Optical emission diagnostics in cascade arc plasma polymerization and surface modification processes

Optical Emission Spectroscopy (OES) was used to identify reactive species and their excitation states in low-temperature cascade arc plasmas of N₂, CF₄, C₂F₄, CH₄, and CH₃OH. In a cascade arc plasma, the plasma gas (argon or helium) was excited in the cascade arc generator and injected into a reactor in vacuum. A reactive gas was injected into the cascade arc torch (CAT) that was expanding in the reactor. What kind of species of a reactive gas, for example, nitrogen, are created in the reactor is dependent on the electronic energy levels of the plasma gas in the cascade arc plasma jet. OES revealed that no ion of nitrogen was found when argon was used as the plasma gas of which metastable species had energy less than the ionization energy of nitrogen. When helium was used, ions of nitrogen were found. While OES is a powerful tool to identify the products of the cascade arc generation (activation process), it is less useful to identify the reactive species that are responsible for surface modification of polymers and also for plasma polymerization. The plasma surface modification and plasma polymerization are deactivation processes that cannot be identified by photoemission, which is also a deactivation process. © 1998 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 36: 1583–1592, 1998     

PECVD of amorphous hydrogenated oxygenated nitrogenated carbon films

An actinometric optical emission spectroscopy (AOES) study of the trends in the concentrations of the plasma species H, CH, CO, OH, and CN in film-producing glow discharges of mixtures of isopropanol and nitrogen was undertaken. Conventional AOES was used to obtain the trends in the plasma concentrations of these species as a function of the proportion of nitrogen in the feed, R_n. A dynamic variant of actinometry in which trends in the concentrations of plasma species are measured as a function of time following the cutting of one of the principal gas flows was also employed to investigate the relative importance of gas phase and plasma/polymer–surface interactions in the production of the species of interest. Each of the above-mentioned species is produced, to some degree, by plasma/polymer–surface reactions. As revealed by transmission infrared spectroscopy, the films deposited contain C H, CO, and O H groups. For R_n > 0, the films become nitrogenated, with both N H and CN groups being present. As revealed by transmission ultraviolet-visible spectroscopy, both the optical gap and the refractive index of the deposited films decrease as R_n is increased. © 1998 John Wiley & Sons, Inc. J Polym Sci B: Polym Phys 36: 1881–1888, 1998     

Excited states of CF4 plasma for polymerization of TMPTA monomer

The F and CF₂–CF₂⁺ excited states have been detected by emission spectroscopy in CF₄RF plasmas used for TMPTA polymerization. These excited states are related through electron collision to F and CF₂ ground states. The temporal variation of the F and CF₂–CF₂⁺ radiative states near the substrate reveals that the F atoms disappear first by incorporation in the monomer during the polymerization phase and, then, by a third body recombination process enhanced by the polymer surface. The CF₂–CF₂⁺ radiative states are varying as the inverse of the F states indicating a strong destruction mechanism of CF₂ radicals by F atoms.     

Effect of excitation states of nitrogen on the surface nitridation of iron and steel in d.c. glow discharge plasma

The plasma nitriding phenomena that occur on the surfaces of iron and steel were investigated. In particular, the correlation between the kinds of nitrogen radicals and the surface nitriding reaction was investigated using a glow‐discharge apparatus. To control the excitation of nitrogen radicals, noble gas mixtures were used for the plasma gas. The highly populated metastables of noble gases selectively produce excited nitrogen molecules (N₂*) or nitrogen molecule ions (N₂⁺). The optical emission spectra suggested that the formation of N₂*‐rich or N₂⁺‐rich plasma was successfully controlled by introducing different kinds of noble gases. Auger electron spectroscopy and XPS were used to characterize the depth profile of the elements and chemical species on the nitrided surface. The nitride layer formed by a N₂⁺‐rich plasma had a much higher nitrogen concentration than that by a N₂*‐rich plasma, likely due to the larger chemical activity of the N₂⁺ species as well as the N₂⁺ sputtering bombardment to the cathode surface. The strong reactivity of the N₂⁺ species was also confirmed from the chemical shift of N 1s spectra for iron nitrides. An iron nitride formed by the N₂⁺‐rich plasma has higher stoichiometric quantity of nitrogen than that formed by the N₂*‐rich plasma. Besides the effect of nitrogen radicals on surface nitridation, the contribution of the chromium in steel to the nitriding reaction was also examined. This chromium can promote a nitriding reaction at the surface, which results in an increase in the nitrogen concentration and the formation of nitride with high nitrogen coordination. Copyright © 2010 John Wiley & Sons, Ltd.     

Behavior and surface energies of polybenzoxazines formed by polymerization with argon,oxygen, and hydrogen plasmas

Polybenzoxazine (PBZZ) thin films can be fabricated by the plasma‐polymerization technique with, as the energy source, plasmas of argon, oxygen, or hydrogen atoms and ions. When benzoxazine (BZZ) films are polymerized through the use of high‐energy argon atoms, electronegative oxygen atoms, or excited hydrogen atoms, the PBZZ films that form possess different properties and morphologies in their surfaces. High‐energy argon atoms provide a thermodynamic factor to initiate the ring‐opening polymerization of BZZ and result in the polymer surface having a grid‐like structure. The ring‐opening polymerization of the BZZ film that is initiated by cationic species such as oxygen atoms in plasma, is propagated around nodule structures to form the PBZZ. The excited hydrogen atom plasma initiates both polymerization and decomposition reactions simultaneously in the BZZ film and results in the formation of a porous structure on the PBZZ surface. We evaluated the surface energies of the PBZZ films polymerized by the action of these three plasmas by measuring the contact angles of diiodomethane and water droplets. The surface roughness of the films range from 0.5 to 26 nm, depending on the type of carrier gas and the plasma‐polymerization time. By estimating changes in thickness, we found that the PBZZ film synthesized by the oxygen plasma‐polymerization process undergoes the slowest rate of etching in CF₄ plasma. © 2004 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 42: 4063–4074, 2004     

Optical Emission Spectroscopy of Abnormal Glow Region in Nitrogen Plasma

Optical emission spectroscopy of the active species in N₂ plasma is carried out to investigate their concentration as a function of discharge parameters such as filling pressure (2.0–7.0 mbar), source power (100–200 W) and gas flow rate (50–300 mg/min). The primary motivation of this work is to obtain reliable information about the concentration of the active species of N₂ plasma, which play an important role in plasma surface nitriding processes. Emission intensity from the selected electronic excited states of molecular and atomic species is evaluated as a function of discharge parameters to investigate their concentration. The emission intensity ratio I(N₂⁺)/I(N₂) and I(N⁺)/I(N) of the electronic transitions is also evaluated as a function of discharge parameters to investigate the relative dependence of their concentrations. It is observed that the concentration of the active species of N₂ plasma is strongly affected by the filling pressure and source power whereas flow rate has no significant effect. An increased occurrence of N₂⁺ molecular ions in comparison with N₂ molecules, and N⁺ ions in comparison with N atoms is observed with source power whereas decreased occurrence of N₂⁺ molecular ions in comparison with N₂ molecules, and N⁺ ions in comparison with N atoms is observed with the rise in filling pressure.     

Penetration of plasma surface modification into porous media. III. Multiple samples exposed to CF4 and C2F4 low temperature cascade arc torch

The depth and possible mechanisms of the penetration of surface modification into porous media by a low temperature cascade are torch are investigated. Two different modes of such penetration (“flow controlled” and “diffusion controlled”) are evaluated. Three porous samples [stacks of 10 sheets of nonwoven fabrics of poly(ethylene terephthalate)each], placed at an axial distance of 24, 28, and 32 cm from the cascade are anode, are exposed to a low temperature cascade arc torch containing argon and CF₄ or C₂F₄, and surface properties of each of the sheets within treated porous samples are examined by ESCA. It is shown that interaction of chemically reactive species, created in the low temperature cascade arc torch, with the surface is not limited to the surface directly contacted by the torch. The flow controlled penetration is more pronounced for the outer layers, while diffusion controlled penetration is within the inner layers of the porous structure. Substantial differences in the fluorination effect of CF₄ (nonpolymer forming gas) and C₂F₄ (polymer forming gas) discharges for the second and third stacks are observed, that can be explained by the fact that the major effect of the CF₄ cascade arc torch treatment is based on the reaction of reactive species with the surface polymer molecules. The effect of C₂F₄ cascade arc torch treatment is based on the reactions of reactive species with polymers as well as reactions of reactive species themselves at the surface (plasma polymerization). Reactivity of the species created in C₂F₄ discharge is much higher compared to that created in CF₄ discharge, which is one of the major factors influencing penetration trends of low temperature cascade arc treatment into porous media. © 1995 John Wiley & Sons, Inc.     

Effect of field emission property of carbon‐like nanofiber treated by using a fluorocarbon/oxygen plasma

Carbon‐like nanofiber (CNF) is synthesized using microwave plasma‐enhanced chemical vapor deposition. We present the effects of fluorocarbon and oxygen (CF₄/O₂) plasma‐treated on the microstructural, crystal, and field emission (FE) characteristics of CNF by SEM, transmission electron microscopy, micro‐Raman, and FE system. Results showed that the presence of the damaged CNF occurs at 2 min CF₄/O₂ plasma treatment and some amorphous carbon particles after 10 min CF₄/O₂ plasma treatment. One can also observe that turn‐on fields were enhanced (2.75 uA/cm²) at 2 min CF₄/O₂ plasma treatment; this indicates a remarkable FE enhancement of the local emission region in CNFs. Complementary information was obtained by thermal desorption atmospheric pressure ionization mass spectrometry and XPS. It can be found that the broken surface morphologies could be attributed to the chemical reaction exchanged via plasma excitation; a large number of bonding (C–F and C–O) in the CNF was detected. In addition, it is observed that the CNF has higher fluorine desorbed at 277.5 and 427 °C after CF₄/O₂ plasma treatment. Copyright © 2012 John Wiley & Sons, Ltd.     

Fast Imaging of Laser-induced Plasma Emission from a ZnO Target

The spatio-temporal evolution of plasma plume laser ablation zinc oxide target was investigated by ICCD camera fast imaging. The plasma was created by a KrF excimer laser of 248 nm wavelength and 25 ns pulse. The laser fluence was set at 2 J/cm². This study was performed under vacuum and oxygen atmosphere at a pressure range of 10^− 6 to 10 mbar.Free expansion, splitting and stopping of the plume were observed at different pressures and time delays following the laser pulse. Moreover, depending on the gas pressures, the photography shows some turbulence for given time delays in the front edge of the plasma while at 5 and 10 mbar the whole plasma edge is perturbed. Rayleigh–Taylor instability is proposed as an explanation to this observed effect. A time integrated emission spectroscopy diagnostic has been also used to identify plasma species. A plasma emission spectrum shows the presence of Zn⁺, Zn and O emission lines both in vacuum and in O₂ atmosphere. As the distance from the target surface increases the Zn⁺ emission line disappears.     

Characterization of Polypropylene Surface Treated in a CO2 Plasma

The polypropylene modification in CO₂ plasma mainly contributes to degradation, functionalization, and cross-linking. The degradation, whose rate is depending on CO₂ dissociation and oxygen atom formation, is a quite slow reaction and it is associated with surface topography alteration, especially of the amorphous phase of the polypropylene. The surface roughness increases with the treatment duration and the amorphous phase is more degraded than the crystallized part. The functionalization, corresponding to an increase of the surface energy (57.3 mJ m ^{– 2} in 30 s), and to an oxidation (23 oxygen at.%) with the appearance of alcohol, ketone, and acid functions is a much faster phenomenon. Cross-linking takes also place during this type of treatment and will reinforce the stability of the modified surface.     

Radial distribution measurement of SiH* in a low-pressure silane plasma

The radial emission intensity distribution of SiH^* (A²,v=0) over the substrate of a low-pressure silane plasma was investigated for various substrate temperatures (T _s=20–320°C). Measured lateral intensities were converted to radial emission coefficients using an Abel inversion. The intensity near the center of the substrate was found to increase withT _s and yielded an activation energyE _a of 1.1 kcal/mole. This result is consistent with the value ofE _a determined by laser-induced flourescence measurements obtained previously. Radially resolved emission data obtained by varying the operating parameters of rf power, gas flow rate, silane/argon mixing rate, and total gas pressure provide a useful means of determining the conditions necessary to generate a uniform plasma.     

Controlled modification of poly(hydroxybutyrate) surfaces by a perfluorohexane plasma: ESCA and contact angle studies

Poly(hydroxybutyrate) films and inorganic glass slides were treated by cold plasma. The composition of the gas mixture of perfluorohexane and hydrogen was varied to obtain controlled surface coatings of different hydrophobicities. The analysis by weight variation, scanning electron microscopy (SEM), electron spectroscopy for chemical analysis (ESCA), and contact angle measurements were used to evaluate the influence of the flow rate, composition, and the plasma power on the surface structure after the plasma deposition. High-resolution ESCA spectra were used to determine quantitatively the amount of different fluorine-containing species present in the plasma-deposited layers. Molecular structures and surface energies of deposited layers on polymer substrates were compared with those on inorganic substrates. In both cases a strong correlation was found between the surface free energy and the fluorine/carbon ratio as well as the oxygen/carbon ratio. Furthermore, samples with high carbon/fluorine ratios showed a high content of CF₂ and CF₃ groups. © 1993 John Wiley & Sons, Inc.     

Penetration of plasma surface modification. II. CF4 and C2F4 low-temperature cascade arc torch

The depth of surface modification by low-temperature cascade arc torch is investigated. A stack of 10 sheets of nonwoven fabrics of polyester fibers is exposed to a low-temperature cascade arc torch containing CF₄ or C₂F₄, and the fluorination effect is examined by ESCA. It is shown that interaction of chemically reactive species, created in a low-temperature cascade arc torch, with the surface is not limited to the surface contacted by the torch (flame). The results indicate that the fluorination effect is observed on surfaces which are shadowed from the torch by overlying fibers. The highest degree of fluorination is found on the second layer, rather than on the first layer which the torch contacts directly. No significant differences in the trends of penetration of CF₄ and C₂F₄ treatment through porous samples are observed. However, ESCA data show principal differences in chemical structures of the surfaces treated with CF₄ (nonpolymer-forming gas) and C₂F₄ (polymer-forming gas). These results indicate that chemically reactive species induced by the excited species of argon rather than primary species created by the ionization process seem to play predominant roles in the surface treatment as well as the low-temperature cascade arc torch polymerization of perfluorinated compounds. © 1994 John Wiley & Sons, Inc.     

Rate Coefficient for Self-Association Reaction of CF2 Radicals Determined in the Afterglowof Low-Pressure C4F8 Plasmas

We have analyzed decay kinetics of CF₂ radicals in the afterglow of low-pressure, high-density C₄F₈ plasmas. The decay curve of CF₂ density has been approximated by the combination of first- and second-order kinetics. The surface loss probability evaluated from the frequency of the first-order decay process has been on the order of 10^–4. This small surface loss probability has enabled us to observe the second-order decay process. The mechanism of the second-order decay is self-association reaction between CF₂ radicals (CF₂+CF₂C₂F₄). The rate coefficient for this reaction has been evaluated as (2.6–5.3)×10^–14 cm³/s under gas pressures of 2 to 100 mTorr. The rate coefficient was found to be almost independent of the gas pressure and has been in close agreement with known values, which are determined in high gas pressures above 1 Torr.     

Reactions of polyethylene surfaces with the downstream products of an air plasma: Gas phase and surface spectroscopic studies

The gas phase downstream products of an air glow discharge have been measured, using absorption and emission spectroscopies, as a function of plasma power, air flow rate, and distance from the plasma. In addition, the reaction of these products with a linear low density polyethylene (LLDPE) polymer surface has been followed using x-ray photoelectron spectroscopy (XPS). At higher air flow rates (>300 sccm), the primary reactive species is confirmed to be O(³P) atomic oxygen. Some O(³P) is generated in the plasma itself, but more appears to be formed in the downstream region, because of dissociation of molecules in their excited states. At low flow rates, the concentration of O(³P) is strongly depleted at the sample position, but other atomic oxygen states become more prominent. O(⁵S) and O(³S) are two states which are identified. XPS studies of the polyethylene surface reacted at high flow rates shows oxygen functionalities that are likely the result of an initiation by hydrogen abstraction. At low flow rates, the products suggest initiation by oxygen insertion. Thus, changes in flow rate can result in major changes to the polymer surface chemistry. © 1996 John Wiley & Sons, Inc.     

Direct Spectroscopic Evidence of the Influence of Chamber Wall Condition on Oxide Etch Rate

The drift of TEOS etch rate has been observed during MERIE oxide etch for the damascene process. The etch rate typically fluctuates between 5300 Å/min and 6000 Å/min. Studies using fluorocarbon-based chemistry show a normal TEOS etch rate when the chamber wall is heavily coated with polymer deposition. On the other hand, a lower etch rate appears when the chamber has less deposition. Hysteresis behavior has been observed during the etch rate of TEOS, as well as emission intensity trends of F, CF _x (x=1~3), and SiF. From the observed emission intensity variation of F, CF _x , and SiF, a model is proposed to explain the impact of chamber wall polymer deposition on the etch rate of TEOS. This model includes a mechanism of etch rate enhancement by embedding oxygen in the chamber wall polymer. From the correlation between etch rate and emission intensity, it clearly shows that F is directly responsible for the etch of TEOS. Compared to F, CF _x plasma chemistry has a closer link to chamber wall polymer formation, but contributes less in the etch of TEOS.     

Contribution of Discharge Excited Atomic N,N2*, and N2+ to a Plasma/Liquid Interfacial Reaction as Suggested by Quantitative Analysis

Electric-discharge nitrogen comprises three main types of excited nitrogen species-atomic nitrogen (N_atom), excited nitrogen molecules (N₂*), and nitrogen ions (N₂⁺) – which have different lifetimes and reactivities. In particular, the interfacial reaction locus between the discharged nitrogen and the water phase produces nitrogen compounds such as ammonia and nitrate ions (denoted as N-compounds generically); this is referred to as the plasma/liquid interfacial (P/L) reaction. The N_atom amount was analyzed quantitatively to clarify the contribution of N_atom to the P/L reaction. We focused on the quantitative relationship between N_atom and the produced N-compounds, and found that both N₂* and N₂⁺, which are active species other than N_atom, contributed to P/L reaction. The production of N-compounds from N₂* and N₂⁺ was enhanced upon UV irradiation of the water phase, but the production of N-compounds from N_atom did not increase by UV irradiation. These results revealed that the P/L reactions starting from N_atom and those starting from N₂^* and N₂⁺ follow different mechanisms.     

Monitoring the deposition process of metal-doped polymer films using optical emission spectroscopy

Simultaneous plasma polymerization of halocarbons (CF₄ and C₂F₃Cl) and sputtering of metals (Au and Al) or cosputtering [Au + polytetrafluoroethylene (PTFE, Teflon)] have been performed by means of an RF (20 MHz) glow discharge excited by a planar magnetron. The optical emission spectroscopy (OES) has been used for monitoring the deposition process of metal-doped polymer films. The light emission intensity ratios of the relevant species in the plasma volume are given in connection with the characteristics of the films prepared.     

CF_x-Ru复合阴极材料的制备及在锂一次电池中的应用（英文）

首次采用简单的原位化学改性方法合成了CFx-Ru复合阴极材料并应用于锂一次电池。与原始CFx材料相比,CFx-Ru在5C的放电倍率下放电容量、放电电压平台和最大功率密度可分别高达605 mAh·g^-1、2 V、8727 W·kg^-1。通过X射线衍射、X射线光电子能谱、扫描电子显微镜和透射电子显微镜对阴极材料结构、化学环境和形貌进行了研究。研究发现,在CFx-Ru复合材料中,nF/nC和C-F2键与C-F共价键的峰面积比都有所降低,这可能是由于RuO2与CFx材料表面或边缘的CF2惰性基团反应所致。这种原位化学反应消耗了非活性的CF2,产生了导电元素钌,并由于气相产物的演化而增加了比表面积。这些特性有助于改善阴极材料的电化学性能。电化学阻抗谱和N2吸附-脱附测试结果也进一步证实了改性材料拥有较大的比表面积和优异的电导率。     

Towards Green Ammonia Synthesis through Plasma-Driven Nitrogen Oxidation and Catalytic Reduction

Ammonia is an industrial large-volume chemical, with its main application in fertilizer production. It also attracts increasing attention as a green-energy vector. Over the past century, ammonia production has been dominated by the Haber–Bosch process, in which a mixture of nitrogen and hydrogen gas is converted to ammonia at high temperatures and pressures. Haber–Bosch processes with natural gas as the source of hydrogen are responsible for a significant share of the global CO₂ emissions. Processes involving plasma are currently being investigated as an alternative for decentralized ammonia production powered by renewable energy sources. In this work, we present the PNOCRA process (plasma nitrogen oxidation and catalytic reduction to ammonia), combining plasma-assisted nitrogen oxidation and lean NO_x trap technology, adopted from diesel-engine exhaust gas aftertreatment technology. PNOCRA achieves an energy requirement of 4.6 MJ mol⁻¹ NH₃, which is more than four times less than the state-of-the-art plasma-enabled ammonia synthesis from N₂ and H₂ with reasonable yield (>1 %).