Fabrication of microstructures on paraffin substrate using laser heating

In this paper, a technique of forming convex microstructures on a paraffin substrate using laser heating is described. This technique makes use of a phenomenon that solid paraffin, melted by continuous laser irradiation, grows into a pillar-shaped structure with a high aspect ratio in a liquid. Two-dimensional structures, such as line- and wall-shaped structures, are available by scanning irradiation. Also, it is possible to fabricate oblique structures with an inclined laser irradiation. In addition, some characteristics of this fabrication method, such as the laser power and the material temperature, are investigated. Furthermore, the mechanism of this fabrication method is presented. PACS 07.10.Cm; 47.55.Pf; 65.40.De; 79.20.Ds; 81.05.-t     

Catalytic growth of nickel-encapsulated and hollow graphitic carbon nanoparticles during laser vaporization of cellulose char containing nickel

Nickel-encapsulated and hollow graphitic carbon nanoparticles (CNPs) with diameters of up to 200 nm were fabricated from cellulose char containing nickel, by continuous wave Nd:YAG laser vaporization. The relative yields of the Ni-encapsulated and hollow CNPs strongly depended on the laser power density and the quantity of Ni in the cellulose char. The hollow CNPs with yields of up to 90% were successfully formed with increasing laser power density. A net-like structure composed of small fragments of bending graphitic layers was also produced under an excess condition of the cellulose char. We discuss the formation mechanisms of the CNPs, in which the growth of graphitic layers around Ni particles and their separation repeatedly occur after the start of laser irradiation. PACS 81.05.Uw; 81.07.Wx; 81.16.Mk     

Microdot pattern of multiple organic molecules prepared by laser photopolymerization process with a nanosecond pulsed laser

A microdot pattern of multiple organic molecules was prepared. Fluorescent molecules, which absorb visible light, were added to a commercial ultraviolet photopolymerization polymer solution and the polymer solution was polymerized by irradiating with nanosecond pulsed visible laser light. The size and the shape of the polymerized dots differed with the irradiation condition and the kind of the added molecules. Based on these results, a microdot pattern of multiple organic molecules was prepared by repeating a micropatterning process with the molecules. PACS 82.50.Hp; 81.65.Cf; 81.05.Lg     

Photopolymerization of C<Subscript>60</Subscript> and Li@C<Subscript>60</Subscript> studied by second-harmonic generation and infrared spectroscopy

The photopolymerization of C₆₀ and Li@C₆₀ films was investigated by means of optical second-harmonic generation. The films were deposited under ultra-high-vacuum conditions and irradiated in situ with an Ar⁺ laser at 514 nm. The second harmonic generated by a Nd:YAG laser working at 1064 nm was monitored after different steps of irradiation. Photopolymerization was observed after very low irradiation doses, of the order of 10²⁰ photons/cm², and confirmed with infrared absorption spectroscopy. Similar kinetics for C₆₀ and Li@C₆₀ were observed. The measurements give evidence for photopolymerization of the endohedral fullerene Li@C₆₀. PACS 78.30.Na; 82.50.Hp; 81.05.Tp     

Effect of cerium oxide on the precipitation of silver nanoparticles in femtosecond laser irradiated silicate glass

We investigated the effect of cerium oxide on the precipitation of Ag nanoparticles in silicate glass via a femtosecond laser irradiation and successive annealing. Absorption spectra show that Ce³⁺ ions may absorb part of the laser energy via multiphoton absorption and release free electrons, resulting in an increase of the concentration of Ag atoms and a decrease of the concentration of hole-trapped color centers, which influence precipitation of the Ag nanoparticles. In addition, we found that the formed Ag⁰ may reduce Ce⁴⁺ ions to Ce³⁺ ions during the annealing process, which inhibits the growth of the Ag nanoparticles. PACS 78.55.Qr; 78.67.Bf; 81.05.Pj     

Fabrication of microchannels in glass using focused femtosecond laser radiation and selective chemical etching

We use the combination of femtosecond laser dielectric modification and selective chemical etching to fabricate high-quality microchannels in glass. The photoinduced modification morphology has been studied in fused silica and in borosilicate glass BK7, using ultra-high spatial resolution techniques of selective chemical etching followed by atomic force or scanning electron microscopy. The analysis shows that the high differential etch rate inside the modified regions, is determined by the presence of polarization-dependent self-ordered periodic nanocracks or nanoporous structures. We also investigate the optimum irradiation conditions needed to produce high-aspect ratio microchannels with small symmetric cross-sections and smooth walls. PACS 42.62.-b; 42.65.Re; 81.05.Kf; 87.80.Mj     

Laser/sol–gel synthesis: a novel method for depositing nanostructured TiN coatings in non-vacuum conditions

In this work results of experiments on the in situ production of titanium nitride by the reaction of titania sol–gel with a nitrogenous admixture under laser irradiation are reported. A diode laser beam at different powers and traverse speeds was applied to the mixture placed on EN43 mild steel and 316L stainless steel substrates. Composite coatings of titanium nitride and titanium oxide with a hardness of 17–21 GPa have been achieved by this new method. Surface morphology and microstructure of the deposited coatings and substrate surface layers were examined using optical microscopy, scanning electron microscopy, and field-emission gun scanning electron microscopy. Chemical composition was determined by energy-dispersive X-ray analysis. The phases were identified by X-ray diffraction. Results of microhardness and nanohardness at the top surface were evaluated. PACS 81.15.Fg; 81.20.Fw; 81.05.-t     

Laser etching of fused silica using an adsorbed toluene layer

A new method for laser etching of transparent materials with a low etch rate and a very good surface quality is demonstrated. It is based on the pulsed UV-laser backside irradiation of a transparent material that is covered with an adsorbed toluene layer. This layer absorbs the laser radiation causing the etching of the solid. The threshold fluence for etching of fused silica amounts to 0.7 J/cm². The constant etch rate of about 1.3 nm/pulse that has been observed in a fluence interval from 2 to 5 J/cm² is evidence of a saturated process. The limited thickness of the adsorbed layer causes the low etch rates and the rate saturation. The etched surface structures have well defined edges and low surface roughness values of down to 0.4 nm rms. PACS 81.65.Cf; 81.05.Kf; 79.20.Ds; 61.80.Ba; 42.55.Lt     

Backside laser etching of fused silica using liquid gallium

Laser-induced backside wet etching (LIBWE) that is regularly performed with hydrocarbon solutions is demonstrated with the liquid metal gallium as a new class of absorbers for the first time. Well-contoured square etch pits in fused silica with smooth bottoms and well-defined edges were achieved already with the first pulse from a 248 nm excimer laser. The etching is characterized by a threshold fluence of 1.3 J/cm² and a straight proportional etch rate growth with the fluence up to 8.2 J/cm². In addition, the etch depth increases linearly for onward pulsed laser irradiation and gives evidence for an only marginal incubation effect. The high fluences necessary for etching originate from the high reflection losses as well as the high thermal conductivity of the metallic absorber. The suggested etch mechanism comprises the heating of the fused silica up to or beyond the fused silica melting point by the laser heated gallium and the removing of the softened or molten fraction of the material by mechanical forces from shock waves, bubbles, high pressures, or stress fields. PACS 81.65.C; 81.05.J; 79.20.D; 61.80.B; 42.55.L     

Processing quartz glass by using the second harmonic of picosecond pulse Nd:YVO<Subscript>4</Subscript> laser

The processing of synthetic quartz glass by use of the second harmonic of a picosecond Nd:YVO₄ laser was examined. The threshold irradiation pulse energy density to process the glass using a picosecond pulse is about 3.8 J/(cm² pulse). The groove depth does not increase effectively by scanning with a single line even if the number of scans is increased. It becomes easy to process a thick material when the aperture is widened. A through hole (entrance side diameter 106 μm) was formed through a 0.3-mm-thick synthetic quartz glass plate without cracking by the use of circular scanning. The trepanning of a ring (outer diameter 3 mm, inner diameter 1 mm) from 0.3-mm synthetic quartz glass was achieved. PACS 52.38.Mf; 42.62.Cf; 81.05.Kf     

Patterning and modification of PDMS surface through laser micromachining of silicon masters and molding

We describe preparation of micro patterned PDMS sample surfaces and their chemical modification for the purposes of increased hydrophobicity. The process includes ablation of micrometer sized patterns on a silicon master by pulsed radiation from a Nd:YAG laser, transfer of the patterns to PDMS through molding, and chemical modification of the topmost surface layers of the polymer sample by further laser irradiation and UV/ozone treatment. The samples were characterized by XPS, FTIR, contact angle measurements, optical microscopy and SEM. The study shows the feasibility of the method to manufacture regular patterns with micron-sized cylindrical pillars and to control surface composition. In the absence of chemical modification of the surfaces due to preparation, we compare the effect of increased roughness on the contact angle with theoretically predicted values. Samples with patterned and chemically modified surfaces due to UV/ozone treatment show reduced hydrophobicity. PACS 52.38.Mf; 81.65.Cf; 81.05.Lg     

Exciton photoluminescence from ZnO layers produced by laser-induced gas breakdown processing

The plasma of optically-excited gas breakdown has been used to treat a Zn target in atmospheric pressure gases (air, O₂, N₂, Ar). The breakdown is produced near the target by a pulsed CO₂ laser radiation, yielding to a local erosion of the target under the irradiation spot and the formation of a porous nanostructured layer, consisting of ZnO nanoscale spheres. We show that the produced nanostructured layers exhibit an intense exciton emission band in the ultraviolet range (380–385 nm), while defect-related photoluminescent bands were weak and could be completely removed by varying the fabrication parameters. Properties of the produced layers were found to be very promising for the development of optoelectronic devices. PACS 81.16.Mk; 81.05.-t     

Environment effects on the lasing photostability of Rhodamine 6G incorporated into organic-inorganic hybrid materials

The effect on the lasing photostability of Rhodamine 6G (Rh6G), and the rigidity of a hybrid inorganic-organic matrix by controlled addition of di-, tri- and tetrafunctionalized alkoxides has been evaluated. The dye was incorporated into hybrid matrices of (2-hydroxyethyl methacrylate) (HEMA) or vol/vol copolymers of methyl methacrylate (MMA) and HEMA with different weight proportions of polycondensated dimethyldiethoxysilane (DEOS), methyltriethoxysilane (TRIEOS), and tetraethoxysilane (TEOS). The laser samples were transversaly pumped at 534 nm at 5.5 mJ/pulse and up to a 10 Hz repetition rate. The dependence of the laser photostability on organic-inorganic composition, pH of the medium, and thermal treatment of the samples was studied. Good stability, with a drop of the initial laser output of only 13% after 10000 pump pulses at 10 Hz in a thermally postcured (HEMA-15 wt%TRIEOS) matrix was obtained. Careful control of the synthesis process is required to reach the necessary photostability for a solid-state dye laser based on hybrid matrices to become competitive with liquid dye lasers. PACS 81.05.Lg; 81.05.Zx; 81.20.Fw; 42.55.Mv; 42.55.Rz; 42.60.Lh; 42.62.b; 42.70a; 42.70-Hj; 42.70.Jk     

Direct fabrication of freely movable microplate inside photosensitive glass by femtosecond laser for lab-on-chip application

We demonstrate the fabrication of complicated three-dimensional (3D) microstructures embedded in a photosensitive glass by a high-order multiphoton process using a femtosecond (fs) laser. Direct writing of the fs laser followed by a post baking process and preferential etching in a dilute hydrofluoric (HF) acid solution results in a microplate that can freely move in hollow structures embedded in the glass. The fabricated structure functions as a microvalve that can control the flow direction of fluids in the microreactor. PACS 42.62.-b; 81.05.Kf; 82.50.Pt     

Thermoluminescent a-CN thin films properties as a function of plasma parameters

Amorphous carbon nitride (a-CN) thin films show luminescent properties that are of interest for many applications. Particularly interesting are their previously reported thermoluminescent characteristics. In order to optimize these properties, the plasma parameters (ion energy, plasma density and type of excited species) were studied in the present work as a function of the laser fluence and the working pressure. The plasma was produced using the fundamental line of a Nd:YAG laser with 28 ns pulse duration focused on a high purity graphite target. The laser fluences used in this work could be varied between 9 and 40 J/cm². Measurements and deposition of a-CN films were carried out in a nitrogen atmosphere at pressures from 3×10^-3 to 7.5×10^-2 Torr. We observed an optimum value of pressure, close to 7.5×10^-2 Torr, in which the nitrogen incorporation into the film achieved its maximum value close to 29 at.% and the thermoluminescent response of the material, after irradiation with UV becomes evident. PACS 81.15.Fg; 78.60.Kn; 81.05.Uw     

Structural modifications of silicon-implanted GaAs induced by the athermal annealing technique

We have used high-resolution X-ray diffraction and Raman spectroscopy to investigate structural modifications inside and outside the focal region of Si-implanted GaAs samples that have been irradiated at high power by a focused short-pulse laser. Si atoms implanted into the GaAs matrix generate exciton-induced local lattice expansion, resulting in a satellite on the lower-angle side of the Bragg peak. After the laser pulse irradiation, surface features inside and outside the focal spot suggest the presence of Bernard convection cells, indicating that a rapid melting and re-crystallization has taken place. Moreover, the laser irradiation induces a compressive strain inside the focal spot, since the satellite appears on the higher-angle side of the Bragg peak. The stress maximizes at the center of the focal spot and extends far outside the irradiated area (approximately 2.5-mm away from the bulls eye), suggesting the propagation of a laser-induced mechanical wave. The maximum compressive stress inside the focal spot corresponds to 2.7 GPa. Raman spectra inside the focal spot resemble that of pristine GaAs, indicating that rapid melting has introduced significant heterogeneity, with zones of high and low Si concentration. X-ray measurements indicate that areas inside the focal spot and annealed areas outside of the focal spot contain overtones of a minor tetragonal distortion of the lattice, consistent with the observed relaxation of Raman selection rules when compared with the parent zinc-blende structure. PACS 61.72.Vv; 62.50.+p; 71.55.Eq; 79.20.Ds; 81.05.Ea     

Fiber laser micro-cutting of stainless steel sheets

The authors report on laser micro-cutting results for stainless steel foils with the aid of a 100 W fiber laser. This novel laser source combines a high output power in relation to conventional laser sources for micro-processing applications with an excellent beam quality (M²=1.1). Different material thicknesses were evaluated (100 μm to 300 μm). Processing was carried out with cw operation of the laser source, and with nitrogen and oxygen as assisting gases. Besides the high processing rate of oxygen assisted cutting, a better cutting performance in terms of a lower kerf width was obtained. PACS 42.82.Cr; 42.62.Cf; 81.05.Bx     

Fabrication of 3D microoptical lenses in photosensitive glass using femtosecond laser micromachining

We describe the fabrication of microoptical cylindrical and hemispherical lenses vertically embedded in a photosensitive Foturan glass by femtosecond (fs) laser three-dimensional (3D) micromachining. The process is mainly composed of four steps: (1) fs laser scanning in the photosensitive glass to form curved surfaces (spherical and/or cylindrical); (2) postannealing of the sample for modification of the exposed areas; (3) chemical etching of the sample for selective removal of the modified areas; and (4) a second postannealing for smoothening the surfaces of the tiny lenses. We examine the focusing ability of the microoptical lenses using a He-Ne laser beam, showing the great potential of using these microoptical lenses in lab-on-a-chip applications. PACS 42.62.-b; 81.05.Kf; 82.50.Pt     

Selective metallization of photostructurable glass by femtosecond laser direct writing for biochip application

We report the selective metallization of photostructurable glass by femtosecond (fs) laser direct writing followed by electroless copper (Cu) plating. It was found that a Cu thin film can be deposited only on the rough surface of glass ablated by the fs laser. The deposited Cu thin film exhibits strong adhesion and excellent electrical properties. A Cu film can even be deposited on the internal wall of a hollow microchannel inside photostructurable glass by the multiphoton absorption of the fs laser. To show the use of this technique for micro-total-analysis-system (μ-TAS) applications, the fabrication of a microheater operating at temperatures up to 200 °C was demonstrated. PACS 81.05.Kf; 85.40.Ls; 87.85.Va