Influence of source composition on the properties of flash-evaporated thin films in the Cu–In–Se system

Using CuIn₂Se_3.5 as source material epitaxial layers are obtained on (111)A- und (100)-oriented GaAs substrates by flash evaporation in the substrate temperature range T_sub = 720—870 K. The composition of the films is between CuInSe₂ and CuIn₂Se_3.5. The structural properties of the films are similar to those for CuInSe₂ epitaxial layers and refer to a chalcopyrite-like structure. The films are always p-type conducting but different acceptor states are found in dependence on the substrate temperature.     

Epitaxial layers of CuInTe2 on GaAs

CuInTe₂ thin films were deposited onto semi-insulating (111)A-oriented GaAs substrates by flash evaporation. Epitaxial growth was found in the substrate temperature range T_sub = 620 … 790 K. Above 750 K a second phase was found besides the chalcopyrite phase. All epitaxial films were p-type conducting and showed an increase of the hole concentration with rising substrate temperature above T_sub = 720 K. Three acceptor states with ionization energies of 350 … 500 meV, 135 … 150 meV, and of some 10⁻³ eV were found.     

Growth and electrical properties of flash evaporated AgGaTe2 thin films

Thin films have been prepared by flash evaporation technique of a stoichiometric bulk of AgGaTe₂ compound in vacuum and analysed using X‐ray diffraction, transmission electron microscopy, selected area diffraction and energy dispersive analysis of X‐rays. The effect of substrate temperature on the structural properties – grain size, film orientation, composition, and stoichiometry of the films have been studied. It was found that the polycrystalline, stoichiometric films of AgGaTe₂ can be grown in the substrate temperature range of 473K < Ts < 573K. The influence of substrate temperature (Ts) on the electrical characteristics‐ Resistivity, Hall Mobility, Carrier concentration of AgGaTe₂ thin films were studied. The electrical resistivity was found to decrease with increase in substrate temperature up to 573K and then increases. The variation of activation energy of AgGaTe₂ thin films were also investigated. The implications are discussed. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Epitaxial layers of CuGaTe2 on GaAs

CuGaTe₂ thin films with thicknesses in the range from 0.1 to 0.2 μm were deposited onto semi-insulating (111) A-oriented GaAs substrates by flash evaporation under controlled growth conditions. Epitaxial growth begins at a substrate temperature of T_sub = 695 K. In the range T_sub = 695 … 820 K the films have the chalcopyrite structure, at T_sub = 820 to 840 K a second phase was observed besides the chalcopyrite phase. At T_sub > 840 K the films become polycrystalline. All epitaxial films were p-type conducting and showed an increase of the hole concentration with rising substrate temperature. The measured mobilities indicate to the presence of a high concentration of neutral impurities or defects.     

Growth and Electron Microscopical Investigations of (CaBa)F2 Epitaxial Layers on GaAs and InP Substrates

(CaBa)F₂ layers have been grown on (100)-oriented GaAs and InP substrates by flash evaporation technique. They were investigated by means of electron microscopical methods (RHEED, TED, TEM). Epitaxial growth was found at temperatures in the range of 725 to 825 K for GaAs substrates and 700 to 800 K for InP substrates, respectively. The films showed a fine-grained structure and consisted of two phases always with a composition of approximately Ca_0.99Ba_0.01F₂ and Ca_0.08Ba_0.92F₂. This is in accordance with the occurrence of a miscibility gap observed in the binary CaF₂ BaF₂ system.     

Growth and electrical properties of epitaxial CuInS2 thin films on GaAs substrates

CuInS₂ thin films with thicknesses in the range of 500 Å were deposited onto semi-insulating (111) A-oriented GaAs substrates by flash evaporation in the substrate temperature range T_sub = 570 … 870 K. Epitaxial growth begins at T_sub = 645 K. The films had always the chalcopyrite structure. Indications to a transition from the chalcopyrite phase to the sphalerite phase were observed at T_sub = 870 K. Films grown at T_sub ≦ 800 K showed n-type conductivity whereas at growth temperatures T_sub ≧ 850 K the films were always p-type conducting. A donor level and an acceptor level with ionization energies of 0.24 eV and 0.22 eV, respectively, were found from an analysis of the electrical measurements.     

Influence of temperature on the microcrystalline structure of thermally evaporated Sb2S3 thin films

Thin films of antimony trisulfide (Sb₂S₃) were prepared by thermal evaporation under vacuum (p=5×10^–5 torr) on glass substrates maintained at various temperatures between 293 K and 523 K. Their microstructural properties have obtained by transmission electron microscopy (TEM). The electron diffraction analysis showed the occurrence of amorphous to polycrystalline transition in the films deposited at higher temperature of substrates (523 K). The polycrystalline thin films were found to have an orthorhombic structure. The interplanar distances and unit‐cell parameters were determined by high‐resolution transmission electron microscopy (HRTEM) and compared with the standard values for Sb₂S₃. The surface morphology of Sb₂S₃ thin films was investigated by scanning electron microscopy (SEM). The optical transmission spectra at normal incidence of Sb₂S₃ thin films have been measured in the spectral range of 400–1400 nm. The analysis of the absorption spectra revealed indirect energy gaps, characterizing of amorphous films, while the polycrystalline films exhibited direct energy gap. From the photon energy dependence of absorption coefficient, the optical band gap energy, E_g, were calculated for each thin films. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Substrate temperature effect on the optical properties of amorphous Sb2S3 thin films

Sb₂S₃ amorphous thin films were prepared by thermal evaporation of corresponding powder on thoroughly cleaned glass substrates held at temperature in the range 300‐473 K. X‐ray diffraction and atomic force microscopy have been used to order to identify the structure and morphology of surface thin films. The optical constants of the deposition films were obtained from the analysis of the experimental recorded transmission data over the wavelength range 400‐1400 nm. An analysis of the absorption coefficient values revealed an optical indirect transition with the estimation of the corresponding band gap values. It was found that the optical band gap energy decrease with substrate temperature from 1.67 eV at 300 K to 1.48 eV at 473K. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Structural and electrical properties of CuGaSe2 thin films on GaAs substrates

CuGaSe₂ thin films with thicknesses in the range of 0.1 μm were deposited onto semiinsulating (111) A-oriented GaAs substrates by flash evaporation under controlled growth conditions. Epitaxial growth begins at a substrate temperature of T_sub = 835 K. Besides the chalcopyrite phase a hexagonal modification was observed in the range T_sub = 835 to 855 K. At T_sub ≧ 860 K the films have sphalerite structure. All epitaxial films were p-type conducting. Two acceptor levels with ionization energies of about 150 meV and 550 meV, respectively, were obtained from an analysis of electrical and photoluminescence measurements.     

Structural and electrical properties of CuIn0.7Ga0.3Se2 epitaxial layers on GaAs substrates

Epitaxial layers of CuIn_0.7Ga_0.3Se₂ could be prepared by flash evaporation onto (111)A-oriented GaAs substrates in the substrate temperature range T_sub = 745 … 870 K. At T_sub = 745 … 820 K the films had the chalcopyrite structure, at T_sub = 820 … 845 K an additional pseudohexagonal phase was found. Indications to the presence of a sphalerite phase were found at high substrate temperatures. Films grown at T_sub ≦ 750 K were always n-type conducting and showed a largely pronounced impurity band conduction effect. At T_sub ≧ 860 K the films were always p-type conducting and two acceptor states with ionization energies of some 10⁻³ eV and of 125 … 140 meV were found.     

Thermoelectric Power of Polycrystalline Sb2Te3 Films

Polycrystalline stochiometric films of Sb₂Te₃ with different thickness were prepared on glass substrates by a flash evaporation technique at constant substrate temperature of 423 K. The thermoelectric power of these films was determined by measuring integrally the developed thermo — e.m.f. at different temperature differences between the hot and cold ends. The thermoelectric power of Sb₂Te₃ films was determined as a function of the temperature and thickness of the films. It was found that the Fermi level becomes pinned at higher temperatures. The values of γ, E₀, and A parameters were determined as functions of the thickness of the films. The dependence of the thermoelectric power on the reciprocal thickness of the films was explained on the basis of the grain size effect.     

Structural and electrical properties of CdS thin films evaporated onto GaAs substrates

CdS thin films on GaAs substrates are prepared by single source thermal evaporation under high vacuum conditions. Films on (111)A-oriented substrates have the wurtzite structure, whereas in the case of (1 1 1 )B-oriented substrates the sphalerite structure predominates. Depositing films on pre-annealed substrates a tetragonal phase with a composition near CdGa₂S₄ was found. The electron concentration in the CdS films is influenced by the substrate temperature, the growth rate of the films, and the substrate orientation.     

In Situ Deposition of Highly C-axis Oriented Lanthanum Modified Lead Titanate Thin Films by Multi-Ion-Beam Reactive Co-sputtering Technique

Highly c-axis oriented La-modified PbTiO₃ (PLT) thin films were in situ grown on Pt(100)/MgO(100) and MgO(100) substrates by multi-ion-beam reactive co-sputtering (MIBRECS) technique at the substrate temperature range of 450°C-540°C. The orientation degree a of the films is more than 90%. The chemical composition is in good agreement with the designed one and is almost uniform across the surface of the substrates. The remanent polarization (P_r) and coercive field (E_c) were found to be 5.3 μC/cm² and 78 kV/cm, respectively.     

Properties of CVD alumina-titania composite films grown at different CO2/H2 inputs

Amorphous alumina-titania (Al₂O₃-TiO₂) films were prepared on silicon substrates by low-pressure chemical vapor deposition (CVD) using a mixture of aluminum tri-sec-butoxide (ATSB) and titanium tetrachloride (TiCl₄) at different CO₂/H₂ inputs (the ATSB/TiCl₄/CO₂/H₂ system). The films had increased Al contents at higher temperatures and CO₂/H₂ inputs. The `splotchy' deposits were observed. The higher compressive internal stress at higher temperature was attributed to the films with a thinner thickness. Higher compressive internal stress and more Al-O bonding resulted in higher specific critical load. Films deposited at low temperature of 350 °C have a defected structure and a higher dielectric property, due to the non-stoichiometric nature at the Ti-rich composition. Resistivity decreased from 10¹¹ to 10⁸-10⁹ Ω cm after annealing. Breakdown voltages increased slightly with substrate temperature and were in the range of 2.3-6.4 MV/cm. Refractive indices were in the range of 1.71-2.28. Greater than 60% transmittance was observed at visible range for all films.     

Influence of thermoannealing on crystallinity and optical properties of Sb2S3 thin films

Sb₂S₃ thin films are obtained by evaporating of Sb₂S₃ powder onto glass substrates maintained at room temperature under pressure of 2×10^‐5 torr. The composition of the thin films was determined by energy dispersive analysis of X‐ray (EDAX). The effect of thermal annealing in vacuum on the structural properties was studied using X‐ray diffraction (XRD) technique and scanning electron microscopy (SEM). The as‐deposition films were amorphous, while the annealed films have an orthorhombic polycrystalline structure. The optical constants of as‐deposited and annealed Sb₂S₃ thin films were obtained from the analysis of the experimental recorded transmission spectral data over the wavelength range 400‐1400 nm. The transmittance analysis allowed the determination of refractive index as function of wavelength. It was found that the refractive dispersion data obeyed the single oscillator model, from which the dispersion parameters (oscillator energy, E₀, dispersion energy, E_d) were determined. The static refractive index n(0), static dielectric constant, ε_∞, and optical band gap energy, E_g, were also calculated using the values of dispersion parameters. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Effect of annealing temperature on the structural and optical properties of amorphous Sb2Te2Se thin films

Thin films of Sb₂Te₂Se were prepared by conventional thermal evaporation of the presynthesized material on Corning glass substrates. The chemical composition of the samples was determined by means of energy‐dispersive X‐ray spectrometry. X‐ray diffraction studies on the as‐deposited and annealed films revealed an amorphous‐to‐crystalline phase transition. The as‐deposited and annealed films at T _a = 323 and 373 K are amorphous, while those annealed at T _a= 423 and 473 K are crystalline with a single‐phase of a rhombohedral crystalline structure as that of the source material. The unit‐cell lattice parameters were determined and compared with the reported data. The optical constants (n , k ) of the investigated films were determined from the transmittance and reflectance data at normal incidence in the spectral range 400–2500 nm. The analysis of the absorption spectra revealed non‐direct energy gaps, characterizing the amorphous films, while the crystalline films exhibited direct energy gaps. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Influence of Substrate Surface Polarity on Epitaxial Layer Growth of CuInSe2 on GaAs

CuInSe₂ thin films with thicknesses of about 0.1 μm were deposited onto (III) B-oriented GaAs substrates by flash evaporation. At substrate temperatures T_sub = 695–820 K the films have the chalcopprite structure with some admixture of the cubic sphalerite phase. At T_sub > 820 K only the sphalerite phase was found All the films are partly polycrystalline. From the electrical properties it follows that the films are characterized by nearly complete compensation at T_sub = 695–820 K. At T_sub = 870 K the films are p-type conducting and show two acceptor states with ionization energies of about 8 meV and 105 meV.     

Optical properties and structure of thin films from the system GeSe2-Sb2Se3-AgI

Chalcohalide glasses from the GeSe₂-Sb₂Se₃-AgI system were synthesized by taking preliminary prepared GeSe₂, Sb₂Se₃ and AgI in their molecular percentages and melting them in an evacuated quartz ampoule. Thin films from the above system were deposited using vacuum thermal evaporation at different conditions on optical glass substrates BK-7. Using X-ray microanalysis it was found that the film composition differs in a certain degree from the bulk composition. Optical transmission and reflection measurements were carried out in the spectral range 400-2500 nm. The optical constants of films thicker than 400 nm (refractive index, n, and absorption coefficient, k) and the film thickness (d) were calculated using a method developed by Konstantinov. The values of n change from 2.38 for thin GeSe₂ films up to 3.48 for thin Sb₂Se₃ films while the optical band gap decreased from 1.92 eV to 1.29 eV, respectively. After exposure to light the photo-induced changes in the optical parameters were negligible for GeSe₂ and Sb₂Se₃ films and increase for some of the ternary samples. Using IR spectroscopy some conclusions about changes in the film structure were drawn.     

Characterization of Vacuum Evaporated Polycrystalline Cd0.96Zn0.04Te Thin Films by XRD,Raman Scattering and Spectroscopic Ellipsometry

Cd_0.96Zn_0.04Te thin films are deposited onto well cleaned glass substrates (Corning 7059) kept at room temperature by vacuum evaporation and the films are annealed at 423 K. Rutherford Backscattering Spectrometry and X‐ray diffraction techniques are used to determine the thickness, composition and crystalline structure and grain size of the films respectively. The films exhibited zinc blende structure with predominant (111) orientation. The surface morphology of the films is studied by Atomic Force Microscopy. The rms roughness of the as‐deposited films is 3.7 nm and on annealing the films at 423K, the rms roughness value decreases to 3.4 nm. The Raman spectra of the Cd_0.96Zn_0.04Te films are recorded at room temperature to study lattice vibrations and their interactions with other excitations. The intensity of the peak increases and the FWHM decreases on annealing the films. The pseudodielectric‐function spectra, ε(E) = ε₁(E) + i ε₂(E), of polycrystalline Cd_0.96Zn_0.04Te thin films in the 1.3 ‐ 5.5eV photon energy range at room temperature are measured by spectroscopic ellipsometry. The measured dielectric function spectra reveal distinct structures at energies of the E₁, E₁+Δ₁ and E₂ critical points are due to interband transitions.     

RHEED Measurements of AgGaSe2 thin films flash evaporated onto {111} a-GaAs

AgGaSe₂ thin films were prepared by flash evaporation on {111} A-oriented GaAs substrates and investigated by reflection high energy electron diffraction (RHEED). Epitaxial growth takes place in the substrate temperature interval of T_s = 845–920 K. The azimuthal orientation of the deposit on the substrate is discussed, supposing a AgGaSe₂ c/a ratio of 1.82. It is shown that detection of twin formation in the films is possible from RHEED measurements in the <211>-azimuths with respect to the substrate.