原子力显微镜与透射电镜对比研究嵌段共聚物微相分离形态

嵌段共聚物微观相分离形态结构由于其理论与应用中的重要性一直是人们研究的热点 [1] .本文研究的聚苯乙烯 -聚乙烯 /聚丁烯 -聚苯乙烯三嵌段共聚物 (SEBS)为聚苯乙烯 -聚丁二烯 -聚苯乙烯 (SBS)饱和加氢后的产物 .由于中间嵌段中的双键大多已加氢饱和 ,过去一直没有合适的染色剂进行染色 ,所以在 2 0世纪 80年代中期以前 ,SEBS形态结构未见文献报道 [1] .近年来 ,由于新型染色剂 Ru O4 的应用 ,使得用透射电镜 (TEM)观察其微相分离形态成为可能 .　　随着对嵌段共聚物形态结构认识程度深入 ,人们迫切希望能有新的手段提供更加丰富的…     

表面场诱导线性三嵌段共聚物薄膜的微结构及其转变规律

采用实空间自洽场理论研究了ABC对称线性三嵌段共聚物薄膜的自组装结构及其转变规律.选取具有特定聚合物参数的对称线性三嵌段共聚物,对无修饰条纹和有修饰条纹的两类薄膜受限表面情况,通过调节其薄膜表面场强度和薄膜厚度,获得了一系列新颖的聚合物薄膜微结构.研究结果表明,在无修饰条纹的单一薄膜受限情况下,共聚物趋向于形成规整有序的层状或穿孔层状结构;而在有条纹修饰情况下,共聚物在相应的条纹修饰区域下发生微相分离并趋于形成水平柱状结构.     

外加气流法制备微相结构有序的PS-b-PEO嵌段共聚物薄膜

采用原子转移自由基聚合(ATRP)的方法合成了聚苯乙烯-聚环氧乙烷(PS-b-PEO)嵌段共聚物,并利用核磁共振波谱(1H-NMR)、傅里叶变换红外光谱(FTIR)以及凝胶渗透色谱法(GPC)对聚合物进行了表征.利用外加气流法制备了具有不同形貌的嵌段共聚物薄膜,并讨论聚合物分子组成、气流温度、气流速度以及不同基底对薄膜表面形貌以及内部结构的影响.当嵌段共聚物中聚苯乙烯嵌段的质量分数为83%~85%,气流温度为30~50℃,气流速度3~5 m/s时,有利于形成表面垂直柱状微相分离结构.当硅基底的接触角小于90°时,在合适的外加气流场作用下可以形成薄膜的表层和底层垂直有序而薄膜内部无序的非对称结构.     

单一分子量含氟嵌段共聚物的本体及薄膜自组装研究

嵌段共聚物导向自组装作为一种自下而上的图案化工艺,受到工业界和学术界的广泛关注.然而,导向自组装中缺陷率与分子参数之间的关系研究尚不清晰.本文工作基于模块化合成策略,利用迭代指数增长法并结合巯基-双键的点击反应成功制备了高χ低N的单一分子量含氟聚酯嵌段共聚物(oLA_n-FPOSS).单一分子量特征可以排除多分散性对自组装行为的影响.本体自组装研究表明聚酯嵌段和含氟嵌段具有强相分离驱动力,可以形成特征尺寸小于10 nm的六方柱状相结构(HEX).在薄膜自组装中,嵌段共聚物经过简单的热退火可以在硅片表面形成平行基底排布的柱状纳米图案.此外,通过对比研究不同链长单一分子量嵌段共聚物的薄膜组装行为,发现随着嵌段共聚物链长的增长薄膜组装图形缺陷率明显下降,初步揭示了薄膜自组装过程中缺陷形成对嵌段共聚物链长的依赖性.     

聚苯乙烯-聚甲基丙烯酸甲酯两嵌段共聚物薄膜在丙酮蒸汽退火下的形貌演化

用敲击模式原子力显微镜研究了聚苯乙烯-聚甲基丙烯酸甲酯(PS-b-PMMA)两嵌段共聚物薄膜形貌在丙酮蒸汽退火下随时间的演化过程.对于对称的嵌段共聚物薄膜(fPS≈fPMMA,fPS为PS-b-PMMA中PS的体积分数,fPMMA为PMMA的体积分数),通过控制膜厚和平衡态时相周期的比值可以使不同分子量的嵌段共聚物薄膜都实现由蠕虫状结构到孔洞再到条纹的形貌演化过程;对于非对称的嵌段共聚物薄膜,发现当聚苯乙烯组分含量较少(25%,36%)时,薄膜的形貌由无序态分别转变为规则排列的小球和直接转变为条纹结构;而当聚苯乙烯组分含量较多(70%)时,薄膜的形貌则由无序态转变为较平整的表面结构.我们对不同形貌的形成机理进行了详细的讨论.     

溶剂对SBS溶液浇铸膜形态结构及性能影响

聚苯乙烯 聚丁二烯 聚苯乙烯 (ＳＢＳ)嵌段共聚物所兼具的高弹性与热塑性来源于其独特的微观相分离结构 ,其形态结构与性能的关系长期以来一直倍受人们的关注 .对于这种微相分离体系 ,除了传统意义上的良溶剂 (对两种嵌段均具有良好的溶解性 ,又称非选择性溶剂 )与不良溶剂外 ,还存在着对两种嵌段中的一种溶解性较好 ,对另一种溶解性较差的选择性溶剂[1,2 ].在溶液浇铸成膜过程中 ,不同溶剂与组成共聚物的两种嵌段的相互作用参数的差异将导致溶液中大分子构象的差异以及微观相分离过程的差异 ,从而影响浇铸膜的形态以及性能[3].本文首先利用…     

丙烯腈-苯乙烯嵌段共聚物的RAFT聚合与表征

以S,S'-二(α,α '-二甲基-α″-乙酸)三硫代碳酸酯(TRIT)为链转移剂,利用可逆加成断裂链转移自由基聚合(RAFT)制备了窄分布的端羧基大分子链转移剂——聚苯乙烯和聚丙烯腈.以大分子链转移剂为RAFT试剂,引发苯乙烯或丙烯腈单体的RAFT聚合,进一步得到聚丙烯腈-聚苯乙烯-聚丙烯腈(PAN-b-PS-b-PAN)和聚苯乙烯-聚丙烯腈-聚苯乙烯(PS-b-PAN-b-PS)三嵌段共聚物.通过1 H-NMR、FT-IR、凝胶渗透色谱(GPC)对所得产物的结构和分子量进行了袁征,通过原子力显微镜(AFM)和拉曼光谱(Raman)研究了嵌段共聚物薄膜的微相分离结构与热解行为.结果表明:所得产物中除PAN-b-PS-b-PAN外,分子量分布均小于1.2.嵌段共聚物薄膜经250℃热稳定化与600℃热解处理后,碳化并形成了规整的石墨结构,微区尺寸在75 nm左右.     

PDMS-MDI-PEG多嵌段共聚物涂层表面微相分离行为研究

采用两步溶液聚合方法合成了一系列聚二甲基硅氧烷(PDMS)-4,4′-二苯基甲烷二异氰酸酯(MDI)-聚乙二醇(PEG)多嵌段共聚物.利用轻敲模式原子力显微镜(AFM)观察了嵌段共聚物的表明形貌,研究了退火、共聚物组成以及PEG分子量和不同的官能团对涂层表面微相分离行为的影响,同时对微相分离行为的形成机理也作了相应的探讨.研究表明,该嵌段共聚物即使在PDMS含量大于50wt%时,涂层表面仍呈现出规整有序的纳米级相分离结构,其中疏水相和亲水相分别由PDMS链段和MDI-PEG组分构成.     

嵌段共聚物PVCH-b-PE-b-PVCH的多重结晶行为

通过采用差示扫描量热仪(DSC)主要研究了结晶-非晶嵌段共聚物聚乙烯基环己烷-b-聚乙烯-聚乙烯基环己烷(PVCH-b-PE-b-PVCH)溶液结晶样品的熔融与非等温再结晶过程.探讨了溶液结晶样品中微相分离结构的形成对嵌段共聚物受限结晶的影响,并发现样品在熔融后的非等温结晶过程中出现了多重结晶峰.通过对嵌段共聚物有序、...     

图案化两亲性刚-柔嵌段共聚物薄膜的耗散粒子动力学模拟

运用耗散粒子动力学模拟,研究了两亲性刚-柔嵌段共聚物在平面基板上的自组装,考察了溶剂选择性和基板形状对自组装形貌的影响。结果表明,共聚物可以在基板表面形成多种图案(如条纹图案),其中疏水刚性链段有序排列形成条纹的内核,亲水柔性链段形成外壳。当溶剂对柔性链段亲和性较好且对刚性链段亲和性较差时可以得到具有条纹图案的薄膜。此外,共聚物可以在不同形状的基板上形成与基板具有相似拓扑结构的条纹图案。     

聚苯乙烯/聚二甲基硅氧烷嵌段共聚物的表面形态研究

采用原子力显微镜(AFM)和透射电镜(TEM)研究了聚苯乙烯/聚二甲基硅氧烷嵌段共聚物(PS-b-PDMS)薄膜的相形态.结果表明,当采用甲苯作为溶剂,旋转涂膜的薄膜样品呈现网络状的形态分布在表面,而样品所对应的透射电镜照片中,PDMS相作为球状分布在PS的连续相中.退火温度对共聚物表面形态有一定的影响,当退火温度高于PDMS的玻璃化温度,表面中PDMS相增多.PS-b-PDMS嵌段共聚物的表面形态随着所用溶剂的变化而有所不同,当采用甲苯作为溶剂时,样品的PS相形成凹坑分布在PDMS的相区之中,而采用环己烷作为溶剂时,PS相作为突起分布在PDMS相区之中.另外,基底对共聚物薄膜表面形态的有较大的影响,当采用硅晶片作为基底时,样品中的PDMS相和PS相呈现近似平行于表面的层状结构.     

PS-b-P (DMS-stat-VMS)嵌段聚合物的制备及性能

采用活性阴离子聚合方法,以仲丁基锂为引发剂,以苯乙烯、六甲基环三硅氧烷（D3）和2,4,6-三乙烯基-2,4,6-三甲基环三硅氧烷（V3）为反应单体,分步聚合制备了聚苯乙烯-b-聚（二甲基硅氧烷-stat-乙烯基甲基硅氧烷）[PS-b-P（DMS-stat-VMS）]嵌段聚合物.采用傅里叶变换红外光谱、氢核磁共振谱及凝胶渗透色谱对共聚物的化学结构、分子量及分子量分布进行了表征,并通过扫描电子显微镜、原子力显微镜及接触角等测试方法研究了共聚物各链段组分对共聚物形貌及表面亲疏水/油性的影响.结果表明,所制备的共聚物分子量分布较窄,由于各组分性能的差异而呈现出微相分离结构,同时该共聚物保留了PS-b-PDMS原有的表面性质,为设计结构多样性及性能优异的聚硅氧烷共聚物提供了新思路.     

Assembly of copolymer blend on nanopatterned surfaces: a molecular simulation study

We report a molecular simulation study on the assembly of an (A7B5)5/A7B5 copolymer blend on nanopatterned surfaces. The density distributions, anisotropic radii of gyration, and conformations of both copolymers are quantitatively characterized. As the width of stripes on the surface decreases, the shape and thickness of the assembled film are found to be in qualitative agreement with those from experiments. The simulation results indicate that the shape and conformation of ordered film can be modulated by tuning the adsorption energy between the surface and the polymer or by adjusting the width of the stripes on the surface. We can regulate the width of the stripes to obtain a desired polymer conformation without altering the assembled film. In remarkable contrast to the pure copolymer, the radii of gyration of the blend in three directions are consistently smaller. The simulation reveals that the addition of a short chain during assembly is of central importance in restructuring the conformations of the long chain.     

聚合物链长及表面吸附强度对三维受限下嵌段共聚物微观相分离的影响

利用动态密度泛函(Dynamic density functional theory, DDFT)方法研究了三维受限下嵌段共聚物的微观相分离, 讨论了共聚物链长和表面吸附强度对微观相形成与取向的影响. 体系中随机分布的等径微球提供三维限制结构, 体积分数为0.6. 增加微球的半径和体积分数, 能够使其从破坏微相规整结构的纳米掺杂过渡到提供三维限制结构. 调整嵌段共聚物与微球表面的相互作用对微相形成与取向有重要影响.     

Preparation of Oriented Liquid‐Crystalline/Isotropic Block Copolymer Films with Parallel or Perpendicular Arrangement of Smectic Layers and Lamellar Microdomains

Films of a symmetric liquid‐crystalline/isotropic block copolymer consisting of a smectic LC side‐chain polymer and polystyrene were prepared by solvent casting from solution and from the isotropic melt. By annealing the solvent‐cast film in the S_A phase an oriented microphase‐separated film of lamellar morphology was obtained in which both the lamellae of the block copolymer and the smectic layers of the LC block were oriented parallel to the film surface. A lamellar morphology with perpendicular orientation of lamellae and smectic layers was generated by cooling the block copolymer from the melt.     

Effect of annealing on the microphase separated behavior and properties of PDMS–MDI–PEG multiblock copolymer films

A model multiblock copolymer based on (Poly dimethylsiloxane) (PDMS),–4, 4′‐diphenylmethanediisocyanate (MDI)–(poly ethylene glycol) (PEG) was synthesized by employing two step growth polymerization technique. The effect of annealing on microphase separation of the copolymer surface and bulk, surface composition, hydrogen‐bonding and some properties was investigated by AFM, SAXS, XPS, FTIR, contact angle measurement, and protein adsorption experiment, respectively. It was found that increasing the annealing temperature availed formation of microphase separation and surface enrichment of PDMS, which was accompanied by increase in average interdomain spacing, long period, and the crystallizing degree in the hard domains. But the best microphase separated structure seemed to occur at the annealing temperature of 140 °C; exorbitant annealing temperature might demolish the ordered structure. The annealing temperature dependence of microphase separation was further confirmed by the changes in urea hydrogen‐bonding and melting points characterized by FTIR and DSC, respectively. Protein adsorption experiments revealed that all annealed copolymer films possessed the low protein adsorption. © 2006 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 45: 208–217, 2007     

Monte Carlo simulation of AB diblock copolymer between surface and substrate and comparison of experimental results

The morphologies of AB diblock copolymer film between the substrate and surface were investigated via Monte Carlo simulations on simple cubic lattices. The morphological dependence of the diblock copolymer thin film on the thickness, as well as the composition and interactive intensity has been mainly studied. With the increase of A‐segments fraction, various microdomain morphologies including regular parallel stripe‐like, mesh‐like, and normal lamella near the region of the surface were generated in this work. The morphology of thin films of asymmetric diblock copolymer was found to form cylinders in a bulk system when L_z was equal to 30. The morphologies of PS‐b‐PDMS diblock copolymer films have been studied via atomic force microscopy (AFM) and transition electron microscopy (TEM) measurements. The surface morphology of the PS‐b‐PDMS copolymer thin film shows a mesh‐like microphase separated structure, and PDMS continuous phase protruded on the PS dispersed phase. The surface composition of PS‐b‐PDMS copolymer thin films was measured by means of X‐ray photoelectron spectroscopy (XPS) and ATR‐IR. The comparison results show that the experimental observations are in good agreement with the simulation results. © 2006 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 44: 1835–1845, 2006     

聚苯乙烯大单体与丙烯酸丁酯接枝共聚物的微观分相与表面性能研究

研究了以大单体技术合成的不同侧链长度的苯乙烯与丙烯酸丁酯的接枝共聚物的侧链长度对其微观分相与表面性能的影响,发现仅当聚苯乙烯侧链分子量大于5900时,才可能发生部分微观相分离,分离后对其表面性能影响不明显。临界表面张力r_c虽有差异,但色散力部分y_s^D的计算值却较一致,与所用参照液无关。实验证实,接枝共聚物的表面几乎全被低表面能的聚丙烯酸丁酯骨架所复盖,呈现出明显的表面富集现象。     

POSS基杂化含氟丙烯酸酯共聚物涂膜的表面相分离与疏水性研究

采用自由基溶液聚合法成功合成了多面体低聚倍半硅氧烷(POSS)基杂化含氟丙烯酸酯共聚物,并采用核磁共振仪(NMR)和凝胶渗透色谱仪(GPC)表征了共聚物,其中POSS和含氟单体分步加入到反应中.首先将共聚物溶解到三氟三氯乙烷(F113)和乙酸乙酯的混合溶剂中配制成溶液,然后通过直接在玻璃片上滴落共聚物溶液制备了共聚物涂膜.采用扫描电子显微镜(SEM)、X-射线光电子能谱(XPS)、原子力显微镜(AFM)和接触角测量仪考察了F113和乙酸乙酯的配比对共聚物涂膜表面形貌、表面元素组成、表面粗糙度以及表面疏水性的影响.实验数据表明POSS在表面能够聚集成纳米颗粒并能极大增强涂膜表面粗糙度和疏水性.共聚物表面同时存在POSS聚集与有机相微相分离两类相分离行为,并形成了复合粗糙结构.虽然POSS和含氟段竞争迁移到表面,但是随着混合溶剂中F113的增多,涂膜表面含氟量越来越多,同时POSS在表面的聚集体越来越少,表面平均粗糙度越来越小,最终涂膜的疏水性越来越强,这说明F113有助于提升氟的趋表迁移能力,使涂膜表面含氟链段占据较多的表面空间,从而抑制了POSS在表面聚集分布.当使用纯F113作为溶剂时,共聚物涂膜的表面氟含量为45.25%,平均粗糙度为93.4 nm,此时静态水接触角最大为135.0?,表现出优异的疏水性.     

Radiation‐induced fabrication of polymer nanoporous materials from microphase‐separated structure of diblock copolymers as a template

Polymer nanoporous materials with periodic cylindrical holes were fabricated from microphase‐separated structure of diblock copolymers consisting of a radiation‐crosslinking polymer and a radiation‐degrading polymer through simultaneous crosslinking and degradation by γ‐irradiation. A polybutadiene‐block‐poly(methyl methacrylate) (PB‐b‐PMMA) diblock copolymer film that self‐assembles into hexagonally packed poly(methyl methacrylate) cylinders in polybutadiene matrix was irradiated with γ‐rays. Solubility test, IR spectroscopy, and TEM and SEM observations for this copolymer film in comparison with a polystyrene‐block‐poly(methyl methacrylate) diblock copolymer film revealed that poly(methyl methacrylate) domains were removed by γ‐irradiation and succeeding solvent washing to form cylindrical holes within polybutadiene matrix, which was rigidified by radiation crosslinking. Thus, it was demonstrated that nanoporous materials can be prepared by γ‐irradiation, maintaining the original structure of PB‐b‐PMMA diblock copolymer film. © 2007 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 45: 5916–5922, 2007