Improvement of sintering,nonlinear electrical,and dielectric properties of ZnO-based varistors doped with TiO_2

The effects of TiO_2 on sintering and nonlinear electrical properties of(98.5-x)ZnO–0.5MnO_2–0.5Co_2O_3-0.5Bi_2O_(3–x)TiO_2(x = 0.3,0.5,0.7,0.9 mol%) ceramic varistors prepared by the ceramic technique are investigated in this work.The optimum sintering temperature of the prepared samples is deduced by determining the firing shrinkage and water absorption percentages.The optimum sintering temperature is found to be 1200℃,at which each of the samples shows a maximum firing shrinkage and minimum water absorption.Also minimum water absorption appears in a sample of x = 0.9 mol%.Higher sintering temperature and longer sintering time give rise to a reduction in bulk density due to the increased amount of porosity between the large grains of ZnO resulting from the rapid grain growth induced by the liquid phase sintering.The crystal size of ZnO decreases with increasing TiO_2 doping.The addition of TiO_2 improves the nonlinear coefficient and attains its maximum value at x = 0.7 mol% of TiO_2,further addition negatively affects it.A decrease in capacitance consequently in the dielectric constant is recorded with increasing the frequency in a range of 30 kHz–200 kHz.The temperature and composition dependences of the dielectric constant and AC conductivity are also studied.The increase of temperature raises the dielectric constant because it increases ionic response to the field at any particular frequency.     

(Sr,Co,Nb）掺杂SnO2压敏电阻的电学非线性

研究了Sr对新型(Co, Nb)掺杂SnO₂压敏材料微观结构和电学性质的影响.当SrCO ₃的含量从零增加到1.50mol%时，(Co, Nb)掺杂SnO₂压敏电阻的击穿电压从240V/mm猛增 到1482V/mm.样品的微观结构分析发现, 当SrCO₃的含量从零增加到1.50 mol%时, SnO2的晶粒尺寸迅速减小．晶界势垒高度测量揭示，SnO₂晶粒尺寸的迅速减小是击穿 关键词： 碳酸锶 二氧化锡 势垒 电学非线性     

退火温度对旋涂法制备SnO_2薄膜性能的影响

采用旋涂法在玻璃基底上制备SnO_2薄膜,通过原子力显微镜(AFM)、X射线反射(XRR)、傅氏转换红外线光谱仪(FT-IR)、X射线衍射(XRD)、紫外-可见分光光度计、四探针、开尔文探针系统对薄膜的表面形貌、结构及光学特性、电学特性进行分析,探讨了退火温度对薄膜质量的影响及作用机制。研究发现:随着退火温度升高,薄膜厚度和有机成分杂质减小,薄膜密度递增,但薄膜表面粗糙度有所上升;当退火温度升高至500℃时,薄膜结构由非晶转变为结晶,其主要晶面为氧化锡的(110)、(101)和(211)晶面。旋涂法制备的氧化锡薄膜在可见光区域的平均透光率在90%以上,随着退火温度上升,薄膜在400～800 nm波段的透光率先减小后增大,薄膜的带隙宽度分别为3. 840 eV(沉积态薄膜)、3. 792 eV(100℃)、3. 690 eV(300℃)和3. 768eV(500℃);薄膜的电导率也随着退火温度升高而增加,在500℃时电导率高达916 S/m;薄膜的功函数先增大后减小,分别为(4. 61±0. 005) eV(沉积态薄膜)、(4. 64±0. 005) eV(100℃)、(4. 82±0. 025) eV(300℃)、(4. 78±0. 065) eV(500℃)。     

Uniaxial stress dependence of the dielectric properties of barium titanate single crystals

BaTiO₃ single crystals were grown by the melt-grown method. The effect of uniaxial pressure (0–1700 bar) on the dielectric properties of these crystals has been systematically studied. The external stress showed obvious effects on these properties. An increase in the difference between the Curie T_c and Curie–Weiss T₀ temperatures induced by the applied pressure is observed. This could be ascribed to the inducing of non-ferroelectric cubic islands in the tetragonal phase by the applied compressive stress. On the other hand, the pressure behavior of thermal hysteresis and the ??/?T vs. T plot strongly suggests that the phase transition changes to second-order type with increasing pressure. The Curie–Weiss constant obtained from a modified Curie–Weiss law strongly decreases with increasing pressure, suggesting that the mechanism of phase transition is going to order–disorder type. An increase in the difference between the Curie T_c and Burn's T_B temperatures with increasing pressure is observed. This could be ascribed to the narrowing of the temperature range on which the Curie–Weiss law is valid. In general, the obtained results are in good agreement with hydrostatic pressure data. Some kind of relaxation near T_c, which is strongly coupled with strain caused by applied compressive stress, is postulated.     

基于钛酸锶钡介电非线性效应的可调谐太赫兹人工电磁媒质

数值仿真研究了内嵌钛酸锶钡薄膜夹层的金属网格谐振单元人工电磁媒质的谐振行为. 垂直电磁波激励下, 电磁响应频率随着内嵌夹层钛酸锶钡薄膜介电常数的变大呈现红移, 调谐率为22.6%. 本文提出的人工电磁媒质调谐方法只需要以结构单元的上下两层金属图形本身作为电极对内嵌夹层钛酸锶钡薄膜施加电压, 极大地简化了可调谐人工电磁媒质的制备及应用, 在太赫兹人工电磁媒质调制器等方面具有潜在的应用. 关键词： 人工电磁媒质 钛酸锶钡薄膜 介电非线性 调谐     

Frequency and voltage-dependent electrical and dielectric properties of Al/Co-doped PVA/p-Si structures at room temperature

In order to investigate of cobalt-doped interracial polyvinyl alcohol （PVA） layer and interface trap （Dit） effects, A1/p- Si Schottky barrier diodes （SBDs） are fabricated, and their electrical and dielectric properties are investigated at room temperature. The forward and reverse admittance measurements are carded out in the frequency and voltage ranges of 30 kHz-300 kHz and -5 V-6 V, respectively. C-V or er-V plots exhibit two distinct peaks corresponding to inversion and accumulation regions. The first peak is attributed to the existence of Dit, the other to the series resistance （Rs）, and interfacial layer. Both the real and imaginary parts of dielectric constant （er and err） and electric modulus （Mr and Mrr）, loss tangent （tan~）, and AC electrical conductivity （aac） are investigated, each as a function of frequency and applied bias voltage. Each of the M~ versus V and Mrr versus V plots shows a peak and the magnitude of peak increases with the increasing of frequency. Especially due to the Dit and interfacial PVA layer, both capacitance （C） and conductance （G/w） values are strongly affected, which consequently contributes to deviation from both the electrical and dielectric properties of A1/Co-doped PVA/p-Si （MPS） type SBD. In addition, the voltage-dependent profile of Dit is obtained from the low-high frequency capacitance （CLF-CHF） method.     

Optimized growth and dielectric properties of barium titanate thin films on polycrystalline Ni foils

Barium titanate(BTO) thin films were deposited on polycrystalline Ni foils by using the polymer assisted deposition(PAD) technique.The growth conditions including ambient and annealing temperatures were carefully optimized based on thermal dynamic analysis to control the oxidation processing and interdiffusion.Crystal structures,surface morphologies,and dielectric performance were examined and compared for BTO thin films annealed under different temperatures.Correlations between the fabrication conditions,microstructures,and dielectric properties were discussed.BTO thin films fabricated under the optimized conditions show good crystalline structure and promising dielectric properties with εr～ 400 and tan δ < 0.025 at 100 kHz.The data demonstrate that BTO films grown on polycrystalline Ni substrates by PAD are promising in device applications.     

Structural, optical and electrical properties of Cd-doped SnO2 thin films grown by RF reactive magnetron co-sputtering

Transparent conducting SnO₂:Cd thin films were prepared by RF reactive magnetron co-sputtering on glass slides at a substrate temperature of 500 °C using CdO as cadmium source. The films were deposited under a mixed argon/oxygen atmosphere. The structural, optical and electrical properties were analyzed as a function of the Cd amount in the target. The X-ray diffraction shows that polycrystalline films were grown with both the tetragonal and orthorhombic phases of SnO₂. The obtained films have high transmittance and conductivity. The figure of merit of SnO₂:Cd films are in the order of 10⁻³ Ω⁻¹, which suggests that these films can be considered as candidates for transparent electrodes.     

第一性原理研究Fe掺杂SnO2材料的光电性质

采用基于第一性原理的线性缀加平面波(FP-LAPW)方法,研究Fe掺杂SnO₂材料电子结构和光学性质,包括电子态密度、能带结构、介电函数和其他一些光学图谱. 研究结果表明,掺Fe后材料均属于直接跃迁半导体,且呈现半金属性;随掺杂浓度增加,费米能级进入价带,带隙逐渐减小,Fe原子之间耦合作用增强;通过掺杂能够在一定程度上改变成键性质,使其具有金属键性质. 光学谱线(吸收谱、消光系数等)与介电函数虚部谱线相对应,均发生蓝移,各峰值与电子跃迁吸收有关,从理论上指出光学性质和电子结构的内在联系. 关键词： 能带结构 态密度 光学性质 介电函数     

High Pressure effects on electrical resistivity and dielectric properties of nanocrystalline SnO2

Nanocrystalline tin oxide (SnO₂) was prepared by chemical precipitation method with different grain sizes. The X-ray diffraction studies showed the structural stability of nanocrystalline SnO₂ under high-pressure. Electrical and dielectric properties were studied on these samples using complex impedance spectroscopy under different hydrostatic pressures. Electrical resistivity and dielectric studies showed a transition in nanocrystalline SnO₂ when it was subjected to high-pressure. The transition pressures obtained from both the resistivity and dielectric measurements agree with each other. The transition pressures were found to increase considerably with the decrease in grain size. Dielectric constant was found to decrease with the reduction of grain size. In order to find whether the transition with pressure is structure- related or not, Raman spectroscopy was done at normal temperature and pressure (NTP) and as a function of pressure at room temperature. Raman modes at NTP showed lines which correspond to tetragonal rutile structure of SnO₂. In situ high-pressure Raman measurements were carried out up to 3.38 GPa. No structural change was found with pressure.     

Nonlinear electrical properties and DC accelerated aging characteristics of ZnO-Pr6O11-CoO-Cr2O3-Dy2O3-based varistors

The nonlinear electrical properties and stability against DC accelerated aging stress of various varistors, which are composed of ZnO-Pr₆O₁₁-CoO-Cr₂O₃-Dy₂O₃ (ZPCCD)-based ceramics, was investigated as a function of Dy₂O₃ content. The varistors with Dy₂O₃ exhibited a high nonlinear exponent above 30, compared with that without Dy₂O₃. The varistor with 0.5 mol% Dy₂O₃ exhibited the highest nonlinearity, with a nonlinear exponent of 66.6 and a leakage current of 1.2 μA. Furthermore, this varistor showed the high stability, in which the variation rate of varistor voltage, of nonlinear exponent, and of leakage are −1.9, −10.5, and +275.0%, respectively, under DC accelerated aging stress, 0.95 V_1 mA/150 °C/24 h.     

掺杂水平对ZnO基变阻器电学性能的影响

根据相图规则设计、制备了三个系列不同Bi₂O₃与Sb₂O₃掺杂水平的ZnO基复合变阻器材料,研究了掺杂对氧化锌复合陶瓷电学性能的影响.研究发现,当Sb元素掺杂水平较低时,随着Sb₂O₃掺杂量的增加,所得氧化锌基变阻器材料漏电流的变化也很小,非线性系数(非线性系数α_L和击穿非线性系数α_B)将减小,而场强(场 关键词： 氧化锌 掺杂 复合陶瓷变阻器 电学性质     

Effect of Mg doping on the electrical properties of SnO2 nanoparticles

Sol-gel derived Mg doped tin oxide (Sn_1−xMg_xO₂) nanocrystals were synthesized with x ranging between 0.5 and 7 at. %. Characteristic single phase tetragonal structure of pure and doped samples was obtained and doping saturation was inferred by X-ray diffraction analysis. Structural, morphological and phase informations were obtained by high resolution transmission electron microscope, field emission scanning electron microscope and X-ray photoelectron spectroscopy respectively whereas bonding information was obtained from Fourier transformed infrared spectroscopy. Measurement of different electrical parameters with frequency (200 Hz-10⁵ Hz) has been carried out at room temperature. Ultrahigh dielectric constant and metallic AC conductivity were observed for undoped tin oxide and the profiles reflected highly sensitive changes in the atomic and interfacial polarizability generated by doping concentrations. Relaxation spectra of tangent loss of any sample did not show any loss peak within the frequency range. Both the grain and grain boundary contributions are observed to increase as the doping concentration increased. Results of first principle calculation based on density functional theory indicated effective Fermi level (E_F) suppression due to Mg doping which is responsible for the experimentally observed conductivity variation. AC conductivity was found to depend strongly on the doping concentration and the defect chemistry of the compound. Mg doped SnO₂ may find applications as a low loss dielectric and high density energy storage material.     

SnO2量子点/石墨烯复合结构的合成及其光催化性能研究

本文以SnCl₄·5H₂O和氧化石墨烯为先驱物, 乙醇水溶液为溶剂, 采用一种简单的水热法一步合成了具有可见光催化活性的SnO₂量子点(约3–5 nm)与石墨烯复合结构, 利用透射电子显微镜(TEM), 高分辨透射电子显微镜(HRTEM), X射线衍射仪(XRD), 傅里叶变换红外光谱(FT-IR)等技术对其结构进行了表征, 利用紫外可见吸收光谱(UV-vis)分析了其光学性能, 罗丹明-B染料为目标降解物研究了SnO₂量子点/石墨烯复合结构可见光催化性能. 结果表明: 与纯SnO₂、纯石墨烯相比, 复合结构显示出了很高的可见光催化活性. 通过对其结构进行分析, 我们提出了SnO₂量子点/石墨烯复合结构的形成机制及其可见光催化活性机理.     

Study of structural, optical and electrical properties of ZnO and SnO2 thin films

The investigation of structure, optical and electrical properties of tin and zinc oxide films on glass substrates by using magnetron sputtering are carried out. X-ray data show the formation of textured tin oxides film during deposition and its transformation to SnO₂ polycrystalline film at low temperature (200 C) if the concentration of oxygen in the chamber is high (O₂ — 100%, Ar — 0%). Optimal conditions of SnO₂ polycrystalline film deposition (pressure of Ar–O₂ mixture in chamber — 2.7 Pa, concentration of O₂ — 10%) are determined. Low resistivity of as-deposited ZnO film and increasing ZnO crystallite sizes and phase volume at temperatures higher than the melting point of Zn (419.5 C) are explained by formation of conductive Zn and ZnO particle chains and their destruction, respectively.     

Temperature and frequency dependence of AC electrical properties of Zn and Ni doped CoFe2O4 nanocrystals

Abstract

We have investigated the structure and the electrical properties of CoFe₂O₄, Ni_0.5Co_0.5Fe₂O₄ and Zn_0.5Co_0.5Fe₂O₄ nanoparticles, prepared through a chemical pyrophoric reaction technique. The study of the dielectric constant reveals evidence of Rabinkin and Novikova polarisation in the system. The increased value of the dielectric constant at low frequency is attributed to the presence of interfacial and dipolar polarisation in the system. The impedance for Zn_0.5Co_0.5Fe₂O₄ nanoparticles is found to decrease with increase in temperature, indicating the presence of a temperature-dependent electrical relaxation process in the system. Nyquist plots have been fitted using parallel combinations of grain boundaries resistance and grain boundaries capacitance. The activation energy is estimated from Nyquist plots, dc and ac conductivity data using the Arrhenius relation. This is indicating that the same type of charge carrier is responsible for the relaxation and the conduction processes in the system. Ac conductivity curves follow a double power law, as proposed by Jonscher. The conduction mechanism with temperature is mainly due to the large polaronic hopping in the system.     

Synthesis and characterization of single- and co-doped SnO2 thin films for optoelectronic applications

Doped SnO₂ thin films have been prepared by sputtering from two different targets: antimony doped tin oxide (ATO) and antimony and zinc doped tin oxide (AZTO). In the case of ATO ceramic, the antimony amount only reaches 0.012 mol per formula unit due to its evaporation at high temperature while the presence of Zn²⁺ in AZTO prevents the antimony evaporation, greatly enhances the ceramic density and allows the deposition of thin films with a high deposition rate. Both types of thin films have a dense morphology with a smooth surface and they are polycrystalline. For post-annealed ATO thin films, the Drude model was applied to deduce the carrier concentration, the optical mobility as well as the resistivity. The carrier concentration is around ten times higher for ATO thin films compared to AZTO. The two combined effects (higher carrier concentration and mobility) for ATO thin films doped with 1.2% of Sb lead to the best optoelectronic performances, confirming previous results obtained with ceramics. Nevertheless, we have a better opportunity to modulate the conductivity in the case of AZTO thin films.     

Effect of doping MnO2 on magnetic properties for M-type barium ferrite

The crystalline structure and magnetic properties of M-type barium ferrite doped with small amounts of MnO₂ (0, 0.25, 0.5, 0.75, 1.0, 1.5, and 2.0 wt%, respectively) have been investigated by means of XRD, SEM and VSM. The results show that the crystalline structures of barium ferrite are still M-type hexagonal structure and Mn ions are distributed homogeneously in both the grains and the grain boundaries. The saturation magnetization and magnetocrystalline anisotropy constants both reach the highest values when x=0.75 wt%. The displacement of Fe ions from 4f₁ to 2b site is mainly responsible for the appearance of the maximum values.     

Sr位Nd掺杂对SrBi$lt;sub$gt;2$lt;/sub$gt;Nb$lt;sub$gt;2$lt;/sub$gt;O$lt;sub$gt;9$lt;/sub$gt;性能的影响及机理研究

采用传统固相法制备了（Sr_1-3x/2A_x/2Nd_x）Bi₂Nb₂O₉（x=0,0.05,0.1和0.2）陶瓷,并系统研究了Nd离子取代Sr离子对SrBi₂Nb₂O₉性能的影响及其作用机理.研究结果表明：Sr_1-3x/2A_x/2Nd_xBi₂Nb₂O₉的介电常数和介电损耗随温度变化的行为具有明显的离子松弛极化特征.Nd³⁺对Sr²⁺的部分取代,导致Sr_1-3x/2A_x/2Nd_xBi₂Nb₂O₉剩余极化强度P_r稍有下降,但其压电系数d₃₃却有所增加,根据铁电热力学理论,这是Nd³⁺对Sr²⁺取代导致材料介电常数增大所致.Sr_1-3x/2A_x/2Nd_xBi₂Nb₂O₉的居里温度（T_C）没有随Nd含量的增加而变化,拉曼光谱技术分析表明这是其NbO₆八面体畸变程度没有发生变化所致.Nd³⁺取代Sr²⁺提高了材料的介电常数ε_r、压电系数d₃₃、机电耦合系数K_p,同时降低了机械品质因数Q_m,但是谐振频率温度系数C值没有改变. 关键词： 压电陶瓷 介电性能 压电性能 拉曼光谱     

合成温度和N2/O2流量比对碳纤维衬底上生长的SnO2纳米线形貌及场发射性能影响

采用化学气相沉积法系统研究了合成温度和N₂/O₂流量对生长在碳纤维衬底上的SnO₂纳米线形貌及场发射性能的影响规律. 利用扫描电镜(SEM)、透射电镜(TEM), X射线衍射(XRD)及能谱仪(EDS)对产物细致表征, 结果表明, SnO₂纳米线长径比随反应温度的升高而增大; 随N₂/O₂流量比值的增大先增大后变小, 场发射测试表明, 合成温度780 ℃, N₂/O₂流量比为300 : 3 时SnO₂纳米线阵列具有最佳的场发射性能, 开启电场为1.03 V/μm, 场强增加到1.68 V/μm时, 发射电流密度达0.66 mA/cm², 亮度约2300 cd/m².