Detailed peak fitting analysis of the Zn 2p photoemission spectrum for metallic films and its initial oxidation stages

The metallic Zn 2p photoemission spectra hold a complex background that requires individual assignment of Shirley background for each peak comprising the spectra. For this reason, a close fit requires the use of the Shirley‐Vegh‐Salvi‐Castle background‐type under the active background approach. We found that the intensity of the plasmon peaks and their associated background cannot be described through existing energy loss (intrinsic and extrinsic) formalisms. We also analyzed the Zn 2p and O 1s spectra for the initial stages of oxide formation at various oxygen exposures. We found that the composition of the oxide layer is ZnO_1.00±0.10 for all exposures, suggesting that our assessment of the primary function of metallic Zn is accurate and can be employed for quantitative studies. We also present a set of parameters to accurately fit and resolve the metallic and oxide Zn 2p peaks.     

Composition assessment of ferric oxide by accurate peak fitting of the Fe 2p photoemission spectrum

A quantitative study of the surface composition of ferric oxide employing photoemission spectra is presented. It was possible to accurately reproduce the expected composition (Fe_2.00±0.05O₃) by modeling the background as a combination of Shirley‐type (Shirley–Vegh–Salvi–Castle) and slope backgrounds through the active approach. The line‐shape employed to fit apparent peak asymmetries was the double‐Lorentzian. It was possible to resolve a previously unreported satellite located at ~729 eV. Copyright © 2016 John Wiley & Sons, Ltd.     

Comment on “Intensity modulation of the Shirley background of the Cr3p spectra with photon energies around the Cr2p edge”, by A Herrera‐Gomez,D Cabrera‐German,A D Dutol et al,Surface Interface Anal, 2018;50:246‐252

We show that, while the Shirley background lacks a theoretical basis, its use satisfies the condition for the proper modeling of all these backgrounds when properly applied. We present these four conditions of applicability, discuss their use, and indicate where their lack of use gives misleading results.     

Universal inelastic electron scattering cross-section including extrinsic and intrinsic excitations in XPS

The high importance of X-ray photoelectron spectroscopy (XPS) in surface analysis is well established. In XPS, the shape of the measured peaks is affected by two classes of energy loss: extrinsic losses because of the transport of photoelectrons in the matter and intrinsic losses because of the sudden creation of the static core hole. In order to perform a quantitative, comprehensive determination of the zero-energy loss spectrum, a systematic and physically meaningful background subtraction method must be used. In this paper, we propose a universal analytical expression to model the energy loss cross section of the emitted photoelectrons for transition metals and their oxides. The proposed expression is a generalization of the well-known Tougaard's universal inelastic scattering cross section to also account for the intrinsic losses. We demonstrate the use of this to determine the primary excitation spectra of several transition metals and their oxides, and we compare the results with a more accurate calculation based on the dielectric response model for XPS.     

Evaluation of uncertainties in X‐ray photoelectron spectroscopy intensities associated with different methods and procedures for background subtraction. I. Spectra for monochromatic Al X‐ray

We report uncertainties in X‐ray photoelectron spectroscopy (XPS) intensities arising from commonly used methods and procedures for subtraction of the spectral background. These uncertainties were determined from a comparison of XPS intensities reported by volunteer analysts from 28 institutions and the corresponding intensities expected for a set of simulated XPS spectra. We analyzed peak intensities from 32 sets of data for a group of 12 spectra that had been simulated for a monochromated Al Kα source. Each reported intensity was compared with an expected intensity for the particular integration limits chosen by each analyst and known from the simulation design. We present ratios of the reported intensities to the expected intensities for the background‐subtraction methods chosen by the analysts. These ratios were close to unity in most cases, as expected, but deviations were found in the results from some analysts, particularly if the main peak was asymmetrical or if shakeup was present. We showed that better results for the Shirley, Tougaard, and linear backgrounds were obtained when analysts determined peak intensities over certain energy ranges or integration limits. We then were able to recommend integration limits that should be a useful guide in the determination of peak intensities for other XPS spectra. The use of relatively narrow integration limits with the Shirley and linear backgrounds, however, will lead to measures of peak intensities that are less than the total intensities. Although these measures may be satisfactory for some quantitative analyses, errors in quantitative XPS analyses can occur if there are changes in XPS lineshapes or shakeup fractions with change of chemical state. The use of curve‐fitting equations to fit an entire spectrum will generally exclude the shakeup contribution to the intensity of the main peak, and no account will be taken of any variation in the shakeup fraction with change of chemical state. Published in 2009 by John Wiley & Sons, Ltd. Certain commercial products are identified to specify the formats in which the test spectra were distributed and the software with which the test spectra were analyzed by participants. This identification does not imply that the products are endorsed or recommended by the National Institute of Standards and Technology, or that they are necessarily the most suitable for the purposes described.     

Evaluation of uncertainties in X‐ray photoelectron spectroscopy intensities associated with different methods and procedures for background subtraction. II. Spectra for unmonochromated Al and Mg X‐rays

We report uncertainties in X‐ray photoelectron spectroscopy (XPS) intensities arising from commonly used methods and procedures for subtraction of the spectral background. These uncertainties were determined from a comparison of XPS intensities reported by volunteer analysts and the corresponding intensities expected for a set of simulated XPS spectra. We analyzed peak intensities from 16 sets of data (submitted from 15 institutions) for a group of 12 spectra that had been simulated for an unmonochromated Al‐Kα source and similar intensities from 20 sets of data (submitted from 17 institutions) that had been simulated for an unmonochromated Mg‐Kα source. Each reported intensity was compared with an expected intensity for the particular integration limits chosen by each analyst and known from the simulation design. We present ratios of the reported intensities to the expected intensities for the background‐subtraction methods chosen by the analysts. These ratios were close to unity in most cases, as expected, but deviations were found in the results from some analysts, particularly if shakeup was present. We showed that better results for the Shirley and Tougaard backgrounds were obtained when analysts determined peak intensities over certain energy ranges or integration limits. We then were able to suggest integration limits that should be a useful guide in the determination of peak intensities for other XPS spectra. The use of relatively narrow integration limits with the Shirley and linear backgrounds, however, will lead to measures of peak intensity that are less than the total intensities. Although these measures may be satisfactory for some quantitative analyses, errors in quantitative XPS analyses can occur if there are changes in XPS lineshapes or shakeup fractions with change of chemical state. The use of curve‐fitting equations to fit an entire spectrum will generally exclude the shakeup contribution to the intensity of the main peak, and any variation in the shakeup fraction with change of chemical state will not be taken into account. Published in 2009 by John Wiley & Sons, Ltd.     

A self-consistent multiple-peak structure of the photoemission spectra of metallic Fe 2p as a function of film thickness

The Fe 2p spectrum has a very complex peak structure and a very strong background. Based on the comparison of the spectra for iron film with varying thicknesses, an experimental multiple-peak structure for the metallic Fe 2p spectrum is proposed. The analysis required the use of state-of-the-art background modeling (including the active approach) and peak-fitting methods (including the simultaneous fitting method). A key aspect that allowed for this analysis is that the peak components are the same for various Fe film thicknesses, but with varying relative intensities. The early stages of oxidation are analyzed. The angular dependence of the peak components is also discussed.     

Information depth determination for hard X‐ray photoelectron spectroscopy up to 15 keV photoelectron kinetic energy

In the present work, we have determined the information depth in a solid for hard X‐ray photoelectron spectroscopy (HAXPES) up to a photoelectron kinetic energy of 15 keV. For that, we have followed the evolution of the photoemission signal from different core levels of a gold overlayer grown in situ on a polycrystalline copper substrate as a function of the photoelectron kinetic energy. We demonstrate that in the case of gold, an information depth of 57 nm can be achieved by detecting photoelectrons with 15‐keV kinetic energy. The photoemission signal produced at this depth corresponds to 0.2% of the signal coming from a semi‐infinite solid bulk. Such a high sensitivity can only be reached with the combination of a third‐generation synchrotron radiation beam with a high‐transmission electron analyzer. Copyright © 2008 John Wiley & Sons, Ltd.     

Photoelectron-spectroscopy of multi-photon ionization of rare gases with circularly and linearly polarized light

Above-threshold multiphoton ionization of xenon, krypton, and argon was studied with circularly and linearly polarized light (photon energy 1.17 eV and 2.33 eV). With linearly polarized light photoelectrons are preferentially ejected along the direction of the polarization vector. With circularly polarized light a strong suppression of ejected photoelectrons was observed; the measured yield of photoelectrons was reduced by factors of up to 80 depending on the laser intensity and the photon energy. The experimental results are compared with theoretical calculations based on a multiphoton-detachment model.     

Quantitative surface analysis by Auger and x-ray photoelectron spectroscopy

Recent developments in quantitative surface analysis by Auger (AES) and x-ray photoelectron (XPS) spectroscopies are reviewed and problems relating to a more accurate quantitative interpretation of AES/XPS experimental data are discussed. Special attention is paid to consideration of elementary physical processes involved and influence of multiple scattering effects on signal line intensities. In particular, the major features of core-shell ionization by electron impact, Auger transitions and photoionization are considered qualitatively and rigorous approaches used to calculate the respective transition probabilities are analysed. It is shown that, in amorphous and polycrystalline targets, incoherent scattering of primary and signal Auger and photoelectrons can be described by solving analytically a kinetic equation with appropriate boundary conditions. The analytical results for the angular and energy distribution, the mean escape depth, and the escape probability as a function of depth of origin of signal electrons as well as that for the backscattering factor in AES are in good agreement with the corresponding Mote Carlo simulation data. Methods for inelastic background subtraction, surface composition determination and depth-profile reconstructions by angle-resolved AES/XPS are discussed. Examples of novel techniques based on x-ray induced photoemission are considered.     

Layer model approach to background correction in r.f.‐GDOES

Two methods are presented for dealing with variable background signals in radiofrequency glow discharge optical emission spectroscopy (r.f.‐GDOES). Their aim is to improve elemental analysis at trace levels, in bulk analysis or in compositional depth profiling, without having to measure background signals during the analysis. Each method uses background signals measured away from the analytical emission lines of interest during calibration only. The background signal is first determined during calibration for each material type of interest. During analysis in the first method the estimated background signal is varied according to the material type being analysed. In depth profiles this means identifying the various layers present as different material types, hence the name ‘layer model’. The second method is a more conventional approach, where part of the background signal is estimated as a spectral interference. Results are presented for the bulk analysis of a tool steel and for two depth profiles: TiO₂ coating on silicon and TiN‐coated tool steel. The two methods give similar results in the depth profiles, both significantly better than with a constant background. Copyright © 2004 John Wiley & Sons, Ltd.     

Summary of ISO/TC201 technical report: ISO/TR 18392: 2005—Surface chemical analysis—X‐ray photoelectron spectroscopy—Procedures for determining backgrounds

ISO Technical Report 18392 provides the guidance for determining backgrounds in X‐ray photoelectron spectra. The methods of background determination described in this report are applicable for the quantitative evaluation of the spectra of photoelectrons and Auger electrons excited by X‐rays from solid surfaces and surface nanostructures. Copyright © 2006 John Wiley & Sons, Ltd.     

Monte‐Carlo simulation of x‐ray photoelectron emission from silver

Silver 3d x‐ray photoelectron spectroscopy (XPS) spectra were simulated with the Monte‐Carlo method using an effective energy‐loss function that was derived from a reflected electron energy‐loss spectroscopy (REELS) analysis based on an extended Landau approach. After confirming that Monte‐Carlo simulation based on the use of the effective energy‐loss function can successfully describe the experimental REELS spectrum and Ag 3d XPS spectrum, we applied Monte‐Carlo simulation to predict the angular distribution of Ag 3d x‐ray photoelectrons for different x‐ray incidence angles and different photoelectron take‐off angles. The experimental photoelectron emission microscope that we are constructing was confirmed as being close to the optimum configuration, in which the x‐ray incident angle as measured from the surface normal direction is 74° and the photoelectron take‐off angle is set normal to the surface. The depth distribution functions of the Ag 3d X‐ray photoelectrons for different energy windows suggest that the photoelectron emission microscope will exhibit greater surface sensitivity for narrower photoelectron energy windows. Copyright © 2003 John Wiley & Sons, Ltd.     

Improved Tougaard background calculation by introduction of fittable parameters for the inelastic electron scattering cross‐section in the peak fit of photoelectron spectra with UNIFIT 2011

The shape of the background in x‐ray photoemission spectra is strongly affected by scattered electrons from inelastic energy loss processes. A polynomial of low order has very often been applied to model the secondary‐electron background, giving satisfying results in some cases. An improved analysis employing the Tougaard background model has been successfully used to characterize the inelastic loss processes. However, the correct usage of the Tougaard background needs a well defined inelastic electron scattering cross‐section function λ(E) · K(E, T) (λ = inelastic mean free path, E = kinetic energy, T = energy loss). This paper presents a four‐parameter loss function λ(E) · K(E, T) = B · T/(C + C′ · T²)² + D · T² with the fitting parameters B, C, C′ and D implemented in the background function allowing the improved estimation of the λ(E) · K(E, T) function for homogenous materials. The fit of the background parameters is carried out parallel to the peak fit. The results will be compared with the parameters recommended by Tougaard. The calculation of inelastic electron scattering cross‐sections of clean surfaces from different materials using UNIFIT 2011 will be demonstrated. Copyright © 2011 John Wiley & Sons, Ltd.     

Behavior of the continuous X-ray background in grazing-exit electron probe X-ray microanalysis

The energy distribution of the background radiation originating from two kinds of substrate materials has been studied using Electron Probe X-Ray Microanalysis (EPMA) at grazing-exit angles. The different behavior between tendencies of background reduction for the silicon and the gold substrates at the grazing exit angle is explained using a critical energy concept. It is also shown experimentally that a gold substrate results in a lower background intensity than a silicon substrate in the energy region 5–7 keV, while on the other hand, for elements with X-ray lines of 2–3 keV, it is advantageous to perform the analysis when such elements are deposited on the silicon substrate.     

Analysis of highly resolved x‐ray photoelectron Cr 2p spectra obtained with a Cr2O3 powder sample prepared with adhesive tape

By using modern XPS systems it is possible to obtain spectra with well‐resolved spin orbit, multiplet and field splitting even with powder samples mounted using adhesive tape. Measurement of Cr₂O₃ powder with the latest generation of XPS spectrometers, which are able to analyse non‐conductive powders with ultimate energy resolution, revealed multiplet splitting features and satellite emission in the Cr 2p spectrum. Therefore, peak‐fit analysis of Cr 2p XPS spectra of Cr(III) compounds requires a more appropriate approach and common practice has to be reconsidered. One possible way to analyse this spectrum is proposed, based on the experimental and theoretical work of other authors. Copyright © 2004 John Wiley & Sons, Ltd.     

He I ultraviolet photoelectron spectroscopy of benzene and pyridine in supersonic molecular beams using photoelectron imaging

We performed He I ultraviolet photoelectron spectroscopy (UPS) of jet-cooled aromatic molecules using a newly developed photoelectron imaging (PEI) spectrometer. The PEI spectrometer can measure photoelectron spectra and photoelectron angular distributions at a considerably higher efficiency than a conventional spectrometer that uses a hemispherical energy analyzer. One technical problem with PEI is its relatively high susceptibility to background electrons generated by scattered He I radiation. To reduce this problem, we designed a new electrostatic lens that intercepts background photoelectrons emitted from the repeller plate toward the imaging detector. An energy resolution (ΔE/E) of 0.735% at E = 5.461 eV is demonstrated with He I radiation. The energy resolution is limited by the size of the ionization region. Trajectory calculations indicate that the system is capable of achieving an energy resolution of 0.04% with a laser if the imaging resolution is not limited. Experimental results are presented for jet-cooled benzene and pyridine, and they are compared with results in the literature.     

Specific Versus Non-specific Response in Exponential Molecular Amplification from Cross-Catalysis: Modeling the Influence of Background Amplifications on the Analytical Performances

Molecule based signal amplifications relying on an autocatalytic process may represent an ideal strategy for the development of ultrasensitive analytical or bioanalytical assays, the main reason being the exponential nature of the amplification. However, to take full advantage of such amplification rates, high stability of the starting co-reactants is required in order to avoid any undesirable background amplification. Here, on the basis of a simple kinetic model of cross-catalysis including a certain degree of intrinsic instability of co-reactants, we highlight the key parameters governing the analytical response of the system and discuss the analytical performances that are expected from a given kinetic set. In particular, we show how the detection limit is directly related to the relative instability of reactants within each catalytic loop. The model is validated with an experimental dataset and is intended to serve as a guide in the design and optimization of autocatalytic molecular-based amplification systems with improved analytical performances.     

3-乙基-5-[α'-(3"-乙基-α"-苯并亚硒唑啉基)亚乙基]罗丹宁的电荷转移和电学性能

3-乙基-5-2-(3-乙基-乙-萃并亚硒唑啉基]亚乙基丁罗丹宁(BSeER)发生从萃并亚硒唑啉环向罗丹宁环的弱电荷转移。本文以可见吸收光谱, X射线光电子能谱和电子顺磁共振的实验结果来证明上述化合物的电荷转移, 以及通过测量伏安特性曲线, 电阻率-温度特性曲线来表征电学性能。     

Direct measurement of the nitrogen content by XPS in self‐passivated TaNx thin films

The nitrogen content in tantalum nitride (TaN_x) thin films, where x indicates that TaN_x is not generally stoechiometric, can be measured directly by XPS. This is the purpose of the present study. However, the XPS spectra of TaN_x present electron energy loss spectroscopy (EELS) peaks that lead to a complex peak fitting, particularly for self‐passivated thin films. A complete peak fitting procedure based upon Tougaard's background, the Doniach‐Sunjic Function and EELS peaks, is presented. It is applied to two self‐passivated TaN_x thin films elaborated by reactive sputtering and presenting a different nitrogen content. The physical properties of these surfaces are interpreted in terms of Ta 4f_7/2 chemical states directly dependent on the nitrogen content. The main results are discussed and improvements are proposed to the method. Copyright © 2008 John Wiley & Sons, Ltd.