Characteristics of titanium oxide memristor with coexistence of dopant drift and a tunnel barrier

The recent published experimental data of titanium oxide memristor devices which are tested under the same experi- mental conditions exhibit the strange instability and complexity of these devices. Such undesired characteristics preclude the understanding of the device conductive processes and the memristor-based practical applications. The possibility of the coexistence of dopant drift and tunnel barrier conduction in a memristor provides preliminary explanations for the undesired characteristics. However, current research lacks detailed discussion about the coexistence case. In this paper, dopant drift and tunnel barrier-based theories are first analyzed for studying the relations between parameters and physical variables which affect characteristics of mernristors, and then the influences of each parameter change on the conductive behaviors in the single and coexistence cases of the two mechanisms are simulated and discussed respectively. The simulation results provide further explanations of the complex device conduction. Theoretical methods of eliminating or reducing the coex- istence of the two mechanisms are proposed, in order to increase the stability of the device conduction. This work also provides the support for optimizing the fabrications of memristor devices with excellent performance.     

ZnO压敏陶瓷电导研究的新方法

在-180?℃—100?℃温度范围内研究了ZnO-Bi₂O₃二元、ZnO-Bi₂O₃-MnO三元以及商用ZnO压敏陶瓷的I-V特性.研究发现：二元试样电导由散射电导串联构成;三元试样电导由热电子发射电导混联构成;商用试样电导由热电子发射电导和隧道效应电导并联构成.对整个电流范围内的电导拟合表明：通过同一温度下电导分量同电流的关系,可以计算出该部分电导对应的非线性指数.在商用试样中,隧道电流产生的非线性指数为33,与实测值接近;该隧穿分量在小电流区也存在,且在低温下表现地更为明显. 关键词： ZnO压敏陶瓷 I-V特性')" href="#">I-V特性 导电机理     

ZnO纳米线场效应管的制备及I-V特性研究

采用静电探针和原子力探针技术,将化学气相沉积工艺制备的,长度为30—200 μm,直径80—750 nm的单根半导体ZnO纳米线搭接在Au,Zn,Al不同功函的金属隔离沟道两端,构建出了最基本的ZnO纳米线绝缘栅场效应管. 研究了沟道类型、纳米线直径、退火温度和外加栅压对ZnO纳米线场效应管I-V特性的影响. 利用半导体与金属材料的肖特基接触、欧姆接触的产生机理及电子输运理论,对结果进行了分析和讨论. 关键词： ZnO纳米线 场效应管 I-V特性')" href="#">I-V特性     

硼掺杂对四面体非晶碳膜电导性能的影响

以单质硼和高纯石墨的混合粉末压制成型的靶材作为靶源,采用过滤阴极真空电弧技术制备不同硼含量的掺硼四面体非晶碳膜.分别采用四探针法、阻抗分析仪和电化学界面对薄膜的变温电导率、I-V特性和C-V特性进行了测试和研究.实验结果表明,当B含量由0增加至6.04 at%时,薄膜的室温电导率先逐渐增大而后逐渐减小,相应薄膜的电导激活能先逐渐减小而后逐渐增大,并在2.13 at%时分别出现最大和最小值1.42×10^-7S/cm和0.1eV.此外,掺硼四面体非晶碳/n型硅异质结的I-V曲线表现出典型的整流特性,表明p-n结二极管已经形成,且结两端的掺杂能级在空间上连续统一. 关键词： 四面体非晶碳 电导率 I-V曲线')" href="#">I-V曲线 C-V曲线')" href="#">C-V曲线     

The I-V characteristics of InAs/GaAs quantum dot laser

The I-V characteristics of an InAs/GaAs quantum dot (QD) laser diode have been investigated under both the high and low input current conditions. Under the low current condition, the I-V curve obeys the Shockley equation, from which the forbidden energy gap of the junction can be derived. On the other hand, in the high current range, the I-V characteristics violate the Shockley equation and the device tends to operate as a resistance. In addition, the I-V curve can be used to fit the temperature coefficient of the forward voltage, which is a critical parameter for determining the junction temperature of the laser diode.     

荷控忆阻器等效电路分析模型及其电路特性研究

忆阻器是物理上新实现的具有记忆特性的基本二端电路元件. 根据φ-q关系式的泰勒级数形式构建了荷控忆阻器等效电路分析模型, 以三次非线性荷控忆阻器模型为例, 对不同参数条件下的荷控忆阻器进行了伏安关系、有无源性等电路特性的理论分析. 结果表明: 荷控忆阻器的伏安关系具有斜体“8”字形紧磁滞回线特性, 随其参数符号的不同, 荷控忆阻器呈现出无源性和有源性, 导致其电路特性发生相应的变化; 相比无源荷控忆阻器, 有源荷控忆阻器更适用于作为二次谐波信号产生电路使用. 制作了荷控忆阻器特性分析等效电路的实验电路, 实验测量结果很好地验证了理论分析结果. 关键词： 荷控忆阻器 等效电路 伏安关系 电路特性     

Investigation of diode parameters using I-V and C-V characteristics of In/SiO2/p-Si (MIS) Schottky diodes

A study on interface states density distribution and characteristic parameters of the In/SiO₂/p-Si (MIS) capacitor has been made. The thickness of the SiO₂ film obtained from the measurement of the corrected capacitance in the strong accumulation region for MIS Schottky diodes was 220 Å. The diode parameters from the forward bias I-V characteristics such as ideality factor, series resistance and barrier heights were found to be 1.75, 106-112 Ω and 0.592 eV, respectively. The energy distribution of the interface state density D_it was determined from the forward bias I-V characteristics by taking into account the bias dependence of the effective barrier height. The interface state density obtained using the I-V characteristics had an exponential growth, with bias towards the top of the valance band, from 9.44×10¹³ eV⁻¹ cm⁻² in 0.329-E_v eV to 1.11×10¹³ eV⁻¹ cm⁻² in 0.527-E_v eV at room temperature. Furthermore, the values of interface state density D_it obtained by the Hill-Coleman method from the C-V characteristics range from 52.9×10¹³ to 1.11×10¹³ eV⁻¹ cm⁻² at a frequency range of 30kHz-1 MHz. These values of D_it and R_s were responsible for the non-ideal behaviour of I-V and C-V characteristics.     

单颗粒CVD金刚石的场发射

利用改造的扫描电子显微镜(SEM)设备，在SEM腔体中利用钨(W)探针测试了单颗粒金刚石的I-V与场发射特性，结果表明结晶良好的金刚石的I-V特性服从欧姆定律，而孤立的菜花状金刚石颗粒(cauliflower-like diamond)的I-V特性基本符合Pool-Frenkel输运特性.场发射特性表明，结晶良好的金刚石薄膜基本没有场发射，而孤立的菜花状的金刚石颗粒具有一定的场发射.CVD金刚石的场发射过程中，缺陷对电子的输运起主导作用.     

The electrical characteristics of a 4H-silicon carbide metal-insulator-semiconductor structure with Al2O3 as the gate dielectric

A 4H-silicon carbide metal-insulator-semiconductor structure with ultra-thin Al₂O₃ as the gate dielectric, deposited by atomic layer deposition on the epitaxial layer of a 4H-SiC (0001) 8⁰N-/N+ substrate, has been fabricated. The experimental results indicate that the prepared ultra-thin Al₂O₃ gate dielectric exhibits good physical and electrical characteristics, including a high breakdown electrical field of 25 MV/cm, excellent interface properties (1×10¹⁴ cm^-2) and low gate-leakage current (I_G = 1 × 10^-3 A/cm^-2@E_ox = 8 MV/cm). Analysis of the current conduction mechanism on the deposited Al₂O₃ gate dielectric was also systematically performed. The confirmed conduction mechanisms consisted of Fowler-Nordheim (FN) tunneling, the Frenkel-Poole mechanism, direct tunneling and Schottky emission, and the dominant current conduction mechanism depends on the applied electrical field. When the gate leakage current mechanism is dominated by FN tunneling, the barrier height of SiC/Al₂O₃ is 1.4 eV, which can meet the requirements of silicon carbide metal-insulator-semiconductor transistor devices.     

The effect of PVA (Bi2O3-doped) interfacial layer and series resistance on electrical characteristics of Au/n-Si (110) Schottky barrier diodes (SBDs)

Two types of Schottky Barrier Diodes (SBDs) with and without PVA (Bi₂O₃-doped) polymeric interfacial layer, were fabricated and measured at room temperature in order to investigate the effects of the PVA (Bi₂O₃-doped) interfacial layer on the main electrical parameters such as the ideality factor (n), zero-bias barrier height (Φ_B0), series resistance (R_s) and interface-state density (N_ss). Electrical parameters of these two diodes were calculated from the current-voltage (I-V) characteristics and compared with each other. The values of Φ_B0, n and R_s for SBDs without polymeric interfacial layer are 0.71 eV, 1.44 and 4775 Ω, respectively. The values of Φ_B0, n and R_s for SBDs with PVA (Bi₂O₃-doped) polymeric interfacial layer are 0.74 eV, 3.49 and 10,030 Ω, respectively. For two SBDs, the energy density distribution profiles of interface states (N_ss) were obtained from forward-bias I-V measurements by taking the bias dependence of R_s of these devices into account. The values of N_ss obtained for the SBD with PVA (Bi₂O₃-doped) polymeric interfacial layer are smaller than those of the SBD without polymeric interfacial layer.     

The study on the surface state of CdZnTe (1 1 0) surface

Angle-resolved photoemission spectroscopy (ARPES) was used to characterize the surface state of clean CdZnTe (1 1 0) surface. The surface state of CdZnTe with the peak at 0.9 eV below the Fermi level is identified. Meanwhile, Photoluminescence (PL) spectrum confirmed that there existed a surface trap state which introduced a deep-level peak at 1.510 eV. The surface trap states can be decreased by aging in dry-air. The surface leakage current was measured also by I-V measurements. After aging, the leakage current was decreased remarkably, which suggested that the aging treatment is an effective method to decrease the surface trap state.     

Investigation of the electrical properties of a new PPV derivative-based on a sandwich structure for opto-electronic applications

The opto-electronic properties of native poly(p-phenylene vinylene) (PPV) were tuned by the confinement of the π-conjugation and the incorporation of a sulphur group as a spacer in order to obtain a blue-green emitting polymer (PPVS). The energy band gap of the PPVS thin film has been measured by UV-vis absorption spectroscopy and evaluated to 2.87 eV. Current-voltage characteristics and impedance spectroscopy measurements performed on sandwich structures [ITO/PPVS/Al] are used to elucidate the conduction mechanisms. The static electrical characterisations showed a space charge limited conduction (SCLC) and a conductivity with low power frequency behaviour characteristic of a hopping transport in disordered materials. The impedance spectra can be discussed in terms of an equivalent circuit model designed as a parallel resistor R_P and capacitor C_P network in series with a resistor R_S. We extract numerical values of these parameters by fitting experimental data. Their evolution with bias voltages has shown that the SCLC mechanism is characterised by an exponential trap distribution.     

电压应力下超薄栅氧化层n-MOSFET的击穿特性

研究了90nm工艺下栅氧化层厚度为1.4nm的n-MOSFET的击穿特性，包括V-ramp(斜坡电压)应力下器件栅电流模型和CVS(恒定电压应力)下的TDDB(经时击穿)特性，分析了电压应力下器件的失效和退化机理.发现器件的栅电流不是由单一的隧穿引起，同时还有电子的翻越和渗透.在电压应力下，SiO₂中形成的缺陷不仅降低了SiO₂的势垒高度，而且等效减小了SiO₂的厚度(势垒宽度).另外，每一个缺陷都会形成一个导电通道，这些导电通道的形成增大了栅电流，导致器件性能的退化，同时栅击穿时间变长. 关键词： 超薄栅氧化层 斜坡电压 经时击穿 渗透     

Effect of UV lamp irradiation during oxidation of Zr/Pt/Si structure on electrical properties of Pt/ZrO2/Pt/Si structure

Metal-insulator-metal (MIM) capacitors were fabricated using ZrO₂ films and the effects of structural and native defects of the ZrO₂ films on the electrical and dielectric properties were investigated. For preparing ZrO₂ films, Zr films were deposited on Pt/Si substrates by ion beam deposition (IBD) system with/without substrate bias voltages and oxidized at 200 °C for 60 min under 0.1 MPa O₂ atmosphere with/without UV light irradiation (λ = 193 nm, Deep UV lamp). The ZrO₂(∼12 nm) films on Pt(∼100 nm)/Si were characterized by X-ray diffraction pattern (XRD), field emission scanning electron microscopy (FE-SEM) and high-resolution transmission electron microscopy (HRTEM), capacitance-voltage (C-V) and current-voltage (I-V) measurements were carried out on MIM structures. ZrO₂ films, fabricated by oxidizing the Zr film deposited with substrate bias voltage under UV light irradiation, show the highest capacitance (784 pF) and the lowest leakage current density. The active oxygen species formed by UV irradiation are considered to play an important role in the reduction of the leakage current density, because they can reduce the density of oxygen vacancies.     

The Bragg-peak studies in CR-39 SSNTD on the basis of many-hit model for track etch rates

Etching rates along tracks of protons and lithium ions with energies in the Bragg peak region were explored. The energy losses in this region, especially for protons of low energies, are of particular interest from the physical as well as biological points of view. The microscopic track etch rate, V_T, is studied using the many-hit model in its first approximation assuming that V_T is a function of the restricted energy loss (REL_ω). The ions multiple scattering and straggling effects on the average experimental V_T values are corrected by shifting the calculated REL_ω values along the track, until its maximum coincides with that of the V_T. The fitting of least square differences between calculated and experimental V_T values is used in order to determine the many-hit model registration parameters for the detector under investigation.     

Understanding of a-Si:H(p)/c-Si(n) heterojunction solar cell through analysis of cells with point-contacted p/n junction

We fabricated point-contacted a-Si:H(p)/c-Si(n) heterojunction solar cells using patterned SiO₂ and investigated their electrical properties using the light current–voltage (I–V) curve and Suns-V_oc measurements. The light I–V curves showed bias-dependent changes according to the applied voltage in the point-contacted cells, especially in the samples with a long distance between the point-contacted junctions. The Suns-V_oc measurements showed that the bias-dependence of the light I–V curves did not originate from the recombination in the SiO₂/Si or a-Si:H(p)/c-Si(n) interface, but from the series resistances. It is possible to explain the bias-dependent light I–V curve in terms of the conductivity of a-Si:H(p) and difference in the electrical contact properties between a-Si:H(p), ZnO and c-Si(n). These results mean that the electrical properties of the a-Si:H(p) layer and the contact properties with this layer are also critical to obtain a high J_sc and fill factor in n-type based Si heterojunction solar cells.     

Thermal activation of current in an inhomogeneous Schottky diode with a Gaussian distribution of barrier height

This paper investigates the thermal activation behaviour of current in an inhomogeneous Schottky diode with a Gaussian distribution of barrier height by numerical simulation. The analytical Gaussian distribution model predicted that the I--V--T curves may intersect with the possibility of the negative thermal activation of current, but may be contradictory to the thermionic emission mechanism in a Schottky diode. It shows that the cause of the unphysical phenomenon is related to the incorrect calculation of current across very low barriers. It proposes that junction voltage V_j, excluding the voltage drop across series resistance from the external bias, is a crucial parameter for correct calculation of the current across very low barriers. For correctly employing the thermionic emission model, V_j needs to be smaller than the barrier height Ф. With proper scheme of series resistance connection where the condition of V_j > Ф is guaranteed, I--V--T curves of an inhomogeneous Schottky diode with a Gaussian distribution of barrier height have been simulated, which demonstrate normal thermal activation. Although the calculated results exclude the intersecting possibility of I--V--T curves with an assumption of temperature-independent series resistance, it shows that the intersecting is possible when the series resistance has a positive temperature coefficient. Finally, the comparison of our numerical and analytical results indicates that the analytical Gaussian distribution model is valid and accurate in analysing I--V--T curves only for small barrier height inhomogeneity.     

Effect ofγ-radiation on the spectral luminescence characteristics of impure cadmium tungstate crystals

Results of a study of the effect of γ-radiation on the spectral luminescence properties of cadmium tungstate crystals doped with silver, bismuth, and molybdenum cations are presented. Spectral characteristics of the nondnnnoped crystals are briefly described. Absorption and photo and X-ray luminescence spectra of the crystals taken before and after exposure to γ-radiation (5.5·10⁴ Gy) are compared. It is found that the spectral characteristics of the crystals doped with silver, bismuth, and molybdenum cations do not change markedly after the exposure. The relation between the type of impurity-induced defects, individual characteristics of the impurity cations, and the character of the effect of γ-radiation on the spectral luminescence properties of impure crystals is analyzed (preliminarily). Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 64, No. 1, pp. 55–60, January–February, 1997.