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通过对仅有单层介电薄膜双液体变焦透镜模型的相关理论分析,得出介电层薄膜的厚度及均匀性对双液体变焦透镜的性能影响很大,并绘制了双液体变焦透镜焦距与驱动电压、介电层厚度的关系曲线.在此基础上,以降低双液体变焦透镜的驱动电压为目的,对介电层的选择进行了分析,选择既可充当介电层又可充当疏水层的派瑞林材料作为双液体变焦透镜的介电层材料,通过真空蒸发镀膜工艺得到了合适厚度的介电层派瑞林薄膜,并对所镀薄膜表面形貌以及厚度进行了测试.选择氯化钾以及溴代十二烷作为导电液体和油性液体,利用离心方式除去液体中溶有的气体,进而制作完成双液体变焦透镜样品.电驱变焦实验得到低压双液体变焦透镜样品的变焦范围为±20mm,驱动电压约为30V,对于实验过程中出现的迟滞效应,通过对杨氏方程中引入摩擦力项,合理地解释了其原因. 相似文献
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双层介电薄膜结构双液体变焦透镜的研究 总被引:1,自引:0,他引:1
在双层介电薄膜结构双液体变焦透镜模型的基础上,分析了透镜焦距与外加电压、双层介电薄膜的介电常量、薄膜厚度等参量的关系.并以降低双液体变焦透镜驱动电压为目的,选择了相对介电常量较高的五氧化二钽薄膜作为内层介电层,相对介电常量较低的防水层为外层介电层,分析了双层介电薄膜的厚度以及厚度的匹配对双液体变焦透镜的变焦范围和驱动电压的影响,在保证一定的变焦范围并尽可能降低透镜驱动电压情况下获得最佳透镜工艺参量.模拟结果表明:疏水层薄膜厚度比高介电层薄膜厚度小很多时,双液体变焦透镜可实现低压驱动,且双液体变焦透镜在一定变焦范围内所需驱动电压可下降到10V以下,而疏水层薄膜厚度与高介电层薄膜厚度相当或高于高介电层薄膜厚度都不能有效利用高介电薄膜的高介电性能来降低双液体变焦透镜的驱动电压. 相似文献
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在电磁场仿真计算的辅助下,为8SJ45J型示波管中单透镜的电势分布建立了简化模型,利用该模型可以得到单透镜的简正焦距随聚焦/加速电压比的变化关系,并在已有的仿真计算数据基础上拟合出焦距经验公式.运用这一经验公式并结合简正主点的性质证明了单透镜存在两种使电子束聚焦的电压比,在这两种电压比下聚焦系统形成的静电透镜完全等效. 相似文献
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为提高NBI系统的稳定运行参数和可靠性,研制了一台基于高频开关电源技术的全固态调制输出负高压测试电源,并将HL-2A装置NBI系统原4套抑制极电源的电子管调制器改为基于IGBT串联技术的全固态调制器.对比原抑制极电源系统,给出了基于高频开关技术和IGBT串联技术的抑制极电源结构.结合NBI系统调试实验,通过调节抑制极电源电压,瞬态电流输出能力,分析了抑制极电源输出性能对离子源束流引出特性,离子源引出电极击穿特性的影响,获得了引出稳定离子束流的最低抑制电压. 相似文献
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研制了一台用于Neutral Particle Analyzer(NPA)标定系统的高频离子源,对其性能参数进行了实验测量,得到引出束流与高频振荡器板压、引出电压及放电气压之间的特性曲线,对影响引出束流稳定性的原因进行了分析.结果表明:当工作气体为氢气,在板压580 V、引出电压1600 V、聚焦电压1550 V和气压9.5×10~(-4) Pa时,能引出66μA的离子流;在41μA束流条件下,4小时内的束流稳定性优于2.6%,影响束流稳定性的主要因素是放电管内工作气体气压的波动和等离子体温度的升高.此结果可以满足HL-2A/M上NPA系统的标定对离子源的要求. 相似文献
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P.A.Závodszky B.Arend D.Cole J.DeKamp M.Doleans G.Machicoane F.Marti P.Miller J.Moskalik W.Nurnberger J.Ottarson M.Steiner J.Stetson J.Vincent X.Wu A.Zeller Q.Zhao 《中国物理 C》2007,31(Z1):18-22
Since the last ECR Workshop,NSCL/MSU has been involved in a vigorous ECR ion source R&D program,which resulted in the construction of an off-line test ECR ion source(ARTEMIS-B)for new beam development and ion optics studies.Also the design and partial completion of a 3rd generation,fully superconducting ECR ion source,SuSI has been accomplished.This paper is an overview of the construction projects and the different R&D activities performed with the existing ion sources.These activities include development of metallic ion beam production methods using evaporation with resistive and inductive ovens and sputtering of very refractory metals.Ion optics developments include testing different focusing elements(magnetic solenoid lens,electrostatic quadrupole triplet lens,Einzel lens,electrostatic double doublet quadrupole combined with an octupole lens),and different beam forming and diagnostics devices.The detailed results will be presented at the workshop in separate talks and posters. 相似文献
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D C Weisser N R Lobanov P A Hausladen L K Fifield H J Wallace S G Tims E G Apushkinsky 《Pramana》2002,59(6):997-1006
The beam optics of a multi-sample sputter ion source, based on the NEC MCSNICS, has been modified to accommodate cathode voltages
higher than 5 kV and dispenses with the nominal extractor. The cathode voltage in Cs sputter sources plays the role of the
classical extractor accomplishing the acceleration of beam particles from eV to keV energy, minimizing space charge effects
and interactions between the beam and residual gas. The higher the cathode voltage, the smaller are these contributions to
the emittance growth. The higher cathode voltage also raises the Child’s law limit on the Cs current resulting in substantially
increased output. The incidental focusing role of the extractor is reallocated to a deceleration Einzel lens and the velocity
change needed to match to the pre-acceleration tube goes to a new electrode at the tube entrance. All electrodes are large
enough to ensure that the beam fills less than 30% of the aperture to minimize aberrations. The improvements are applicable
to sputter sources generally. 相似文献
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根据离子束生物工程的需要,设计和研制了一台用于静电加速器的小型高频离子源。针对使用环境从理论上确定了离子源的结构和尺寸。通过实验调试取得了引出束流与引出电压、聚焦电压以及放电气压之间的变化特性曲线,测定了引出束流的束径包络,对束流的不稳定性进行了分析,在设计中采取了有效的措施抑制束流不稳定性。结果表明,离子源的最佳工作条件为引出电压1 600V~1 800V,放电气压在(4~8)×10-4Pa范围,此时离子源可引出最大束流30μA。束流大小及其稳定性均达到预期要求。 相似文献
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The relation between magnetic field topography and operating voltage is investigated in a 1kW Hall thruster discharge channel in order to focus the ion beam effectively and optimize the performance. The curvature of magnetic field line (α) is introduced to characterize the differences of topologies. The optimized magnetic field distribution under each operating voltage is obtained by experiment. Through the curvature transformation, we find that the area of (α > 1) in the channel gradually decreases with the increase of the operating voltage. In response to the results above, two dimensional plasma flows are simulated employing Particle‐in‐Cell method. The distributions of the electric potential, ion density and ion radial velocity are calculated to understand the important influence of the relation above on ion beam focusing. The numerical results indicate that magnetic field curvature and thermal electric field control the ion beam in the ionization and acceleration zone, respectively. The magnetic field topography and discharge voltage interact with each other and together form the focusing electric field. The ion radial mobility is suppressed effectively and the ion beam is focused to the channel centerline. In addition, for a given voltages, when the area of (α > 1) is larger than the optimal scope, the electric potential lines excessively bend to the anode causing ion over focus; contrarily, the electric potential lines will bend to the exit and defocus ions. All these results suggest the relation between magnetic field topography and discharge voltage is important to the ion radial flow control and performance optimization of the Hall thruster (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
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根据离子束生物工程的需要,设计和研制了一台用于静电加速器的小型高频离子源。针对使用环境从理论上确定了离子源的结构和尺寸。通过实验调试取得了引出束流与引出电压、聚焦电压以及放电气压之间的变化特性曲线,测定了引出束流的束径包络,对束流的不稳定性进行了分析,在设计中采取了有效的措施抑制束流不稳定性。结果表明,离子源的最佳工作条件为引出电压1 600V~1 800V,放电气压在(4~8)×10-4Pa范围,此时离子源可引出最大束流30μA。束流大小及其稳定性均达到预期要求。 相似文献
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曹建勇 魏会领 刘鹤 邹桂清 杨宪福 张贤明 唐立新 罗萃文 余佩炫 耿少飞 周红霞 周博文 李青 何峰 罗怀宇 周健 任磊磊 潘春花 黄高扬 雷光玖 饶军 段旭如 《强激光与粒子束》2018,30(10):106001-1-106001-9
为开展磁约束堆芯燃烧等离子体物理实验,正在建造的HL-2M装置拟建造3条5 MW的中性束注入加热束线。简要概述了HL-2M装置NBI加热系统的总体规划,第1条5MW-NBI加热束线的设计,离子源调试实验,注入器核心部件的安装和测试结果。通过调试,目前单个离子源引出束流达到36 A,加速电压75 kV,离子束功率达到2.4 MW,脉冲宽度3 s。通过测试发现:注入器的4条离子束汇聚角误差小于±0.1°,残留离子偏转磁体的磁场测试值与模拟计算值偏差小于±5%,注入器静态真空值达到1.0×10-3 Pa。注入器采用大型非标低温泵,低温泵的抽速达到2.40×106 L/s。第1条5MW-NBI加热束线的试装和测试结果表明,该束线能够满足HL-2M装置NBI加热的技术要求。 相似文献
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RF离子源引出特性的研究 总被引:1,自引:1,他引:0
为了使RF离子源具有良好的引出特性,测试了吸极几何参数、振荡器板压和引出电压对离子源聚焦度的影响,对实验结果进行了分析。在其它参数不变的情况下,吸极的外径D与内径d之比存在最佳值,增加D/d,有利于过聚焦的离子束恢复聚焦状态。吸极的长度为L,石英套管比吸极长l。当l/D增大时,聚焦度上升,引出束流下降。L/d之比减小时,聚焦度增大。当L/d小于4时,聚焦度增加趋势变缓。综合考虑聚焦度、引出束流和气压,D/d,l/D,L/d适宜的选择范围分别为1.6~2.1,0.7~1.1,4~7。增加振荡器功率会使离子束呈弱聚焦,而增加引出电压会使离子束呈过聚焦。振荡器功率和引出电压都存在最佳值。 相似文献
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为EAST 装置中性束注入器设计了一套用于将剩余离子在线电偏转的结构,并对系统各设备的核心参数进行了估算。在4.41kV 偏转电压作用下,该电偏转系统可提供80keV 氘离子束偏转所需的偏转电场。在偏转电场调制情况下,该电偏转系统可有效降低极板表面的热负荷,进而满足EAST 中性束注入器稳态运行的需要。 相似文献
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为EAST装置中性束注入器设计了一套用于将剩余离子在线电偏转的结构,并对系统各设备的核心参数进行了估算。在4.41kV偏转电压作用下,该电偏转系统可提供80keV氘离子束偏转所需的偏转电场。在偏转电场调制情况下,该电偏转系统可有效降低极板表面的热负荷,进而满足EAST中性束注入器稳态运行的需要。 相似文献
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The scattering and focusing characteristics of a Gaussian beam with phase distribution is studied by a stepped index Luneberg lens. A model experiment was performed using a six-layer spherical lens. Two kinds of beams, that is, broad and narrow beam are examined for the incident Gaussian beam. We find that focusing effect of a narrow beam is wholly lower than that of a broad beam. The focal point is also shifted toward outer of sphere because of phase lag for the beam source. The spot size equals almost the wavelength for the various beam parameters. 相似文献