Radiation‐induced fabrication of polymer nanoporous materials from microphase‐separated structure of diblock copolymers as a template

Polymer nanoporous materials with periodic cylindrical holes were fabricated from microphase‐separated structure of diblock copolymers consisting of a radiation‐crosslinking polymer and a radiation‐degrading polymer through simultaneous crosslinking and degradation by γ‐irradiation. A polybutadiene‐block‐poly(methyl methacrylate) (PB‐b‐PMMA) diblock copolymer film that self‐assembles into hexagonally packed poly(methyl methacrylate) cylinders in polybutadiene matrix was irradiated with γ‐rays. Solubility test, IR spectroscopy, and TEM and SEM observations for this copolymer film in comparison with a polystyrene‐block‐poly(methyl methacrylate) diblock copolymer film revealed that poly(methyl methacrylate) domains were removed by γ‐irradiation and succeeding solvent washing to form cylindrical holes within polybutadiene matrix, which was rigidified by radiation crosslinking. Thus, it was demonstrated that nanoporous materials can be prepared by γ‐irradiation, maintaining the original structure of PB‐b‐PMMA diblock copolymer film. © 2007 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 45: 5916–5922, 2007     

Surface patterned graft copolymerization of hydrophilic monomers onto hydrophobic polymer film upon UV irradiation

A random copolymer [p(MMA/DMAB)] composed of methyl methacrylate (MMA) and 2,2‐dimethoxy‐1,2‐di(4‐methacryloyloxy)phenylethane‐1‐one (DMAB), which can simultaneously act as a photoradical initiator and crosslinkable monomer, was prepared by free radical random copolymerization. A hydrophobic film on quartz glass was prepared using p(MMA/DMAB) by a spin‐coating technique. Hydrophilic methacrylic acid (MA) and 2‐methacryloyloxyethyl phosphorylcholine (MPC) were graft‐copolymerized from the hydrophobic p(MMA/DMAB) film in water by photo‐cleavage of the DMAB unit. The graft copolymer of MA and MPC was characterized by infrared and X‐ray photoelectron spectroscopies and contact angle measurements. To confirm that MPC can be grafted onto the surface of the film selectively at only UV‐irradiated sites, photoinduced graft copolymerization of MPC using a photomask was performed to prepare a pMPC patterned p(MMA/DMAB) film. The film was stained using a rhodamine 6G dye that can absorb specifically to pMPC to confirm the pMPC pattern. The p(MMA/DMAB) film can be applied to various fields including photolithography and biomedical applications, because the film surface properties can be controlled using various vinyl monomers selectively on UV‐irradiated sites. © 2014 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2014 , 52, 2822–2829     

Image formation by dyeing of copolymers bearing photogenerated acid and base groups with dye bath containing acid and basic dyes

Copolymers bearing photoacid generating groups and/or photobase generating groups were dyed after UV irradiation with a dye bath containing both an acid dye and a basic dye. Acetophenone O‐acryloyloxime (AAPO) was used as a monomer bearing acyloxyimino (AOI) group that generates a primary amino group upon irradiation, which is followed by hydrolysis. Phenacylsulfonylstyrene (PSSt) and 1,2,3,4‐tetrahydronaphthylideneamino p‐styrenesulfonate (NISS) were chosen as monomers having β‐keto sulfone (β‐KS) and iminosulfonate (IS) groups, respectively, which yielded acid groups when irradiated. Copolymers of AAPO and methyl methacrylate (MMA) were dyed with only the acid dye, and those of PSSt or NISS were dyed with only the basic dye after irradiation. AAPO‐PSSt‐MMA films became dyeable with the acid dye when irradiated for a short time and with the basic dye with further irradiation. However, AAPO‐NISS‐MMA copolymers showed the reverse dyeing behavior. IR spectra revealed that AOI groups were photochemically decomposed prior to the β‐KS groups for AAPO‐PSSt‐MMA, and AOI and IS groups decomposed simultaneously for AAPO‐NISS‐MMA. These results suggested the possibility of adsorption of different ionic dyes on the films by a change of irradiation time; in fact, color patterns could be obtained in a single staining process using the dye bath. © 2000 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 38: 3043–3051, 2000     

Image recording material based on the polymeric photobase generator containing oxime‐urethane groups

A polymeric photobase generator containing oxime‐urethane groups was prepared from copolymerization of MMA with N‐[4‐(benzophenoneoximino‐carbonylamino)phenyl]maleimide, a maleimide monomer containing oxime‐urethane group, and its properties as an image recording material were studied. The irradiation of this copolymer with UV light dissociates the urethane linkage to result in the formation of aromatic amino groups, which can be developed by the diazo‐coupling reaction. Various colors could be developed depending on the phenolic coupling reagents as the developer.     

A polymeric photobase generator containing oxime–urethane groups: Crosslinking reaction and application to negative photoresist

A polymeric photobase generator containing oxime–urethane groups was prepared by copolymerization of methyl methacrylate and methacryloxyethyl benzophenoneoxime urethane, and its photo and thermal crosslinking reaction after irradiation was examined from the measurement of UV and IR absorption spectral changes, insoluble fraction, and molecular weight changes. The photo‐crosslinking reaction of the copolymer film was more efficient when irradiations were carried out with 310 nm UV light in the presence of benzophenone than with 254 nm UV light without the addition of benzophenone. The crosslinking reaction increased after postexposure baking (PEB), and this thermal crosslinking reaction mechanism was studied from the identification of the photolysis products of a model compound, benzophenoneoxime phenylurethane, by a high‐performance liquid chromatography. The results indicate that the thermal crosslinking reaction of the copolymer after PEB is due to the formation of urea‐type chemical bonds. Resist properties of the copolymer were examined from the measurement of normalized thickness and micropattern development. A negative tone image with a resolution of 2 μm was obtained with this copolymer, having a sensitivity (D) of 1200 mJ/cm² and contrast (γ_n) of 1.31, when irradiation was carried out with 310 nm UV light in the presence of benzophenone following chloroform development. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 975–984, 2004     

Surface‐confined photopolymerization of single‐ and mixed‐monomer systems to tailor the wettability of poly(L‐lactide) film

The major objective of this research was to modify the surface characteristics of poly(L ‐lactide) (PLA) by grafting a combination of hydrophilic polymers to produce a continuum of hydrophilicity. The PLA film was solvent cast, and the film surfaces were activated by ultra violet (UV) irradiation. A single monomer or combination of two monomers, selected from vinyl acetate (VAc), acrylic acid (AA), and acrylamide (AAm), were then grafted to the PLA film surface using a UV induced photopolymerization process. The film surfaces resulting from each reaction step were analyzed using ATR‐FTIR spectroscopy and contact angle goniometry. Results showed that AAm dominated the hydrophilicity of the film surface when copolymerized with VAc or AA, while the water contact angles for PLA films grafted with poly(vinyl acetate‐co‐acrylic acid) varied more gradually with feed composition. © 2006 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 44: 6534‐6543, 2006     

Structure induced by irradiation of femtosecond laser pulse in dyed polymeric materials

We investigated the structures induced by an irradiation of a near‐infrared (NIR) femtosecond laser pulse in dye‐doped polymeric materials {poly(methyl methacrylate) (PMMA), thermoplastic epoxy resin (Epoxy), and a block copolymer of methyl methacrylate and ethyl acrylate‐butyl acrylate [p(MMA/EA‐BA) block copolymer]}. Dyes used were classified into two types—type 1 with absorption at 400 nm and type 2 with no absorption at 400 nm. The 400‐nm wavelength corresponds to the two‐photon absorption region by the irradiated NIR laser pulse at 800 nm. Type 1 dye‐doped PMMA and p(MMA/EA‐BA) block copolymer showed a peculiar dye additive effect for the structures induced by the line irradiation of a NIR femtosecond laser pulse. On the contrary, dye‐doped Epoxy did not exhibit a dye additive effect. The different results among PMMA, p(MMA/EA‐BA) block copolymer, and Epoxy matrix polymers are supposed to be related to the difference of electron‐acceptor properties. The mechanism of this type 1 dye‐additive‐effect phenomenon for PMMA and p(MMA/EA‐BA) block copolymer is discussed on the basis of two‐photon absorption of type 1 dye at 400 nm by the irradiation of a femtosecond laser pulse with 800 nm wavelength and the dissipation of the absorbed energy to the polymer matrix among various transition processes. Dyes with a low‐fluorescence quantum yield favored the formation of thicker grating structures. © 2002 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 40: 2800–2806, 2002     

Designing superhydrophobic surface based on fluoropolymer–silica nanocomposite via RAFT‐mediated polymerization‐induced self‐assembly

Superhydrophobic surfaces (SHS) find versatile applications as coatings due to their very high water‐repellency, self‐cleaning, and anti‐icing properties. This investigation describes the preparation of a SHS from surfactant‐free hybrid fluoropolymer latex. In this case, reversible addition‐fragmentation chain transfer (RAFT) polymerization was adopted to prepare a copolymer of 4‐vinyl pyridine (4VP) and vinyl triethoxysilane (VTES), where the pyridine units were quaternized to make the copolymer soluble in water. The copolymer was further used as a macro‐RAFT agent to polymerize 2,2,2‐trifluoroethyl methacrylate (TFEMA) in a surfactant‐free emulsion via polymerization‐induced self‐assembly (PISA). The macro‐RAFT agent contained a small amount of VTES as co‐monomer which was utilized to graft silica nanoparticles (SNPs) onto the P(TFEMA) spheres. The film prepared using the nanocomposite latex exhibited a nano‐structured surface as observed by SEM and AFM analyses. Surface modification of the film with fluorinated trichlorosilane produced an SHS with a water contact angle (WCA) of 151.5°. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2018 , 56, 266–275     

Templated synthesis of silver nanoparticles in amphiphilic poly(vinylidene fluoride‐co‐chlorotrifluoroethylene) comb copolymer

In this study, poly(vinylidene fluoride‐co‐chlorotrifluoroethylene)‐graft‐poly(oxyethylene methacrylate), P(VDF‐co‐CTFE)‐g‐POEM, an amphiphilic comb copolymer with hydrophobic P(VDF‐co‐CTFE) backbone and hydrophilic POEM side chains at 73:27 wt % was synthesized. The POEM side chains were grafted from the P(VDF‐co‐CTFE) mainchain backbone via atom transfer radical polymerization (ATRP) using direct initiation of the chlorine atoms in CTFE units. Synthesis of microphase‐separated P(VDF‐co‐CTFE)‐g‐POEM comb copolymer was successful, as confirmed by nuclear magnetic resonance (¹H NMR), FTIR spectroscopy, and transmission electron microscopy (TEM). Nanocomposite films were prepared using the comb copolymer as a template film and the in situ reduction of AgCF₃SO₃ precursor to silver nanoparticles under UV irradiation. Silver nanoparticles with 4–8 nm in average size were in situ created in the solid state template film, as revealed by TEM, UV–visible spectroscopy, and wide angle X‐ray scattering (WAXS). Differential scanning calorimetry (DSC) and thermogravimetric analysis (TGA) presented the selective incorporation and the in situ growth of silver nanoparticles within the hydrophilic POEM domains of microphase‐separated comb copolymer film. © 2008 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 46: 702–709, 2008     

Synthesis of poly(isobutyl‐co‐2,2,2‐trifluoroethyl methacrylate) with 5,10,15,20‐tetraphenylporphinato platinum(II) moiety as an oxygen‐sensing dye for pressure‐sensitive paint

Pressure‐sensitive paint (PSP), which consists of luminescent molecules embedded in an oxygen‐permeable polymer, has been developed for use in wind‐tunnel experiments. To improve the PSP technique, a novel luminescent methacrylate monomer, 5‐[4‐(2‐methacryloyloxyethoxycarbonyl)phenyl]‐10,15,20‐triphenylporphinato platinum(II), was synthesized and copolymerized with isobutyl methacrylate and 2,2,2‐trifluoroethyl methacrylate to produce a dye‐pendant copolymer ( 2 ). The introduction of 5,10,15,20‐tetraphenylporphinato platinum(II) (PtTPP) dye into 2 was confirmed by ultraviolet–visible spectroscopy and extended X‐ray absorption fine structure measurements. The extent of PtTPP dye incorporation in 2 was proportional to the molar fraction of the PtTPP‐pendant methacrylate monomer in the feed. The oxygen‐sensing property of 2 was compared with that of a PSP consisting of PtTPP dye embedded in poly(isobutyl‐co‐2,2,2‐trifluoroethyl methacrylate). Although the simple mixture of PtTPP and poly(isobutyl‐co‐2,2,2‐trifluoroethyl methacrylate) showed a marked deviation from a single Stern–Volmer relation, novel copolymer 2 gave a highly linear Stern–Volmer plot. This was unequivocal evidence of dye conjugation on the oxygen‐sensing polymer film. © 2005Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 43: 2997–3006, 2005     

Luminescent copolymers for applications in multicolor‐light‐emitting devices

Light‐emitting diodes based on organic materials [organic light‐emitting diodes (OLEDs)] have attracted much interest over the past decade. Several different attempts have been made to realize multicolor OLEDs. This article describes a new approach based on energy transfer in a donor/acceptor system. A copolymer containing both donor and acceptor compounds as comonomer units is prepared. The polymer consists of a derivative of a luminescent dye [4‐dicyanmethylene‐2‐methyl‐6‐4H‐pyran (DCM); acceptor compound], which is copolymerized with fluorene (donor compound) to combine the properties of an electroactive polymer with a highly luminescent dye. Photochemical processing is achieved by UV irradiation of this copolymer in the presence of gaseous trialkylsilanes. This reagent selectively saturates the C?C bonds in the DCM comonomer units while leaving the fluorene units essentially unaffected. As a result of the photochemical process, the red electroluminescence of the acceptor compound vanishes, and the blue‐green electroluminescence from the polyfluorene units is recovered. Compared with previous approaches based on polymer blends, this copolymer approach avoids problems associated with phase‐separation phenomena in the active layer of OLEDs. © 2006Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 44: 4317–4327, 2006     

UV‐responsive degradable polymers derived from 1‐(4‐aminophenyl) ethane‐1,2‐diol

A UV‐responsive polymer was prepared via condensation polymerization of 2‐nitrobenzyl(4‐(1,2‐dihydroxyethyl)phenyl)carbamate and azalaic acid dichloride. When the polymer was irradiated with UV light, the nitrobenzyl urethane protecting group was removed and the deprotected aniline underwent spontaneous 1,6‐elimination reactions, resulting in degradation of the polymer. Nanoparticles with encapsulated Nile Red were formulated with the degradable polymer and triggered burst release of Nile Red was observed when the nanoparticles were irradiated by UV light. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015 , 53, 1161–1168     

Facile synthesis and responsive behavior of PDMS‐b‐PEG diblock copolymer brushes via photoinitiated “thiol‐ene” click reaction

We present herein a mild and rapid method to create diblock copolymer brushes on a silicon surface via photoinitiated “thiol‐ene” click reaction. The silicon surface was modified with 3‐mercaptopropyltrimethoxysilane (MPTMS) self‐assembled monolayer. Then, a mixture of divinyl‐terminated polydimethylsiloxane (PDMS) and photoinitiator was spin‐coated on the MPTMS surface and exposed to UV‐light. Thereafter, a mixture of thiol‐terminated polyethylene glycol (PEG) and photoinitiator were spin‐coated on the vinyl‐terminated PDMS‐treated surface, and the sequent photopolymerization was carried out under UV‐irradiation. The MPTMS, PDMS, and PEG layers were carefully identified by X‐ray photoelectron spectroscopy, atomic force microscopy, ellipsometry, and water contact angle measurements. The thickness of the polydimethylsiloxane‐block‐poly(ethylene glycol) (PDMS‐b‐PEG) diblock copolymer brush could be controlled by the irradiation time. The responsive behavior of diblock copolymer brushes treated in different solvents was also discussed. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2012     

Water transport in 2‐hydroxyethyl methacrylate copolymer irradiated by γ rays in air and related phenomena

The water transport in 2‐hydroxyethyl methacrylate copolymer (HEMA copolymer) irradiated by γ rays in air is investigated. The sorption data of deionized water transport in HEMA copolymer subjected to various dosages of γ‐ray irradiation are in excellent agreement with the theoretical model that accounts for case I, case II, and anomalous transport. The diffusion coefficient for case I and the velocity for case II satisfy the Arrhenius equation for all dosage levels. The transport process is exothermic and the equilibrium–swelling ratio satisfies the van't Hoff plot. The studies of the glass transition temperature of the irradiated HEMA copolymer, the pH value of deionized water after irradiation treatment, and the quantitative determination of water structures in the HEMA copolymer hydrogel are helpful in analyzing the irradiation effect on water transport in the HEMA copolymer. The effect of irradiation on the optical properties of the HEMA copolymer is also analyzed. The transmittance of a standard specimen with saturated water is lower than that before the water treatment because of the creation of holes. However, because of the formation of color centers, the color of the copolymer becomes yellow to brown and the UV cutoff wavelength of the HEMA copolymer shifts to the longer wavelength side with increasing irradiation dosage. Some of the color centers can be annihilated after water treatment. The buckled pattern on the outer surface is observed when the HEMA copolymer irradiated by a γ ray in air is immersed in the water. This phenomenon is explained by the inhomogeneous distribution of crosslinking density. © 2000 John Wiley & Sons, Inc. J Polym Sci B: Polym Phys 38: 659–671, 2000     

Photopolymerizations initiated by oxime derivatives

A number of ester, urethane, and carbonate derivatives of biacetyl monooxime, dimethylglyoxime, and ketone oxime, were synthesized and their photolyses studied by means of ultraviolet spectroscopy. Most of the oxime derivatives photolyzed easily upon UV irradiation. Among them, however, only the free radicals formed by photolysis from the ester and carbonate of biacetyl monooxime could effectively initiate the polymerization of a vinyl monomer such as methyl methacrylate. Based on the results obtained from the monomeric reactions, syntheses of grafting polymers were made. Graft polymers were obtained by using a copolymer of methyl methacrylate and methacrylic acid–biacetyl monooxime ester (copolymer I) and that of methyl methacrylate and vinyl benzioc acid–biacetyl monooxime ester (copolymer II) in good yield and without the formation of homopolymer. It was also found that when copolymer I was employed as a grafting polymer, a considerable amount of main-chain scission was seen, but no chain degradation was noted in the case of copolymer II. Photocrosslinking was attempted by using these copolymers in the presence of divinyl benzene. It was confirmed that copolymer II was photocrosslinkable, whereas copolymer I underwent photodegradation.     

Film‐formation property of vinylidene chloride‐methyl methacrylate copolymer latex. II. Effect of latex storage temperature

Changes in the minimum film‐formation temperature (MFFT) of 91:9 wt % vinylidene chloride (VDC)‐methyl methacrylate (MMA) latex prepared by the seeded batch process during storage at 5, 20, and 40 °C were investigated. MFFT of the latex rose the fastest at 20 °C. Infrared absorption of fresh and stored latexes and wide‐angle X‐ray diffraction of powder polymers obtained by lyophilization of fresh and stored latexes indicated a much greater increase in polymer crystallinity during latex storage at 20 °C than at 5 and 40 °C. Observed increases in MFFT during latex storage correlated with increases in polymer crystallinity. Infrared absorption of polymer stored at 5–60 °C in the dry state, such as lyophilized polymer and coating film, indicated that a polymer crystallinity increase was greater during storage at higher temperatures. These results showed that crystallization behavior of 91:9 wt% VDC‐MMA copolymer latex differed from that of VDC‐MMA copolymer in the dry state. © 2002 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 40: 948–953, 2002     

Photoluminescent properties of poly(p‐phenylene vinylene thiophene‐co‐siloxane)

A new p‐phenylene–vinylene–thiophene‐based siloxane block copolymer has been synthesized. The copolymer consists of alternating rigid and flexible blocks. The rigid blocks are composed of phenylene–vinylene–thiophene‐based units, and the flexible blocks are derived from 1,3‐dialkyldisiloxane units. The former component acts as the chromophore, and allows fine tuning of band gap for blue‐light emission, while the latter imparts good solubility of the copolymer in organic solvents, and thus, should enhance processibility of the resulting copolymer. The thermal properties of the copolymer have been characterized by thermogravimetric analysis (TGA) and differential scanning calorimetry (DSC). The photoluminescence (PL) of the copolymer in solution and in cast film has been studied. The effects of concentration on the PL intensity of the new copolymer in polymer blends with poly(methyl methacrylate) (PMMA) and poly(vinyl carbazole) (PVK) have also been described. Efficient energy transfer from PVK to the new block copolymer in the blended film was observed. © 2000 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 38: 1450–1456, 2000     

Design and proof of reversible micelle‐to‐vesicle multistimuli‐responsive morphological regulations

Multistimuli‐responsive precise morphological control over self‐assembled polymers is of great importance for applications in nanoscience as drug delivery system. A novel pH, photoresponsive, and cyclodextrin‐responsive block copolymer were developed to investigate the reversible morphological transition from micelles to vesicles. The azobenzene‐containing block copolymer poly(ethylene oxide)‐b‐poly(2‐(diethylamino)ethyl methacrylate‐co‐6‐(4‐phenylazo phenoxy)hexyl methacrylate) [PEO‐b‐P(DEAEMA‐co‐PPHMA)] was synthesized by atom transfer radical polymerization. This system can self‐assemble into vesicles in aqueous solution at pH 8. On adjusting the solution pH to 3, there was a transition from vesicles to micelles. The same behavior, that is, transition from vesicles to micelles was also realizable on addition of β‐cyclodextrin (β‐CD) to the PEO‐b‐P(DEAEMA‐co‐PPHMA) solution at pH 8. Furthermore, after β‐CD was added, alternating irradiation of the solution with UV and visible light can also induce the reversible micelle‐to‐vesicle transition because of the photoinduced trans‐to‐cis isomerization of azobenzene units. The multistimuli‐responsive precise morphological changes were studied by laser light scattering, transmission electron microscopy, and UV–vis spectra. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011     

Modulating structural stability and acid sensitivity of photosensitive polymer micelles simply via one‐batch UV irradiation

This article describes the photosensitive polymer micelles whose structural stability and acid sensitivity can be widely tuned simply via one‐batch UV irradiation. To this end, the well‐defined poly(5‐ethyl‐5‐methacryloyloxy‐methyl‐2‐styryl‐[1,3]dioxane)‐block‐poly[poly(ethylene glycol) methacrylate] (PEMSD‐b‐PPEGMA) copolymers were synthesized via RAFT polymerization under mild visible light radiation at 30 °C. The results demonstrated that the irradiation of the homogeneous acetone solution with UV light only induced Z‐isomerization of their cinnamyl groups, while irradiating PEMSD chains in the bulky micellar cores only induced dimerization. Moreover, the micelles of previously Z‐isomerized copolymer could be effectively stabilized without changing their acid sensitivity on irradiating for shortly 3 min, while UV irradiation for 30 min could remarkably improve the acid stability of these micelles. These novel properties are of potential applications in controlled drug delivery. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2012     

Block copolymerization of tert‐butyl methacrylate with α,ω‐difunctionalized polystyrene macroiniferter and hydrolysis to amphiphilic block copolymer

The block copolymerization of tert‐butyl methacrylate (tBMA) with a difunctionalized polystyrene (PS) macroinitiator was investigated. The polymerizations were performed under UV light irradiation using PS bearing α‐ and ω‐functionalized end groups containing diethyldithiocarbamyl groups as a macroiniferter. Kinetic studies indicate the molecular weights of triblock copolymers increased linearly with the conversion. Block copolymers with different lengths of PtBMA segments were easily prepared by varying the ratio of tBMA and PS macroiniferter or by controlling the monomer conversion. The formations of block copolymers were characterized by gel permeation chromatographic, ¹H NMR, and DSC analyses. PtBMA segments of the triblock copolymer were subsequently hydrolyzed quantitatively to poly(methacrylic acid) segments using concentrated HCl as a catalyst in a refluxing solution of dioxane, and then an amphiphilic ABA triblock copolymer was produced. © 2001 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 39: 1450–1455, 2001