Cooperative Regulation of Vocal Fold Morphology and Stress by the Cricothyroid and Thyroarytenoid Muscles

Voice is produced by vibrations of vocal folds that consist of multiple layers. The portion of the vocal fold tissue that vibrates varies depending primarily on laryngeal muscle activity. The effective depth of tissue vibration should significantly influence the vibrational behavior of the tissue and resulting voice quality. However, thus far, the effect of the activation of individual muscles on the effective depth is not well understood. In this study, a three-dimensional finite element analysis is performed to investigate the effect of the activation of two major laryngeal muscles, the cricothyroid (CT) and thyroarytenoid (TA) muscles, on vocal fold morphology and stress distribution in the tissue. Because structures that bear less stress can easily be deformed and involved in vibration, information on the morphology and stress distribution may provide a useful estimate of the effective depth. The results of the analyses indicate that the two muscles perform distinct roles, which allow cooperative control of the morphology and stress. When the CT muscle is activated, the tip region of the vocal folds becomes thinner and curves upward, resulting in the elevation of the stress magnitude all over the tissue to a certain degree that depends on the stiffness of each layer. On the other hand, the TA muscle acts to suppress the morphological change and controls the stress magnitude in a position-dependent manner. Thus, the present analyses demonstrate quantitative relationships between the two muscles in their cooperative regulation of vocal fold morphology and stress.     

Atomic layer epitaxy of AlP and (AlP)n(GaP)n superlattice using ethyldimethylamine alane as a new aluminum source

Atomic layer epitaxy (ALE) of AlP was realized using ethyldimethylamine alane (EDMAAl) as a new Al source. Self-limiting growth of AlP took place at one and two monolayers per ALE cycle. Secondary ion mass spectroscopy revealed that the amounts of incorporated impurities (carbon, hydrogen and oxygen) in ALE-grown AlP layers was greatly suppressed by using the new Al source, to nearly the same levels as in high-quality MOVPE-grown layers. We also achieved the successful ALE growth of (AlP)_n(GaP)_n short-period superlattices (SLs), taking advantage of the overlapping temperature windows of ALE-GaP and ALE-AlP. X-ray diffraction measurements showed reasonably good interface abruptness of SLs as low as 3. The PL emission peak from SLs involving Al-containing layers was observed in ALE growth for the first time.     

Influences of different oxidants on the characteristics of HfAlOx films deposited by atomic layer deposition

A comparative study of two kinds of oxidants(H2O and O3) with the combinations of two metal precursors [trimethylaluminum(TMA) and tetrakis(ethylmethylamino) hafnium(TEMAH)] for atomic layer deposition(ALD) hafnium aluminum oxide(HfAlOx) films is carried out.The effects of different oxidants on the physical properties and electrical characteristics of HfAlOx films are studied.The preliminary testing results indicate that the impurity level of HfAlOx films grown with both H2O and O3 used as oxidants can be well controlled,which has significant effects on the dielectric constant,valence band,electrical properties,and stability of HfAlOx film.Additional thermal annealing effects on the properties of HfAlOx films grown with different oxidants are also investigated.     

(Bi1-x Agx)2(Te1-ySey)3粉体的机械合金化制备及其放电等离子烧结体的热电输运特性

采用机械合金化制备了n型(Bi_1-xAg_x)₂(Te_1-ySe_y)₃合金粉体,对其进行XRD分析表明Bi,Te,Ag,Se单质粉末,经2h球磨后实现了合金化;SEM分析表明随着机械合金化时间延长粉体颗粒变得均匀、细小,颗粒尺寸在微米至亚微米数量级.采用放电等离子烧结制备了块体样品,研究了合金成分和球磨时间对热电性能的影响.结果表明材料的热电性能与掺杂元素有密切关系,Ag有利于提高功率因子和降低晶格热导率,球磨10h的(Bi_0.99Ag_0.01)₂(Te_0.96Se_0.04)₃合金粉末的烧结块体具有最大的功率因子和最低的晶格热导率,并在323K取得最高ZT值0.52. 关键词： 1-xAg_x)₂(Te_1-ySe_y)₃合金')" href="#">(Bi_1-xAg_x)₂(Te_1-ySe_y)₃合金 机械合金化 放电等离子烧结 热电性能     

Experimental and numerical study on instability structure of the supersonic mixing layer (Mc = 0.5)

The parameters of instability wave of supersonic mixing layer(Mc=0.5,M1=3.5/M2=1.4) are measured by flow visualization and calculated by means of two-dimensional direct numerical simulaitons of the compressible Navier-Stokes equations.In both cases of the mixing layer with harmonic disturbance or not,the comparative results indicate that the wavelength of the two-dimensional wave is equal to the vortex spacing in the streamwise direction because the difference between them is less than 1%.However,the measur...     

Strong visible photoluminescence in amorphous SiOx and SiOx : H thin films prepared by thermal evaporation of SiO powder

Amorphous SiO_x and SiO_x : H films were prepared by thermal evaporation of SiO powder in ultrahigh vacuum or under a flow of hydrogen ions onto silicon substrates maintained at 100°C. Photoluminescence (PL) can be seen in the visible range with the naked eye on the as-deposited samples without post-treatments. Composition and structure investigations were performed by infrared and Raman spectrometry experiments on films annealed at different temperatures. Hydrogen and oxygen bonding was studied by infrared spectrometry. The PL is attributed to the quantum confinement of excitons in a-Si clusters embedded in the a-SiO_x matrix. Our results demonstrate that oxygen creates an efficient potential barrier and no further passivation by hydrogen is necessary.     

脉冲激光沉积法制备的Ni1-xFexO稀磁半导体的结构和磁性研究

利用脉冲激光沉积方法制备出了具有室温铁磁性的Ni_1-xFe_xO(x=0.02,0.05)稀磁半导体.X射线衍射(XRD)结果表明Ni_1-xFe_xO的晶体结构为NaCl结构,并且在Fe含量较高的Ni_0.95Fe_0.05O中出现了少量的α-Fe₂O₃物相.X射线吸收近 关键词： 1-xFe_xO')" href="#">Ni_1-xFe_xO XANES 脉冲激光沉积方法     

Magnetic and structural properties of magnetoresistive FexAu100−x alloys produced by mechanical alloying

Fe_xAu_100−x alloys have been produced for the first time by mechanical alloying. X-ray diffractograms show FCC peaks. From the X-ray diffracion peak-widths we estimate the final grain size, which vary with x from 112 nm (for x=15) to 32 nm (for x=30). Lattice parameter decreases with concentration (minimum 0.401 nm at x=30), but above Vegard's law values. Susceptibility measurements show cluster-glass behaviour. Critical temperatures are consistently lower than similar alloys produced by arc melting followed by fast quenching. A magnetic phase diagram is presented. Giant magnetoresistance is present in all samples, with a maximum at x=25. This effect is caused by the dispersion of small iron clusters produced by the mechanical work.     

原子层沉积技术沉积的FeOx包裹层显著提高Pd/C催化剂在甲酸分解放氢反应中的催化活性

Hydrogen generation from formic acid (FA) has received significant attention.The challenge is to obtain a highly active catalyst under mild conditions for practical applications.Here atomic layer deposition (ALD) of FeO_x was performed to deposit an ultrathin oxide coating layer to a Pd/C catalyst,therein the FeO_x coverage was precisely controlled by ALD cycles.Transmission electron microscopy and powder X-ray diffraction measurements suggest that the FeO_x coating layer improved the thermal stability of Pd nanoparticles (NPs).X-ray photoelectron spectroscopy measurement showed that deposition of FeO_x on the Pd NPs caused a positive shift of Pd3d binding energy.In the FA dehydrogenation reaction,the ultrathin FeO_x layer on the Pd/C could considerably improve the catalytic activity,and Pd/C coated with 8 cycles of FeO_x showed an optimized activity with turnover frequency being about 2 times higher than the uncoated one.The improved activities were in a volcanoshape as a function of the number of FeO_x ALD cycles,indicating the coverage of FeO_x is critical for the optimized activity.In summary,simultaneous improvements of activity and thermal stability of Pd/C catalyst by ultra-thin FeO_x overlayer suggest to be an effective way to design active catalysts for the FA dehydrogenation reaction.     

Structural and optical properties of Ba(Ti1−x,Nix)O3 thin films prepared by sol–gel process

Ba(Ti_1−x,Ni_x)O₃ thin films were prepared on fused quartz substrates by a sol–gel process. X-ray diffraction and Raman scattering measurements showed that the films are of pseudo-cubic perovskite structure with random orientation and the change of lattice constant caused by Ni-doping with different concentrations is very small. Optical transmittance spectra indicated that Ni-doping has an obvious effect on the energy band structure. The energy gap of Ba(Ti_1−x,Ni_x)O₃ decreased linearly with the increase of Ni concentration. It indicates that the adjusting of band gap can be achieved by controlling the Ni-doping content accurately in Ba(Ti_1−x,Ni_x)O₃ thin films. This has potential application in devices based on ferroelectric thin films.     

Study on adsorption and reaction mechanism of preparation of TiO2/SiO2 by adsorption phase reactor technique

This paper approaches the evolution of adsorption layer with temperature under different water concentrations. EDX and X-ray diffraction (XRD) indicated that under low water concentration (LWC), there was a sharp decrease in TiO₂ quantity curve and grain size curve between 40 °C and 60 °C. But under high water concentration (HWC), TiO₂ quantity and grain size both rose continually. In transmission electron microscopy (TEM) picture, the characteristic of samples of LWC and HWC at low temperature were similar, whereas they became quite different at high temperature. These phenomena manifest that the effects of adsorption and reaction alter at different conditions. Under LWC, adsorption mechanism dominates the process. Under HWC, the chief mechanism at low temperature was similar to that of LWC and at high temperature the major reaction region switches from adsorption to alcohol bulk. Based on the characteristics of adsorption on silica surface, the phenomenology theory dealt with formation of adsorption layer and its evolution with temperature was proposed.     

线性微波化学气相沉积制备SiNx薄膜的微结构及光学性能研究

利用自主研发的线性微波化学气相沉积系统在不同微波功率、微波占空比、基片温度、特气比例条件下制备了SiN_x薄膜. 通过扫描电子显微镜、椭圆偏振仪等表征测量技术, 研究了不同工艺参数对SiN_x薄膜表面形貌、元素配比、折射率、沉积速度的影响, 并探讨了薄膜元素配比、折射率、沉积速度间的关系. 结果表明: 利用线性微波沉积技术, 不同工艺参数下制备的SiN_x薄膜组成元素分布均匀, 同时具有平整的表面状态; 特气比例和微波占空比是影响薄膜折射率的最主要因素, 薄膜折射率在1.92–2.33之间连续可调; 微波功率、微波占空比、沉积温度、特气比例都对SiN_x 薄膜沉积速度影响较大, 制备的SiN_x薄膜最大沉积速度为135 nm·min^-1.     

Structural and mechanical properties of compositionally gradient CrNx coatings prepared by arc ion plating

Compositionally gradient CrN_x coatings were fabricated using arc ion plating by gradually increasing N₂ flow rate during the deposition process. The effect of substrate bias, ranging from 0 to −250 V, on film microstructure and mechanical properties were systematically investigated with XRD, SEM, HRTEM, nanoindentation, adhesion and wear tests. The results show that substrate bias has an important influence on film microstructure and mechanical properties of gradient CrN_x coatings. The coatings mainly crystallized in the mixture of hexagonal Cr₂N, bcc Cr and fcc rock-salt CrN phases. N₂ flow rate change during deposition results in phase changes in order of Cr, Cr + Cr₂N, Cr₂N, Cr₂N + CrN, and CrN, respectively, along thickness direction. Phase fraction and preferred orientation in CrN_x coatings vary with substrate bias, exerting an effective influence on film hardness. With the increasing of bias, film microstructure evolves from an apparent columnar structure to a highly dense one. The maximum hardness of 39.1 GPa was obtained for the coatings deposited at a bias of −50 V with a friction coefficient of 0.55. It was also found that adhesion property and wear resistance of gradient CrN_x coatings were better than that of homogeneous CrN coatings.     

Influence of octahedral tilting and composition on electrical properties of the Li0.2 − xNaxLa0.6TiO3 (0 ≤ x ≤ 0.2) series

The Rietveld analysis of ND patterns of polycrystalline Li_0.2 − xNa_xLa_0.6TiO₃ (0 ≤ x < 0.2) samples, recorded between 300 and 1075 K, shows an orthorhombic–tetragonal transformation, in which the octahedral tilting along the b axis is eliminated at ~ 773 K, but the vacancy ordering along the c axis remains. In Li rich samples, conductivity (10^− 3 Ω^− 1 cm^− 1 at 300 K) departs from the Arrhenius behaviour, decreasing activation energies from 0.37 to 0.14 eV when octahedral tilting is eliminated. Successive Maxwell–Wagner blocking processes, detected in the real part of dielectric constant plots, have been ascribed to the Li blocking at interior domains, grain-boundary and electrode–electrolyte interfaces. The substitution of Li⁺ by Na⁺ decreases the amount of vacant A-sites, decreasing several orders of magnitude the conductivity when the amount of vacancies approaches the vacancy percolation threshold (n_p = 0.27). Below the percolation threshold, Li ions only display local mobility, remaining confined into small domains of perovskites.     

Preparation, structure and ferromagnetic properties of the nanocrystalline Ti1-xMnxO2 thin films grown by radio frequency magnetron co-sputtering

This paper reported that the Mn-doped TiO2 films were prepared by radio frequency （RF） magnetron cosputtering. X-ray diffraction measurements indicate that the samples are easy to form the futile structure, and the sizes of the crystal grains grow big and big as the Mn concentration increases. X-ray photoemlssion spectroscopy measurements and high resolution transmission electron microscope photographs confirm that the manganese ions have been effectively doped into the TiO2 crystal when the Mn concentration is lower than 21%. The magnetic property measurements show that the Ti1-xMnxO2 （x = 0.21） films are ferromagnetic at room temperature, and the saturation magnetization, coercivity, and saturation field are 16.0 emu/cm^3, 167.5 × 80 A/m and 3740 × 80 A/m at room temperature, respectively. The room-temperature ferromagnetism of the films can be attributed to the new futile Ti1-xMnxO2 structure formed by the substitution of Mn^4＋ for Ti^4＋ into the TiO2 crystal .lattice, and could be explained by O vacancy （Vo）-enhanced ferromagnetism model.     

Characterization by electrolyte electroreflectance and X-ray photoelectron spectroscopy of amorphous Ni59Nb40Pt1−xSnx alloys and their activation by HF solutions

The influence of chemical etching with HF on the nature of the surface of amorphous Ni₅₉Nb₄₀Pt_1−xSn_x alloys has been studied in situ by electrolyte electroreflectance (EER) and ex situ by X-ray photoelectron spectroscopy (XPS). The EER spectrum of the untreated alloy in 0.5 M H₂SO₄ shows a bipolar band, which disappears after the HF treatment yielding a structureless EER spectrum similar to that of Pt, but reappears after several hours in the 0.5 M H₂SO₄ electrolyte. This process of dissolution by HF of an oxide species and its reappearance after a few hours cannot be followed by XPS, since the time interval between sample withdrawal from the electrolyte and actual measurement is of a few hours as well. XPS spectra showed the presence of metallic Nb before and after the HF treatment, and that niobium pentoxide was the main species in the as-quenched alloy, but that after treatment with HF it became a minor component, the main one being NbO. The main effect of the HF treatment is to produce a platinum enrichment of the surface, as unequivocally determined by cyclic voltammetry, XPS and EER. After Ar sputtering for 9 min the XPS spectrum of the untreated alloy showed metallic Nb only, while in the HF-treated alloy the peaks of metallic Nb were swamped by those of NbO and some Nb₂O₅. We interpret this difference as being due to the formation by the HF attack of a porous Nb film which becomes oxidized in the electrolyte and/or during transfer to the spectrometer, and so thick that it is not eliminated by Ar sputtering for 9 min.     

Scanning tunneling and atomic force microscopy study of the misfit layer compounds (LaS)1.14(NbS2)n (n=1, 2) and [(Pb,Sb)S)]1.14NbS2

The misfit layer compounds (LaS)_1.14(NbS₂)_n (n=1, 2) and [(Pb,Sb)S]_1.14NbS₂ were examined by scanning tunneling microscopy (STM) and atomic force microscopy (AFM). In these compounds the NaCl-type double MS (M=La, Pb, Sb) layers (Q layers) alternate with the NbS₂ layers (H layers) made up of NbS₆ trigonal prisms. It was possible to record AFM and STM images for only the H layers for (LaS)_1.14(NbS₂)_n, but for both the H- and Q-layers for [(Pb,Sb)S]_1.14NbS₂. Partial and total electron density plots of the H and Q layers were calculated to interpret the observed STM and AFM images. The bright spots in the STM and AFM images of the H layer correspond to S atoms, and those of the Q layer to Pb and Sb atoms. The STM images for the Q layers of [(Pb,Sb)S]_1.14NbS₂ suggest that a short-range ordering of the Pb and Sb atoms occurs in the (Pb,Sb)S sheets of the Q layer.     

Observing the effect of water vapor on post-irradiated surface morphology of SiO2 and Si3N4 insulators by atomic force microscopy

In this work, we investigated the effect of water-vapor treatment on the surface morphology of SiO₂ and Si₃N₄ insulators before and after Co⁶⁰ gamma-ray irradiation by using the atomic force microscopy (AFM) operated under non-contact mode. Before irradiation, no apparent surface morphology change was found in SiO₂ samples even they were water vapor treated. However, bright spots were found on post-irradiated water-vapor-treated SiO₂ sample surfaces but not on those without water-vapor treatment. We attributed the bright spots to the negative charge accumulation in the oxide due to charge balancing between hydroxyl (OH⁻) ions adsorbed on SiO₂ surface and electron-hole pairs (ehps) generated during irradiation since they can be annealed out after low temperature annealing process. On the contrary, no bright spots were observed on post-irradiated Si₃N₄ samples with and without water-vapor treatment. This result confirms that Si₃N₄ is a better water-resist passivation layer than SiO₂ layer.     

(111)择优取向的Pb(Zr0.52Ti0.48)O3铁电薄膜的制备及研究

选用不同浓度的Pb(Zr_0.52Ti_0.48)O₃溶胶，用Sol-gel法在Pt/Ti/SiO₂/Si基片上沉积一层厚度不同的Pb(Zr_0.52Ti_0.48)O₃ (PZT52)过渡层，经400℃烘烤、550℃退火等程序后，再用Sol-gel法在PZT52过渡层上沉积Pb(Zr_0.52Ti_0.48)O _{关键词： PZT铁电薄膜 择优取向 过渡层 剩余极化强度}     

高功率脉冲电子束辐照SiO$lt;sub$gt;2$lt;/sub$gt;的光学和激光损伤性能

研究了不同剂量的60 kW高功率脉冲电子束辐照对高纯熔石英玻璃的微观结构、光学性能和激光损伤特性的影响规律. 光学显微图像表明, 辐照后熔石英样品由于热效应导致表面破裂, 裂纹密度和尺寸随辐照剂量增加而增大, 采用原子力显微镜分析表面裂纹的微观形貌, 裂纹宽度约1 um, 同时样品表面分布着大量尺寸约0.1–1μm的碎片颗粒. 吸收光谱测试表明, 所有样品均在394 nm处出现微弱的吸收峰, 吸收强度随着电子束辐照剂量增大呈现先增加后减小的趋势. 荧光光谱测试发现辐照前后样品均有3个荧光带, 分别位于460, 494和520 nm, 荧光强度随辐照剂量的变化趋势与吸收光谱一致. 利用355 nm激光研究了不同剂量电子束辐照对熔石英激光损伤阈值的影响, 结果表明熔石英的损伤阈值随着辐照剂量的增加而降低. 在剂量较低时, 导致熔石英激光损伤阈值下降的原因主要是色心缺陷; 剂量较高时, 导致损伤阈值降低的原因主要是样品表面产生的大量微裂纹和碎片颗粒对激光的调制和吸收. 关键词： 熔石英 电子束辐照 色心 激光损伤阈值