Poly(arylsulfone imide) as E-beam resist: Synthesis and radiolysis

Aromatic diamines containing ? SO₂? and ? S? moieties have been used to prepare soluble polyimides with ditrifluoromethyl methane bis(phthalic anhydride) (F-series polyimides) and polyamic acid with pyromellitic dianhydride (P-series). Gamma radiolysis gave G(S) values for scission between 1 to 2 with no crosslinking. Significant weight loss occurred with radiolysis is attributable to efficient ? SO₂? bond scission for the F-series polyimides, as well as imidization in the cases of P-series polyamic acids.     

Poly(aryline imide)s as E-beam resist: Sensitivity and resolution

Polyamic acids synthesized from di-trifluoromethyl methane bis(phthalic anhydride) and 4,4′-diaminophenyl sulfone and 4,4′-diaminophenyl ether were found to have excellent negative E-beam resist properties. The best materials contain about 90% imidized structural units having sensitivities of 1.5–2.5 μC cm^?2 and contrast of 1.0–1.3. Polyamic acid of pyromellitic dianhydride and 4,4′-diaminophenyl sulfone imidized to 97% exhibits useful positive E-beam resist properties. Radiation induces imidization or chain scission to alter the solubility of the resist polymers resulting in the formation of latent images.     

Radiolysis of poly(vinyl chloride)

Allyl free-radical intermediates are detected by ultraviolet absorption at 255 mu in poly(vinyl chloride) irradiated at ?196°C and stored at 25°C. In vacuum at 25°C, allyl radicals are converted into polyenyl free radicals and polyenes. From the nature of allyl radical decay in vacuum, radical chain transfer between polyenyl radicals and poly(vinyl chloride) is inferred. Allyl and polyenyl free radicals are scavenged by oxygen on post-irradiation storage in air.     

Radiolysis of resist polymers. IV. Poly(p-substituted-α-methylstyrene)s

The effect of parasubstituents on the radiation chemistry of poly(α-methylstyrene) (PMS) was compared for the fluoro (PFMS), chloro (PCMS), bromo (PBMS), isopropyl (PiPMS), and methoxy (PMeOM) derivatives. Radiolysis yields, ESR spectra, and GC? MS analysis of products were obtained. PMS and PFMS have similar low radiolysis yields, products, and product distributions. Only main-chain radicals which persist to 200° were observed. PCMS has increased values of G_s, G_x, and G_r. The product analysis results suggest that the presence of chlorine contributes to the primary process by dissociative electron capture and enhances the cleavage of α-methyl group. Irradiation of PBMS caused crosslinking and yielded few volatile products. PMeOMS and PiPMS gel readily by γ-irradiation and may be useful as negative radiation resists.     

Acid-catalyzed degradation mechanism of poly(phthalaldehyde): Unzipping reaction of chemical amplification resist

The acid-catalyzed degradation mechanism of chemical amplification resists based on end-capped poly(phthalaldehyde) has been elucidated by semi-empirical molecular orbital calculations. It is concluded that: (i) two different starting points exist in the degradation of end-capped poly(phthalaldehyde), the central part of the polymer as well as the polymer end; (ii) in both cases, after the first protonation, cationic hydroxyl compounds generated decompose to the identical cation intermediate, which can unzip itself to phthalaldehyde monomers successively (unzipping reaction); (iii) the hemiacetal type intermediates hardly degrade to the same intermediate without acid catalyst; (iv) the overall activation energy for the degradation reaction is less than 14 kcal/mol in all the cases. Thus, the poly(phthalaldehyde) resist can easily self-develop below 100°C, as reported in the literature. © 1997 John Wiley & Sons, Inc.     

Radiolysis of aqueous solutions of poly(vinyl alcohol) at 77 K

Paramagnetic products of low-temperature X-ray radiolysis of aqueous poly(vinyl alcohol) solutions (2.5 and 5% by weight) were studied by ESR spectroscopy. Experimental spectra were ascribed to a superposition of signals from hydroxyl radicals and –CH₂?^?C(OH)–CH₂? macroradicals (C_α-macroradicals), respectively. No ESR signals corresponding to trapped electrons were observed that was attributed to the peculiarities of microheterogenous structure of the frozen aqueous polymer solutions. Annealing at 115 K resulted in partial conversion of OH radicals to C_α-macroradicals. It was suggested that main part of hydroxyl radicals was stabilized in phase of polycrystalline ice while macroradicals were formed in “mixed” water–polymer phase. The radiation–chemical yields of paramagnetic species stabilized in the systems under study were determined.     

Substituent positional variations and the lithographic properties of poly(methylstyrene-CO-chloromethylstyrene) resist systems

The lithographic performances of structurally different copolymers of methylstyrene (ortho-, meta- and para-isomers) and chloromethylstyrene (meta- and para-isomers) have been assessed. Linear correlations of the data, based on Charlesby's theory of radiation-induced crosslinking of polymers, demonstrate that sensitivity and contrast are functionally related for this system. Variation of the structure of the chloromethylstyrene component of the copolymers had little effect on the lithographic parameters, but the effect of structural variation of the methylstyrene component was pronounced, the order of increasing sensitivity being ortho < meta < para.     

Radiolysis of resist polymers. VI. Copolymers of trihalophenylmethacrylate and methyl methacrylate

Copolymers of several compositions of methyl methacrylate (MMA), trichlorophenyl methacrylate (TCPMA), and tribromophenyl methacrylate (TBPMA) have been synthesized and characterized. Gamma radiolysis yields are very sensitive to the presence of the halogenated monomers. With less than 10% of the halogenated monomer in the copolymers. G_s values were found to be much greater than that of PMMA. However, the halogenated monomer introduces a tendency toward crosslinking. The results are consistent with the enhancement of chain scission by dissociative electron capture and the tendency of phenyl radical intermediates to cause crosslinking. These structure-property relationships were found to be valid for all the homopolymers and copolymers investigated in this series.     

Poly(phenylhydrosilane): Base-developable polysilane resist

Poly(phenylhydrosilane) becomes soluble in a 2.38% tetramethylammoniumhydroxide aqueous solution after exposure to UV light. This is the first report that the polysilanes not bearing acidic groups can be developed with dilute basic aqueous solutions. Addition of 3,3′,4,4′-tetra(t-butylperoxycarbonyl)benzophenone increases the resist sensitivity. The reaction mechanism is as follows: PS1 photodecomposes to form silyl compounds having SiOH groups, which become soluble in an aqueous base solution, because these silane compounds bearing SiOHs are acidic. © 1997 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 35 : 2355–2364, 1997     

γ Radiolysis of poly(4,4′-isopropylidene diphenylene sebacate)

Poly-(4,4′-isopropylidene diphenylene sebacate) (PIDPS), a condensation product of bisphenol-A and sebacic acid, was irradiated with ⁶⁰Co γ rays. Viscosity, end-group analysis, and IR spectral measurement techniques were used to study the chemical changes occurring during γ radiolysis. It is observed that PIDPS undergoes random chain scission owing to weak links which may be present or be incorporated by the oxygen from air. The G value of random chain scission is estimated to be 9, whereas the enthalpy of fusion is found to be 6.2 kcal/mol repeat unit of PIDPS.     

Grafting epoxy-modified hydrophilic polymers onto poly(dimethylsiloxane) microfluidic chip to resist nonspecific protein adsorption

In order to achieve a simple covalent hydrophilic polymer coating on poly(dimethylsiloxane) (PDMS) microfluidic chip, epoxy modified hydrophilic polymers were synthesized in aqueous solution with a persulfate radical initiation system, and crosslinked onto PDMS pretreated by oxygen plasma and silanized with 3-aminopropyl-triethoxysilanes (APTES). Glycidyl methacrylate (GMA) was copolymerized with acrylamide (poly(AAM-co-GMA)) or dimethylacrylamide (poly(DAM-co-GMA)), and graft polymerized with polyvinylpyrrolidone (PVP-g-GMA) or polyvinylalcohol (PVA-g-GMA). The epoxy groups in the polymers were determined by UV spectra after derivation with benzylamine. Reflection absorption infrared spectroscopy (RAIRS) confirmed covalent grafting of GMA-modified polymers onto PDMS surface. Electroosmotic flow (EOF) in the polymer grafted microchannel was strongly suppressed within the range pH 3-11. Surface adsorption of lysozyme and bovine serum albumin (BSA) was reduced to less than 10% relative to that on the native PDMS surface. On the GMA-modified polymer coated PDMS microchip, basic proteins, peptides, and sodium dodecyl sulfate (SDS) denatured proteins were separated successfully.     

Radiolysis of aqueous solutions of ethylenediaminetetraacetatocerium(III)

The effect of γ-rays on acidic and alkaline solutions of ethylenediaminetetraacetatocerium(III) has been studied both in the presence and absence of oxygen. A mechanism is proposed, in which the radiolytic degradation of the complex is due only to OH, while the radiolytic oxidation of Ce(III) EDTA to Ce(IV) by γ-rays occurs via the formation of hydrogen peroxide.     

Poly(epsilon-caprolactone) biomaterial sterilized by E-beam irradiation

The effects of ionizing radiation (electron beam) on poly(epsilon-caprolactone) (PCL) were studied by analyzing changes in viscosity-average and weight-average molecular weight and radius of gyration, and by performing sol-gel analysis and swelling tests. Samples were irradiated under various conditions: solid and molten PCL in the presence or absence of air. The overall efficiency of crosslinking is higher for samples irradiated in the molten state than in the solid state, and is reduced in the presence of oxygen. Based on three kinds of experiments (molecular weight dependence on the dose in the pre-gelation region, sol-gel analysis, and swelling study), radiation-chemical yields of intermolecular crosslinking and scission were determined and are discussed in terms of the mechanism of radiation-induced reactions in PCL. Properties of the gels formed by high-dose irradiation and mechanical properties of irradiated PCL were analyzed. Irradiation causes an increase in the compression modulus of PCL. This process occurs at the pre-gelation stage and continues in the gel-containing system. We have demonstrated, for the first time, that irradiation of solid PCL is accompanied by a pronounced post-effect, which manifests itself by changes in the average molecular weight. EPR data indicate that this effect, at least in part, is caused by the presence of long-lived radicals trapped in the crystalline regions. Irradiation with the sterilizing dose does not cause a statistically significant change in the biocompatibility of PCL after subsequent storage for 79 d, as determined by preliminary osteoblast vitality tests.     

On the kinetics of polymer degradation in solution—XII. Radiolysis of poly(2,2,2-trichloroethyl methacrylate)

The title compound (PTCMA) was irradiated in O₂-free dioxane solution by ⁶⁰Co-γ-rays or by 100 nsec-pulses of 16 MeV electrons. At concentrations below ca 0.04 base mol/l, main-chain scission occurred as was concluded from the decrease of the light scattering intensity (LSI). G(S) = 3.7 ± 0.4 was independent of the polymer concentration and equal to G(S) observed with solid PTCMA. This result indicates that in dilute solution main-chain scission is induced by the direct action of radiation on the polymer. The free radical [presumably ---C(CH₃)---(CH₂)---] giving rise to main-chain scission has a lifetime of 2.6 msec. It reacts with ethane thiol (k = 6.6 × 10⁴M⁻¹sec⁻¹). At concentrations above 0.04 base mol/l, the polymer crosslinked (gel formation, increase of the LSI according to 2nd order kinetics). It is assumed that crosslinking is due to the combination of radicals of the type ---CH₂---C(CH₃)(COOCH₂CCl₂)--- formed via dissociative electron capture processes involving mainly electrons in spurs that otherwise recombine with parent ions. This conclusion was inferred from the finding that [(τ_1/2)₁]⁻¹ ∞ (c_polymer)²[(τ_1/2)₁): 1st half-life of LSI increase after the pulse, c_polymer: polymer concentration].     

Synthesis of poly(tert-butoxycarbonyl-p-phenylene): precursor to poly(p-phenylene)

Poly[2-(tert-butoxycarbonyl)-1,4-phenylene] ( 2 ) was prepared by the Ni-catalyzed polymerization of tert-butyl 2,5-dichlorobenzoate ( 1 ). The microstructure of polymer 2 was probably alternating head-to-head and tail-to-tail. This polymer was soluble in dipolar aprotic solvents, chloroform, tetrahydrofuran, and dichloromethane. Polymer 2 was saponified easily by thermal or acid treatment to yield poly[2-carboxy-1,4-phenylene] ( 3 ). Decarboxylation of polymer 3 in quinoline in the presence of copper(II) oxide produced poly(p-phenylene) (PPP) ( 4 ).     

Radiolysis of resist polymers. III. Copolymers of methyl-α-chloroacrylate and trihaloethylmethacrylates

Homopolymers of 2,2,2-trifluoroethyl(methacrylate) (TFEMA) and 2,2,2-trichloroethyl-(methacrylate) (TCEMA) and copolymers with methyl-α-chloroacrylate (MCA) in a range of compositions were synthesized. The reactivity ratios were obtained; the two copolymerizations were close to ideal. Poly(MCA) showed G_s = 7.4 and G_s = 0.9 by γ-radiolysis. On the other hand, poly(TFEMA) and poly(TCEMA) and G_s values of 2.0 and 2.4, respectively, and G_x = 0. Radiolysis of copolymers was initiated to a large degree by dissociative electron capture by the halogen atoms in both comonomers, as revealed by the ESR spectra of radicals derived from them. Germinal recombinations in irradiated poly(TFEMA) suggested the presence of radicals in proximity. This process was absent in the copolymers. GC-MS analysis of volatile products and other supporting evidence showed that TFEMA monomers tended to depolymerize; the TCEMA monomers did not. The radiolysis yields varied monotonically with the comonomer composition for the MCA–TFEMA system but the yield–composition relationship was irregular in MCA–TCEMA copolymers. Four noncrosslinking systems are potential radiation resists arranged in increasing order of promise: poly(TFEMA) (G_s = 2.0, T_g = 70°); poly(TCEMA) (G_s = 2.7, T_g = 142°); poly(94MCA-co-6TCEMA) (G_s = 2.7, T_g = 142°); and poly(68MCA-co-32TFEMA) (G_s = 3.0, T_g = 112°). These materials merit further investigation for E-beam or x-ray lithographic applications. Mechanisms of radiolysis for these materials, based on ESR, GC-MS, and radiolysis yield data, were discussed.     

Radiolysis of aqueous solutions of ethylenediaminetetraaceta tocobalt(II) and (III)

The radiolysis of ethylenediaminetetraacetatocobalt (II) and (III) has been studied, both in the presence and absence of oxygen, Radiolytic degradation of the metal chelate was observed. Based on the experimental data, a radiolytic degradation mechanism of the chelates is proposed and discussed.     

Radiolysis of aqueous solutions of cobalt(II) and cobalt(III)

Radiolysis of aqueous solution of di and trivalent cobalt with 1:2 (bis) carboxymethylaminodiethyltetraacetic acid (EGTA) was investigated, both in absence and in presence of oxygen. A radiolytic mechanism has been proposed. It has been shown that the degradation at the ligand of the chelate is due to OH only.