Optical and magneto-optical properties of Co/Pt multilayered films

Both experimental and computer-simulated magneto-optical (MO) and optical spectroscopies of Co/Pt multilayered films (MLF) with a nearly constant Pt sublayer thickness and variable Co sublayer thickness, as well as pure Co and Pt, and Co_0.51Pt_0.49 alloy films, have been performed in the energy range 1.1–4.7 eV. The simulations were achieved by solving the multireflection task for various models of the MLF. The comparison between experimental and computer-simulated optical properties of the Co/Pt MLF allowed us to evaluate the thickness of the interfacial regions with the alloyed components. The diagonal and off-diagonal components of the optical conductivity tensor were calculated not only for the pure Co and Co_0.51Pt_0.49 alloy films, and the whole Co/Pt MLF, but also for the spin-polarized Pt layers in the Co/Pt MLF.     

Effects of thermal annealing on structural and magnetic properties of thin Pt/Cr/Co multilayers

Thermal stability of thin Pt/Cr/Co multilayers and the subsequent changes in their structural, magnetic, and magneto-optical properties are reported. We observe CoCrPt ternary alloy phase formation due to annealing at temperatures about 773 K, which is accompanied by enhancement in the coercivity value. In addition, 360° domain wall superimposed on a monodomain like background has been observed in the pristine multilayer, which changes into a multidomain upon annealing at 873 K.     

Test investigation on interfacial characteristics of Cr/Al nanofilms structure

The objective of this paper is to provide a systematic test for fabrication or evaluation of a bilayer film structure between Cr and Al in micro/nanoelectronic manufacturing. The Cr/Al bilayer film is fabricated by using the magnetron sputtering. To understand the basic mechanical properties of the Cr/Al bilayer films, the elastic modulus and the hardness of the sample are investigated by using a nanoindenter test. The test can show the changing trend of the Cr/Al sample structure. To investigate the integrating characteristics of the sample in progress, the effect of the thermal cycling loading and no-thermal cycling loading on the integrating force of the Cr/Al samples is tested by using nanoscratch. The interfacial binding force in the films can be obtained for understanding the integrating characteristics. It builds a basis for future work on progress investigation of physical property of Cr/Al bilayer film structure.     

Magnetisation and remagnetisation peculiarities of Fe/Cr multilayer films caused by instability of Cr layers magnetic structure

A model to describe the magnetic properties of Fe/Cr/Fe films with nanometer-thick layers of Fe and Cr is proposed. The model rests on the assumption that there exists a magnetic order of the linearly polarized spin-density wave type in a chromium interlayer with thicknesses even less than its wavelength. This only assumption proved to be enough to describe the following characteristics, experimentally observed, of the magnetic properties of the multilayer Fe/Cr films: the existence of short and long periods, dependences of their magnetic properties on the chromium layer thickness, noncollinear orientation of the magnetizations of neighboring iron layers, the existence of the magnetization curves beyond the hysteresis loops of magnetization.     

Metal vapor vacuum-arc ion implantation effects on the adhesion and hardness of ion-beam deposited Cr/Cu films

Two groups of Cr/Cu multilayer films were deposited on surfaces of Si (1 0 0) crystal and Al₂O₃ ceramic, respectively. One group was prepared by both metal vapor vacuum-arc (MEVVA) ion implantation and ion beam assistant deposition (IBAD) technologies with different sputtering ion densities and deposition times. The other group was prepared only by IBAD. The morphologies of the Cr/Cu films and cross-section micrographs were observed by scanning electron microscopy (SEM). Nanohardness, modulus, and adhesive strength of the Cr/Cu films were measured by a nano-indenter. Continuous stiffness measurement (CSM) was used while measuring nanohardness and modulus of the samples. The experimental data indicate that the adhesive strength of the samples prepared with MEVVA ion implantation was about 3-3.5 times higher than one of the corresponding samples prepared without MEVVA ion implantation. The nanohardness and modulus of the Cr/Cu films were obviously affected by the test parameters and substrate kind.     

The effect of thickness and annealing condition on the microstructure and magnetic properties of Fe/Pt multilayer thin films

[Fe(0.5 nm)/Pt(0.5 nm)]₄₀, [Fe(1 nm)/Pt(1.5 nm)]₂₀ and [Fe(3 nm)/Pt(3 nm)]₁₀ multilayer were prepared by DC magnetron sputtering. By conventional furnace annealing (CA) at 270–600 °C for various time, all of the films still remained the disordered structure with the soft magnetic phase. By rapid thermal annealing (RTA) at 500 °C for various time, we obtained the [Fe(1 nm)/Pt(1.5 nm)]₂₀ and [Fe(3 nm)/Pt(3 nm)]₁₀ films with L1₂ ordered FePt₃ phase which was almost ferromagnetic at room temperature. However, the [Fe(0.5 nm)/Pt(0.5 nm)]₄₀ films was still disordered state even under RTA. Compared with CA, RTA exposed an outstanding effect on accelerating the phase transition when the film thickness is over [Fe(0.5 nm)/Pt(0.5 nm)]₄₀.     

Thermal stability and data retention of resistive random access memory with HfO_x/ZnO double layers

As an industry accepted storage scheme, hafnium oxide(HfO_x) based resistive random access memory(RRAM)should further improve its thermal stability and data retention for practical applications. We therefore fabricated RRAMs with HfO_x/ZnO double-layer as the storage medium to study their thermal stability as well as data retention. The HfO_x/ZnO double-layer is capable of reversible bipolar switching under ultralow switching current( 3 μA) with a Schottky emission dominant conduction for the high resistance state and a Poole–Frenkel emission governed conduction for the low resistance state. Compared with a drastically increased switching current at 120℃ for the single HfO_x layer RRAM, the HfO_x/ZnO double-layer exhibits excellent thermal stability and maintains neglectful fluctuations in switching current at high temperatures(up to 180℃), which might be attributed to the increased Schottky barrier height to suppress current at high temperatures. Additionally, the HfO_x/ZnO double-layer exhibits 10-year data retention @85℃ that is helpful for the practical applications in RRAMs.     

Pt/CNTs电催化剂制备的UV-Vis、FTIR和XRD光谱分析

采用在乙二醇溶液中添加十二烷基硫酸钠(SDS)作为稳定剂的调变乙二醇还原法,制备了高分散的碳纳米管(CNTs)负载Pt电催化剂Pt/CNTs。利用紫外-可见(UV-Vis)、傅里叶变换红外(FTIR)和X射线衍射(XRD)光谱研究了催化剂的制备过程和结构,考察了Pt/CNTs制备过程中SDS的添加对其结构和甲醇电催化氧化活性的影响。结果表明,在乙二醇溶液中PtCl2-₆与SDS形成了配合物,PtCl2-₆能够被乙二醇完全还原;超声处理后的CNTs表面接上了含氧基团,有利于Pt粒子的吸附,催化剂上不残留有SDS;Pt/CNTs电催化剂具有典型的面心立方结构,添加SDS制备的Pt/CNTs-2电催化剂Pt高度分散,粒径更小,达4.5 nm。循环伏安(CV)测试结果表明,添加SDS制备的Pt/CNTs-2电催化剂比传统乙二醇还原法制备的Pt/CNTs-1具有更高的甲醇电催化氧化活性。     

A novel optical diagnostic technique for analyzing the recrystallization characteristics of polycrystalline silicon thin films following frontside and backside excimer laser irradiation

Excimer laser annealing (ELA) is a widely used technique for producing polycrystalline silicon (poly-Si) thin films. An optical inspection system with simple optical arrangements for rapid measurement of recrystallization results of poly-Si thin films is developed in this study. The recrystallization results after both frontside ELA and backside ELA can be easily visible from the profile of peak power density distribution using the optical inspection system developed with an optimized moving velocity of 0.312 mm/s of the specimen. The method of backside ELA is suggested for batch production of low-temperature polycrystalline silicon thin-film transistors due to higher laser beam utilization efficiency and lower surface roughness of poly-Si films.     

3ω法加热/测温膜中温度波解析及其在微/纳米薄膜导热系数测量中的应用

给出了3ω法测试系统中描述薄膜表面加热/测温膜中温度波动的级数形式解，并将复数温度波动的实部和虚部分开表示.利用该解分析了交流加热频率、加热膜宽度和材料热物性的组合参数对加热膜温度波动幅度的影响.并根据此解对测量原理的数学模型进行了修正，建立了相应的3ω测试系统，首先测定了厚度为500 nm SiO₂薄膜的导热系数，验证了实验系统的合理性.加大了测试频率，利用级数模型在高频段直接得到SiO₂薄膜的导热系数，结合低频段的数据同时确定了Si基体的导热系数.利用级数解分析测试了激光晶体Nd:YAG〈111〉面上多层ZrO₂/SiO₂增透膜的导热系数，测试的ZrO₂薄膜的导热系数比体材料小.进行了不确定度分析.结果表明，提出的分析方法可以有效研究微器件表面薄膜结构的导热性能. 关键词： ω法')" href="#">3ω法 微/纳米薄膜 导热系数 微尺度加热膜     

Effects of surface-modification with Bi2O3 on the thermal stability and photoinduced charge property of nanocrystalline anatase TiO2 and its enhanced photocatalytic activity

Bi₂O₃ surface-modified TiO₂ nanoparticle has been synthesized by sol-hydrothermal processes, followed by post-treatment with an appropriate amount of bismuth nitrate solution, and also characterized by XRD, Raman, BET, TEM, FT-IR, XPS, UV-vis DRS and SPS techniques. The effects of the surface-modification with Bi₂O₃ on the thermal stability, photoinduced charge separation and photocatalytic activity for degrading rhodamine B (or phenol) under ultraviolet (or visible) irradiation are investigated in detail, along with their relationships and the activity enhancement mechanisms are also suggested. The results show that the modification with Bi₂O₃ can improve the thermal stability of the as-prepared anatase crystallites, consequently enhancing the anatase crystallinity so as to promote the photoinduced charge separation. And the modification with Bi₂O₃ also extends the optical response range. It can be concluded that the activity enhancement of surface-modified TiO₂ is mainly attributed to the increase in the photoinduced charge separation rate and to the extent of the optical response range, compared with un-modified ones. Moreover, the inhibition phase transformation mechanism related to Bi₂O₃ is suggested.