纳米硅粒子的表面氧化及其光致发光特性

采用射频等离子体增强化学气相沉积技术制备了纳米晶硅粒子,并对其溶液发光的稳态和瞬态特性进行了研究.稳态光致发光结果显示,新制备的纳米硅粉体表现为峰值位于440 nm附近的蓝色发光,经长时间氧化后,该波段发光强度显著增强,并且出现另一峰值位于750 nm附近的红色发光带.不同波长激发和时间分辨光致发光谱的分析表明,纳米硅...     

Copper and Copper Oxide Nanoparticle Formation by Chemical Vapor Nucleation From Copper (II) Acetylacetonate

Crystalline nanometer-size copper and copper (I) oxide particle formation was studied by thermal decomposition of copper acetylacetonate Cu(acac)₂ vapor using a vertical flow reactor at ambient nitrogen pressure. The experiments were performed in the precursor vapor pressure range of P _prec = 0.06 to 44 Pa at furnace temperatures of 431.5°C, 596.0°C, and 705.0°C. Agglomerates of primary particles were formed at P _prec0.1 Pa at all temperatures. At 431.5°C the number mean size of the primary particles increased from D _p = 3.7 nm (with geometric standard deviation _g = 1.42) to D _p = 7.2 nm (_g = 1.33) with the increasing precursor vapor particle pressure from 1.8 to 16 Pa. At 705.0°C the primary particle size decreased from D _p = 24.0 nm (_g=1.57) to D _p = 7.6 nm (_g = 1.54), respectively.At furnace temperatures of 431.5°C and 596.0°C only crystalline copper particles were produced. At 705.0°C the crystalline product of the decomposition depended on the precursor vapor pressure: copper particles were formed at P _prec>10 Pa, copper (I) oxide at P _precleq 1 Pa, and a mixture of the metal and its oxide at intermediate vapor pressures. A kinetic restriction on copper particle growth was shown, which leads to the main role of Cu₂ molecule participation in the particle formation. The formation of copper (I) oxide particles occurs due to the surface reaction of the decomposition products (mainly carbon dioxide). For the explanation of the experimental results, a model is proposed to build a semiempirical phase diagram of the precursor decomposition products.     

Laser-induced Chemical VaporDeposited Nanosized Silicon Nitridewith Double Optical Beams

SupportedbyNationalNaturalScienceFiundationandGuangdongNSF.Intr0ductionSiliconnitridc(Si3N')isknownas"a1l-r0undchampi0n"am0ngtheceramicmateria1s.0wingt0itscharacteristies0fthermal-shockresistance,anti-0xi(1ati0n,c0rrosi0nresistance,andll4gh-temperaturestrcngth,Si3N4isnot0nlyago0dkindofhigh-temPeraturestructuralmaterials,buta1soan0wtyPe0ffuncti0nalmaterial.Becauseofitsexcellentproperties,nanosizedSi3N4isbeingc0nsidcredforapplicati0ninthefieldofccramicengines,microelec-tronies,spacescience…     

单晶硅上化学气相沉积铜薄膜的机理研究

在自行设计、建立的MOCVD系统上,以Cu(hfac)2为反应前驱物在单晶硅上进行铜薄膜的化学气相沉积,并用AFM、SEM对铜核的成长机理进行了研究．结果表明,反应初期,单晶硅上铜核的成长为岛状,反应后期为先层状后岛状．利用XPS对铜薄膜成长的反应机理进行了探讨,由薄膜的Cu2p、Ols、Fls、Si2p谱可推论出,XPS谱中所出现的C=O、OH及CF3／CF2可能为Cu(hfac),当Cu(hfac)2在高温下分解成Cu(hfac)及hfac后,H2还原表面的hfac生成OH基,反应进行一段时间,OH基浓度大到一定的程度后,与Cu(hfac)2热裂解产生的hfac作用生成HO-hfac并脱附,使表面的铜的氧化物被还原以及发生Cu(hfac)2与H2的氧化还原反应．     

红外用CVD ZnS多晶材料的研制

论述了制备红外用CVD ZnS多晶材料的化学气相沉积工艺和热等静压处理工艺。针对CVD ZnS多晶材料具备优良的光学和力学性能,采用化学气相沉积工艺和热等静压处理技术成功研制出大尺寸多晶材料,其最大尺寸达到250mm×15mm。测试了CVD ZnS样品的各项光学、力学性能指标。样品的全波段透过率均接近ZnS材料的本征水平,折射指数均匀性优于2×10^-5,在1.06μm的吸收系数为2×10^-3cm^-1,抗弯强度达到104MPa。     

Substitutional phosphorus incorporation in nanocrystalline CVD diamond thin films

Nanocrystalline diamond (NCD) thin films were produced by chemical vapor deposition (CVD) and doped by the addition of phosphine to the gas mixture. The characterization of the films focused on probing the incorporation and distribution of the phosphorus (P) dopants. Electron microscopy evaluated the overall film morphology and revealed the interior structure of the nanosized grains. The homogeneous films with distinct diamond grains featured a notably low sp²:sp³‐ratio as confirmed by Raman spectroscopy. High resolution spectroscopy methods demonstrated a homogeneous P‐incorporation, both in‐depth and in‐plane. The P concentration in the films was determined to be in the order of 10¹⁹ cm^–3 with a significant fraction integrated at substitutional donor sites. (© 2014 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

CVD合成的掺杂BNx-石墨烯纳米复合材料:结构和发光性能

用B₄C为硼源,利用CVD系统在N₂-H₂等离子体中合成了掺杂BN_x纳米棒,接着在掺杂BN_x纳米棒表面用CH₄生长了石墨烯纳米片,制备出掺杂BN_x-石墨烯三维纳米复合材料。一系列表征结果说明合成的纳米复合材料由C和O共掺杂的BN_x纳米棒和石墨烯纳米片组成,其形成与碳氢基团的转换和掺杂BN_x纳米棒的形变在石墨烯纳米片中产生的应力有关。室温发光性能表明石墨烯纳米片对掺杂BN_x纳米棒的紫外光和绿光有明显的猝灭作用,起源于掺杂BN_x-石墨烯界面上的电荷转移和电子散射。     

电子助进化学气相沉积金刚石中的光发射谱特性

采用蒙特卡罗方法,对以CH₄/H₂为源料气体的电子助进化学气相沉积(EACVD)金刚石中的氢原子(H_α, H_β, H_γ)、碳原子C(2p3s2p2∶λ=165.7 nm)以及CH(A2Δ→X2Π∶λ=420～440 nm)的光发射过程进行了模拟,气体温度随空间的变化采用温度梯度变化,研究了不同反应室气压及衬底温度下的光发射谱特性。结果表明,不同衬底温度下各谱线强度均随气压的增大先增大后减小; 当气压较低时,谱线强度随衬底温度的增大而减少,而气压较高时,谱线强度随衬底温度的增大而增大。     

Metal CVD for microelectronic applications: An examination of surface chemistry and kinetics

We review the surface chemistry and kinetics relevant to the chemical vapor deposition (CVD) of metals used for microelectronic applications. Our efforts focus on the surface chemistry of aluminum, tungsten, and copper CVD, which have received the most recent interest for metallization. We first briefly review a variety of topics concerning the applications and the chemistry and kinetics of metal CVD. We also give a brief overview of the application of surface science techniques to the study of CVD-related surface chemistry.     

MOCVD生长中载气H2对N掺杂ZnO性质的影响

采用MOCVD方法在石英衬底上生长ZnO。实验使用二乙基锌(DEZn)为锌源,N2O作为氧和氮源,H2作为载气。采用PL和Raman光谱方法对ZnO样品进行表征,结果表明H2的加入大幅度减少薄膜中碳的掺入,明显改善了薄膜的光学质量。采用N2O离化技术,可以进一步提高其带边峰的强度,抑制带内发光。XRD测量表明,生长的ZnO薄膜具有c轴择优取向。目前生长高质量N掺杂的p型ZnO薄膜是很困难的,而H2作为载气的加入明显改善了ZnO薄膜的光学性质,在生长过程中加入H2将为获得高质量N掺杂的p型ZnO薄膜提供一种途径。     

电子助进化学气相沉积金刚石中发射光谱的空间分布

采用蒙特卡罗方法,对以CH₄/H₂为源料气体的电子助进化学气相沉积(EACVD)金刚石中的氢原子(H_α,H_β,H_γ)、碳原子C(2p3s→2p2：λ=165.7 nm)以及CH(A2Δ→X2Π：λ＝420～440 nm)的发射过程进行了模拟,研究了不同CH₄浓度下各发射谱线的空间分布。结果表明,不同CH₄浓度下各发射谱线在反应空间的大部分区域内均随距灯丝距离的增大而增大,而当到达基片表面附近时有所减弱。随着CH₄浓度的增加,H谱线强度减弱,CH与C谱线强度增强。     

CoSb3纳米薄膜的制备与热电性能

通过对低压化学气相沉积制得的CoSb3纳米薄膜在300～800K温度范围内的热电性能测试,发现其电阻率较其他单晶CoSb3块状样品低一个量级,热导率值在1.08～4.05 Wm-1K-1之间,比单晶CoSb3低得多.这表明纳米结构导致热导率显著降低,最高热电优值在773K出现且为0.114.这种纳米薄膜材料在研制新型高效热电半导体方面板具应用前景.     

The influence of chemical solvents on the properties of CVD graphene

The ultra‐clean and defect‐free transfer of chemical vapor deposition (CVD) graphene is essential for its application in electronic devices. Here, we study the influence of commonly used etching solvents during the transfer process, i.e. ammonium persulfate, ferric chloride, and ferric nitrate, on the properties of CVD graphene by Raman spectroscopy. Obvious blue shift and broadening of Raman G and 2D peaks were observed for graphene transferred by ferric chloride and ferric nitrate, as compared to that transferred by ammonium persulfate. These changes are attributed to p‐doping as well as reduction of phonon lifetime of graphene in the presence of residue iron compounds during the transfer process. The latter would also introduce a great reduction of thermal conductivity of graphene, e.g. with 76% reduction for graphene transferred by ferric nitrate as compared to that transferred by ammonium persulfate. This work would provide valuable information for the transfer of high‐quality CVD graphene. Copyright © 2014 John Wiley & Sons, Ltd.     

化学气相沉积法在蓝宝石衬底上可控生长大面积高质量单层二硫化钨

在常压条件下使用CVD法生长单层WS_2,通过改变实验条件实现控制晶粒大小或生长成薄膜的目的。采用光学显微镜、拉曼、光致发光谱等对制备的样品进行表征,得到了结晶质量高、尺寸达120μm的单层WS_2晶粒。同时讨论了几个重要参数如温度、生长时间以及钨源用量等对生长单层WS_2的影响。结果表明:温度对CVD生长WS_2影响最大,高温有助于生长高结晶质量的WS_2。调节生长时间可以控制WS_2晶粒的大小,较长时间能生长出连续的薄膜。过量的S蒸汽会抑制WS_2生长,影响结晶质量。     

微波电子回旋共振-化学气相沉积SiN_x薄膜的光学性能研究

研究了微波电子回旋共振－化学气相沉积ＳｉＮｘ薄膜的光学性能，这种ＳｉＮｘ薄膜具有透光谱宽、透光率高的特点，总结了透光谱、折射率、光隙能随微波功率、基片温度的变化关系     

Luminescence properties of Mn doped Zn2SiO4 phosphor films synthesized by combustion CVD

Zn₂SiO₄:Mn²⁺ phosphor films were successfully prepared by a novel combustion chemical vapor deposition (CCVD) method. In the CCVD process, a flammable solution, containing precursor materials, is atomized and sprayed through a specially designed nozzle and ignited to form a combustion flame. This enables crystallized films to be directly deposited onto a substrate in open-atmosphere with no post deposition heat treatment. SEM images indicated that the film deposited at 1200 °C consisted of densely packed particles with a fine grain size of several 100 nm. Strong Photoluminescence (PL) and cathodoluminescence (CL) intensities were observed with Zn₂SiO₄:Mn²⁺ samples deposited at a substrate temperature of 1200 °C exhibiting the best crystallinity and highest luminescence. The optimum doping level for films deposited using CCVD was found to be ∼4 mol% Mn²⁺ of starting concentration, with a maximum CL luminescence equivalent to 53% of the luminescence measured from a commercial powder phosphor. A relatively fast CL decay with life time about 0.6-0.7 ms was also observed from these films.     

Excitation Intensity Dependence of Free-exciton Transitions in GaN Grown by Low-pressure Metalorganic Chemical Vapor Deposition

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