Comparative characterisation by atomic force microscopy and ellipsometry of soft and solid thin films

Ellipsometry and atomic force microscopy (AFM) were used to study the film thickness and the surface roughness of both ‘soft’ and solid thin films. ‘Soft’ polymer thin films of polystyrene and poly(styrene–ethylene/butylene–styrene) block copolymer were prepared by spin‐coating onto planar silicon wafers. Ellipsometric parameters were fitted by the Cauchy approach using a two‐layer model with planar boundaries between the layers. The smooth surfaces of the prepared polymer films were confirmed by AFM. There is good agreement between AFM and ellipsometry in the 80–130 nm thickness range. Semiconductor surfaces (Si) obtained by anisotropic chemical etching were investigated as an example of a randomly rough surface. To define roughness parameters by ellipsometry, the top rough layers were treated as thin films according to the Bruggeman effective medium approximation (BEMA). Surface roughness values measured by AFM and ellipsometry show the same tendency of increasing roughness with increased etching time, although AFM results depend on the used window size. The combined use of both methods appears to offer the most comprehensive route to quantitative surface roughness characterisation of solid films. Copyright © 2007 John Wiley & Sons, Ltd.     

Autophobic dewetting of Z-tetraol perfluoropolyether lubricant films on the amorphous nitrogenated carbon surface

The thermodynamic stability of thin films of the perfluoropolyether (PFPE) Z-Tetraol, as a function of molecular weight, on amorphous nitrogenated carbon, CNx, is investigated. An optical surface analyzer is used to image the autophobic dewetting of the Z-Tetraol films. Film dewetting results when the PFPE film thickness applied to the CNx surface exceeds a critical value. This critical dewetting thickness is identified as the monolayer thickness of the adsorbed PFPE film via measurements of the changes in the surface energy as a function of lubricant film thickness. The observed dewetting coincides with the film thickness at which the disjoining pressure goes to zero. The critical dewetting thickness is dependent on the PFPE molecular weight.     

Thickness, surface morphology, and optical properties of porphyrin multilayer thin films assembled on Si(100) using copper(I)-catalyzed azide-alkyne cycloaddition

We report the structure, optical properties and surface morphology of Si(100) supported molecular multilayers resulting from a layer-by-layer (LbL) fabrication method utilizing copper(I)-catalyzed azide-alkyne cycloaddition (CuAAC), also known as "click" chemistry. Molecular based multilayer films comprised of 5,10,15,20-tetra(4-ethynylphenyl)porphyrinzinc(II) (1) and either 1,3,5-tris(azidomethyl)benzene (2) or 4,4'-diazido-2,2'-stilbenedisulfonic acid disodium salt (3) as a linker layer, displayed linear growth properties up to 19 bilayers. With a high degree of linearity, specular X-ray reflectivity (XRR) measurements yield an average thickness of 1.87 nm/bilayer for multilayers of 1 and 2 and 2.41 nm/bilayer for multilayers of 1 and 3. Surface roughnesses as determined by XRR data fitting were found to increase with the number of layers and generally were around 12% of the film thickness. Tapping mode AFM measurements confirm the continuous nature of the thin films with roughness values slightly larger than those determined from XRR. Spectroscopic ellipsometry measurements utilizing a Cauchy model mirror the XRR data for multilayer growth but with a slightly higher thickness per bilayer. Modeling of the ellipsometric data over the full visible region using an oscillator model produces an absorption profile closely resembling that of a multilayer grown on silica glass. Comparing intramolecular distances from DFT modeling with experimental film thicknesses, the average molecular growth angles were estimated between 40° and 70° with respect to the substrate surface depending on the bonding configuration.     

Observation of surface contamination layer by X‐ray reflectometry (XRR) analyses

Ultra‐thin HfO₂ films of 3.5, 5.0, and 8.0 nm nominal thicknesses were prepared, respectively, on silicon substrates by using atomic layer deposition method. Through the analyses of X‐ray reflectometry (XRR), X‐ray photoelectron spectroscopy, and transmission electron microscopy for HfO₂ films with and without sample cleaning, the effects of surface contamination on XRR curve and film thickness were investigated, and contamination layer was observed and the thickness of the layer was determined. X‐ray photoelectron spectroscopy results indicated that the amount of surface contamination varied considerably because of the surface cleaning. XRR curve shapes and the positions of thickness fringes changed and the thickness from Fourier analyses of the curves were different for the same sample due to the different surface contamination. Contamination layer of about 1 nm thickness was observed by Fourier analysis of XRR curve. Simulation for XRR curve showed the best fit to data when contamination layer of about 1 nm thickness was considered, and the result was consistent with that of the Fourier analysis. Copyright © 2016 John Wiley & Sons, Ltd.     

Review on the thickness measurement of ultrathin oxide films by mutual calibration method

Mutual calibration was suggested as a method to determine the absolute thickness of ultrathin oxide films. It was motivated from the large offset values in the reported thicknesses in the Consultative Committee for Amount of Substance (CCQM) pilot study P-38 for the thickness measurement of SiO₂ films on Si(100) and Si(111) substrates in 2004. Large offset values from 0.5 to 1.0 nm were reported in the thicknesses by ellipsometry, X-ray reflectometry (XRR), medium-energy ion scattering spectrometry (MEIS), Rutherford backscattering spectroscopy (RBS), nuclear reaction analysis (NRA), and transmission electron microscopy (TEM). However, the offset value for the thicknesses by X-ray photoelectron spectroscopy (XPS) was close to zero (−0.013 nm). From these results, the mutual calibration method was reported for the thickness measurement of SiO₂ films on Si(100) by combination of TEM and XPS. The mutual calibration method has been applied for the thickness measurements of hetero oxide films such as Al₂O₃ and HfO₂. Recently, the effect of surface contamination was reported to be critical to the thickness measurement of HfO₂ films by XPS. On the other hand, MEIS was proved to be a powerful zero offset method which is not affected by the surface contamination. As a result, the reference thicknesses in the CCQM pilot study P-190 for the thickness measurement of HfO₂ films on Si(100) substrate were determined by mutual calibration method from the average XRR data and MEIS analysis. Conclusively, the thicknesses of ultrathin oxide films can be traceably certified by mutual calibration method and most thickness measurement methods can be calibrated from the certified thicknesses.     

Nitridation of V5Al8 films with NH3 by Rapid Thermal Processing (RTP)

V₅Al₈ films (thickness about 100 nm) were deposited on sapphire substrates by RF‐sputtering and nitridated with NH₃ at 600‐1250 °C (1 min) in a RTP system. The as deposited and nitridated films were investigated by ESCA (electron spectroscopy for chemical analysis), XRD (X‐ray diffraction), XRR (X‐ray reflectometry), AFM (atomic force microscopy) and SEM (scanning electron microscopy). Formation of an aluminum nitride layer at the surface and precipitation of V(Al) in the bulk was found. In the temperature regime from 600 °C to 900 °C a considerable amount of oxygen is incorporated in the aluminum nitride layer. The roughness of the surface increased with increasing temperature and at 1250 °C a partially detaching of the AlN layer could be observed.     

Annealing effect on the structural and magnetic properties of nickel ferrite thin films

Nickel ferrite is a soft magnetic material with inverse spinel structure. Soft ferrite films are used in microwave devices, integrated planar circuits, etc., because of their high resistivity. In this work, thin films of nickel ferrite were deposited on Si (100) substrate by using pulsed laser deposition (PLD) technique. The thickness of the film was measured by surface profilometer and also by X‐ray reflectivity (XRR). The films were annealed at three different temperatures to observe the effect on the structural and magnetic properties of the film. The films were characterised by X‐ray diffraction (XRD), Raman spectroscopy and vibrating sample magnetometer (VSM) to study the structural and magnetic properties. Copyright © 2010 John Wiley & Sons, Ltd.     

X-ray and neutron reflectometry study of glow-discharge plasma polymer films

Radio-frequency glow-discharge plasma polymer thin films of allylamine (AA) and hexamethyldisiloxane (HMDSO) were prepared on silicon wafers and analyzed by a combination of X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), X-ray reflectometry (XRR), and neutron reflectometry (NR). AFM and XRR measurements revealed uniform, smooth, defect-free films of 20-30 nm thickness. XPS measurements gave compositional data on all elements in the films with the exception of hydrogen. In combination with XRR and NR, the film composition and mass densities (1.46 and 1.09 g cm(-)(3) for AA and HMDSO, respectively) were estimated. Further NR measurements were conducted with the AA and HMDSO films in contact with water at neutral pH. Three different H(2)O/D(2)O mixtures were used to vary the contrast between the aqueous phase and the polymer. The amount of water penetrating the film, as well as the number of labile protons present, was determined. The AA film in contact with water was found to swell by approximately 5%, contain approximately 3% water, and have approximately 24% labile protons. The HDMSO polymer was found to have approximately 6% labile protons, no thickness increase when in contact with water, and essentially no solvent penetration into the film. The difference in the degree of proton exchange within the films was attributed to the substantially different surface and bulk chemistries of the two films.     

Molecular layer deposition of poly(p-phenylene terephthalamide) films using terephthaloyl chloride and p-phenylenediamine

Ultrathin polymer films can be fabricated using the gas-phase method known as molecular layer deposition. This process typically uses bifunctional monomers in a sequential, self-limiting reaction sequence to grow conformal polymer films with molecular layer control. In this study, terephthaloyl chloride (TC) and p-phenylenediamine (PD) were used as the bifunctional monomers to deposit poly(p-phenylene terephthalamide) (PPTA) thin films. 3-Aminopropyl trimethoxysilane or ethanolamine was used to prepare amine-terminated surfaces prior to the PPTA MLD. The surface chemistry and growth rate during PPTA MLD at 145 degrees C were studied using in situ transmission Fourier transform infrared (FTIR) spectroscopy experiments on high surface area powders of SiO2 particles. PPTA MLD thin film growth at 145 degrees C was also examined using in situ transmission FTIR experiments on flat KBr substrates with an amine-terminated Al2O3 ALD overlayer. The integrated absorbances of the N-H and amide I stretching vibrations were measured and used to estimate the thin film thickness. X-ray reflectivity (XRR) experiments were also employed to measure the film thickness after PPTA MLD at 145 degrees C and 180 degrees C. The experiments revealed that the TC and PD reactions displayed self-limiting surface chemistry. The surface species alternated with sequential TC and PD exposures and the PPTA MLD films grew continuously. However, the growth rates per MLD cycle at 145 degrees C were less than expectations based on the size of the molecules involved in the reaction chemistry and were variable between 0.5 and 4.0 A per TC/PD reaction cycle. The lower growth rates are explained by the growth of a limited number of polymer chains on the substrate. The variability in the growth rate is attributed to the difficulties with the bifunctional monomer precursors. Alternative surface chemistries for polymer MLD are proposed that would avoid the use of bifunctional monomers.     

Interface thickness of the incompatible polymer system PS/PnBMA as measured by neutron reflectometry and ellipsometry

The techniques of neutron reflectometry and spectroscopic ellipsometry are compared as methods to measure the interface width between immiscible polymers. The interface thickness of the incompatible polymer system of polystyrene (PS) and polyn-butyl methacrylate) (PnBMA) is determined by neutron reflectrometry to (6.4±0.2) nm and (8.6±0.2) nm at temperatures of 120 and 156°C, respectively. Some emphasis is put on the measurement of those values also by spectroscopic ellipsometry using the same materials. A special sample geometry is chosen for ellipsometric measurements to compensate for thickness changes of films during annealing, and the dispersions of PS and PnBMA films are determined. With respect to the determination of the interface widths, however, it turns out that in the available wavelength range of 280 to 700 nm spectroscopic ellipsometry is not sensitive enough to measure the thin interface width between PS and PnBMA films. Neutron reflectivity results obtained for PS/PnBMA are discussed with respect to the Flory-Huggins segment interaction parameter calculated within the approximations of meanfield theory.     

The stability of ultra-thin perfluoropolyether mixture films on the amorphous nitrogenated carbon surface

The thermodynamic stability of boundary lubricant films based upon mixtures of liquid perfluoropolyethers (PFPEs) is reported. Mixtures of A20H-2000 with Zdols 2000, 2500, and 4000 and Zdol-TX 2200 on amorphous carbon nitride films are investigated. An optical surface analyzer is used to image the autophobic dewetting of the mixture PFPE films. The critical dewetting thickness coincides with the monolayer thickness of the adsorbed mixture PFPE films as determined by the changes in the surface energy as a function of lubricant film thickness. The critical dewetting thickness varies linearly with mixture concentration.     

Quantitative Analysis of Thin Aluminium-Oxynitride Films by EPMA

 Thin films of aluminium oxynitride with diverse composition were prepared by dc-magnetron sputtering of aluminium, utilising sputtering power as well as argon, oxygen and nitrogen gas flows to vary the composition. Since film properties depend mainly on the content of incorporated oxygen and nitrogen, a method for quantitative analysis of the main constituents based on electron probe micro analysis with energy dispersive detection was developed. The excellent precision of the quantitative results for aluminium as well as oxygen and nitrogen are shown. Furthermore, a film layer analysis program was applied for the quantification of several films deposited under the same deposition parameters on silicon wafers, from 520 nm down to 40 nm thickness, showing that electron probe micro analysis with energy dispersive detection is a reliable method for quantitative compositional analysis of thin aluminium oxynitride films down to approximately 20 nm thickness. Since this method of analysis provides only bulk information, expected inhomogeneities of the depth distribution of the film components were checked by secondary ion mass spectrometry depth profiles of two thin films and correlated to the EPMA results. The thickness of the films was determined by ellipsometry. Received September 1, 1998     

Applying grazing incidence X-ray reflectometry (XRR) to characterising nanofilms on mica

Molecularly smooth mica has hitherto not been widely used as a substrate for the X-ray reflectometry (XRR) technique. That is largely due to the difficulty of achieving flatness over a sufficiently large area of mica. Here we show that this difficulty can be overcome by slightly bending the mica substrate over an underlying cylinder; the enhanced rigidity of the bent mica sheet along the axis of the cylinder provides sufficient flatness along this axis for XRR measurements. To test this method, we have employed it to characterise three types of nanofilms on mica in air: (A) Cr-Au thin films; (B) a surface-grown zwitterionic polymer brush; and (C) a Langmuir-Blodgett (LB) phospholipid monolayer, using a table-top X-ray reflectometer. Fitting the obtained reflectivity curves with the standard Parratt algorithm allows us to extract the structural information of the nanofilms (both thickness and apparent roughness). Our simple method points to how XRR may be exploited as a useful characterisation tool for nanofilms on mica.     

Coordination‐Based Molecular Assemblies of Oligofurans and Oligothiophenes

Molecular assemblies (MAs) of oligofurans and oligothiophenes were formed from solutions on various substrates. These films were obtained by alternating deposition of organic chromophores (oligofurans or oligothiophenes) and a palladium salt. These coordination‐based MAs were characterized by UV/Vis spectroscopy, spectroscopic ellipsometry, atomic force microscopy (AFM), X‐ray reflectivity (XRR), X‐ray photoelectron spectroscopy (XPS), and electrochemistry. The MAs exhibit similar electrochemical behavior and their growth and structure are apparently not affected when different organic template layers are used. The density of the MAs is a function of the structure of the molecular component. The oligothiophene density is approximately 50 % higher than that observed for the oligofuran‐based assemblies. The optical and electrochemical properties of the MAs scale linearly with their thickness. The UV/Vis data indicate that upon increasing the film thickness, there is no significant conjugation between the metal‐separated organic chromophores. DFT calculations confirmed that the HOMO–LUMO gap of the surface‐bound oligofuran and oligothiophene metal oligomers do not change significantly upon increasing their chain length. However, electrochemical measurements indicate that the susceptibility of the MAs towards oxidation is dependent on the number of chromophore units.     

Controlling structure from the bottom-up: structural and optical properties of layer-by-layer assembled palladium coordination-based multilayers

Layer-by-layer assembly of two palladium coordination-based multilayers on silicon and glass substrates is presented. The new assemblies consist of rigid-rod chromophores connected by terminal pyridine moieties to palladium centers. Both colloidal palladium and PdCl2(PhCN)2 were used in order to determine the effect of the metal complex precursor on multilayer structure and optical properties. The multilayers were formed by an iterative wet-chemical deposition process at room temperature in air on a siloxane-based template layer. Twelve consecutive deposition steps have been demonstrated resulting in structurally regular assemblies with an equal amount of chromophore and palladium added in each molecular bilayer. The optical intensity characteristics of the metal-organic films are clearly a function of the palladium precursor employed. The colloid-based system has a UV-vis absorption maximum an order of magnitude stronger than that of the PdCl2-based multilayer. The absorption maximum of the PdCl2-based film exhibits a significant red shift of 23 nm with the addition of 12 layers. Remarkably, the structure and physiochemical properties of the submicron scale PdCl2-based structures are determined by the configuration of the approximately 15 angstroms thick template layer. The refractive index of the PdCl2-based film was determined by spectroscopic ellipsometry. Well-defined three-dimensional structures, with a dimension of 5 microm, were obtained using photopatterned template monolayers. The properties and microstructure of the films were studied by UV-vis spectroscopy, spectroscopic ellipsometry, atomic force microscopy (AFM), X-ray reflectivity (XRR), scanning electron microscopy (SEM), and aqueous contact angle measurements (CA).     

Interaction of alcohols and ethers with a-CF(x) films

The surfaces of the magnetic data storage hard disks used in computers are coated with a thin film of amorphous carbon and a layer of perfluoropolyalkyl ether (PFPE) lubricant. Both protect the surface of the magnetic layer from contact with the read-write head flying over the disk surface. Although the most commonly used carbon films are amorphous hydrogenated carbon, a-CH(x), it has been suggested that the thermal properties of amorphous fluorinated carbon films, a-CF(x), might be superior. This work has probed the interaction of small fluorinated ethers and alcohols with the surfaces of a-CF(x) films to understand the effects of carbon film fluorination on the interaction of the lubricant with its surface. Temperature-programmed desorption was used to measure the desorption energies of small fluorocarbons from the a-CF(x) surface and to compare their desorption energies with those from the surfaces of a-CH(x) films. These measurements reveal that, similarly to a-CH(x) films, a-CF(x) films expose a heterogeneous surface on which fluorocarbons adsorb at sites with a range of binding energies. The fluorocarbon ethers all have lower heats of adsorption than their hydrocarbon counterparts, suggesting that the ethers adsorb by donation of electron density from the oxygen lone-pair electrons to sites on the surface. Fluorinated alcohols have roughly the same heats of adsorption as their hydrocarbon counterparts. There is little significant difference between the interactions of fluorinated ethers (or alcohols) with the surfaces of either a-CF(x) or a-CH(x) films.     

Morphological behavior of thin polyhedral oligomeric silsesquioxane films at the molecular scale

Synchrotron X-ray reflectivity (XRR) was used to study the structure of thin films of polyhedral oligomeric silsesquioxanes (POSS) with side organic chains of different flexibility and containing terminal epoxy groups. POSS films were deposited from volatile solvents on hydroxylated and hydrogen-passivated silicon surfaces. The XRR data show a variety of structural morphologies, including autophobic molecular monolayers and bilayers as well as uniform films. The role of conformational and energetic factors governing the development of different morphologies in a restricted geometry is discussed.     

Quantitative chemical composition of thin films with infrared spectroscopic ellipsometry: application to hydrated oxide films on aluminium

A method to quantify the composition of thin films using infrared spectroscopic ellipsometry (IRSE), supplemented by visible spectroscopic ellipsometry (VISSE), is proposed. Because ellipsometry measures the thickness and optical constants of a surface layer simultaneously, the absorption coefficient of the film as a function of wavelength can be obtained. Using values of the absorption coefficients for the pure components of the film, the percentages (mol.% or wt.%) of each component in the film can be calculated. The method is demonstrated in a study of the hydration of oxide films on electropolished aluminium and the anodically formed barrier oxide film. The IRSE technique shows that hydration of the films by immersion in boiling water results in the conversion of aluminium oxide to pseudoboehmite. Copyright © 2003 John Wiley & Sons, Ltd.     

Surface roughness and electrical conductivity of the SnO2 ultra‐thin layers investigated by X‐ray reflectivity

Spray pyrolysis technique was applied to deposit two sets of ultra‐thin layers of tin dioxide (SnO₂). For the first and second sets, 0.01 and 0.05 molar precursor solutions were prepared, respectively. In both sets, utilizing the X‐ray reflectivity (XRR) technique, the effect of precursor concentration (PC) and precursor volume (PV) on the layer structure are investigated. The layer thickness of the samples, in each set, is a PV‐dependent parameter. For the same PV, samples with higher PC have a larger thickness and higher density. The electron density profiles deduced from XRR data analyses establish a link between measured values of sheet resistance and electron densities. The samples with higher PV and PC show less sheet resistance. The quantum size effect was utilized to show that the surface roughness for layers of more than almost 200 Å of samples in set two plays no role in the layer conductivity. Meanwhile, the same effect explains, adequately, the role of the surface roughness in the resistivity of the ultra‐thin layers in Set 1.     

Surface characterization of 3-glycidoxypropyltrimethoxysilane films on silicon-based substrates

Silane coupling agents are commonly used to activate surfaces for subsequent immobilization of biomolecules. The homogeneity and surface morphology of silane films is important for controlling the structural order of immobilized single-stranded DNA probes based on oligonucleotides. The surfaces of silicon wafers and glass slides with covalently attached 3-glycidoxypropyltrimethoxysilane (GOPS) have been characterized by using angularly dependent X-ray photoelectron spectroscopy (XPS), time-of-flight secondary-ion mass spectrometry (ToF–SIMS), atomic force microscopy (AFM), scanning electron microscopy (SEM), and monochromatic and spectroscopic ellipsometry. XPS and ToF–SIMS data provided evidence of complete surface coverage by GOPS. Data from angularly resolved XPS and ellipsometry methods suggested that the GOPS films were of monolayer thickness. AFM and SEM data indicated the presence of films that consisted of nodules approximately 50–100 nm in diameter. Modeling suggested that the nodules may lead to a nanoscale structural morphology that might influence the hybridization kinetics and thermodynamics of immobilized oligonucleotides.