coupling of the generated light. Herein, it is demonstrated that the current efficiency and EQE of red, yellow, and blue fluorescent single layer polymer OLEDs is significantly enhanced when a MoO_x(5 nm)/Ag(10 nm)/MoO_x(40 nm) stack is used as the transparent anode in a top emitting OLED structure. A maximum current efficiency and EQE of 21.2 cd/A and 6.7%, respectively, was achieved for a yellow OLED, while a blue OLED achieved a maximum of 16.5 cd/A and 10.1%, respectively. The increase in light out‐coupling from the top‐emitting OLEDs led to increase in efficiency by a factor of up to 2.2 relative to the optimised bottom emitting devices, which is the best out‐coupling reported using solution processed polymers in a simple architecture and a significant step forward for their use in large area lighting and displays.     

Accumulation and annealing of implantation damage in a-Si:H

Hydrogenated amorphous silicon (a-Si:H) films have been irradiated with H⁺, B⁺, P⁺, and Ar⁺ ion beams. The accumulation and the annealing of irradiation-induced defects has been investigated through a series of electronic transport and PDS measurements. We find that for all projectiles damage accumulation is dominated by atomic displacement collisions with the damage saturating for energy transfers in excess of about 10 eV/target atom. Annealing at elevated temperatures causes the conductivity of doped and irradiated a-Si:H films to increase according to stretched exponential decay curves. All annealing parameters derivable from such fits scale with the energy originally dissipated into atomic displacement collisions. For energy transfers up to 10 eV/target atom the activation energy for annealing increases up to a saturation value and, at the same time, an increasing fraction of the irradiation-induced defects becomes stable against annealing at moderate temperatures (T _a<250° C). We discuss these results with respect to damage accumulation data in crystalline silicon (c-Si) and with regard to the annealing of metastable defects in a-Si:H.     

Au/(SiO2/Si/SiO2)纳米双势垒/n+-Si结构的电致发光研究

利用射频磁控溅射方法,在n⁺-Si衬底上淀积SiO₂/Si/SiO_{2纳米双势垒单势阱结构,其中Si层厚度为2至4nm,间隔为0.2nm,邻近n⁺-S i衬底的SiO2层厚度固定为1.5nm,另一SiO2层厚度固定为3nm.为了 对比研究,还制备了Si层厚度为零的结构,即SiO2(4.5nm)/n⁺-Si 结构.在经过600℃氮气下退火30min,正面蒸上半透明Au膜,背面也蒸Au作欧姆接触后,所 有样品都在反向偏置(n^＋-Si的电压高于Au电极的电压)下发光,而在正向偏压 下不发光.在一定的反向偏置下,电流和电致发光强度都随Si层厚度的增加而同步振荡,位 相相同.所有样品的电致发光谱都可分解为相对高度不等的中心位于2.26eV(550nm)和1.85eV (670nm)两个高斯型发光峰.分析指出该结构电致发光的机制是：反向偏压下的强电场使Au/( SiO2/Si/SiO2)纳米双势垒/n⁺-Si结构发生了雪崩击穿 ,产生大量的电子-空穴对,它们在纳米SiO2层中的发光中心(缺陷或杂质)上复 合而发光. 关键词： 电致发光 纳米双势垒 高斯型发光峰 雪崩击穿}     

Polar-center phase nuclei in He+-irradiated CuO single crystals

Irradiation of various single-crystal CuO faces [ac,bc,(110)] with 4.6-MeV He⁺ ions has been found to result in reduction of CuO to Cu₂O and Cu on the irradiated and unirradiated sides, lifting of forbiddenness from optical transitions in the [CuO₄]⁷⁻ electron center in the 0.7–0.95-eV energy range, a change in dichroism near the bands corresponding to transitions in the hole centers, [CuO₄]⁵⁻, and electron centers, [CuO₄]⁷⁻, as well as in a resonant increase of absorption at 0.95–1.30 eV with an unusual polarization dependence. The results of He⁺ irradiation of CuO single crystals are discussed in terms of a model of the nucleation of the phase of polar (electron and hole) centers in copper-oxygen systems. Fiz. Tverd. Tela (St. Petersburg) 40, 419–424 (March 1998)     

高效率金属微腔OLEDs性能

以半透明Ag膜为阳极出光面,利用MoO₃作为空穴注入层,在普通玻璃衬底上制备了底发射微腔OLEDs器件,其中微腔由接近全反射厚度为100nm的Al阴极和反射率约为50%左右厚度为22nm的半透明Ag阳极构成,由于采用了有效的空穴和电子注入层MoO₃和LiF,以Alq₃作为发光材料,器件的起亮电压为2.5V,在10V外加电压下正向亮度超过了15000cd/m²,最大电流效率接近6cd/A,大约是制备于ITO玻璃衬底阳极上的常规器件的两倍(3.2cd/A),并研究了光谱窄化以及随观测角度变化的微腔效应。