MnxSi1-x磁性薄膜的结构研究

利用X射线衍射(XRD)和X射线吸收近边结构(XANES)方法研究了在Si(100)衬底上及600℃温度条件下用分子束外延(MBE)共蒸发方法生长的MnxSi1-x磁性薄膜的结构.由XRD结果表明,只有在高Mn含量(8%和17%)样品中存在着Mn4Si7化合物物相.而XANES结果则显示,对于Mn浓度在0.7%到17%之间的MnxSi1-x样品,其Mn原子的XANES谱表现出了一致的谱线特征.基于多重散射的XANES理论计算进一步表明,只有根据Mn4Si7模型计算出的理论XANES谱才能够很好的重构出MnxSi1-x样品的实验XANES谱.这些研究结果说明在MnxSi1-x样品中,Mn原子主要是以镶嵌式的Mn4Si7化合物纳米晶颗粒存在于Si薄膜介质中,几乎不存在间隙位和替代位的Mn原子.     

Mn掺杂对ZnO薄膜结构及发光性能的影响

利用脉冲激光沉积的方法在Si衬底上生长出了c轴高度取向的Mn掺杂ZnO薄膜.X射线衍射表明所有样品都具有纤锌矿结构,没有发现其它相,随着掺杂量的增加,c轴晶格常数增大.原子力显微镜结果显示:Mn的掺杂引起了ZnO薄膜表面粗糙度的变化.由光致发光谱发现,在387 nm附近出现了由于近带边自由激子复合引起的紫外峰,还有以4...     

X射线吸收近边结构理论

在X射线吸收谱中,阈值之上60eV以内的低能区的谱出现强的吸收特性,称之为近边吸收结构(XANES)。它是由于激发光电子经受周围原子的多重散射造成的。它不仅反映吸收原子周围环境中原子几何配置,而且反映凝聚态物质费米能级附近低能位的电子态的结构。因此成为研究凝聚态物质的有用工具。本文较详细地介绍了XANES理论中的多重散射模型与计算方法。同时,也揭示多重散射理论与广延系统中通常采用的能带结构理论以及有限系统中的单电子的分子轨道方法之间的关系。并给出若干实例以说明XANES的多重散射理论的应用。     

FeS2多晶薄膜电子结构的实验研究

用磁控溅射方法制各纯Fe薄膜,并硫化合成FeS2.采用同步辐射X射线近边吸收谱与X射线光电子能谱研究了薄膜的电子结构.结果表明,合成的FeS2薄膜,在费米能级附近,有较强的Fe 3d态密度存在,同时,在价带谱中2-10eV处有强度较大的S 3p态密度存在;Fe的3d轨道在八面体配位场作用下分别为t2g和eg轨道,实验中由Fe的吸收谱计算得到两分裂能级之差为2.1eV;实验测得FeS2价带结构中导带宽度约为2.4eV,导带上方仍存在第二能隙,其宽度约为2.8eV.     

过渡金属二硼化物的金属K边XAS研究

结合X射线衍射实验(XRD)和金属K边的X射线吸收谱(XAS)研究了过渡金属二硼化物(TiB₂,VB₂和CrB₂).在近边吸收区,除了主吸收峰之外,还观察到了3个弱的边前峰,它们是由于金属吸收原子的3d轨道在D6h配位场下分裂,分裂后的3个d轨道与高层金属原子4p轨道发生杂化而引起的.此外,还根据XRD实验得到的晶格参数初步拟合了金属K边EXAFS谱,得到了一些有意义的结果.     

MnxSi1-x磁性薄膜的结构研究

利用X射线衍射(XRD)和X射线吸收近边结构(XANES)方法研究了在Si(100)衬底上及600℃温度条件下用分子束外延(MBE)共蒸发方法生长的Mn_xSi_1-x磁性薄膜的结构.由XRD结果表明,只有在高Mn含量(8％和17％)样品中存在着Mn₄Si₇化合物物相.而XANES结果则显示,对于Mn浓度在0.7%到17%之间的Mn_xSi_1-x样品,其Mn原子的XANES谱表现出了一致的谱线特征.基于多重散射的XANES理论计算进一步表明,只有根据Mn₄Si₇模型计算出的理论XANES谱才能够很好的重构出Mn_xSi_1-x样品的实验XANES谱.这些研究结果说明在Mn_xSi_1-x样品中,Mn原子主要是以镶嵌式的Mn₄Si₇化合物纳米晶颗粒存在于Si薄膜介质中,几乎不存在间隙位和替代位的Mn原子. 关键词： xSi_1-x磁性薄膜')" href="#">Mn_xSi_1-x磁性薄膜 分子束外延 XRD XANES     

FeS2多晶薄膜电子结构的实验研究

用磁控溅射方法制各纯Fe薄膜，并硫化合成FeS₂. 采用同步辐射X射线近边吸收谱与X射线光电子能谱研究了薄膜的电子结构. 结果表明，合成的FeS₂薄膜，在费米能级附近，有较强的Fe 3d态密度存在，同时，在价带谱中2—10eV处有强度较大的S 3p态密度存在；Fe的3d轨道在八面体配位场作用下分别为t_2g和e_g轨道，实验中由Fe的吸收谱计算得到两分裂能级之差为2.1eV;实验测得FeS₂价带结构中导带宽度约为2.4eV，导带上方仍存在第二能隙，其宽度约为2.8eV. 关键词： 磁控溅射 二硫化铁 X射线吸收近边结构 电子结构     

薄膜结构分析中的低角X射线衍射方法

利用带折射修正的布喇格衍射定律和薄膜光学理论分析了低角Ｘ射线衍射谱中出现的一系列现象，导出了多层膜周期厚度和周期中不同材料间的配比率的计算公式，对多层膜的低角射线衍射谱中主峰间的次峰现象作出了解释，并对低角Ｘ射线衍射测量单层膜厚度进行了分析，给出了精确的测厚公式。     

分子束外延生长GaN薄膜中的一种早期位错结构

利用高分辨电子显微术，对在GaP基体上由分子束外延生长六角GaN晶体薄膜中的晶体缺陷结构进行了研究．实验中发现了GaN薄膜外延生长过程中产生的一种典型早期刃型位错结构．此晶体缺陷位于一大块GaN晶粒内部，其外观类似于一段（1120）晶界．它由一条（1120）高能孤立晶界段及其两端的两个1/6［1120］不完全刃型位错组成．从大晶格失配材料之间分子束外延生长的机理上对这种缺陷结构的形成进行了解释． 关键词：     

Electrosynthesis and characterization of Fe doped CdSe thin films from ethylene glycol bath

The CdSe and Fe doped CdSe (Fe:CdSe) thin films have been electrodeposited potentiostatically onto the stainless steel and fluorine doped tin oxide (FTO) glass substrates, from ethylene glycol bath containing (CH₃COO)₂·Cd·2H₂O, SeO₂, and FeCl₃ at room temperature. The doping concentration of Fe is optimized by using (photo) electrochemical (PEC) characterization technique. The deposition mechanism and Fe incorporation are studied by cyclic voltammetry. The structural, surface morphological and optical properties of the deposited CdSe and Fe:CdSe thin films have been studied by X-ray diffraction, scanning electron microscopy (SEM) and optical absorption techniques respectively. The PEC study shows that Fe:CdSe thin films are more photosensitive than that of undoped CdSe thin films. The X-ray diffraction analysis shows that the films are polycrystalline with hexagonal crystal structure. SEM studies reveal that the films with uniformly distributed grains over the entire surface of the substrate. The complete surface morphology has been changed after doping. Optical absorption study shows the presence of direct transition and a considerable decrease in bandgap, E_g from 1.95 to 1.65 eV.     

Spray deposition of highly transparent fluorine doped cadmium oxide thin films

The cadmium oxide (CdO) and F:CdO films have been deposited by spray pyrolysis method using cadmium acetate and ammonium fluoride as precursors for Cd and F ions, respectively. The effect of temperature and F doping on the structural, morphological, optical and Hall effect properties of sprayed CdO thin films was investigated using X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), optical absorption and electrical measurement techniques. TGA and DTA studies, indicates the formation of CdO by decomposition of cadmium acetate after 250 °C. XRD patterns reveal that samples are polycrystalline with cubic structure and exhibits (2 0 0) preferential orientation. Considerable broading of (2 0 0) peak, simultaneous shifting of corresponding Bragg's angle have been observed with respect to F doping level. SEM and AFM show the heterogeneous distribution of cubical grains all over the substrate, which are randomly distributed. F doping shifts the optical gap along with the increase in the transparency of CdO films. The Hall effect measurement indicates that the resistivity and mobility decrease up to 4% F doping.     

Microstructure and magnetic properties of FeRh thin films with Pt doping

In this paper,the structure and magnetic properties of FeRh alloy thin films with a small amount of Pt doping fabricated onto a glass substrate by sputtering are investigated systematically.XRD results show that the diffraction pattern of as-deposited film exhibits only nonmagnetic γ phase.After annealing,the disordered γ phase transforms to an ordered α' phase.The temperature dependence of saturation magnetization of different annealing times and Pt contents are characterized.The phase transition temperatu...     

Structural and magnetic properties of Fe doped NiO

Mott-Hubbard anti-ferromagnetic insulator, NiO shows p-type semiconducting behaviour due to vacancy at Ni²⁺ site in its bunsenite structure. We report the modification of structural and magnetic order in NiO on Fe doping. NiO samples at different Fe concentrations in the range 0 to 5 at.% have been prepared by chemical co-precipitation and post thermal decomposition method. Both structural and magnetic characterization reveal that with increasing Fe doping concentration, NiO evolves as a magnetically inhomogeneous state out of the parent homogeneous antiferromagnetic state. In addition, structural inhomogeneity was also observed with Fe precipitating to γ-Fe₂O₃ phase, the signature of which could be clearly seen for Fe content beyond 2 at.%. At lower Fe content however, some amount of Fe occupies lattice and interstitial sites in the NiO matrix and drive the latter to acquire ferromagnetic ordering, which was evident from a clear hysteresis loop at 300 K.      

高质量宽带隙立方氮化硼薄膜的研究进展

文章着重介绍了最近研制出的高质量宽带隙立方氮化硼薄膜的三种制备方法和结构特性 :(1)用射频溅射法在Si衬底上制备出立方相含量在 90 %以上 ,Eg>6 .0eV的c-BN薄膜 ;(2 )用离子束辅助的化学气相沉积法(CVD) ,在金刚石上外延生长出立方含量达 10 0 %的单晶c -BN薄膜 ;(3)用微波电子回旋共振CVD法 (MW -ECR-CVD)在金刚石上外延生长出高纯c-BN薄膜 .这些高纯c -BN薄膜 ,可应用于制作各种半导体 (主要是高温、高频大功率 )电子器件 .     

Preparation and characterization of electrodeposited SnS thin films

Tin sulfide (SnS) thin films have been deposited by electrodeposition using potentiostaic method on indium doped tin oxide (ITO) coated glass substrates from aqueous solution containing SnCl₂·2H₂O and Na₂S₂O₃ at various potentials. Good quality thin films were obtained at a cathodic potential −1000 mV versus saturated calomel electrode (SCE). The deposited films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), and Fourier transform infrared (FTIR). X-ray diffraction analysis shows that the crystal structure of SnS thin films is orthorhombic with preferential orientation along 〈0 2 1〉 plane. Microstructural parameters such as crystallite size, micro strain, and dislocation density are calculated and found to depend upon cathodic potentials. SEM studies reveal that the SnS films exhibited uniformly distributed grains over the entire surface of the substrate. The optical transmittance studies showed that the direct band gap of SnS is 1.1 eV. FTIR was used to further characterize the SnS films obtained at various potentials.     

单晶和孪晶的Zn0.96Co0.04O稀磁半导体薄膜的制备与研究

采用分子束外延技术分别在不同晶面的蓝宝石（sapphire Al₂O₃）基片上制备了沿c轴生长的Zn_0.96Co_0.04O稀磁半导体薄膜.发现在Al₂O₃（1120）晶面（a面）上薄膜是二维层状外延生长的高质量单晶薄膜,而在Al₂O₃（0001）晶面（c面）上薄膜却具有有趣的孪晶结构,部分区域相互之间有一个30°的面内转动来减少和基片之间的失配度.在孪晶薄膜中存在的这些相互旋转形成的区域界面上会引起载流子强烈的散射作用,导致载流子迁移率的下降和平均自由程的缩短.利用X射线吸收精细结构技术证明了无论单晶还是孪晶的Zn_0.96Co_0.04O薄膜中所有的Co都以+2价替代进入了ZnO的晶格,而没有形成任何杂相.而对其磁性研究发现,孪晶的薄膜样品比高质量的单晶薄膜样品具有大得多的饱和磁矩.这充分说明孪晶薄膜中的铁磁性来源与缺陷有关.我们还对铁磁性耦合机制进行了探讨. 关键词： Co掺杂ZnO 稀磁半导体 X射线吸收精细结构 单晶和孪晶薄膜     

Swift heavy ion induced modifications in cobalt doped ZnO thin films: Structural and optical studies

Modifications in the structural and optical properties of 100 MeV Ni⁷⁺ ions irradiated cobalt doped ZnO thin films (Zn_1−xCo_xO, x = 0.05) prepared by sol-gel route were studied. The films irradiated with a fluence of 1 × 10¹³ ions/cm² were single phase and show improved crystalline structure with preferred C-axis orientation as revealed from XRD analysis. Effects of irradiation on bond structure of thin films were studied by FTIR spectroscopy. The spectrum shows no change in bonding structure of Zn-O after irradiation. Improved quality of films is further supported by FTIR studies. Optical properties of the pristine and irradiated samples have been determined by using UV-vis spectroscopic technique. Optical absorption spectra show an appreciable red shift in the band gap of irradiated Zn_1−xCo_xO thin film due to sp-d interaction between Co²⁺ ions and ZnO band electrons. Transmission spectra show absorption band edges at 1.8 eV, 2.05 eV and 2.18 eV corresponding to d-d transition of Co²⁺ ions in tetrahedral field of ZnO. The AFM study shows a slight increase in grain size and surface roughness of the thin films after irradiation.     

Fabrication of atomically smooth SrRuO3 thin films by laser molecular beam epitaxy

High-quality SrRuO₃ (SRO) thin films and SrTiO₃/SRO bilayer were grown epitaxially on SrTiO₃ (STO)(001) substrates by laser molecular beam epitaxy. The results of in situ observation of reflection high-energy electron diffraction and ex situ X-ray diffraction ϑ-2ϑ scan indicate that the SRO thin films have good crystallinity. The measurements of atomic force microscopy and scan tunneling microscopy reveal that the surface of the SRO thin film is atomically smooth. The resistivity of the SRO thin film is 300 μΘ·cm at room temperature. Furthermore, the transmission electron microscopy study shows that the interfaces of STO/SRO and SRO/STO are very clear and no interfacial reaction layer was observed. The experimental results show that the SRO thin film is an excellent electrode material for devices based on perovskite oxide materials. Supported by the National Natural Science Foundation of China (Grant No. 10334070)