Optical and structural properties of MgZnO/ZnO hetero- and double heterostructures grown by pulsed laser deposition

MgZnO thin films, MgZnO/ZnO heterostructures (HS) and double heterostructures (DHS) have been prepared on a-plane sapphire substrates by means of pulsed laser deposition (PLD). A linear blueshift of the MgZnO emission with increasing Mg content is observed in photoluminescence spectroscopy (PL) at 2 K. Cathodoluminescence measurements verify the spatial homogeneity of the emission properties of the MgZnO films. The film roughness is evaluated from atomic force microscopy scans. In MgZnO/ZnO HS the ZnO grows on all appearing MgZnO facets. PL investigations of such PLD-grown heterostructures show the high optical quality of thin ZnO films (d≤100 nm) grown on MgZnO. Capping those structures with a thin MgZnO layer further improves their luminescence intensity and enhances the emission of free-exciton luminescence from the ZnO layers. MgZnO/ZnO/MgZnO DHS with nominal ZnO layer thicknesses of d_nom≤6 nm show a clear intensification of the ZnO PL. Temperature dependent PL and transmission measurements between 4.4 and 300 K prove the dominating emission to be due to the recombination of excitons localized in the ZnO. At 2 K, due to confinement effects, their emission energy is blueshifted up to 51 meV compared to free excitons in bulk ZnO. PACS 81.15.Fg; 78.66.Hf; 68.37.Ps     

Electrical characterization of ZnO,including analysis of surface conductivity

Most current device applications of ZnO are hampered by the lack of control over the electrical conductivity. As-grown ZnO usually exhibits n-type conductivity, and the cause of this residual doping is heavily debated. We have performed temperature-dependent Hall measurements and material characterization by secondary ion mass spectroscopy on nominally undoped bulk ZnO crystals as well as on material doped with potential candidates for p-conductivity in order to explore the cause of the background doping and to study the impact of possible candidates for p-doping of ZnO. Also, this paper gives an overview about surface conductivity of high-resistivity ZnO bulk material and discusses how this property might impact the difficult search for p-type ZnO. We will demonstrate the effect of a surface conducting channel on homoepitaxial MgZnO layers grown by liquid-phase epitaxy. The detectability of such a surface layer on an epi sample indicates the high structural quality and low background doping of the layer. PACS 61.72.Vv; 68.49.Sf; 73.25.+i; 74.62.Dh; 81.15.Lm     

Effect of MgZnO barrier layer on the UV emission of n-ZnO/p-Si heterojunction diodes

ZnO-based heterojunction light emitting diodes (LEDs) with MgZnO barrier layer had been fabricated on the p-Si substrate by metal-organic chemical vapor deposition (MOCVD) technology. The current-voltage (I-V) characteristics exhibited a typical p-n diode behavior. Both ultraviolet (UV) and visible emissions could be detected in the electroluminescence (EL) measurement. The result was compared with the EL spectrum of n-ZnO/p-Si heterojunction LED without MgZnO barrier layer. An improved light extraction efficiency by about 31% was realized owing to the current-blocking effect of MgZnO layer. The result indicated that MgZnO barrier layer can prevent the electrons as expected and realize electron-hole recombination in ZnO layer effectively.     

Fabrication of p-CuGaS2/n-ZnO:Al heterojunction light-emitting diode grown by metalorganic vapor phase epitaxy and helicon-wave-excited-plasma sputtering methods

Greenish-white electroluminescence (EL) was observed from the heterojunction light-emitting diodes (LEDs) composed of p-type (001) CuGaS₂ chalcopyrite semiconductor epilayers and preferentially (0001)-oriented polycrystalline n-type ZnO thin films. The CuGaS₂ layers were grown on a (001) GaP substrate by metalorganic vapor phase epitaxy and the ZnO films were deposited by the surface-damage-free helicon-wave-excited-plasma sputtering method. The n-ZnO/p-CuGaS₂ LED structure was designed to enable an electron injection from the n-type wider band gap material forming a TYPE-I heterojunction. The EL spectra exhibited emission peaks and bands between 1.6 and 2.5 eV, although their higher energy portions were absorbed by the GaP substrate. Since the spectral lineshape resembled that of the photoluminescence from identical CuGaS₂ epilayers, the EL was assigned to originate from p-CuGaS₂.     

Dependences of the surface and the optical properties on the O2/O2 + Ar flow-rate ratios for ZnO thin films grown on ZnO buffer layers

ZnO active layers on ZnO buffer layers were grown at various O₂/O₂ + Ar flow-rate ratios by using radio-frequency magnetron sputtering. Atomic force microscopy images showed that the surface roughnesses of the ZnO active layers grown on ZnO buffer layers decreased with decreasing O₂ atmosphere, indicative of an improvement in the ZnO surfaces. The type of the ZnO active layer was n-type, and the resistivity of the layer increased with increasing O₂ atmosphere. Photoluminescence spectra from the ZnO active layers grown on the ZnO buffer layers showed dominant peaks corresponding to local levels in the ZnO energy gap resulting from oxygen vacancies or interstitial zinc vacancies, and the peak positions changed significantly with the O₂/O₂ + Ar flow rate. These results can help improve understanding of the dependences of the surface and the optical properties on the O₂/O₂ + Ar ratio for ZnO thin films grown on ZnO buffer layers.     

ZnO-based heterojunction light-emitting diodes on p-SiC(4H) grown by atomic layer deposition

Atomic layer deposition was used to grow n-type Al-doped ZnO (n-ZnO) and undoped ZnO (i-ZnO) layers on p-type 4H-SiC substrates, to fabricate n-ZnO/p-SiC and n-ZnO/i-ZnO/p-SiC heterojunction light-emitting diodes (LEDs). Electroluminescence (EL) from the n-ZnO/p-SiC LED originated from radiative recombination of donor–acceptor pairs in SiC due to the predominant electron injection from n-ZnO into p-SiC. On the other hand, the n-ZnO/i-ZnO/p-SiC LED exhibited dominant ultraviolet (UV) emission at 393 nm from ZnO. This difference is attributable to the insertion of the undoped i-ZnO layer between n-ZnO and p-SiC, leading to the injection of holes from p-SiC and electrons from n-ZnO into the i-ZnO layer and thus the generation of UV EL from ZnO.     

氧气压强对PLD制备MgZnO薄膜光学性质的影响(英文)

使用准分子脉冲激光沉积(PLD)方法在Si(100)基片上制备了高度c轴取向的MgZnO薄膜。分别使用SEM、XRD、XPS、PL谱和吸收谱表征了薄膜的形貌、结构、成分和光学性质。实验发现氧气压强对MgZnO薄膜的结构和光学性质有重要影响。当氧气压强由5 Pa增大到45 Pa时,薄膜的PL谱紫外峰蓝移了86meV,表明氧气压强的增大提高了MgZnO薄膜中Mg的溶解度。在15 Pa氧气压强下制备的薄膜显示了独特、均匀的六角纳米柱状结构,其PL谱展示了优异的发光特性,具有比其他制备条件下超强的紫外发射和微弱的可见发光。500~600 nm范围内的绿光发射,我们讨论其机理可能源于深能级中与氧相关的缺陷。使用PLD得到纳米柱状结构表明:优化制备条件,可望使用PLD制备ZnO纳米阵列的外延衬底;可使用PLD技术开发基于ZnO纳米结构的高效发光器件。     

The demonstration of hybrid n-ZnO nanorod/p-polymer heterojunction light emitting diodes on glass substrates

We report a demonstration of heterojunction light emitting diode (LED) based on a hybrid n-ZnO-nanorod/p-polymer layered structure. The ZnO was grown using the aqueous chemical growth (ACG) on top of the polymer(s) which were deposited on glass. The current–voltage (I–V) behavior of the heterojunctions showed good rectifying diode characteristics. Room-temperature electroluminescence (EL) spectra of the LEDs provided a broad emission band over a wide LED color range (430–650 nm), in which both zinc and oxygen vacancy peaks are clearly detected. We present here luminescent devices based on the use of ZnO-nanorods in combination with two different blended and multi-layered p-type polymers. Electroluminescence of the first batch of devices showed that white bluish strong emission for the presently used polymers is clearly observed. We obtained a turn-on voltage of 3 V and break-down voltage equal to −6 V for PVK-TFB blended device. The corresponding values for the NPD-PFO multilayer device were 4 V and −14 V, respectively. The rectification factors were equal to 3 and 10 for the two devices, respectively. The films and devices processed were characterized by scanning electron microscopy (SEM), DEKTAK 3ST Surface Profile, Semiconductor Parameter Analyzer, photoluminescence (PL), and electroluminescence (EL).     

Structure and optoelectronic properties of Si/O superlattice

We have carried out structural study of the Si/O semiconductor atomic superlattices (SAS) with up to 18 Si/O layers fabricated by molecular beam epitaxy and in situ oxygen exposure on both Sb-doped and undoped Si buffer layers, and correlated the results with our photoluminescence, electroluminescence (EL) and I–V data. The Si/O SAS is a new type of superlattice, where monolayers of oxygen are sandwiched between the Si layers. High-resolution cross-sectional transmission electron microscopy (TEM) study has confirmed the presence of the superlattice and shown epitaxy in the Si/O superlattices. The high structural quality of the layers grown on the undoped Si buffer layers with low density of stacking faults—less than 10⁷/cm²—was established by TEM. Although structure perfection is very important allowing this new class of superlattices to be extended to other systems, it is important to point out that a 9-period SAS-based EL device with emission of light in green has been life-tested with stable output for over 1 year of continuous operation. The Si/O superlattice also serves as an epitaxially grown insulating layer as possible replacement of silicon-on-insulator. Together with the tailor-made effective band gap, this epitaxially grown superlattice may serve as future silicon-based three-dimensional integrated circuits.     

Improved color rendering of phosphor-converted white light-emitting diodes with dual-blue active layers and n-type AlGaN layer

An InGaN/GaN blue light-emitting diode (LED) structure and an InGaN/GaN blue-violet LED structure were grown sequentially on the same sapphire substrate by metal-organic chemical vapor deposition. It was found that the insertion of an n-type AlGaN layer below the dual blue-emitting active layers showed better spectral stability at the different driving current relative to the traditional p-type AlGaN electron-blocking layer. In addition, color rendering index of a Y3Al5O12:Ce3+ phosphor-converted white LED based on a dual blue-emitting chip with n-type AlGaN reached 91 at 20 mA, and Commission Internationale de L'Eclairage coordinates almost remained at the same point from 5 to 60 mA.     

ZnMgO/n-ZnO/ZnMgO/p-GaN异质结LED的紫外电致发光

利用等离子体辅助分子束外延( P-MBE)技术制备了ZnMgO/n-ZnO/ZnMgO/p-GaN异质结LED.Ni/Au电极与p-GaN、In电极与ZnMgO之间都形成了良好的欧姆接触.在ZnMgO/n-ZnO/ZnMgO/p-GaN异质结器件中观察到了明显的整流特性.异质结的电致发光强度随着注入电流的增大而逐渐增强...     

Effect of MgO buffer layer thickness on the electrical properties of MgZnO thin film transistors fabricated by plasma assisted molecular beam epitaxy

We report the fabrication and electrical characteristics of thin film transistors based on MgZnO thin films with different thicknesses of MgO buffer layer. The MgZnO thin films with MgO buffer layers were grown on SiO₂/p-Si substrates by plasma assisted molecular beam epitaxy. The effects of the buffer layer thickness on the structural properties of MgZnO films are investigated by X-ray diffraction, and the results show that the crystal quality of the MgZnO film is enhanced with 4 nm MgO buffer layer. The MgZnO TFT with 4 nm MgO buffer layer exhibits an n-type enhancement mode characteristics with a field effect mobility of 1.85 cm²/V s, a threshold voltage of 27.6 V and an on/off ratio of above 10⁶.     

The effect of Al doping on the morphology and optical property of ZnO nanostructures prepared by hydrothermal process

The undoped and Al-doped ZnO nanostructures were fabricated on the ITO substrates pre-coated with ZnO seed layers using the hydrothermal method. The undoped well-aligned ZnO nanorods were synthesized. When introducing the Al dopant, ZnO shows various morphologies. The morphology of ZnO changes from aligned nanorods, tilted nanorods, nanotubes/nanorods to the nanosheets when the Al doping concentrations increase. The ZnO nanostructures were characterized by X-ray diffraction, field emission scanning electron microscopy, X-ray photoelectron spectroscopy, photoluminescence and Raman technology. The Al doping concentrations play an important role on the morphology and optical properties of ZnO nanostructures. The possible growth mechanism of the ZnO nanostructures was discussed.     

ZnO nanorods–polymer hybrid white light emitting diode grown on a disposable paper substrate

We demonstrate intrinsic white light emission from hybrid light emitting diodes fabricated using an inorganic–organic hybrid junction grown at 50 °C on a paper substrate. Cyclotene was first spin coated on the entire substrate to act as a surface barrier layer for water and other nutrient solutions. The active area of the fabricated light emitting diode (LED) consists of zinc oxide nanorods (ZnO NRs) and a poly(9,9‐dioctylfluorene) (PFO) conducting polymer layer. The fabricated LED shows clear rectifying behavior and a broad band electroluminescence (EL) peak covering the whole visible spectrum range from 420 nm to 780 nm. The color rendering index (CRI) was calculated to be 94 and the correlated color temperature (CCT) of the LED was 3660 K. The low process temperature and procedure in this work enables the use of paper substrate for the fabrication of low cost ZnO–polymer white LEDs for applications requiring flexible/disposable electronic devices. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

反对称n-AlGaN层对GaN基双蓝光波长发光二极管性能的影响

采用数值分析方法对在InGaN/GaN混合多量子阱活性层和n-GaN之间引入n-AlGaN层的GaN基双蓝光波长发光二极管进行模拟分析.结果发现,与传统的具有p-AlGaN电子阻挡层的双蓝光波长发光二极管相比,这种反对称n-AlGaN层能有效改善电子和空穴在混合多量子阱活性层中的分布均匀性及减少电子溢出,实现电子空穴在各个量子阱中的平衡辐射,从而减弱了双蓝光波长发光二极管的效率衰减.此外,通过改变Al组分可以提高双蓝光波长发光二极管发射光谱的稳定性:当Al组分为0.16时,双蓝光波长发光二极管的光谱在小电流下比较稳定,而Al组分为0.12时,光谱在大电流下比较稳定.     

CVD两步法生长ZnO薄膜及其光致发光特性

用CVD两步法在常压下于p型Si(100)衬底上沉积出具有较好择优取向的多晶ZnO薄膜。在325nm波长的光激发下,室温下可观察到显著的紫外光发射(峰值波长381nm)。高温退火后氧空位缺陷浓度增加,出现了一个450~600nm的绿光发光带,发光峰值在510nm。作为比较,用一步法生长的ZnO薄膜结晶质量稍差。在其PL谱中不仅有峰值波长389nm的紫外发射而且还出现了一个很强的蓝光发光中心(峰值波长437nm),退火后同样产生绿光发光带。对这两种绿光发光带的发光机制进行了研究,认为前者源于VO,而后者与O_Zn有密切的关系。     

Photoluminescence of a ZnO/GaN Heterostructure Interface

Growth of a ZnO/GaN heterostructure is carried out using pulsed laser deposition. By etching the ZnO layer from the ZnO/GaN structure, the photoluminescence （PL） of the associated GaN layer shows that the donor- acceptor luminescence of CaN shifts to about 3.27eV, which is consistent with the electroluminescence （EL） of n-ZnO/p-GaN already reported. XPS shows that oxygen diffuses into the CaN crystal lattice from the surface to 20nm depth. The PL spectra at different temperatures and excitation densities show that oxygen plays the role of potential fluctuation. The associated PL results of the interface in these LEDs could be helpful to understand the mechanism of EL spectra for ZnO/CaN p-n junctions.     

ZnO薄膜受激发射特性的研究

氧化锌薄膜因其大的激子结合能和强的光发射、激光阈值低和能在高温下工作等优点而成为制备短波长激光、发光二极管等光电子器件的有希望材料。采用激光分子束外延 (L MBE)方法制备了ZnO薄膜。在室温下 ,测量了样品的吸收光谱 ,以及不同光泵浦强度下的发射光谱。从光谱图中可以看出该材料有很好的质量。研究了ZnO薄膜的受激发射特性及机理 ;测量了发射光强与泵浦光强之间的关系 ;比较了较高激发密度下的受激发射、自发发射和激光脉冲的时间特性 ,这些都证实了该发射是受激发射。     

Nano-plasmon enhancement effect on MWIR light emitting diode performance

We observed a significant increase in electro luminescence from GaSb based mid-wave infrared (MWIR) LED device through coupling with localized surface plasmon of a single layer Au nano-particles. We fabricated an interband cascade (IC) LED device with nine cascade active/injection layers with InAs/Ga_1−x In_xSb/InAs quantum well (QW) active region. Thin Au plasmon layer of 20 nm thickness is deposited on top anode electrode by e-beam technique, which resulted in 100% increase in light output for 50 μm square mesa device. We also observed a reduction in the device turn on voltage and increase in the apparent black body emission temperature due to nano-structure surface plasmon layer.     

GaInAsP/InP LED透镜的研制

带有透镜结构的发光管有利于提高器件的外量子效率和耦合效率。InP衬底对1.3μm波长范围的光发射是透明的,因而可制造带透镜结构器件。本文研究了4%CH3COOH体系腐蚀液和H3PO4:HCI体积比为1:3腐蚀液的腐蚀特性,比较了二者的活化能和腐蚀液的温度,状态和衬底晶向等对腐蚀速率的影响。并用二步腐蚀法在外延片的InP衬底上制成了带有透镜的InAsP/InP发光管。其曲率半径为160—170μm。该器件在彩色录像传输系统中的应用效果良好。