载流子穿越具有双Mot势垒的半导体晶界的输运行为

讨论了穿越具有双Mot势垒的n型半导体晶界的载流子输运行为，重点分析了受主缺陷扩散层对偏压下晶界势垒、直流电流、非线性特性和电容等的作用．晶界势垒在偏压下的变化决定了载流子穿越晶界的输运行为分为预击穿、击穿和回复三个区域．受主缺陷扩散层的存在改变了势垒及其偏压关系，使电流的变化和非线性特性大幅度加强，很大程度上决定了预击穿区的漏电流；同时也使势垒加宽而减小高频电容，但使直流偏压下因晶界电荷的共振响应而产生的电容峰值增大 关键词：     

Quantum box resonant tunneling spectroscopy: Experiments and modelisation

We have calculated the potential profile and the electronic levels in resonant tunneling double barrier structures with nanometric lateral dimensions (≤ 500 nm) for various contact doping. At biases for which the box states (laterally confined quantum well) are resonant with the emitter Fermi level, fine structures are expected in the resonant tunneling current. Comparison with I(V) characteristics measured on nanometric GaAs/GaAlAs and GaAs/GaAlAs/InGaAs resonant tunneling diodes shows that our model accounts for the resonance bias voltage and explains the shape of the current peak. The fine structure observed in the current peak provides a spectroscopy of the confined states in the quantum box.     

Vertical transport and relaxation mechanisms in δ-doping superlattices

We report on electron transport in growth direction and relaxation mechanisms in δ-doped GaAs-superlattices. In order to investigate pure electron transport, n-type δ–n–i–p–i structures sandwiched between two n⁺-cladding layers have been investigated, with doping induced barrier heights ΔV smaller than the band gap energy E_g of the host material. An exponential increase of the current is expected with increasing bias due to tunneling through a decreasing barrier. At elevated temperatures, thermally activation over the barriers becomes possible. A simple WKB-model describes the experimental data reasonably well. Moreover, a current step appears in the I–V characteristics at a critical field which is clearly below the breakthrough value. Opto-electrical measurements confirm the existence of holes in the structure at fields larger than the critical field. A model is presented which explains the photocurrent and electroluminescence measurements consistently. The key mechanism is based on a few ballistically traveling electrons that can gain enough energy for interband avalanche multiplication.     

Spin-Polarization in Quasi-Magnetic Tunnel Junctions

Spin polarization in ferromagnetic metal/insulator/spin-filter barrier/nonmagnetic metal, referred to as quasimagnetic tunnel junctions, is studied within the free-electron model. Our results show that large positive or negative spin-polarization can be obtained at high bias in quasi-magnetic tunnel junctions, and within large bias variation regions, the degree of spin-polarization can be linearly tuned by bias. These linear variation regions of spin-polarization with bias are influenced by the barrier thicknesses, barrier heights and molecular fields in the spin-filter(SF) layer. Among them, the variations of thickness and heights of the insulating and SF barrier layers have influence on the value of spin-polarization and the linear variation regions of spin-polarization with bias.However, the variations of molecular field in the SF layer only have influence on the values of the spin-polarization and the influences on the linear variation regions of spin-polarization with bias are slight.     

Electrical and dielectric characterization of Au/ZnO/n-Si device depending frequency and voltage

Au/Zn O/n-type Si device is obtained using atomic layer deposition(ALD) for Zn O layer, and some main electrical parameters are investigated, such as surface/interface state(Nss), barrier height(Φb), series resistance(Rs), donor concentration(Nd), and dielectric characterization depending on frequency or voltage. These parameters are acquired by use of impedance spectroscopy measurements at frequencies ranging from 10 k Hz to 1 MHz and the direct current(DC) bias voltages in a range from-2 V to +2 V at room temperature are used. The main electrical parameters and dielectric parameters,such as dielectric constant(ε"), dielectric loss(ε"), loss tangent(tan δ), the real and imaginary parts of electric modulus(M and M), and alternating current(AC) electrical conductivity(σ) are affected by changing voltage and frequency. The characterizations show that some main electrical parameters usually decrease with increasing frequency because charge carriers at surface states have not enough time to fallow an external AC signal at high frequencies, and all dielectric parameters strongly depend on the voltage and frequency especially in the depletion and accumulation regions. Consequently, it can be concluded that interfacial polarization and interface charges can easily follow AC signal at low frequencies.     

基于I-V-T和C-V-T的GaN上Ni/Au肖特基接触特性研究

基于对制作在n-GaN上的肖特基二极管的变温I-V测试和C-V测试，采用表面势垒减薄模型对肖特基二极管的电流输运特性进行了研究.试验结果表明，肖特基接触的电流输运机理非常复杂，在不同的温度条件和偏压条件下有着不同的电流输运机理.在此基础上对肖特基接触I-V特性方程进行了修正，得到了很好的拟合曲线.试验表明，高温I-V法提取的势垒高度与常温C-V法提取的势垒高度接近于根据金属功函数得出的理论势垒高度值. 关键词： 氮化镓 肖特基二极管 表面势垒减薄模型 热电子场发射     

One-dimensional breakdown voltage model of SOI RESURF lateral power device based on lateral linearly graded approximation

A novel one-dimensional(1D) analytical model is proposed for quantifying the breakdown voltage of a reduced surface field(RESURF) lateral power device fabricated on silicon on an insulator(SOI) substrate.We assume that the charges in the depletion region contribute to the lateral PN junctions along the diagonal of the area shared by the lateral and vertical depletion regions.Based on the assumption,the lateral PN junction behaves as a linearly graded junction,thus resulting in a reduced surface electric field and high breakdown voltage.Using the proposed model,the breakdown voltage as a function of device parameters is investigated and compared with the numerical simulation by the TCAD tools.The analytical results are shown to be in fair agreement with the numerical results.Finally,a new RESURF criterion is derived which offers a useful scheme to optimize the structure parameters.This simple 1D model provides a clear physical insight into the RESURF effect and a new explanation on the improvement in breakdown voltage in an SOI RESURF device.     

Resonant tunneling properties of inverted Morse double quantum barrier

We study resonant tunneling characteristics of inverted Morse double quantum barrier structures. The effect of electric bias and structure parameters is calculated by using non-equilibrium Green's function method. Results for the transmission coefficients are compared with the structure parameters. Our results show that the widths of the wells and heights of barriers have a significant effect on the transmission properties. We found that the resonant peak of the transmission coefficient decreases with increasing electric field bias. Moreover, resonant energy level increases with increasing barrier height and increasing width parameters.     

A physics-based potential and electric field model of a nanoscale rectangular high-K gate dielectric HEMT

In this paper, we have developed a physics-based model for surface potential, channel potential, electric field and drain current for AlGaN/GaN high electron mobility transistor with high-K gate dielectric using two-dimensional Poisson equation under full depletion approximation with the inclusion of effect of polarization charges. The accuracy of the model has been verified and is found to be in good agreement with the simulated results.     

The barrier-height inhomogeneity in identically prepared Ni/n-type 6H-SiC Schottky diodes

The effective barrier heights and ideality factors of identically fabricated Ni/n-type 6 H-SiC Schottky diodes (23 dots) have been calculated from their experimental forward bias current–voltage (I–V) and reverse bias capacitance–voltage (C–V) characteristics. A statistical study related to the experimental barrier heights (BHs) and ideality factors of the diodes has been made. The effective Schottky barrier heights (SBHs) and ideality factors obtained from the I–V and C–V characteristics have differed from diode to diode. The BHs obtained from the I–V characteristics varied from 0.85 to 1.03 eV, the ideality factors varied from 1.13 to 1.40 and the BHs from C^-2–V characteristics varied from 1.10 to 1.70 eV. The experimental BH and ideality factor distributions obtained from the I–V characteristics are fitted by a Gaussian function, and their mean values are found to be 0.92±0.04 eV and 1.29±0.08 eV, respectively. The lateral homogeneous SBH value of 1.16 eV for the Ni/n-type 6H-SiC diodes has been calculated from a linear extrapolation of the effective barrier heights to n_if=1.03. PACS 79.40.+z; 73.40.Sx; 73.30.+y; 71.20.Nr     

磁通量子比特qubit信号强度随势垒偏置电压的变化

在20mK极低温下,测量了超导磁通量子比特的环流方向,并测到量子比特(qubit)信号.通过改变磁通量子比特的势垒高度,得到qubit信号强度随势垒高度的变化的实验数据并建立理论模型解释了实验现象.     

Electrical properties and conduction mechanism of an organic-modified Au/NiPc/n-InP Schottky barrier diode

The effect of nickel phthalocyanine (NiPc) organic interlayer on the electronic parameters of Au/n-InP Schottky contacts has been investigated using current–voltage (I–V) and capacitance–voltage (C–V) measurements. Measurements showed that the barrier heights and ideality factors are 0.58 eV (I–V), 0.69 eV(C–V) and 1.32 for Au/n-InP Schottky contact and 0.80 eV (I–V), 1.12 eV (C–V) and 1.73 for Au/NiPc/n-InP Schottky contact, respectively. Experimental results show that the interfacial layer of NiPc increases the effective barrier height by the influence of the space charge region of the Au/n-InP Schottky junction. Further, Cheung’s and modified Norde functions are used to extract the barrier height, series resistance and ideality factors. The discrepancy between barrier heights estimated from I–V to C–V methods is also explained. Moreover, the energy distribution of interface state density is determined from the forward bias I–V data. Results show that the interface states and series resistance play an important role on electrical properties of the structures studied. The reverse leakage current conduction mechanism is investigated. Results reveal that the Schottky conduction mechanism is found to be dominant in the Au/n-InP Schottky contact. However, in the case of Au/NiPc/n-InP Schottky contact, the Schottky conduction mechanism is found to be dominant in the higher bias region, while Poole–Frenkel conduction is found to be dominant in the lower bias region.     

Analysis of current-voltage characteristics of inhomogeneous Schottky diodes at low temperatures

Two approaches of Gaussian distribution of barrier heights in inhomogeneous Schottky diodes have been analyzed by comparing the results for consistency between the two. For this the current-voltage characteristics of inhomogeneous Schottky diodes have been generated by using analytically solved thermionic-emission diffusion equation incorporating Gaussian distribution of barrier heights and by direct numerical integration over a barrier height range. The differences in the results obtained in two approaches are discussed and it is shown that the two approaches yield current-voltage characteristics with slightly different features. The discrepancies in the results obtained in two approaches are attributed to the same series resistance assumed for all elementary barriers of the distribution. It is shown that assigning same series resistance to all barrier of the distribution in numerical integration approach causes current saturation at low bias and inhibits intersection of current-voltage curves from being observable which otherwise occurs in the curves obtained using analytical equation. The paper deals with these aspects in details.     

Electrical behaviour of lateral Al/n-GaN/Al structures

The electrical behaviour of lateral Al/n-GaN/Al structures has been studied by current-voltage measurements between a large pad with an area of 22 mm² and small contacts with different areas in the range of 0.01-1 mm². The results indicated that near room temperature the current was limited by the GaN layer exhibiting linear I-V characteristics for large contacts around 1 mm², while it was contact limited for small contacts around 0.1 mm² and below. This indicates that the same metal contact can behave as ohmic or rectifying depending on the contact area and so on the ratio of contact resistance to the series resistance of the structure.Near liquid nitrogen temperature, the current through the lateral Al/n-GaN/Al structures was limited by space charges. The Al/n-GaN contacts exhibited a very low Schottky barrier height below or around 0.2 eV. A new possible mechanism responsible for the temperature dependence of the ideality factor is proposed.     

Analysis of the actual Schottky-barrier contact model in a wide temperature and bias-voltage range

We numerically study the model of an actual metal-semiconductor Schottky-barrier contact with an interfacial layer and surface states (the Bardeen model). Our study is based on the previously developed view that the anomalies of the characteristics of such a contact is a consequence of the nonlinear dependence of the barrier height on the bias voltage. It is shown that on this basis it is possible to explain in a natural way the so-called low-temperature anomaly in metal-semiconductor Schottky-barrier contacts (an increase in the ideality factor of the current-voltage characteristic and a decrease in the measured barrier height with decreasing temperature), as well as the relationship between different barrier heights characterizing a contact, namely, among the actual barrier height, which is measured from a saturation current, the flat-band barrier height, and the barrier height measured from a C — V characteristic.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Radiofizika, Vol. 47, No. 9, pp. 769–783, September, 2004.     

Mechanism of current transport in Schottky barrier diodes based on coarse-grained CdTe films

The possibility of fabricating a Schottky barrier on Al-p-CdTe structures with the lowest density of surface states has been demonstrated and confirmed by the results obtained from the capacitance-voltage and photoelectric measurements of the potential barrier height. It has been established that, at different forward bias voltages, there are different exponential dependences of the electric current on the voltage, which are related to the changes in kinetic parameters of the base of the Al-p-CdTe-Mo structure. It has been shown that the Al-p-CdTe-Mo structure at a forward current and high illumination levels operates as an injection photodiode. This injection photodiode has a high current sensitivity. When the current is switched on in the reverse direction, after the complete coverage of the base of the structure by the space charge, electrons responsible for the charge transfer mechanism and noise characteristics of the structure are injected from the rear contact.     

Experimental barrier heights and the image potential in scanning tunneling microscopy

The effect of the classical image potential on the tunnel-barrier heights deduced from scanning tunneling microscopy is considered. An earlier prediction that the image potential should lead to an observable difference in barrier heights as deduced from two different measurements is shown to be incorrect. Using an approximation to the full multiple image potential we find that the barrier height deduced from the variation of current with tunnel-barrier width is extremely close to the unreduced work function, and we discuss what characteristic of the image potential leads to this result.     

BEEM studies of the PtSi/Si(100) interface electronic structure

The aim of the present work is a comparative study by ballistic electron emission microscopy (BEEM) of PtSi/n-Si(100) interface electronic structures using the assumption of an energy-dependent transmission coefficient or an energy-independent transmission coefficient and the possible explanation of the standard deviation of the barrier height from the most probable barrier height. PtSi/n-Si(100) interfaces have been studied for PtSi layers with an average estimated thickness of 2–3 nm. Locally measured barrier heights show distributions with the most probable values of barrier heights between 0.734 eV and 0.829 eV and with standard deviations from these most probable values of barrier heights in the range 0.010–0.066 eV. The assumption of an energy-independent coefficient for transmission of electrons through the interface is more preferable since the treatment of experimental results using a square-law leads to a most probable value of the barrier height in accordance to other measurements. The standard deviations of barrier heights from the most probable barrier heights may be explained by the heterogeneity of the PtSi layer thickness. The experimental results show lower barrier height for a higher PtSi layer thickness. The decreasing barrier height is accompanied by an increasing amount of Pt interstitial atoms.     

Silicon surface passivation by static charge

A properly passivated silicon surface is chemically stable, and all interface properties are constant. The silicon dioxide layers fulfil the chemical stability requirements; however, their surface and interface charges have effect on the silicon surface potential barrier. Positive charge is usually assumed at the oxide-silicon interface, thus depletion or inversion layer develops in the case of p and accumulation in the case of n-type silicon.The surface of silicon dioxide can be charged macroscopically by corona charger or by conductive rubber stamp, microscopically by a tip of some scanning probe microscope (STM or AFM). The oxide surface usually retains the charges for a long time, however in the case of ultra-thin or other leaky oxide continuous charging it is necessary to keep the constant surface potential.The main purpose of this work is to summarize the possibilities of charging up the surface, the effect of the surface and interface charge on the surface properties of the silicon. The rearrangement of the surface charges will also be discussed.     

Surface and interface electronic properties of group III-nitride heterostructures

For group III-nitrides with wurtzite structure the presence of fixed polarization interface charges yields new challenges in order to understand and control Schottky barrier heights, band offsets and 2D confinement in heterostructure FETs. In this short review experimental results obtained by in situ photoemission spectroscopy on MBE AlGaN/GaN heterostructures grown on 6H–SiC are discussed, with emphasis on the presence and interplay of surface electronic states. Schrödinger–Poisson calculations are performed to get the complete band scheme at the selected heterojunctions. Results on the polarity dependence of Pt/GaN Schottky barrier values from the literature are also discussed.