Formation of microstructures on silicon surface in a fluorinated plasma via the cyclic etching-passivation process

The conditions and causes of formation of microneedles and columnar structures on the surface of silicon during deep anisotropic etching in an SF₆/C₄F₈ plasma in the two-stage cyclic mode were determined. The appearance of microstructures is accelerated with an increase in the thickness of the fluorocarbon film formed on the silicon surface at the step of passivation in a C₄F₈ plasma and with an increase is the rate of etching the film in an SF₆ plasma. By means of X-ray photoelectron spectroscopy, it was shown that the formation of carbon residues of fluorocarbon film etching on the Si surface is enhanced under these conditions. Building-up on the surface in the cyclic process, the residues as a micromasking coating lead to the formation of microneedles and columnar structures.     

Effect of Wafer Temperature on High Aspect Ratio Hardmask Etching

Fluorocarbon-based chemistries were used to study the effect of wafer temperature on the etch of high aspect ratio hardmasks composed of SiO₂ and SiN_x layers. It is found that etch stop can occur easily at high temperature. The rate of polymer deposition plays an important role in etch stop. The etching rates were found to be inversely proportional to the wafer temperature. Such a relation indicates a negative activation energy in the rate expression of hardmask etching using fluorocarbon plasma. It also implies that in hardmask etching, complicated gas-surface, but not simple one-step, reactions are involved. Different wafer surface temperature can provide different degree of activation for etching reactions. Analysis of etching rate and optical emission trends indicates that CF_x may contribute more than F does in the etch of SiO₂ and SiN_x, since polymer-rich etching chemistries were used. Based on the temperature-dependent etching rate, we propose a reaction mechanism for the reaction trends observed in hardmask etching.     

Quantenchemische Untersuchung der Elementarprozesse beim Plasmaätzen im System Fluor/Silizium

Summary Using the cluster model of the silicon (111) surface we derive by means of EHT calculations a mechanism of reactive plasma etching in the system F/Si including diffusion processes. Species SiF₂ are found to be the primary etching products at the surface. SiF₄ is formed with high probability in the gas phase.

     

A model of the mechanism of the chemical interaction of the etchant ion (HF<Subscript>2</Subscript>)<Superscript>–</Superscript> with silicon during its electrochemical etching in hydrofluoric acid solutions

A model was proposed for the mechanism of the chemical interaction of the etchant ion (HF₂)^– with silicon during its electrochemical etching, which explains the possibility of porous silicon etching in the dark and the formation of hydride and hydroxyl groups on the silicon surface.     

Advances of Microneedles in Biomedical Applications

A microneedle (MN) is a painless and minimally invasive drug delivery device initially developed in 1976. As microneedle technology evolves, microneedles with different shapes (cone and pyramid) and forms (solid, drug-coated, hollow, dissolvable and hydrogel-based microneedles) have been developed. The main objective of this review is the applications of microneedles in biomedical areas. Firstly, the classifications and manufacturing of microneedle are briefly introduced so that we can learn the advantages and fabrications of different MNs. Secondly, research of microneedles in biomedical therapy such as drug delivery systems, diagnoses of disease, as well as wound repair and cancer therapy are overviewed. Finally, the safety and the vision of the future of MNs are discussed.     

Calcite Microneedle Arrays Produced by Inorganic Ion‐Assisted Anisotropic Dissolution of Bulk Calcite Crystal

Besides studies on the mineralization process, research on the demineralization of minerals provides another way to understand the crystallization mechanism of biominerals and fabricate crystals with complicated morphologies. The formation of ordered arrays of c‐axis‐oriented calcite microneedles with a tri‐symmetric structure and lengths of more than 20 μm was realized on a large scale for the first time through anisotropic dissolution of calcite substrates in undersaturated aqueous solution in the presence of ammonium salts. The lengths and the aspect ratios of the calcite microneedles can be tuned by simply changing the concentrations of the ammonium salts and the dissolution time. The shape of the transverse cross sections of the calcite microneedles obtained in the presence of NH₄Cl and NH₄Ac is almost regularly triangular. The tri‐symmetric transverse cross‐section geometry of the calcite microneedles could be attributed to the tri‐symmetric feature of rhombohedral calcite atomic structures, the synergetic interactions between electrostatic interaction of ammonium ions and dangling surface carbonate groups, and the ion incorporation of halide ions.     

Etching of Silicon and Silicon Dioxide in Dense Low-Pressure Inductively Coupled Radiofrequency Discharge Fluorocarbon Plasmas

The results of a study on the selective etching of SiO₂ and Si in dense low-pressure (p < 1 Pa) inductively coupled radio-frequency discharge fluorocarbon (HF₃ and HF₃ + H₂) plasmas in a nonuniform magnetic field are reported. It was found that the selectivity of etching SiO₂/Si increased from 9 to 24 with the addition of hydrogen. In the etching of SiO₂ in a HF₃ + H₂ plasma under certain process conditions, groove ridges were formed at the bottom of the etched groove. The mechanisms of ridge formation and the role of ion bombardment in this process are discussed.     

Mechanisms of radical production in CF3Cl,CF3Br,and related plasma etching gases: The role of added oxidants

A model is presented that accounts for the formation of various etchants, unsaturated species, and polymers in halocarbon/oxidant plasma etching mixtures. It is discussed in terms of emission and mass spectral measurements of stable and unstable products in CF₃Cl, CF₃Br, C₂F₆, and related systems. In this reaction scheme, fluorocarbon precursors derived from the building block radical CF₂ are saturated during reactions with atoms and reactive molecules. The most reactive species are preferentially removed by the saturation reactions. An ordering of this reactivity can be used to predict the dominant atomic etchants as a function of halocarbon and additive gas compositions.     

Influence of dielectric barrier plasma treatment of ZnMgAl alloy-coated steel on the adsorption of organophosphonic acid monolayers

The adsorption of octadecyl phosphonic acid (ODPA) on oxide-covered surfaces of ZnMgAl alloy coatings is described as a function of a dielectric barrier discharge (DBD) pretreatment step. The ODPA monolayer formation enables the investigation of the influence of the DBD treatment on the resulting interfacial bond formation and surface coverage. Surface characterisation by means of surface spectroscopy (PM-IRRAS, XPS) and surface electrochemistry (cyclic voltammetry) showed that the DBD pretreatment with Ar, Ar/O₂ and Ar/H₂O gas mixtures leads to improved barrier properties of the adsorbed ODPA monolayer. Moreover, during ODPA monolayer formation from ethanolic solution, a partial etching of the surface oxide layer occurs.     

Microneedle array-based carbon paste amperometric sensors and biosensors

The design and characterization of a microneedle array-based carbon paste electrode towards minimally invasive electrochemical sensing are described. Arrays consisting of 3 × 3 pyramidal microneedle structures, each with an opening of 425 μm, were loaded with a metallized carbon paste transducer. The renewable nature of carbon paste electrodes enables the convenient packing of hollow non-planar microneedles with pastes that contain assorted catalysts and biocatalysts. Smoothing the surface results in good microelectrode-to-microelectrode uniformity. Optical and scanning electron micrographs shed useful insights into the surface morphology at the microneedle apertures. The attractive performance of the novel microneedle electrode arrays is illustrated in vitro for the low-potential detection of hydrogen peroxide at rhodium-dispersed carbon paste microneedles and for lactate biosensing by the inclusion of lactate oxidase in the metallized carbon paste matrix. Highly repeatable sensing is observed following consecutive cycles of packing/unpacking the carbon paste. The operational stability of the array is demonstrated as well as the interference-free detection of lactate in the presence of physiologically relevant levels of ascorbic acid, uric acid, and acetaminophen. Upon addressing the biofouling effects associated with on-body sensing, the microneedle carbon paste platform would be attractive for the subcutaneous electrochemical monitoring of a number of physiologically relevant analytes.     

Chemical mechanisms in C3F8-H2 radiofrequency discharges

Discharges fed with C₃F₈-H₂ mixtures have been studied by means of mass spectrometry in a tubular reactor operated at 0.5 torr and 50 W. Comparison of the results with those obtained with emission actinometry give additional evidence that emission actinometry and mass spectrometry are powerful diagnostic tools to monitor stable and unstable species in discharges utilized for dry etching and polymer depositions. Mechanisms for end product formation and polymer deposition are also discussed.     

Quantum chemical and x-ray spectral studies of the structures of superstoichiometric fluorocarbons

The possibility of hole formation in the structures of superstoichiometric fluorocarbons is studied. Different geometries are modeled by removing one, two, or six CF groups from the stoichiometric fluorocarbon lattice. The positions of fluorine atoms in the internal CF₂ groups are optimized using the semiempirical MNDO method. The quantum chemical calculations of fluorocarbon clusters containing holes of different geometries suggest the preferential formation of six-center hole structures in fluorocarbon lattices. The X-ray emission CK_α-spectra of the superstoichiometric CF_x (x=1.20 and 1.33) samples are obtained. Based on the cluster calculations, theoretical CK_α-spectra of CF_x are constructed. A comparison of the theoretical and experimental results shows that the spectra of the superstoichiometric fluorocarbons are characterized by a short-wave maximum, whose intensity increases with x. Deceased Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences. Translated fromZhurnal Strukturnoi Khimii, Vol. 37, No. 6, pp. 1072–1080, November–December, 1996. Translated by I. Izvekova     

The Relationship between the State of Active Species in a Ni/Al2O3Catalyst and the Mechanism of Growth of Filamentous Carbon

The formation of active particles and their changes in the course of 1,3-butadiene decomposition on a Ni/Al₂O₃catalyst at temperatures from 400 to 800°C were studied by high-resolution electron microscopy. It was found that carbon filaments of different types were formed at 400–800°C. The growth of thin filaments (20–30 nm in diameter) takes place at 400–600°C on a conical Ni particle located at the growing end of the filament, whereas di-symmetrical filaments 50–100 nm in diameter grow on biconical metal particles. As the carbonization temperature was increased to 700–800°C, graphite nanotubes 5–20 nm in diameter were formed. It was found that the mechanism of formation and the structure of filaments are related to the state of catalytically active species, which consist of a solid solution of carbon in the metal. It is suggested that the metastable surface nickel carbide Ni₃C_{1 – x} is an intermediate compound in the catalytic formation of graphite filaments from 1,3-butadiene. Upon termination of the reaction, the metastable Ni₃C_{1 – x} microphase is decomposed with the formation of hexagonal nickel microinclusions. The role of epitaxy in the nucleation and growth of a graphite phase on the metal is discussed. Models are presented for the growth of structurally different carbon filaments depending on the formation of active metal species at various temperatures. Considerable changes in the structure of carbon and the formation of nanotubes at 700–800°C are related to the appearance of a viscous-flow state of metal–carbon particles.     

Quantum-chemical approach to the elementary steps of plasma etching

We derive for the first time a mechanism of reactive plasma etching in the system Si/F by the quantum-chemical approach. SiF₂-like species at the surface play an important role. SiF₃ surface complexes also occur. The final etching product SiF₄ is formed with high probability in the gas phase.     

Surface Interactions of Radicals During Plasma Processing of Polymers

Surface interactions of radical species were investigated using the imaging of radicals interacting with surfaces (IRIS) technique during plasma surface modification of polymers. Three plasma systems were investigated by spatially probing the laser induced fluorescence of individual radical species and determining their surface scattering coefficients, S. The behavior of CF₂ moieties on polymer surfaces was studied using the fluorocarbon plasmas C₂F₆ and hexafluoropropylene oxide (HFPO). Three types of surface interactions were observed, surface generation of CF₂ (S > 1), surface loss of CF₂ (S < 1), and unit scattering (S = 1). Surface loss of CF₂ was seen in HFPO plasmas, while CF₂ was generated in C₂F₆ systems. The differences between these systems is believed to be the result of different overall surface interactions, specifically film deposition in the HFPO system and etching in the C₂F₆ system. Using NH₃ plasmas, the surface interactions of NH₂ radicals with polymers was also investigated. Here, NH₂ is generated at the surface of polyethylene and polytetrafluoroethylene substrates, but is consumed on polyimide substrates. Ion effects were also investigated by placing a grounded mesh in the path of the molecular beam to remove charged species.     

Electrochemical behaviour of p-Si in methanol solutions of chlorides

The mechanism of anodic dissolutions of p-Si single crystals in CH₃OH–LiCl and CH₃OH–LiCl–HCl solutions was investigated by means of the following electrochemical methods: linear sweep voltammetry, the potentiostatic transient technique and XPS surface analysis. The dissolution of p-Si proceeds by a two-step mechanism with the creation of a Si(II) surface intermediate. At low anodic overvoltage the dissolution proceeds with the formation of porous silicon, probably through the reaction: 2Si(II)Si+Si(IV). Structural etching of the single crystals surface was observed at high anodic overvoltage (E>2 V). At this potential range, silicon dissolves with the formation of a Si(IV) soluble product. Electrolysis of the methanol solvent containing Si(IV) in the cell p-Si|CH₃OH–LiCl–Si(IV)|M, where M=Pt, Cu or 18/8 stainless steel, leads to the deposition of an amorphous organosilicon layer on the cathode. The analysis of the deposit performed by means of XPS, FTIR and SEM allows determination of the morphology and composition of the film. The layer consists of Si–OCH₃ compounds and can be created only in methanol solvent. The film is unstable in a humid atmosphere and undergoes transformation into a Si–OH layer.Contribution to the 3rd Baltic Conference on Electrochemistry, Gdansk-Sobieszewo, Poland, 23–26 April 2003Dedicated to the memory of Harry B. Mark, Jr. (28 February 1934–3 March 2003)     

From superamphiphobic to amphiphilic polymeric surfaces with ordered hierarchical roughness fabricated with colloidal lithography and plasma nanotexturing

Ordered, hierarchical (triple-scale), superhydrophobic, oleophobic, superoleophobic, and amphiphilic surfaces on poly(methyl methacrylate) PMMA polymer substrates are fabricated using polystyrene (PS) microparticle colloidal lithography, followed by oxygen plasma etching-nanotexturing (for amphiphilic surfaces) and optional subsequent fluorocarbon plasma deposition (for amphiphobic surfaces). The PS colloidal microparticles were assembled by spin-coating. After etching/nanotexturing, the PMMA plates are amphiphilic and exhibit hierarchical (triple-scale) roughness with microscale ordered columns, and dual-scale (hundred nano/ten nano meter) nanoscale texture on the particles (top of the column) and on the etched PMMA surface. The spacing, diameter, height, and reentrant profile of the microcolumns are controlled with the etching process. Following the design requirements for superamphiphobic surfaces, we demonstrate enhancement of both hydrophobicity and oleophobicity as a result of hierarchical (triple-scale) and re-entrant topography. After fluorocarbon film deposition, we demonstrate superhydrophobic surfaces (contact angle for water 168°, compared to 110° for a flat surface), as well as superoleophobic surfaces (153° for diiodomethane, compared to 80° for a flat surface).     

Revealing the Role of Gold in the Growth of Two-Dimensional Molybdenum Disulfide by Surface Alloy Formation

The formation of Mo/Au surface alloy during Au-assisted chemical vapor deposition (CVD) of MoS₂ is confirmed by a series of control experiments. A metal–organic chemical vapor deposition (MOCVD) system is adapted to conduct two-dimensional MoS₂ growth in a controlled environment. Sequential injection of Mo and S precursors, which does not yield any MoS₂ on SiO₂/Si, grows atomically thin MoS₂ on Au, indicating the formation of an alloy phase. Transmission electron microscopy of a cross-section of the specimen confirms the confinement of the alloy phase near the surface only. These results show that the reaction intermediate is the surface alloy, and that the role of Au in the Au-assisted CVD is the formation of an atomically thin reservoir of Mo near the surface. This mechanism is clearly distinguished from that of MOCVD, which does not involve the formation of any alloy phases.     

Plasmochemical modification of fluorocarbon polymers for creation of new hemocompatible materials

The various plasmochemical technique for the surface functionalization and regulation of the biological characteristics of fluorocarbon polymers aimed at the enhance their blood compatibility are described. The plasmochemical treatment in oxygen and nitrogen containing gases has been used to increase of surface energy and hydrophoby of fluorocarbon polymers. Modification of the surface morphology and chemical structure to improve thromboresistive properties of polymers by plasma etching and deposition of biocompatible materials was demonstrated and discussed. Plasma-assisted immobilization of proteins in combination with other plasma modification methods provides a promising technique for engineering of a new generation of hemocompatible materials.     

C K‐edge NEXAFS study of fluorocarbon formation on carbon anodes in molten NaF–AlF3–CaF2

Operational instability from processes occurring at the anode during the production of aluminum in the commercial Hall‐Héroult process may lead to an increase in undesirable fluorocarbon emissions, higher energy use, and shorter plant life. One contribution to this instability may be the possible formation of a fluorocarbon film at the electrode interface. Here, the surface composition of graphite anodes after electrolysis in molten NaF–AlF₃–CaF₂ at 990 °C is investigated for evidence of fluorocarbon formation using C K‐edge near edge X‐ray absorption fine structure. Fluorocarbon is identified on an anode surface after prolonged anode effect (very high overpotential with increased cell resistance) and also on an anode surface after normal electrolysis without anode effect. This provides evidence that fluorocarbon formation may occur prior to anode effect lowering the surface tension of the anode and therefore resulting in dewetting to contribute to the onset of the anode effect. Confirmation that such compounds form furthers our understanding of electrochemical reactions of graphite with fluoride and of the fundamental processes that occur in an aluminum smelter cell. Copyright © 2013 John Wiley & Sons, Ltd.