Influence of Enhanced Gravitation on the Growth of Ammonium Oxalate Monohydrate Crystals from Aqueous Solutions

The growth behaviour of ammonium oxalate monohydrate crystals on seeds from aqueous solutions under terrestrial and enhanced gravity conditions has been investigated. It was found that all types of faces on the crystals revealed growth layers on them. The faces of the crystals obtained under both terrestrial and enhanced gravity conditions on seeds hung on nylon threads show cracks, trapped inclusions and macrospirals, while the faces of the crystals grown on seeds in fixed holders under enhanced gravity conditions are devoid of cracks, inclusions and macrospirals.     

Effects of surface reconstruction on CdTe/GaAs(001) interface structure

CdTe/GaAs(001) heterostructures were fabricated by molecular beam epitaxy on chemically etched and thermally deoxidized GaAs(001) substrates, as well as GaAs(001) (3×1) buffer layers grown in situ by molecular beam epitaxy. Different growth protocols were also explored, leading to Te-induced (6×1) or (2×1) surface reconstructions during the early growth stage. High-resolution cross-sectional transmission electron microscopy was used to examine the final interface structure resulting from the different substrate preparations, and surface reconstructions. The (2×1) surface reconstruction led to pure (001) growth, while the (6×1) reconstruction led to an interface which included small (111)-oriented inclusions. In addition, deposition on etched and deoxidized GaAs(001) wafers led to preferential CdTe growth within etch pits and resulted in a macroscopically rough interface region.     

Microstructures on gel-grown KClO4 single crystals

The present paper reports the observations made on the microstructures of gel grown KClO₄ single crystals. Various observations such as growth spirals, growth layers, liquid inclusions and growth of microcrystallites are discussed in relation to the mechanism and conditions of crystal growth.     

Variation of strain in granular GaAs:MnAs layers

Granular GaAs(MnAs) layers with different Mn concentration and various layer thickness were grown by MBE method and subjected to annealing at 500°C under ambient and enhanced hydrostatic pressure. Distinct influence of hydrostatic pressure applied during annealing on strain state of layers as well as on hexagonal MnAs inclusions was found. Pressure induced strain of inclusions is related to different bulk moduli of GaAs and of hexagonal MnAs. Formation of hexagonal inclusions depends on concentration of Mn in interstitial position in as-grown samples.     

Tin as an n-type dopant in the molecular beam epitaxial growth of GaAs(111)A

We have made a systematic study of the tin doping of GaAs layers grown on GaAs(111)A substrates using molecular beam epitaxy (MBE). A series of samples were grown with a range of substrate temperatures (from 460 to 620°C), As:Ga flux ratios (5:1 to 25:1) and tin concentrations (10¹⁶ to 10²⁰ atoms cm⁻³). Layers grown on (111)A surfaces were n-type (in contrast to silicon doping) but with carrier concentrations dependent on growth conditions. We have used secondary ion mass spectrometry (SIMS) measurements to confirm the concentration of tin incorporated and its distribution within the layers.     

Role of microcrystals in the growth and development of prism faces of cultured quartz (I). Attached microcrystals

Microcrystals attached in random orientations to growing host prism faces of cultured quartz grown by the hydrothermal crystallization technique are described. The microcrystals are established to be quartz. Growth layers and pyramids initiated by the attached guest microcrystals of quartz on the growing host prism faces of bulk quartz crystals are illustrated. Also described are striations, parallel, perpendicular and inclined to the c-axis, and polygonal growth pyramids on the prism surfaces of attached guest microcrystals. Formation of the microcrystals of quartz is linked to the possibilities of creation of quartz micronuclei in the autoclaves which further establishes and solidly supports the explanation put forward by KOTRU . Effect of unoriented attached tiny crystals of quartz and impurities on the progress of growth layers on the host prism faces is dealt with. Role of attached guest microcrystals in the growth and development of the host prism faces in particular and the cultured quartz in general is discussed. Possibilities of the incorporation of quartz micronuclei inclusions and impurity inclusions in the quartz structure and its effect on the crystalline quality of cultured quartz is briefly dealth with.     

Influence of the growth temperature and substrate orientation on the layer properties of MOVPE-growth (Ga,In)(As,P)/GaAs

The luminescence properties of In_1−xGa_xAs_yP_1−y layers and heterostructures grown lattice matched to GaAs by metalorganic vapour-phase epitaxy (MOVPE) were studied and correlated to the crystalline properties. For laser structures emitting around 800 nm a red-shift of the emission from the active layer (y = 0.72) grown at 680°C together with an anomalous temperature behaviour and excitation dependence of the bandgap is observed. Although some degree of ordering is observed for thick layers of this composition, polarization dependent photoluminescence does not indicate ordering of the quantum well to be the main reason for this excitation dependence. Instead, interfacial In-rich layers are found to be responsible. The thickness of these interfacial layers strongly depends on substrate misorientation and growth conditions.     

Transmission electron microscopy investigation of AlN growth on Si(111)

AlN layers with a thickness of 250 nm were grown by plasma-assisted gas source molecular-beam epitaxy on Si(111) at substrate temperatures between 600 °C and 900 °C. The surface morphology and microstructure of the AlN layers were analyzed by scanning and transmission electron microscopy. Different defect types are observed in the AlN layers and at the AlN/Si(111) interfaces as a function of the temperature: inclusions of pure Al in the Si-substrate, crystallites of the cubic AlN phase, dislocations, stacking faults and inversion domain boundaries. The formation and concentration of the defects depends strongly on the substrate temperature during the growth. X-ray diffraction rocking curves for the (0002) reflection yield minimum full width at half maximum values for the sample grown at the 900 °C under Al-rich conditions indicating optimum structural quality. However, the discussion of the entity of defects will show that a more differentiated view is required to assess the overall quality of the AlN layers.     

Liquid phase epitaxy of SiC in the system Tb?Si?SiC by temperature gradient zone melting (III). Epitaxial layer properties

In the present work the electrophysical and structural properties of the SiC epitaxial layers grown by the temperature gradient zone melting method in vacuum conditions is considered. Some correlations between the epitaxial layer properties and the process conditions are observed. It is shown that the performence of the growth process in vacuum leads to a significant improvement of the layer quality, if one observes some requirements – how to decrease significantly the number of the second phase inclusions and how to improve the structural perfection of the layers.     

Investigation on growth defects in Pb(Zn1/3Nb2/3)O3‐PbTiO3 crystals

Relaxor ferroelectric crystal (1‐x)Pb(Zn_1/3Nb_2/3)O₃‐xPbTiO₃ (PZNT) with x=0.07 (PZNT93/7) has been grown by the vertical Bridgman method from the high temperature solution of PZNT‐PbO system. The growth defects, such as nucleation core, inclusions, boundaries and particles, were investigated by optical microscope and scanning electron microscope. Sub‐structures were found in the flux inclusions and the lack of ZnO component in PZNT crystals was attributed to the existence of ZnO particles in the inclusions. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

CZ法生长参数对TeO2晶体质量的影响

本文主要讨论CZ法生长TeO2晶体中温度梯度、拉速、转速等工艺参数对晶体质量的影响,分析了晶体开裂、包裹物等宏观缺陷以及位错等微观缺陷的形成机理.从晶体形态、包裹体和位错密度变化等方面探讨了晶体生长参数与晶体缺陷之间的内在关系.     

Epitaxial growth of silicon carbide layers by sublimation “Sandwich method” (II) structural defects and growth mechanism

Structural defects of α-SiC epitaxial layers grown by sublimation “sandwich-method” in vacuum at the temperatures ranging from 1600 to 2100 °C have been investigated by X-ray topography and optical microscopy methods. It was shown, that perfect SiC layers with the homogeneous polytype structure and small dislocation density (≦ 10² cm⁻²) may be obtained on the substrates with any crystallographic orientation at the conditions close to quasi-equilibrium one. The presence of impurities and silicon deficiency in the vapour phase, lead usually to the deterioration of morphological and structural perfection of SiC layers. There are the following structural defects: uncoherent polytype inclusions (mainly β-SiC), pores, dislocations, specific stacking faults. Morphological peculiarities of the SiC epitaxial layers and possible growth mechanisms are discussed.     

Influence of cooling rate on the liquid-phase epitaxial growth of Zn3P2

We report the liquid-phase epitaxial growth of Zn₃P₂ on InP (1 0 0) substrates by conventional horizontal sliding boat system using 100% In solvent. Different cooling rates of 0.2–1.0 °C/min have been adopted and the influence of supercooling on the properties of the grown epilayers is analyzed. The crystal structure and quality of the grown epilayers have been studied by X-ray diffraction and high-resolution X-ray rocking measurements, which revealed a good lattice matching between the epilayers and the substrate. The supercooling-induced morphologies and composition of the epilayers were studied by scanning electron microscopy and energy dispersive X-ray analysis. The growth rate has been calculated and found that there exists a linear dependence between the growth rate and the cooling rate. Hall measurements showed that the grown layers are unintentionally doped p-type with a carrier mobility as high as 450 cm²/V s and a carrier concentration of 2.81×10¹⁸ cm⁻³ for the layers grown from 6 °C supercooled melt from the cooling rate of 0.4 °C/min.     

沿[1-100]方向升华法生长6H-SiC单晶

本文采用升华法沿着垂直于c轴方向的[1-100]方向生长6H-SiC单晶.利用光学显微镜对晶体表面及腐蚀后的晶片进行观察,发现沿[1-100]方向生长出的单晶与传统方法沿[0001]方向生长单晶有很多的不同之处,多型对于籽晶的继承性非常强,但是在生长过程中多型夹杂不会发生,该方法生长的晶体中没有发现螺位错(微管)缺陷.     

Growth and interface study of 2 in diameter CdZnTe by THM technique

Growth interface of large diameter CdZnTe ingots grown from Te solution by travelling heater method have been studied. Both macroscopic and microscopic investigations were carried out. The results indicated that the shape of the interface strongly governs the grain growth on the ingot, while the microscopic morphology of the growth interface is responsible for Te inclusions in the grown crystal.     

InP heteroepitaxy on Si substrates in In-PH3-HC1-H2 systems

Heteroepitaxial growth of InP on Si in an In-PH₃-HC1-H₂ system is demonstrated. Injecting hydrogen chloride into the growth ambiance prevents indium droplets from precipitating and enables the growth of a featureless InP buffer layer. Morphologies of InP/Si grown by the two-step method vary from island growth at 650°C to continuous-layer growth at 550°C. The temperature required for growing continuous InP layers depends on the crystallinity of the InP under-layer on the Si. High-quality InP layers with 650 arc sec full width at half maximum of double X-ray diffraction are obtained by using a three-step growth method.     

Formation of Ge-diffusion-suppressed GaAs layers and InAs quantum dots on Ge/Si substrates

Crystal growth of GaAs layers and InAs quantum dots (QDs) on the GaAs layers was investigated on Ge/Si substrates using ultrahigh vacuum chemical vapor deposition. Ga-rich GaAs with anti-site Ga atoms grown at a low V/III ratio was found to suppress the diffusion of Ge into GaAs. S-K mode QD formation was observed on GaAs layers grown on Ge/Si substrates with Ga-rich GaAs initial layers, and improved photoluminescence from 1.3 μm-emitting InAs QDs was demonstrated.     

Growth and annealing effect of high-quality ZnSe:N/ZnSe by MOCVD

The ZnSe : N epitaxial layers were grown on (1 1 0) ZnSe substrates in a low-pressure metalorganic chemical vapor deposition (MOCVD) system using hydrogen as a carrier gas, and using ammonia as a dopant source. In order to obtain highly doped ZnSe : N epitaxial layers, the optimum growth and doping conditions were determined by studying the photoluminescence (PL) spectra from the ZnSe epitaxial layers grown at different ammonia flux and VI/II flux ratio. Furthermore, in order to enhance the concentration of active nitrogen in ZnSe epitaxial layer, a rapid thermal anneal technique was used for post-heat-treating. The results show that the annealing temperature of over 1023 K is necessary. Beside, a novel treatment method to obtain a smooth substrate surface for growing high quality ZnSe epitaxial layers is also described.     

On the nature of growth hillocks on sodium chlorate crystals

Optical examination of as-grown {100} surfaces of sodium chlorate crystals grown from aqueous solution revealed the presence of elliptical growth hillocks. The hillocks were present on both enantiomorphous forms and originated from dislocations, inclusions, and microcrystals attached to the growing surface. The value of the surface entropy factor equal to 4.55 at 313 K suggests that crystals grow via/or with the participation of dislocation mechanism, and the hillocks are dislocation growth centers. Compound mechanism controlled growth of some crystals because edge nucleation and dislocation centers operated simultaneously on the same surfaces.     

硅酸镥闪烁晶体的生长与缺陷研究

本文采用提拉法生长出了硅酸镥闪烁晶体,讨论了晶体生长中遇到的问题,所生长的硅酸镥晶体有开裂、解理、多晶、回熔现象等宏观生长缺陷和包裹物、位错等微观缺陷.开裂是由热应力和晶体解理两种因素引起的,其中热应力是导致开裂的主要因素,优化生长工艺条件可完全避免开裂.晶体中存在两种包裹物,成份分别为氧化镥和坩埚材料铱,氧化镥很可能是未参加反应的原料,也有可能是氧化硅挥发而导致氧化镥析出.