微腔有机发光器件中的电致发光光谱

设计了结构为Glass/DBR/ITO/TPD/Alq3/Ag的微腔有机发光器件。从理论上详细地研究了腔内各层结构对器件电致发光谱性能的影响。结果表明:随着腔长厚度的增加,器件的归一化电致发光谱强度不断减小;在可见光区,器件的EL谱随发光层厚度的增加出现振荡变化。空穴传输层和发光层的界面位置对器件电致发光谱的影响也很大。最后得到,在设计微腔时发光层厚度要尽量窄,并且中心发光区域应位于谐振腔中电场的峰值位置。     

微腔有机电致发光器件的谐振腔反射镜性能

根据微腔原理运用传输矩阵法对构成微腔有机电致发光器件(MOLED)谐振腔的两个反射镜进行模拟计算并比较,可观察到:随金属反射镜的反射率增大,微腔器件的电致发光(PL)谱的半峰全宽(FWHM)逐渐窄化;峰值逐渐蓝移至设计的谐振峰值520nm处;峰值强度和光谱积分强度逐渐增强。结果表明:金属反射镜反射率越大越好。随DBR反射镜的周期数从1增加到9,EL的峰值均为520nm,半峰全宽逐渐窄化,积分强度逐渐减弱;峰值强度由弱增强再减弱,4个周期时峰值强度最大,所以设计微腔器件时,DBR的周期是一项很重要的参数。DBR反射率太大不利于出光,太小微腔效应小。需要根据制作目的和需要进行合理选择。     

有机微腔绿色发光二极管

光学微腔是指尺寸在光波长量级的光学微型谐振腔。微腔结构可以使腔内物质和光场的相互作用与体材料相比发生很大变化,出现了自发辐射谱线窄化和增强等腔效应。利用这些腔效应,可以改善有机发光器件的性能。采用微腔结构,优化设计并研制了有机微腔绿色发光二极管,器件结构为Glass/DBR/ITO/NPB/Alq∶Rubrene/Alq/MgAg,获得了最大亮度40100 cd/m2、最大发光效率为6.44 cd/A、半峰全宽为28 nm的纯绿色有机微腔电致发光器件。而与之比较的无腔器件最大亮度为22580 cd/m2、最大发光效率为2.98 cd/A、半峰全宽为120 nm。相同电流密度下微腔电致发光谱的峰值发射强度是无腔器件的4.2倍。结果表明将微腔结构引入有机电致发光器件中,不但改善了发光的色纯度,而且使器件的发光效率和亮度都得到明显增强。     

不同微腔结构有机电致发光器件的电致发光光谱模拟

采用传输矩阵法对有机电致发光器件(OLED)、微腔有机电致发光器件(MOLED)和耦合微腔有机电致发光器件(CMC)的电致发光光谱(EL)进行了模拟计算。OLED、MOLED和CMC的结构分别为glass/ITO(134 nm)/NPB(74 nm)/Alq_3(62 nm)/Al、glass/DBR/ITO(134 nm)/NPB(74 nm)/Alq_3(62 nm)/Al和glass/DBR_1/filler/DBR_2/ITO(134 nm)/NPB(74 nm)/Alq_3(62 nm)/Al。通过模拟计算发现:OLED光谱呈宽带发射,主峰峰值位于561 nm,肩峰峰值位于495 nm;MOLED光谱呈单峰窄带发射,峰值位于534 nm;CMC光谱呈双峰窄带发射,峰值分别位于520 nm和556 nm。MOLED光谱的色纯度最高;OLED与MOLED的光谱积分面积基本相同;CMC的光谱积分面积是OLED或MOLED的1.1倍,发光效率最高。结果表明,采用双耦合微腔结构可有效提高OLED的发光效率,改善发光的色纯度。     

激子位置不同微腔有机电致发光器件性能模拟

微腔有机电致发光器件(MOLED)的发光特性直接与微腔的结构相关,可以根据微腔器件的相关计算公式,运用传输矩阵法对MOLED进行模拟设计。本文对微腔总长度L=λ/2(λ:中心波长)不变情况下,激子在微腔内不同位置复合发光的电致发光(EL)光谱性能进行模拟并比较。结果表明:发光谱的峰值都在所设计的中心波长520nm处,半峰全宽(FWHM)都是17nm,激子处在微腔的中心区域时,峰值强度和积分强度都是最大,这是因为激子此时位于腔内电场的最大值处,偏离此处的两侧逐渐变小。以上结果表明:要制作出高效率的MOLED,必须使激子处于微腔内的最佳位置处。     

两种谐振腔长度的微腔有机电致发光器件模拟

微腔的谐振腔长度直接影响微腔有机电致发光器件(MOLED)的发光特性,根据微腔器件的相关计算公式运用传输矩阵法,分别对微腔长度L=λ/2和L=λ(λ:中心波长)时,在微腔内不同位置激子复合发光的电致发光谱(EL)进行模拟计算和比较。发现:微腔长度为L=λ/2时,峰值均为520nm,半峰全宽均为17nm,激子处在微腔的中心位置时,峰值强度和积分强度均为最大。L=λ时,激子在腔内不同位置时,峰值均为520nm,半峰全宽均12nm,在腔的中心区域时,与L=λ/2时正好相反,峰值强度和积分强度最小。分析后判断是因为两种长度的微腔内电场强度分布不同,激子位于腔内电场的最大值处发光性能最好。说明要制作出高效率的MOLED,要区别不同谐振腔长度,并使激子处于腔内电场最大处。     

微腔有机电致发光器件角度依赖性的模拟与实验验证

为了分析微腔有机电致发光器件(MOLED)发光的角度依赖性,根据微腔计算公式,采用传输矩阵法进行了模拟计算,并进行了实验验证。所设计器件的结构为Glass/DBR/ITO(58 nm)/NPB(46 nm)/DPVBi(20 nm)/Alq₃(56 nm)/LiF(1 nm )/Al(150 nm)。由实验得到的电致发光(EL)谱可以观察到:随着探测角度的加大,发光峰蓝移、强度减小。与模拟得出的不同观测角度下的反射谱进行比较,发现透射峰值与EL峰值相对应。模拟分析发现,这是由于观测角不同,微腔两个反射镜的S和P偏振的反射率及反射相移不同,同时腔内光学厚度发生变化,即微腔长度变化共同作用所导致。     

有机层厚度变化的有机电致发光器件与微腔器件光谱分析

设计中心波长为520nm,改变有机层厚度,即空穴传输层NPB和发光层Alq3的厚度,分别由10nm逐渐增加至100nm,器件的总体厚度也随着改变,分别计算模拟出有机电致发光器件(OLED)和微腔有机电致发光器件(MOLED)的电致发光谱(EL),并对光谱的积分强度、峰值强度、半峰全宽、峰值位置的三维分布图进行比较分析。综合考虑光谱的峰值位置(中心波长)、最大的峰值强度和积分强度(与亮度、效率相关)、最小半峰全宽(色纯度高)进行合理的设计,可以找到最佳厚度。发现:NPB和Alq3的厚度分别为70和62nm时,器件性能最佳,并且微腔器件的结果尤为明显。结果表明,通过模拟计算,可以深入探索MOLED和OLED发光特性,设计出合理的器件结构。     

绿色磷光微腔有机电致发光器件研究

使用典型绿色磷光材料Ir(ppy)3作为发光层,DBR和金属Al作为微腔的一对反射镜,制备了结构为Glass/DBR/ITO/Mo O3(1 nm)/Tc Ta(40 nm)/CBP:Ir(ppy)3(40 nm,6%)/TPBI(47 nm)/Li F(1 nm)/Al(80 nm)的绿色磷光微腔有机电致发光器件(MOLED),同时制作了无腔对比OLED器件,研究微腔结构对器件发光性能的影响。发现OLED的电致发光谱(EL)的峰值是510 nm,半峰全宽(FWHM)为70 nm,MOLED的峰值是514 nm,FWHM为35 nm,比OLED窄化了1/2,MOLED的最大亮度、最大电流效率分别为143000 cd/m2和64.4 cd/A,OLED的最大亮度、最大电流效率分别为103000 cd/m2和41.6 cd/A;测试并计算了器件的外量子效率(EQE),MOLED和OLED的最大EQE分别为18.6%和14.3%。结果表明,微腔器件发光性能比无腔器件得到了很大的改善。     

蓝色微腔有机发光器件

实现彩色显示需要高效率和高色纯度的红、绿、蓝三种颜色发光.与红、绿色器件相比,蓝光有机电致发光器件(OLED)有较低效率和较差的色纯度.为了改善器件性能,将微腔引入到OLED中,优化设计并制作出蓝色微腔有机电致发光器件(MOLED):Glass/DBR/ITO/NPB/DPVBi/Alq3/LiF/Al.得到蓝光微腔器件电致发光谱(EL)峰值位于472 nm,与无腔器件相比,峰值强度增强5.4倍,半峰全宽(FWHM)减小77.1%(仅为16 nm),光谱积分强度增加33%.微腔器件最大亮度8439 cd/m2,最大发光效率2.4 cd/A,CIE色坐标为(X=0.14,Y=0.10).结果表明,由于微腔效应的存在,导致微腔器件的EL谱线窄化和峰值强度增强,可提高器件的色纯度,改善器件发光性能.     

顶部反射镜对GaN基共振腔发光二极管性能的影响研究

本文在Ga N基共振腔发光二极管(RCLED)顶部设计制备了高反膜结构分布式布拉格反射镜(DBR)和滤波器结构DBR,对比分析了两种反射镜的反射率曲线特征以及对应的RCLED器件的光输出纵模模式、光谱线宽和输出光强等性能差异,详细研究了顶部反射镜的光反射特性对RCLED器件输出光谱性能的影响机理.研究结果表明,顶部反射镜是RCLED的重要组成部分,其反射率曲线特征决定器件的光输出性能.常规高反膜结构DBR顶部反射镜的反射率曲线具有较宽的高反射带,将其作为顶部反射镜可有效压窄RCLED发光纵模线宽,但是发光光谱仍呈现多纵模光输出特征.滤波器结构DBR顶部反射镜的反射率曲线在中心波长处具有较窄的透光凹带,利用透光凹带对输出光的调制作用,器件可实现单纵模光输出,在光通信、光纤传感等领域展示了广阔的应用前景.通过进一步设计RCLED顶部反射镜结构,可以改变其反射率曲线特性,进而优化RCLED器件的输出光谱特性,以满足器件在多个领域的应用需求.     

垂直腔面发射激光器的结构生长及特性研究

在偏〈111〉A 2°的GaAs (100) 衬底上生长了Al0.9Ga0.1As /Al0.2Ga0.8As周期结构的垂直腔面发射激光器（VCSEL）外延片P 型DBR的周期数为24.5对,N型DBR的周期数为34.5对.用光荧光 (PL) 谱、扫描电子显微镜 (SEM)和X射线双晶衍射 (XRD) 方法对VCSEL的光学特性和结构特性进行了分析室温量子阱材料的PL谱峰值波长为837.0 nm,半高宽达到28.9 nm在X射线双晶衍射回摆曲线中,除了“0”级衍射峰外,还观察到一级和二级卫星峰.“0”级双晶衍射峰的半高宽为12.56弧秒(″),衬底GaAs的衍射峰半高宽为11.79″.“0”级衍射峰半高宽与衬底GaAs的衍射峰半高宽比较接近,表明晶格具有很高的完整性.实验结果表明腔模波长为837.2 nm,腔模波长与PL谱峰值波长相匹配.     

Dual-wavelength distributed Bragg reflector semiconductor laser based on composite resonant cavity

We report a monolithic integrated dual-wavelength laser diode based on a distributed Bragg reflector (DBR) composite resonant cavity. The device consists of three sections, a DBR grating section, a passive phase section, and an active gain section. The gain section facet is cleaved to work as a laser cavity mirror. The other laser mirror is the DBR grating, which also functions as a wavelength filter and can control the number of wavelengths involved in the laser action. The reflection bandwidth of the DBR grating is fabricated to have an appropriate value to make the device work at the dual-wavelength lasing state. We adopt the quantum well intermixing (QWI) technique to provide low-absorption loss grating and passive phase section in the fabrication process. By tuning the injection currents on the DBR and the gain sections, the device can generate 0.596 nm-spaced dual-wavelength lasing at room temperature.     

Dual-wavelength distributed Bragg reflector semiconductor laser based on a composite resonant cavity

We report a monolithic integrated dual-wavelength laser diode based on a distributed Bragg reflector (DBR) composite resonant cavity. The device consists of three sections, a DBR grating section, a passive phase section, and an active gain section. The gain section facet is cleaved to work as a laser cavity mirror. The other laser mirror is the DBR grating, which also functions as a wavelength filter and can control the number of wavelengths involved in the laser action. The reflection bandwidth of the DBR grating is fabricated to have an appropriate value to make the device work at the dual-wavelength lasing state. We adopt the quantum well intermixing (QWI) technique to provide low-absorption loss grating and passive phase section in the fabrication process. By tuning the injection currents on the DBR and the gain sections, the device can generate 0.596 nm-spaced dual-wavelength lasing at room temperature.     

Optical properties of Fabry–Perot microcavity with organic light emitting materials

We investigated the optical properties of the tris(8-hydroxyquinoline)aluminum (Alq₃) organic film with Fabry–Perot microcavity by measuring photoluminescence (PL) and transmittance. We have simulated the phase change on reflection as a function of wavelength. The Fabry–Perot microcavity structures were designed according to the simulation results and the resonant wavelength corresponding to the maximum of PL spectrum of a bare Alq₃ film. These structures were fabricated in three types of microcavities, such as type A [air|metal|Alq₃|metal|glass], type B [air|dielectric|Alq₃|dielectric|glass], and type C [air|metal|Alq₃|dielectric|glass]. A bare Alq₃ layer on glass, [air|Alq₃|glass], showed a PL peak around 514 nm and its full width at half maximum (FWHM) was about 80 nm. The broad FWHM of the bare Alq₃ film was reduced to 15–27.5, 7–10.5 and 16–16.6 nm for three types by cavity effects. Also, the control of the resonant wavelength can be achieved by the spacer length as well as the phase change on reflection on mirror.     

基于监测波峰绝对积分的双折射光子晶体光纤环镜轴向应变传感器研究

理论推导了双折射光纤环镜波长变化与轴向应变的公式,研究表明：双折射光子晶体光纤环镜轴向应变灵敏度比传统双折射光纤环镜大为减小。通过监测双折射光子晶体光纤环镜波长的变化,来实现轴向应变的测量就变得较为困难;且输出干涉光谱局部呈凹凸不平,波长监测容易导致数据测量误差。实验监测双折射光子晶体光纤环镜应变光谱,对应变光谱分析发现：随着应变增加,监测波峰下的绝对积分呈现减小的趋势。进一步精确计算分析发现：监测波峰下的绝对积分与应变成线性关系。基于此,提出了通过监测波峰下的绝对积分的变化,来实现轴向应变的测量。波峰下的绝对积分是表征各波长光强的综合性能指标,通过监测波峰下的绝对积分的变化,来实现轴向应变的测量,不仅可以克服双折射光子晶体光纤环镜监测波长变化的困难,而且还可以克服波长监测局部寻优导致的测量误差。     

Multiparametric sensor based on DBR porous silicon for detection of ethanol gas

We are here concerned with fabrication possibility of multiparametric gas sensor based on porous silicon. In order to use the porous silicon as a gas sensor, we made the DBR (distributed Bragg reflector) porous silicon onto silicon wafer and monitored the change of three parameters during exposure of DBR porous silicon to ethanol gas. The sensing parameters were the shift of reflectance peak, the PL (photoluminescence) intensity, and the electrical conductance. As a result, the spectra of reflectance and PL shifted toward longer wavelength. The electrical conductivity increases rapidly. After removing the gas, all sensing parameters return exactly to the initial value.     

Resonant cavity-enhanced quantum dot field-effect transistor as a single-photon detector

A resonant cavity-enhanced （RCE） quantum dot （QD） field-effect transistor （RCEQDFET） is designed for single- photon detection in this paper. Adding distributed Bragg reflection （DBR） mirrors to the single-photon detector （SPD）, we improve the light absorption efficiency of the SPD. The effects of the reflectivity of the mirrors, the thickness and light absorption coefficient of the absorbing layer on the detector＇s light absorption efficiency are investigated, and the resonant cavity is determined by using the air/semiconductor interface as the mirror on the top. Through analyzing the relationship between the refractive index of AlxGal_xAs and A1 component, we choose A1As/Alo.15Gao.85As as the material of the mirror on the bottom. The pairs of A1As/Alo.15Gao.85As film are further determined to be 21 by calculating the reflectivity of the mirror. The detector is fabricated from semiconductor heterostructures grown by molecular beam epitaxy. The reflection spectrum, photoluminescence （PL） spectrum, photocurrent response, and channel current of the detector are tested and the results show that the RCEQDFET-SPD designed in this paper has better performances in photonic response and wavelength selection.     

氮化铌纳米线光学特性

氮化铌(NbN)纳米线是超导纳米线单光子探测器(SNSPD)常用的光敏材料,其光学性质是影响SNSPD性能的关键因素.本文结合实验数据和仿真结果,系统研究了多种NbN超导纳米线探测器器件结构的光学特性,表征了以下四种器件结构下的反射光谱以及透射光谱:1)双面热氧化硅衬底背面对光结构;2)双面SiN硅衬底背面对光结构;3)硅衬底上以金层+SiN缓冲层为反射镜的正面对光结构;4)以分布式布拉格反射镜(DBR)为衬底的正面对光结构.并在上述四种器件结构基础上,生长了不同厚度的NbN薄膜,观察不同厚度NbN薄膜的吸收效率.经分析,发现在不同器件结构下的最佳NbN厚度与光吸收率的关系如下:双面热氧化硅衬底上的NbN层在1606 nm处最大吸收率为91.7%,其余结构在最佳NbN厚度条件下吸收率都能达到99%以上.其中双面SiN的硅衬底结构中最大吸收率为99.3%, Au+SiN为99.8%, DBR为99.9%.最后,将DBR器件实测结果与仿真结果进行了差异性分析.这些结果对高效率SNSPD设计与研制具有指导意义.