The influence of A1GaN/GaN superlattices as electron blocking layers on the performance of blue InGaN light-emitting diodes

P-A1GaN/P-GaN superlattices are investigated in blue InGaN light-emitting diodes as electron blocking layers. The simulation results show that efficiency droop is markedly improved due to two reasons： （i） enhanced hole concentration and hole carrier transport efficiency in A1GaN/GaN superlattices, and （ii） enhanced blocking of electron overflow between multiple quantum-wells and A1CaN/GaN superlattices.     

Performance enhancement of an InGaN light-emitting diode with an AIGaN/InGaN superlattice electron-blocking layer

The efficiency enhancement of an InGaN light-emitting diode （LED） with an A1GaN/InGaN superlattice （SL） electron-blocking layer （EBL） is studied numerically, which involves the light-current performance curve, internal quan- tum efficiency electrostatic field band wavefunction, energy band diagram carrier concentration, electron current density, and radiative recombination rate. The simulation results indicate that the LED with an A1GaN/InGaN SL EBL has better optical performance than the LED with a conventional rectangular A1GaN EBL or a normal A1GaN/GaN SL EBL because of the appropriately modified energy band diagram, which is favorable ibr the injection of holes and confinement of elec- trons. Additionally, the efficiency droop of the LED with an AIGaN/InGaN SL EBL is markedly improved by reducing the polarization field in the active region.     

新型电子阻挡层结构对蓝光InGaN发光二极管性能的提高

分别对3种不种电子阻挡层的蓝光AlGaN LED进行数值模拟研究。3种阻挡层结构分别为传统AlGaN电子阻挡层,AlGaN-GaN-AlGaN电子阻挡层和Al组分渐变的AlGaN-GaN-AlGaN电子阻挡层。此外对这对三种器件的活性区的载流子浓度、能带图、静电场和内量子效率进行比较和分析。研究结果表明,相较于传统AlGaN和AlGaN-GaN-AlGaN两种电子阻挡层的LED,具有Al组分渐变的AlGaN-GaN-AlGaN电子阻挡层结构的LED具有较高的空穴注入效率、较低的电子外溢现象和较小的静电场(活性区)。同时,具有Al组分渐变的AlGaN-GaN-AlGaN电子阻挡层结构的LED的efficiency droop现象也得到一定的缓解。     

In含量对InGaN/GaN LED光电性能的影响

运用软件模拟和理论计算的方法分析了In含量对发光二极管光电性能的影响,研究了In含量与光谱功率密度、量子阱中载流子的浓度、辐射速率、发光功率等之间的关系。分析结果表明:电子泄漏与能带填充是影响光电性能的主要原因。当In含量较低时,随着电流密度增大(<8kA/cm²),光谱发生蓝移程度相对较小,但电流密度太大(>8kA/cm²)会造成电子泄漏,发光功率降低;而当In含量较高时,随着电流密度增大,光谱发生蓝移程度相对较大,但在电流密度较大时,会获得较高的发光功率。因此,为了使InGaN/GaN发光二极管获得最大量子效率与发光效率,应该根据电流密度的大小(8kA/cm²)来选择In含量的高低。     

InxGa1-xN量子阱蓝光LED光电特性与量子阱束缚态能级的关系

运用软件模拟和理论计算的方法分析了量子阱宽度的变化对量子阱束缚态能级与光电性能产生的影响,建立了束缚态分裂能级理论模型。分析结果表明:当量子阱宽较窄时,极化效应导致的能带弯曲是光谱红移的主要原因,而电子泄漏是导致效率下降的主要原因;当阱宽较大时,能级填充是导致光谱红移的主要原因,俄歇复合与载流子离域是导致效率下降的主要原因。由本文得出,当量子阱宽为2.5～3.5 nm时,InGaN/GaN发光二极管获得最大内量子效率与发光效率。     

Enhanced performances of InGaN/GaN-based blue light-emitting diode with InGaN/AlInGaN superlattice electron blocking layer

InGaN/AlInGaN superlattice(SL) is designed as the electron blocking layer(EBL) of an InGaN/GaN-based lightemitting diode(LED). The energy band structure, polarization field at the last-GaN-barrier/EBL interface, carrier concentration, radiative recombination rate, electron leakage, internal quantum efficiency(IQE), current–voltage(I–V) performance curve, light output–current(L–I) characteristic, and spontaneous emission spectrum are systematically numerically investigated using APSYS simulation software. It is found that the fabricated LED with InGaN/AlInGaN SL EBL exhibits higher light output power, low forward voltage, and low current leakage compared with those of its counterparts.Meanwhile, the efficiency droop can be effectively mitigated. These improvements are mainly attributed to the higher hole injection efficiency and better electron confinement when InGaN/AlInGaN SL EBL is used.     

Enhanced performances of InGaN/GaN-based blue light-emitting diode with InGaN/AIInGaN superlattice electron blocking layer

InGaN/AIlnGaN superlattice （SL） is designed as the electron blocking layer （EBL） of an InGaN/GaN-based light- emitting diode （LED）. The energy band structure, polarization field at the last-GaN-barrier/EBL interface, carrier concen- tration, radiative recombination rate, electron leakage, internal quantum efficiency （IQE）, current-voltage （l-V） perfor- mance curve, light output-current （L-l） characteristic, and spontaneous emission spectrum are systematically numerically investigated using APSYS simulation software. It is found that the fabricated LED with InGaN/AIInGaN SL EBL exhibits higher light output power, low forward voltage, and low current leakage compared with those of its counterparts. Meanwhile, the efficiency droop can be effectively mitigated. These improvements are mainly attributed to the higher hole injection efficiency and better electron confinement when InGaN/AIlnGaN SL EBL is used.     

高效InGaN/AlInGaN发光二极管的结构设计及其理论研究

利用AdvancedPhysicalModelsofSemiconductorDevices(APSYS)理论对比研究了InGaN/AlInGaN和InGaN/GaN多量子阱作为有源层的InGaN基发光二极管的结构和电学特性。与InGaN/GaN基LED中GaN作为垒层材料相比,在AlInGaN材料体系中,通过调节AlInGaN中Al和In的组分可以优化器件的性能。当InGaN阱层材料中In组分为8%时,可以实现无应力的In_0.08Ga_0.92N/AlInGaN基LED。在这种无应力结构中可以进一步降低大功率LED的\"效率下降\"(Effciencydroop)问题。理论模拟结果显示,四元系AlInGaN作为垒层可以进一步减少载流子泄露,增加空穴注入效率,减少极化场对器件性能的影响。在In_0.08Ga_0.92N/AlInGaN量子阱中的载流子浓度、有源层的辐射复合率、电流特性曲线和内量子效率等方面都优于InGaN/GaN基LED。无应变AlInGaN垒层代替传统的GaN垒层后,能够得到高效的发光二极管,并且大电流注入下的\"效率滚降\"问题得到改善。

     

硅衬底InGaN/GaN基蓝光发光二极管droop效应的研究

InGaN/GaN基阱垒结构LED当注入的电流密度较大时, LED的量子效率随注入电流密度增大而下降, 即droop效应.本文在Si (111)衬底上生长了 InGaN/GaN 基蓝光多量子阱结构的LED,通过将实验测量的光电性能曲线与利用ABC模型模拟的结果进行对比, 探讨了droop效应的成因.结果显示:温度下降会阻碍电流扩展和降低空穴浓度, 电子在阱中分布会越来越不平衡,阱中局部区域中因填充了势能越来越高的电子而溢出阱外, 从而使droop效应随着温度的降低在更小的电流密度下出现且更为严重, 不同温度下实验值与俄歇复合模型模拟的结果在高注入时趋势相反.这此结果表明,引起 droop效应的主因不是俄歇非辐射复合而是电子溢出,电子溢出的本质原因是载流子在阱中分布不均衡.     

Efficiency enhancement of an InGaN light-emitting diode with a p-AIGaN/GaN superlattice last quantum barrier

In this study, the efficiency droop of an InGaN light-emitting diode （LED） is reduced slgnlncanUy oy using a p-AlGaN/GaN superlattice last quantum barrier. The reduction in efficiency droop is mainly caused by the decrease of electron current leakage and the increase of hole injection efficiency, which is revealed by investigating the light currents, internal quantum efficiencies, energy band diagrams, carrier concentrations, carrier current densities, and radiative recombination efficiencies of three LED structures with the advanced physical model of semiconductor device （APSYS）.     

Improvement of characteristics of an InGaN light-emitting diode by using a staggered AlGaN electron-blocking layer

The optical and physical properties of an InGaN light-emitting diode (LED) with a specific design of a staggered AlGaN electron-blocking layer (EBL) are investigated numerically in detail. The electrostatic field distribution, energy band, carrier concentration, electroluminescence (EL) intensity, internal quantum efficiency (IQE), and the output power are simulated. The results reveal that this specific design has a remarkable improvement in optical performance compared with the design of a conventional LED. The lower electron leakage current, higher hole injection efficiency, and consequently mitigated efficiency droop are achieved. The significant decrease of electrostatic field at the interface between the last barrier and the EBL of the LED could be one of the main reasons for these improvements.     

CdSe/CdZnSe超晶格的激子光学性质的研究

用分子束外延法在GaAs衬底上生长了CdSe/Cd0.65Zn0.35Se超晶格结构。利用X射线衍射（XRD）、77K下变密度激发的光致发光光谱和变温度光致发光光谱研究了CdSe/CdZnSe超晶格结构和激光复合特性,在该材料中观测到激子－激子散射发射峰,变密度激发光致发光光谱和谱温度光致发光光谱证实了这一现象,激子发射峰的线宽随着温度的升高而展宽,低温时发光峰的宽度主要是由合金组分和阱垒起伏引起的,没温时激子线宽展宽是由于激子与纵光学声子和离化的施主杂质间的散射作用引起的,光致发光的强度随着温度的升高而降低,这主要是由激子的热离化造成的,也就是说,热激发使得电子或空穴由阱中跃迁至垒上。