Microwave damage susceptibility trend of a bipolar transistor as a function of frequency

We conduct a theoretical study of the damage susceptibility trend of a typical bipolar transistor induced by a high-power microwave (HPM) as a function of frequency. The dependences of the burnout time and the damage power on the signal frequency are obtained. Studies of the internal damage process and the mechanism of the device are carried out from the variation analysis of the distribution of the electric field, current density, and temperature. The investigation shows that the burnout time linearly depends on the signal frequency. The current density and the electric field at the damage position decrease with increasing frequency. Meanwhile, the temperature elevation occurs in the area between the p-n junction and the n-n + interface due to the increase of the electric field. Adopting the data analysis software, the relationship between the damage power and frequency is obtained. Moreover, the thickness of the substrate has a significant effect on the burnout time.     

不同样式的高功率微波对双极晶体管的损伤效应和机理

结合Si基n⁺-p-n-n⁺ 外延平面双极晶体管, 通过分析器件内部的温度分布变化以及电流密度和烧毁时间随信号幅值的变化关系, 研究了其在三角波信号、正弦波信号和方波脉冲信号等三种样式的高功率微波信号作用下的损伤效应和机理. 研究表明, 三种高功率微波信号注入下器件的损伤部位都是发射结, 在频率和信号幅值相同的情况下方波脉冲信号更容易使器件损伤; 位移电流密度和烧毁时间随信号幅值的增大而增大, 而位移电流在总电流所占的比例随信号幅值的增大而减小; 相比于因信号变化率而引起的位移电流, 信号注入功率在高幅值信号注入损伤过程中占主要作用. 利用数据分析软件, 分别得到了三种信号作用下器件烧毁时间和信号频率的变化关系式. 结果表明, 器件烧毁时间随信号频率的增加而增加, 烧毁时间和频率都符合t= af^b的关系式. 关键词： 双极晶体管 高功率微波 损伤机理 信号样式     

硅基单片式复合晶体管的结构参数对高功率微波损伤效应的影响

建立了三种不同结构的硅基单片式复合晶体管(由T1和T2两个晶体管构成)的二维电热模型,研究了高功率微波对不同结构的硅基单片式复合晶体管的损伤效应的影响。获得了不同器件结构下导致复合晶体管损伤的损伤功率阈值和损伤能量阈值分别与脉宽的关系。结果表明,当复合晶体管的总体尺寸不变而T2和T1晶体管的面积比值更大时需要更多的功率和能量来损伤器件。通过分析器件内部电场、电流密度和温度分布的变化,得到了复合晶体管的结构对其微波损伤效应的影响规律。对比发现,三种结构的复合晶体管的损伤点均位于T2管的发射极附近,随着T2和T1晶体管面积比的增大,电场、电流密度和温度在器件内部的分布将变得更加分散。此外,在发射极处增加外接电阻R_e,研究表明损伤时间随发射极电阻的增大而增加。因此可以得出结论,适当改变器件结构或增加外接元件可以增强器件的抗微波损伤能力。晶体管的仿真毁伤点与实验结果一致。     

The pulsed microwave damage trend of a bipolar transistor as a function of pulse parameters

In the present paper we conduct a theoretical study of the thermal accumulation effect of a typical bipolar transistor caused by high power pulsed microwaves(HPMs),and investigate the thermal accumulation effect as a function of pulse repetition frequency(PRF) and duty cycle.A study of the damage mechanism of the device is carried out from the variation analysis of the distribution of the electric field and the current density.The result shows that the accumulation temperature increases with PRF increasing and the threshold for the transistor is about 2 kHz.The response of the peak temperature induced by the injected single pulses indicates that the falling time is much longer than the rising time.Adopting the fitting method,the relationship between the peak temperature and the time during the rising edge and that between the peak temperature and the time during the falling edge are obtained.Moreover,the accumulation temperature decreases with duty cycle increasing for a certain mean power.     

Pulsed microwave damage trend of bipolar transistor as a function of pulse parameters

In the present paper we conduct a theoretical study of the thermal accumulation effect of a typical bipolar transistor caused by high power pulsed microwave (HPM), and investigate the thermal accumulation effect as a function of pulse repetition frequency (PRF) and duty cycle. A study of the damage mechanism of the device is carried out from the variation analysis of the distribution of the electric field and the current density. The result shows that the accumulation temperature increases with PRF increasing and the threshold for the transistor is about 2 kHz. The response of the peak temperature induced by the injected single pulses indicates that the falling time is much longer than the rising time. Adopting the fitting method, the relationship between the peak temperature and the time during the rising edge and that between the peak temperature and the time during the falling edge are obtained. Moreover, the accumulation temperature decreases with duty cycle increasing for a certain mean power.     

双极晶体管微波损伤效应与机理

结合Si基n⁺-p-n-n⁺外延平面双极晶体管, 考虑了器件自热、高电场下的载流子迁移率退化和载流子雪崩产生效应, 建立了其在高功率微波(high power microwave, HPM)作用下的二维电热模型. 通过分析器件内部电场强度、电流密度和温度分布随信号作用时间的变化, 研究了频率为1 GHz的等效电压信号由基极和集电极注入时双极晶体管的损伤效应和机理. 结果表明集电极注入时器件升温发生在信号的负半周, 在正半周时器件峰值温度略有下降, 与集电极注入相比基极注入更容易使器件毁伤, 其易损部位是B-E结. 对初相分别为0和π的两个高幅值信号的损伤研究结果表明, 初相为π的信号更容易损伤器件, 而发射极串联电阻可以有效的提高器件的抗微波损伤能力.     

高功率微波作用下高电子迁移率晶体管的损伤机理

本文针对高电子迁移率晶体管在高功率微波注入条件下的损伤过程和机理进行了研究,借助SentaurusTCAD仿真软件建立了晶体管的二维电热模型,并仿真了高功率微波注入下的器件响应.探索了器件内部电流密度、电场强度、温度分布以及端电流随微波作用时间的变化规律.研究结果表明,当幅值为20 V,频率为14.9 GHz的微波信号由栅极注入后,器件正半周电流密度远大于负半周电流密度,而负半周电场强度高于正半周电场.在强电场和大电流的共同作用下,器件内部的升温过程同时发生在信号的正、负半周内.又因栅极下靠近源极侧既是电场最强处,也是电流最密集之处,使得温度峰值出现在该处.最后,对微波信号损伤的高电子迁移率晶体管进行表面形貌失效分析,表明仿真与实验结果符合良好.     

高电子迁移率晶体管放大器高功率微波损伤机理

在TCAD半导体仿真环境中,建立了0.25 m栅长的AlGaAs/InGaAs高电子迁移率晶体管(HEMT)低噪声放大器与微波脉冲作用的仿真模型,基于器件内部的电场强度、电流密度和温度分布的变化,研究了1 GHz的微波从栅极和漏极注入的损伤机理。研究结果表明,从栅极注入约40.1 dBm的微波时,HEMT内部峰值温度随着时间的变化振荡上升,最终使得器件失效,栅下靠源侧电流通道和强电场的同时存在使得该位置最容易损伤;从漏极注入微波时,注入功率的高低会使器件内部出现不同的响应过程,注入功率存在一个临界值,高于该值,器件有可能在第一个周期内损伤,损伤位置均在漏极附近。在1 GHz的微波作用下,漏极注入比栅极注入更难损伤。     

GaN高电子迁移率晶体管强电磁脉冲损伤效应与机理

提出了一种新型GaN异质结高电子迁移率晶体管在强电磁脉冲下的二维电热模型,模型引入材料固有的极化效应,高场下电子迁移率退化、载流子雪崩产生效应以及器件自热效应,分析了栅极注入强电磁脉冲情况下器件内部的瞬态响应,对其损伤机理和损伤阈值变化规律进行了研究.结果表明,器件内部温升速率呈现出"快速-缓慢-急剧"的趋势.当器件局部温度足够高时(2000 K),该位置热电子发射与温度升高形成正反馈,导致温度急剧升高直至烧毁.栅极靠近源端的柱面处是由于热积累最易发生熔融烧毁的部位,严重影响器件的特性和可靠性.随着脉宽的增加,损伤功率阈值迅速减小而损伤能量阈值逐渐增大.通过数据拟合得到脉宽τ与损伤功率阈值P和损伤能量阈值E的关系.     

双极型晶体管在强电磁脉冲作用下的瞬态响应

 利用时域有限差分法,对双极型晶体管在强电磁脉冲作用下的瞬态响应进行了2维数值模拟,分析了器件烧毁过程中电场、电流密度、温度等参数的分布及变化情况,分别观察了低电压和高电压脉冲作用下烧毁过程中热点的形成过程,并得到了器件烧毁所需时间以及能量与脉冲电压幅度之间的关系。在电压脉冲较低时,烧毁点位于通道中靠近集电极的位置,当脉冲电压达到一定幅度的时候,由于发射极与集电极之间发生雪崩击穿,基极和发射极之间电势会抬高,从而引起基极和发射极之间的击穿,形成新的热点,并在电压幅度约高于100 V的情况下会率先达到烧毁温度。随着脉冲电压幅度的增高,晶体管烧毁所需时间呈负指数减少,而所需能量在55~100 V之间接近于线性增长,直到电压幅度约高于100 V时才开始减少。     

场致发射的温度效应对微波管爆炸电子发射的影响

为研究场致发射的温度效应对微波管中爆炸电子发射过程的影响,在对比分析低温条件下的场致发射电流密度Fowler-Nordheim（FN）和一般的电子发射电流密度积分公式的基础上,利用细长圆柱形微凸起模型,重点考虑焦耳加热和热传导两个因素,编程计算得到了微凸起内部的温度分布和不同位置处温度随时间的变化。结果表明:场致发射的温度效应是一个重要影响因素,考虑温度对场致发射的影响后,微凸起内部各点的温度随时间呈非线性增长,且增长速率越来越大;在微波电场强度较弱时,若不考虑场致发射的温度效应而直接用FN公式表示的电流密度代入计算,会使爆炸发射延迟时间变短;当微波电场很强时,温度效应对爆炸发射延迟时间的影响则较小。     

双极晶体管在强电磁脉冲作用下的损伤效应与机理

针对典型n⁺-p-n-n⁺结构的双极晶体管,从器件内部电场强度、电流密度和温度分布变化的分析出发,研究了在强电磁脉冲(electromagnetic pulse,EMP)作用下其内在损伤过程与机理.研究表明,双极晶体管损伤部位在不同幅度的注入电压作用下是不同的,注入电压幅度较低时,发射区中心下方的集电区附近首先烧毁,而在高幅度注入电压作用下,由于基区-外延层-衬底构成的PIN结构发生击穿,导致靠近发射极一侧的基极边缘处首先发生烧毁.利用数据分析软件,对不同注入电 关键词： 双极晶体管 强电磁脉冲 器件损伤 损伤功率     

On the feasibility of the coulomb explosion of a metal

The mechanism of the Coulomb explosion of a metal in an external pulsed electric field is discussed. In the case of a low-frequency field, when its frequency is lower than the frequency of electron collisions, it is impossible to reach the conditions of the Coulomb explosion of a metal if the field pulse duration is shorter than the time of electron energy relaxation upon elastic collisions, and the electron temperature is well above the Fermi energy and the work function. In the case of a high-frequency field, e.g., in a powerful pulse of ultraviolet laser radiation, the Coulomb explosion can occur if the field strength is well above the intraatomic field strength (i.e., when the laser power density is ≥10¹⁹ W/cm²).     

Analysis of tokamak plasma confinement modes using the fast Fourier transformation

The Fourier analysis is a satisfactory technique for detecting plasma confinement modes in tokamaks. The confinement mode of tokamak plasma was analysed using the fast Fourier transformation (FFT). For this purpose, we used the data of Mirnov coils that is one of the identifying tools in the IR-T1 tokamak, with and without external field (electric biasing), and then compared it with each other. After the Fourier analysis of Mirnov coil data, the diagram of power spectrum density was depicted in different angles of Mirnov coils in the ‘presence of external field’ as well as in the ‘absence of external field’. The power spectrum density (PSD) interprets the manner of power distribution of a signal with frequency. In this article, the number of plasma modes and the safety factor q were obtained by using the mode number of q = m /n (m is the mode number). The maximum MHD activity was obtained in 30–35 kHz frequency, using the density of the energy spectrum. In addition, the number of different modes across 0–35 ms time was compared with each other in the presence and absence of the external field.     

基极注入强电磁脉冲对双极型晶体管的作用

 空间电磁脉冲注入硅双极型晶体管后可能会导致晶体管烧毁。借助2维数值仿真和理论分析研究了基极注入短电磁脉冲对双极型晶体管的作用，得出结论：晶体管的热斑位于基极边缘，由于该点既是电场峰所在,又是电流最密集之处，热量产生集中，因此基极注入脉冲使晶体管烧毁所需的能量比其它两电极注入要少；在基极注入短脉冲作用下，晶体管烧毁所需能量几乎不随脉冲宽度变化；烧毁所需脉冲功率近似与脉冲宽度成反比。     

水中微弱光散射布里渊频谱选择性光放大研究

提出利用布里渊放大技术对水中微弱光散射信号进行频谱选择性光放大的方法.根据频率失谐布里渊放大理论模型，分析了Stokes种子光的线宽及频率失谐对布里渊放大的影响，研究了种子光放大率随水温及其功率密度变化的规律，理论和实验符合较好.研究表明，相同频率失谐时，线宽较大的种子光信号放大率更高.选取20℃的CS₂为放大介质，不同温度海水产生的Stokes种子光信号均能得到有效的布里渊放大.相同抽运光功率密度情况下，种子光的放大率随其功率密度的增加而减小，当种子光能量约为5μJ时，其放大率达10²以上.     

Preparation and field emission properties of carbon nanotubes cold cathode using melting Ag nano-particles as binder

A new preparation process for carbon nanotubes (CNTs) cold cathode was studied through the replacement of traditional organic or inorganic binder with Ag nano-particles. This method has the advantages of low preparation temperature and fine electrical contact between CNTs paste and substrate. A mixture paste of CNTs, Ag nano-particles and other organic solvents was spreaded on Si substrate. By melting and connecting of Ag nano-particles after sintered 30 min at 250 °C, a flat CNTs films with good field emission properties was obtained. The measurements reveal that the turn on electric field and the threshold electric field of as-prepared CNTs cathode are 2.1 and 3.9 V/μm respectively and the field emission current density is up to 41 mA/cm² at an applied electric field of 4.7 V/μm.     

On the harmonic analysis of non-linear dielectric effects

We investigate the nonlinear dielectric effects in a polar viscous liquid, propylene carbonate, by analyzing the voltage and current traces obtained for a sinusoidal electric field at a frequency of 1 kHz and field amplitudes as high as 162 kV/cm. The main source of non-linear behavior results from the energy absorbed from the field and is understood quantitatively. However, there is a qualitative difference in the behavior of the field induced change, Δε^′′(E), and the third harmonic amplitude of the current, I_3ω. Although both Δε^′′(E) and I_3ω are considered reliable measures of non-linear behavior, we show here that the third harmonic signal reflects only those non-linear responses that are instantaneous on the time scale of the test frequency.     

HIFU治疗中换能器驱动电功率变化机制及规律*

高强度聚焦超声(HIFU)治疗中的驱动电功率对治疗效率起着非常关键的作用,驱动电功率控制的精准性势必会影响治疗的效率和安全性。前期研究表明：HIFU治疗过程中焦域瞬态物理特性的变化会导致换能器的负载阻抗发生变化,进而影响HIFU驱动电功率,但驱动电功率与焦域瞬态物理特性之间的影响关系及规律尚不明确。该文基于电压、电流传感器、空化检测探头和温度传感器等器件,构建了一种HIFU治疗中驱动电功率实时监测及焦域声空化、温度检测系统。基于该实验研究系统,以离体牛心组织作为HIFU辐照对象,分别研究了HIFU焦域温度变化、声空化及组织损伤与驱动电功率之间的变化关系及规律。研究结果表明：当焦域温度升高时,驱动电功率缓慢上升,驱动电功率与温度变化有良好的相关性;当空化产生时,驱动电功率出现明显的波动;当组织出现损伤时,驱动电功率呈陡然下降的变化。三种情景下,驱动电功率变化有明显区别,这有望为区分HIFU治疗过程中焦域处发生损伤和空化以及实时监测靶组织损伤程度提供一种新的解决方案。     

S波段大间隙速调管放大器输出腔的3维模拟

 利用3维高频软件设计了一种用于S波段大间隙速调管的膜片加载大间隙单重入输出腔,建立了带大耦合孔的输出腔3维全结构模型,采用3维PIC程序对输出腔的提取效果进行了粒子模拟。研究结果表明：膜片加载的大间隙单重入输出腔开大耦合孔后,其所有谐振频点的场分布都不再是TM ₀₁₁模式,因此,在设计此类输出腔时不能以工作频点是否谐振为优化目标。提出了大间隙输出腔设计原则,根据设计原则优化后的输出腔可稳定提取1.07 GW的平均功率,提取效率约35.7%。