在线同位素分离器激光离子源的元素选择性和激光技术

分析了目前在线同位素分离器改进的必要性和可能性.介绍了激光多步共振电离原理和激光离子源原理.具体分析了热毛细管式激光离子源元素选择性的产生及其影响的因素.描述了所使用的激光器和激光技术.对热毛细管式的激光离子源作了元素选择性实验,结果表明该离子源的元素选择性达到了50─10000.     

ECR离子源束流引出与传输的研究

针对ECR离子源的束流引出及传输研究，在中国科学院近代物理研究所的LECR3离子源实验平台上开展了大量的实验. 实验中研究了等离子体电极引出孔径、反射电极(抑制电极)偏压以及Glaser透镜等因素对束流引出与传输的影响. 研究的重点是试图通过系列实验与分析来研究如何能更有效地引出强流离子束流并减小其在传输空间的损失. 给出了实验的主要结果，结合这些数据对ECR离子源的束流引出与传输进行了较全面的分析，并综合这些实验结果与分析结果得出了该物理过程的一般物理图像.     

Penning型负氢离子源诊断

 为了给小型医用回旋加速器提供负氢离子,研制了一台Penning型负氢离子源。采用发射光谱法对该负氢离子源进行了诊断,同时结合离子源功率变化对离子源工作状态进行了分析。实验测量了不同氢气流量、离子源弧流及磁场条件下,该离子源等离子体氢原子巴尔末系中前三条谱线的相对光强和离子源功率变化,分析了不同工作条件对离子源工作状态的影响。结果表明：在可调节范围内,该离子源的工作状态主要受氢气流量的影响,对离子源弧流及磁场的变化不敏感。     

ECR离子源束流发射度的实验研究

利用最新自行研制的电扫描发射度探测系统, 在ECR离子源上进行了一系列关于ECR离子源引出束流发射度的研究. 这套电扫描发射度探测系统安装在中国科学院近代物理研究所(兰州)的LECR3试验平台的束运线上. 试验中, 通过测量相关参数, 研究了磁场、微波、掺气效应及负偏压效应等对引出束流发射度的影响. 利用实验所得的结果与关于ECR等离子体和离子源束流发射度的半经验理论, 分析推导了离子源各可调参数与ECR等离子体的直接关系, 这为分析探索ECR离子源的工作机制提供了一定的参考依据.     

不同磁路电子回旋共振离子源引出实验

空间推进所用的电子回旋共振离子源(ECRIS)应具有体积小、效率高的特点. 本文研究的ECRIS使用永磁体环产生磁场, 有效减小了体积, 该离子源利用微波在磁场中加热电子, 电子与中性气体发生电离碰撞产生等离子体. 磁场在微波加热电子的过程中起关键作用, 同时影响离子源内等离子体的约束和输运. 通过比较四种磁路结构离子源的离子电流引出特性来研究磁场对10 cm ECRIS性能的影响. 实验发现: 在使用氩气的条件下, 特定结构的离子源可引出160 mA的离子电流, 最高推进剂利用率达60%, 最小放电损耗为120 W·A^-1; 所有离子源均存在多个工作状态, 工作状态在微波功率、气体流量、引出电压变化时会发生突变. 离子源发生状态突变时的微波功率、气体流量的大小与离子源内磁体的位置有关. 通过比较不同离子源的引出离子束流、放电损耗、气体利用率、工作稳定性的差异, 归纳了磁场结构对此种ECRIS引出特性的影响规律, 分析了其中的机理. 实验结果表明: 保持输入微波功率、气体流量、引出电压不变时, 增大共振区的范围、减小共振区到栅极的距离, 离子源能引出更大的离子电流; 减小共振区到微波功率入口、气体入口的距离能降低维持离子源高状态所需的最小微波功率和最小气体流量, 提高气体利用率, 但会导致放电损耗增大. 研究结果有助于深化对此类离子源工作过程的认识, 为其设计和性能优化提供参考.     

毛细管式的靶–离子源系统在线实验研究

讨论了在线同位素分离器使用激光离子源的必要性,分析研究了毛细管式激光离子源对电离器的要求及热毛细管电离器的工作原理,并给出了在线实验的结果.为了在较低温度下形成等离子体鞘势和降低热电离效率,采用了低电子逸出功的耐高温材料Nb作毛细管材料.在线实验获得成功,使用毛细管式的靶–离子源的在线同位素分离器的总效率约达0.2%,满足了激光离子源电离器和靶室的工作要求.     

利用密度反馈实现离子源长脉冲放电

 介绍了等离子体密度对离子源放电的影响,为了获得长脉冲放电,采用朗缪尔探针测量等离子体密度并反馈调节离子源放电。基于朗缪尔探针测量,设计了控制部分硬件与软件构架,建立了离子源等离子体密度反馈控制系统,并成功地应用于离子源等离子体放电实验,通过反馈调节实验进气,得到了长达4.5 s的长脉冲放电,为中性束注入稳态运行提供了依据。     

强流离子源新型LaMo阴极实验研究

对从美国购进的强流离子源新型LaMo阴极的发射特性以及用于强流离子源阴极的放电性能进行了测试.实验结果表明了LaMo阴极是一种有效的热阴极发射体,且该阴极用于强流离子源时,离子源工作稳定,放电起弧正常,使用寿命大大延长(相对于LaB₆阴极).从实际应用来看,LaMo阴极确是强流离子源的一种有效的新型阴极.     

磁场引起的潘宁离子源阻抗变化研究

以11 MV回旋加速器潘宁离子源作为研究对象,通过调节磁场强度研究了磁场对工作在弧放电模式下的潘宁离子源的影响规律,深入分析了该放电模式下的放电自持机制、磁场引起的阻抗变化规律、异常发光现象。实验在6 mL/min氢气流量下,保持离子源弧流不变,调节磁场强度,记录磁场强度对弧压的影响。实验结果表明:二次电子发射机制与热电子发射机制在潘宁源自持放电过程中发挥了同样重要的作用;在强磁场情况下离子源阻抗受到磁场变化影响不大,在磁场小于0.15 T时磁场的作用才变得明显;当磁场减弱至等离子体进入阻抗增长区后,存在一段等离子体剧烈放电、光强突然增加的区域。在实验的基础上,得到了设计潘宁源的启发,并分析了磁场对等离子体电导率影响的微观物理机制,这些有助于研制或使用工作在弧放电模式下的潘宁离子源。     

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介绍了一种广泛应用于离子刻蚀、预清洗和离子束辅助镀膜的阳极层离子源的工作原理,分析了磁场对其性能的影响。给出了线性阳极层离子源磁路的设计。采用ANSYS有限元分析软件对线性阳极层离子源的静态电磁场进行了模拟分析,并与实验结果进行了比较,结果令人满意。通过ANSYS编码对电磁场模拟,可为具体的阳极层离子源的改进设计提供指导。     

医用加速器装置的离子源进气系统控制

HIMM是国产自主研发的医用加速器装置,作为目前最大的医学放疗装置,整个加速器控制系统的稳定性和可靠性要比工业系统有更高的要求。离子源针阀是离子源产生束流的重要组件,气体流量的大小和混合比直接影响源体真空度、电离效率、离子源稳定性等。本文针对HIMM离子源进气系统设计了基于三菱伺服电机和菲尼克斯PLC的控制系统,从系统结构、硬件设计、软件设计、数据分析等方面进行了介绍。为保证系统稳定性,加入伺服驱动器与相关真空度的硬连锁和远程开关功能。经过实际测试,该系统运行稳定,定位精度可达0.1?,满足设计要求。     

Simulation of electron behavior in PIG ion source for 9 MeV cyclotron

In this paper, we focus on a PIG source for producing intense H-ions inside a 9 MeV cyclotron. The properties of the PIG ion source were simulated for a variety of electric field distributions and magnetic field strengths using a CST particle studio. After analyzing the secondary electron emission (SEE) as a function of both magnetic and electric field strengths, we found that for the modeled PIG geometry, a magnetic field strength of 0.2 T provided the best results in terms of the number of secondary electrons. Furthermore, at 0.2 T, the number of secondary electrons proved to be greatest regardless of the cathode potential. Also, the modified PIG ion source with quartz insulation tubes was tested in a KIRAMS-13 cyclotron by varying the gas flow rate and arc current, respectively. The capacity of the designed ion source was also demonstrated by producing plasma inside the constructed 9 MeV cyclotron. As a result, the ion source is verified as being capable of producing an intense H^- beam and high ion beam current for the desired 9 MeV cyclotron. The simulation results provide experimental constraints for optimizing the strength of the plasma and final ion beam current at a target inside a cyclotron.     

回流离子对强流相对论电子束传输的影响

 介绍了采用双膜法测量神龙一号直线感应加速器靶区回流离子效应的实验工作,通过一片厚度数十μm的靶膜产生回流离子,并采用基于光学渡越辐射的电子束剖面测量系统记录时间分辨的束斑,首次证实了神龙一号加速器靶区存在回流离子。通过采用不同材料的靶膜,实验观测到了不同离子发射情况下回流离子对强流相对论电子束传输的影响,结果发现采用金属靶膜时,回流离子导致电子束部分汇聚、部分发散,而采用聚合物薄膜时,回流离子会导致电子束剖面出现剧烈的变化。     

供水温度对CO2空气源热泵系统性能的影响

为探究热泵供水温度对CO2空气源热泵系统性能的影响,保持室外环境温度15.5℃不变,调节热泵供水温度,测试冷却水流量、气冷器出水温度、压缩机排气温度、气冷器CO2进出口温差、压缩机排气压力、压缩机耗功量、系统制热量、气冷器热交换完善度、系统COP的变化情况。结果表明:供水温度由45℃升至85℃,气冷器出水温度、压缩机排气温度、气冷器CO2进出口温差、压缩机排气压力随之增加,冷却水流量随之减小。系统制热量增加了7.3%、气冷器热交换完善度下降了20.0%、系统COP下降了35%、压缩机功耗增加了65.1%。     

射频聚焦离子源熔石英高确定去除特性研究

在离子束抛光工艺过程中，材料确定性去除特性对预测光学元件的各工位材料去除量和驻留时间具有极其重要的作用。采用射频离子源对熔石英光学元件的离子束刻蚀特性进行了研究，利用ZYGO激光干涉仪获得准确的去除函数，系统分析了气体流量、屏栅电压、离子束入射角和工作距离等因素对熔石英去除函数的影响，并分析了各单一工艺因素微小扰动时，材料峰值去除率、半高宽和体积去除率的相对变化率。实验结果表明，相同工作真空条件下，工作气体质量流量的微小变化对去除函数影响极小，在典型的工艺条件下，屏栅电压在±5 V、离子束入射角±1°、工作距离在±0.5 mm范围内变化时，熔石英峰值去除率、体积去除率和峰值半高宽的相对变化均小于5%，去除函数具有较好的确定性和稳定性。     

Discharge and emission parameters of a plasma electron source based on a discharge in crossed E × H fields with various cathode materials

The possibility of using a plasma electron source (PES) with a discharge in crossed E × H field for compensating the ion beam from an end-Hall ion source (EHIS) is analyzed. The PES used as a neutralizer is mounted in the immediate vicinity of the EHIS ion generation and acceleration region at 90° to the source axis. The behavior of the discharge and emission parameters of the EHIS is determined for operation with a filament neutralizer and a plasma electron source. It is found that the maximal discharge current from the ion source attains a value of 3.8 A for operation with a PES and 4 A for operation with a filament compensator. It is established that the maximal discharge current for the ion source strongly depends on the working gas flow rate for low flow rates (up to 10 ml/min) in the EHIS; for higher flow rates, the maximum discharge current in the EHIS depends only on the emissivity of the PES. Analysis of the emission parameters of EHISs with filament and plasma neutralizers shows that the ion beam current and the ion current density distribution profile are independent of the type of the electron source and the ion current density can be as high as 0.2 mA/cm² at a distance of 25 cm from the EHIS anode. The balance of currents in the ion source-electron source system is considered on the basis of analysis of operation of EHISs with various sources of electrons. It is concluded that the neutralization current required for operation of an ion source in the discharge compensation mode must be equal to or larger than the discharge current of the ion source. The use of PES for compensating the ion beam from an end-Hall ion source proved to be effective in processes of ion-assisted deposition of thin films using reactive gases like O₂ or N₂. The application of the PES technique makes it possible to increase the lifetime of the ion-assisted deposition system by an order of magnitude (the lifetime with a Ti cathode is at least 60 h and is limited by the replacement life of the deposited cathode insertion).     

Neutralization of an ion beam from the end-Hall ion source by a plasma electron source based on a discharge in crossed E × H fields

The possibility of using a plasma electron source (PES) with a discharge in crossed E × H field for compensating the ion beam from an end-Hall ion source (EHIS) is analyzed. The PES used as a neutralizer is mounted in the immediate vicinity of the EHIS ion generation and acceleration region at 90° to the source axis. The behavior of the discharge and emission parameters of the EHIS is determined for operation with a filament neutralizer and a plasma electron source. It is found that the maximal discharge current from the ion source attains a value of 3.8 A for operation with a PES and 4 A for operation with a filament compensator. It is established that the maximal discharge current for the ion source strongly depends on the working gas flow rate for low flow rates (up to 10 ml/min) in the EHIS; for higher flow rates, the maximum discharge current in the EHIS depends only on the emissivity of the PES. Analysis of the emission parameters of EHISs with filament and plasma neutralizers shows that the ion beam current and the ion current density distribution profile are independent of the type of the electron source and the ion current density can be as high as 0.2 mA/cm² at a distance of 25 cm from the EHIS anode. The balance of currents in the ion source-electron source system is considered on the basis of analysis of operation of EHISs with various sources of electrons. It is concluded that the neutralization current required for operation of an ion source in the discharge compensation mode must be equal to or larger than the discharge current of the ion source. The use of PES for compensating the ion beam from an end-Hall ion source proved to be effective in processes of ion-assisted deposition of thin films using reactive gases like O₂ or N₂. The application of the PES technique makes it possible to increase the lifetime of the ion-assisted deposition system by an order of magnitude (the lifetime with a Ti cathode is at least 60 h and is limited by the replacement life of the deposited cathode insertion).     

Study on collimation and shielding of the back-streaming neutrons at the CSNS target

The back-streaming neutrons from the spallation target at CSNS are very intense, and can pose serious damage problems for the devices in the accelerator-target interface region. To tackle the problems, a possible scheme for this region was studied, namely a specially designed optics for the proton beam line produces two beam waists, and two collimators are placed at the two waist positions to maximize the collimation effect of the back-streaming neutrons. Detailed Monte Carlo simulations with the beams in the two different CSNS phases show the effectiveness of the collimation system, and the radiation dose rate decreases largely in the interface section. This can ensure the use of epoxy coils for the last magnets and other devices in the beam transport line with reasonable lifetimes, e.g., thirty years. The design philosophy for such an accelerator-target interface region can also be applicable to other high-power proton beam applications.     

Gas pressure regulation in a r.f. ion source

An experimental technique by which devterium gas pressure in a radio frequency ion source is automatically controlled and maintained to its initial set value is described. The accuracy achieved is ± 0.5 μ in about 5 μ gas pressure being used in the r.f. ion source of the neutron generator of this laboratory.