XPS and XAES analysis of copper,arsenic and sulfur chemical state in enargites

Enargite, a copper arsenic sulfide with the formula Cu₃AsS₄ is of environmental concern due to its potential to release toxic arsenic species. The oxidation and dissolution of enargite are governed by the composition and chemical state of the outermost surface layer. Qualitative and quantitative analysis of the enargite surface can be initially obtained on the basis of X‐ray photoelectron spectroscopy (XPS) binding energy and intensity data. However, a more precise determination of the chemical state of the principal elements of enargite (copper, arsenic and sulfur) in the altered surface layer and in the bulk of the mineral requires a combined analysis based on XPS photoelectron lines and the corresponding X‐ray excited Auger lines. On the basis of results obtained on natural and synthetic enargite samples and on standards of sulfides and oxides, the Auger parameter α′ of different compounds was calculated and the Wagner chemical state plots were drawn for arsenic, copper and sulfur. Arsenic in enargite is found to be in a chemical environment similar to that of arsenides or elemental arsenic, whereas copper in enargite is in a chemical state that corresponds to copper sulfide, Cu₂S, for all samples irrespective of surface treatment (natural or freshly cleaved). Only sulfur changed from a chemical state similar to that of copper or iron sulfide in freshly cleaved samples to another state in natural enargite in the as‐received state. Thus, it is the sulfur atom at the surface of enargite that is most susceptible to changes in the enargite surface state and composition. A more detailed interpretation of this behavior, based on differences in the initial and final state effects, is proposed here. The concept of Auger parameter and chemical state plot, used here for the first time for investigating enargite, has proved to be a method to unambiguously assign the chemical state of the principal elements copper, arsenic and sulfur in these minerals. Copyright © 2006 John Wiley & Sons, Ltd.     

Surface modification of a liquid‐crystalline polymer for copper metallization

The effects of different surface modifications on the adhesion of copper to a liquid‐crystalline polymer (LCP) were investigated with X‐ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy, contact‐angle measurements, and pull tests. High pull‐strength values were achieved when copper was sputter‐deposited onto plasma and reactive‐ion‐etching (RIE)‐pretreated LCP surfaces. The values were comparable to the reference pull strengths obtained with laminated copper on the LCP. The adhesion was relatively insensitive to the employed feed gas in the pretreatments. The surface characterizations revealed that for RIE and plasma treatments, the enhanced adhesion was attributable to the synergistic effects of the increased surface roughness and polar component of the surface free energy of the polymer. However, if the electroless copper deposition was performed on RIE‐ or plasma‐treated surfaces, very poor adhesion was measured. Good adhesion between the LCP substrate and electrolessly deposited copper was achieved only in the case of wet‐chemical surface roughening as a result of the creation of a sufficient number of mechanical interlocking sites, together with a significant loss of oxygen functionalities, on the surface. © 2003 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 41: 623–636, 2003     

Summary of ISO/TC 201 Standard: ISO 14701:2011 – Surface chemical analysis – X‐ray photoelectron spectroscopy—measurement of silicon oxide thickness

This International Standard specifies several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X‐ray photoelectron spectroscopy. It is only applicable to flat, polished samples and for instruments that incorporate an Al or Mg X‐ray source, a sample stage that permits defined photoelectron emission angles and a spectrometer with an input lens that may be restricted to less than a 6° cone semiangle. For thermal oxides in the range 1‐ to 8‐nm thickness, using the best method described in this International Standard, uncertainties at a 95% confidence level around 2% may be typical and around 1% at optimum. A simpler method is also given with slightly poorer, but often adequate, uncertainties. Copyright © 2012 Crown copyright.     

Electroless plating of copper on fly ash cenospheres using polyaniline‐Pd activation

The polyaniline of different intrinsic oxidation states, viz., the emeraldine (EM) and the leucoemeraldine (LM) states, were coated on 3‐aminopropyltriethoxy silane modified fly ash cenospheres. Without prior sensitization by SnCl₂ solution, Pd activation by PdCl₂ solution was carried out on EM and LM laden cenospheres, followed by electroless plating of copper (Cu). The topography and composition of the composites were characterized by scanning electron microscopy, X‐ray diffraction, and X‐ray photoelectron spectroscopy, etc. The results indicate that the oxidation state of the LM layer showed a much bigger increase than that of the EM layer in the Pd activation process, while coupled Pd reduction underwent to a more extent on the LM layer. The metallic Pd atoms on the LM and EM layers surface initiated the subsequent electroless plating of Cu, and the coated Cu on LM laden cenospheres had a much more uniform and compact morphology than that on EM laden cenospheres. Copyright © 2012 John Wiley & Sons, Ltd.     

XPS analyses on Ta/Au/NiFe/NiO/Ta films

In this study, Ta/NiFe/NiO/Ta films were prepared by magnetron sputtering. The Au layer inserted at the interface of Ta and NiFe significantly influences the exchange bias field (H_ex) of the Ta/NiFe/NiO/Ta films. The Hex of the film with 0.9 nm Au layer increased by 28% compared with that of the film without a Au layer. The results show that the Au layer inserted at the interface of Ta and NiFe segregated at the surface of the NiFe/NiO in Ta/Au/NiFe/NiO/Ta films. The Au layer insulated the direct contact and suppressed the interface reaction between the NiFe and NiO layers, thus increasing the Hex. Copyright © 2015 John Wiley & Sons, Ltd.     

Interlaboratory study comparing analyses of simulated angle‐resolved X‐ray photoelectron spectroscopy data

An interlaboratory study has been conducted to determine the following: (i) the similarities and differences of film thicknesses and composition profiles obtained from analyses of simulated angle‐resolved X‐ray photoelectron spectroscopy (ARXPS) data by different analysts using different algorithms for data analysis, and (ii) the effects of two assumptions commonly made in data‐analysis algorithms for ARXPS on derived film thicknesses and composition profiles. The analyzed data were generated by the National Institute of Standards and Technology Database for the Simulation of Electron Spectra for Surface Analysis, (SESSA) which provides a simple way to study the influence of the aforementioned effects on compositional depth profile reconstruction. Sets of simulated ARXPS data were produced for thin films of SiO₂, SiON, HfO₂, and HfON of varying thicknesses on a Si substrate. For some HfON films, the N concentration varied with depth. Eleven groups participated in the round robin study. The majority (eight) employed a commercial ARXPS instrument in which the angular distribution is measured for a fixed sample geometry, in contrast to conventional ARXPS in which the sample is tilted for angular variation. The average deviations between the reported average depth, film thickness, and amount of material typically varied between 20% and 30% but were considerably larger, between 30% and 80%, for some cases. The average errors were generally larger for simulations that included elastic scattering and the finite analyzer‐acceptance angle (realistic conditions) than those for simulations that neglected elastic scattering and the finite analyzer‐acceptance angle (simplified conditions). The retrieved N depth profiles were quantitatively different from the true depth profiles and showed substantial variability among the group of members who used the same instrument and analysis software. Copyright © 2014 John Wiley & Sons, Ltd.     

The investigation of NbO2 and Nb2O5 electronic structure by XPS,UPS and first principles methods

In this paper, the electronic structures of NbO₂ and Nb₂O₅ are theoretically and experimentally analyzed. The oxides in the samples are mainly consisted of NbO₂ and NbO, whereas the outmost layer of the samples is NbO₂. After exposure to air, the outermost layer on all niobium samples is Nb₂O₅. The photoelectrons from the first 2–4 Å contribute to the spectra, so the valence band structure of NbO₂ and Nb₂O₅ can be confirmed from ultraviolet photoelectron spectroscopy (UPS). By comparing the UPS with density of state results, the electronic structure of NbO₂ and Nb₂O₅ can be distinguished from each other, and then the electronic structure was deconvoluted into several electronic states. The agreement between experimental result and theory is, in the best case, satisfactory. Copyright © 2013 John Wiley & Sons, Ltd.     

XPS characterisation of carbon‐coated alumina support

Hybrid carbon–alumina supports, synthesised by pyrolysis of grafted 4,4′‐methylenebis‐(phenylisocyanate) moiety on the alumina surface, were characterised by X‐ray photoelectron spectroscopy. The recorded Al 2p and C 1s envelopes showed asymmetry that decreased with an increase in carbon loading. In all experimental Al 2p envelopes, the high‐energy individual components at 75.3–75.9 eV were present along with the low‐energy component at 74.0 eV typical for Al₂O₃. In the case of the C 1s envelope, the component around 284.3–284.4 eV and three high‐energy individual components at 285.9–286.0, 288.0–288.3 and 290.1–290.6 eV were observed. The presence of the high‐energy Al 2p components can be explained considering the occurrence of a steady‐state charging of the different parts of insulating alumina supports. The component around 284.3–284.4 eV in C 1s envelopes can be attributed to carbon, which constitutes the coating and, hence, ensures surface conductivity. The component around 285.9–286.0 eV is connected with carbon in carbonaceous surface species, which do not form the conducting layer on the alumina support. Carbonaceous surface species associated with C? O, C?O and O?C? O groups in carbon coating can be also identified due to the presence of corresponding components in XPS spectra at 285.9–286.0, 288.0–288.3 and 290.1–290.6 eV. Copyright © 2006 John Wiley & Sons, Ltd.     

XPS and resistive studies on thin films of a copper(II)‐based coordination polymer deposited on functionalized interdigital electrodes

A symmetrical 2‐thiopyrimidine based molecule with an expanded π‐electron system is synthesized and used to form a self‐assembled monolayer (SAM) on gold surfaces. Utilizing chemical vapor deposition a monolayer of (3‐mercaptopropyl)triethoxysilane is formed on silicon dioxide substrates. Both of these SAM coated substrates are characterized by X‐ray photoelectron spectroscopy and the growth of a coordination polymer built up from 5,5′‐(ethyne‐1,2‐diyl)bis(2‐hydroxyacetophenone) and copper(II) on dual SAM coated transducers is studied. After the deposition procedure on interdigital electrodes the electrical properties of the polymer are investigated performing resistive measurements. A significant change of the resistance, which depends on the surrounding atmosphere, proves the sensing behavior of the synthesized coordination polymer. © 2014 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2015 , 53, 335–344     

In Situ Observation of Surface Species on Iridium Oxide Nanoparticles during the Oxygen Evolution Reaction

An iridium oxide nanoparticle electrocatalyst under oxygen evolution reaction conditions was probed in situ by ambient‐pressure X‐ray photoelectron spectroscopy. Under OER conditions, iridium undergoes a change in oxidation state from Ir^IV to Ir^V that takes place predominantly at the surface of the catalyst. The chemical change in iridium is coupled to a decrease in surface hydroxide, providing experimental evidence which strongly suggests that the oxygen evolution reaction on iridium oxide occurs through an OOH‐mediated deprotonation mechanism.     

The initial oxidation of magnesium: an in situ study with XPS,HERDA and ellipsometry

The initial oxidation of magnesium at oxygen partial pressures between 1.3 × 10^?8 and 1.3 × 10^?5 Pa and at temperatures ranging from 273 to 550 K has been investigated in situ with X‐ray photoelectron spectroscopy (XPS), ellipsometry and high resolution elastic recoil detection analysis (HERDA). Quantitative analysis of the XPS spectra showed a clear oxygen deficiency with respect to MgO for the initial oxide. HERDA measurements confirmed this relatively low oxygen content in the thin oxide layers formed. Ellipsometry measurements showed that the electronic structure of the initially formed oxide differs significantly from that of bulk MgO. The band gap values at room temperature for the oxide layers investigated are clearly smaller than the value for bulk MgO. Copyright © 2006 John Wiley & Sons, Ltd.     

Ultrasound‐assisted oxidation of tungsten in oxygen plasma: the early stages of the oxide film growth

The effect of ultrasonic vibrations applied in situ on the formation of W–WO interface during the exposure of a pure tungsten foil to a low‐temperature oxygen plasma is investigated by photoelectron spectroscopy (XPS) and time‐of‐flight secondary ion mass spectrometry (TOF‐SIMS). The tungsten surface was exposed to oxygen plasma at different time intervals and the evolution of the interface formation was studied by angle‐resolved XPS. We show that oxidation without ultrasonic vibrations leads to the formation of a thin oxide film whose growth kinetics is governed by an island growth mechanism. On the other hand, oxide growth in the presence of ultrasonic treatment (UST) appears to follow a layer‐by‐layer growth mode with a distinctly sharper W–WO interface. TOF‐SIMS analysis in this case revealed a reduced amount of water bonded in the film, which suggests an increase in the film's packing density. Copyright © 2006 John Wiley & Sons, Ltd.     

NMR Spectroscopy and X‐Ray Characterisation of Cationic N‐Heteroaryl‐Pyridylamido ZrIV Complexes: A Further Level of Complexity for the Elusive Active Species of Pyridylamido Olefin Polymerisation Catalysts

New [(N^?,N,N^?)ZrR₂] dialkyl complexes (N^?,N,N^?=pyrrolyl‐pyridyl‐amido or indolyl‐pyridyl‐amido; R=Me or CH₂Ph) have been synthesised and tested as pre‐catalysts for ethene and propene polymerisation in combination with different activators, such as B(C₆F₅)₃, [Ph₃C][B(C₆F₅)₄], [HNMe₂Ph][B(C₆F₅)₄] or solid AlMe₃‐depleted methylaluminoxane (DMAO). Polyethylene (M_w>2 MDa and M_w/M_n = 1.3–1.6) has been produced if pre‐catalysts were activated with 1000 equivalents of DMAO (based on Al) [activity >1000 kg_PE (mol_[Zr] h mol atm)^?1] or by using a higher pre‐catalyst concentration and a mixture of [HNPhMe₂][B(C₆F₅)₄] (1 equiv) and AliBu₂H (60 equiv). In the case of propene polymerisation, activity has been observed only if pre‐catalysts were treated with an excess of AliBu₂H prior to addition of DMAO, which led to highly isotactic polypropylene ([mmmm]>95 %). Neutral pre‐catalysts and ion pairs derived from their activation have been characterised in solution by using advanced 1D and 2D NMR spectroscopy experiments. The detection and rationalisation of intercationic NOEs clearly showed the formation of dimeric species in which some pyrrolyl or indolyl π‐electron density of one unit is engaged in stabilising the metal centre of the other unit, which relegates the counterions in the second coordination sphere. The solid‐state structure of the dimeric indolyl‐pyridyl‐amidomethylzirconium derivative, determined by X‐ray diffraction studies, points toward a weak Zr???η³‐indolyl interaction. It can be hypothesised that the formation of dimeric cationic species hampers monomer coordination (especially of less reactive α‐olefins) and that addition of AliBu₂H is crucial to split the homodimers.     

Structure and growth of oxides on polycrystalline nickel surfaces

The oxidation of polycrystalline nickel (Ni) metal surfaces after exposure to oxygen gas (O₂) at 25 and 300 °C and pressures near 130 Pa, was studied using X‐ray photoelectron spectroscopy (XPS). Oxide structures involving both divalent (Ni²⁺) and trivalent (Ni³⁺) species could be distinguished using Ni 2p spectra, while surface adsorbed O₂ and atomic oxygen (O) species could be differentiated from bulk oxide (O^2?) using O 1s spectra. Oxide thicknesses and distributions were determined using QUASES^?, and the average oxide thickness was verified using the Strohmeier formula. The reaction kinetics for oxide films grown at 300 °C followed a parabolic mechanism, with an oxide thickness of greater than 4 nm having formed after 60 min. Exposure at 25 °C followed a direct logarithmic mechanism with an oxide growth rate about four to five times slower than at 300 °C. Reaction of a Ni (100) single crystal under comparable conditions showed much slower reaction rates compared to polycrystalline specimens. The higher reaction rate of the polycrystalline materials is attributed to grain boundary transport of Ni cations. Oxide thickness was measured on a microscopic scale for polycrystalline Ni exposed to large doses of O₂ at 25 and 300 °C. The thickness of oxide was not strongly localized on this scale. However, the QUASES^? analysis suggests that there is localized growth on a nanometric scale—the result of island formation. Copyright © 2007 John Wiley & Sons, Ltd.     

Superoxide Compounds of the Large Pseudo‐Alkali‐Metal Ions Tetramethylammonium, ‐Phosphonium,and ‐Arsonium

Compounds of the three large cations tetramethylammonium, tetramethylphosphonium, and tetramethylarsonium with the superoxide radical anion were synthesized by either metathesis or ion exchange in liquid ammonia. They were obtained from concentrated solutions as ammoniates in the form of long needle‐shaped single crystals. [N(CH₃)₄]‐(O₂)?3NH₃ crystallizes in the monoclinic crystal system, whereas the two compounds [E(CH₃)₄](O₂)?2NH₃ (E=P, As) are isostructural and belong to the orthorhombic crystal system. The cation–anion packing in all three crystal structures is related to the sodium chloride structure. All structures contain hydrogen bonds between the ammonia molecules and between ammonia and the superoxide. The solvent of crystallization was easily released from the crystals upon complete removal of the solvent from the reaction vessel, leading to polycrystalline samples. The Raman spectra of all three solvent‐free compounds show the symmetric stretching mode of the superoxide ion at about 1123 cm^?1. The desolvated [N(CH₃)₄](O₂) was investigated by powder X‐ray diffraction, and the crystal structure was solved by ab initio simulated annealing methods by using rigid‐body models of the constituent molecular ions. The superoxide ion shows rotational disorder. The magnetic susceptibility of tetramethylammonium superoxide follows the Curie–Weiss law with a high‐temperature effective magnetic moment of 1.66(3) μ_B and a paramagnetic Curie temperature of Θ=?13(6) K. Complementary electron paramagnetic resonance spectroscopy revealed that the average g factor is temperature‐dependent. It decreased from 2.15 at 10 K to 1.66 at 100 K, possibly due to the onset of rotational motion of the superoxide ion and in accordance with the lower‐than‐expected effective magnetic moment.     

XPS investigations of ink‐jet printed paper

Different ink‐jet printed paper materials were investigated using X‐ray photoelectron spectroscopy (XPS) yielding the elemental composition of the near‐surface region of the papers. We found significant differences with respect to the detected elements and their atomic concentrations in the different inks studied here. Two different groups of inks could be identified by means of a lower ratio of the O and C atomic concentrations and lower concentrations in specific trace elements like Mg, Na and Si. High‐resolution spectra of C 1s and O 1s core levels allowed a detailed determination of the chemical state of the respective elements. On the basis of a detailed deconvolution of these XPS signals, significant differences between all the investigated ink‐jet printed papers were found, thereby allowing their discrimination. The applicability of the measurements and, more generally, the XPS technique for forensic investigations of paper are discussed. Copyright © 2007 John Wiley & Sons, Ltd.