共查询到19条相似文献,搜索用时 109 毫秒
1.
利用辉光放电技术采用等离子体质谱诊断的方法研究了不同工作 压强下H2/C4H8混合气体等离子体中 主要正离子成分及其能量的变化规律, 并分析了压强对H2/C4H8混合气体的离解机理以及主要正离子形成过程的影响. 结果表明: 随着工作压强的增加, 碳氢碎片离子的浓度和能量均逐渐减小. 当工作压强为5 Pa时, H2/C4H8混合气体等离子体中C3H5+相对浓度最大; 压强为10 Pa时, C3H3+相对浓度最大; 压强为15, 20 Pa时, C2H5+相对浓度最大; 压强为25 Pa时, C4H9+相对浓度最大. 对H2/C4H8等离子体中的主要组分及其能量分布所进行的定性分析, 将为H2/C4H8混合气体辉光放电聚合物涂层的工艺参数优化提供参考技术基础.
关键词:
辉光放电技术
等离子体质谱诊断
工作压强 相似文献
2.
射频辉光放电等离子体的电探针诊断 总被引:8,自引:2,他引:6
本文简要叙述了探针诊断技术的作用,比较了单、双探针测量技术的异同,分析了当前所碰到的主要问题和各种可能的解决办法。着重报导了我们提出和制作的加热调谐单探针装置,不仅抑制了射频干扰,还克服了中毒效应对探针测量的影响。首次成功地测量了射频辉光放电硅烷等离子体的电子能量分布函数、电子平均能量和密度。并对测量结果进行了简要的分析。 相似文献
3.
通过用Monte Carlo方法模拟N2-H2 混合气体直流辉光放电等离子体快电子行为,从不同H2浓度的电子能量分布函数,电子密度以及ef-N2碰撞率等方面,研究了加H2对氮辉光放电等离子体过程的影响. 研究结果表明: 随着H2浓度的升高,电子的平均能量增加, 电子密度及ef-N2的各种非弹性碰撞率减小; 但在
关键词:
2-H2辉光放电')" href="#">N2-H2辉光放电
Monte Carlo模拟
2碰撞率')" href="#">e-N2碰撞率 相似文献
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功率对氘代辉光放电聚合物结构和力学性能的影响 总被引:1,自引:0,他引:1
采用射频辉光放电聚合技术,在低压等离子体聚合装置上开展在5~20 W功率下氘代辉光放电聚合物薄膜的制备及性能研究。利用傅里叶变换红外吸收光谱仪表征薄膜的化学结构,讨论了功率变化对其官能团结构的影响规律。利用元素分析仪和纳米压痕仪表征薄膜中氘原子的相对含量和薄膜的力学性能。研究表明:随着功率的升高,薄膜中的氘含量先升高后降低,在10W时达到最大,薄膜中SP3 CD的相对含量增加,SP3 CD2的相对含量减小;聚合物薄膜的硬度和杨氏模量均随功率的增加而减小。 相似文献
6.
射频辉光放电CH4等离子体一维流体动力学模拟 总被引:1,自引:1,他引:0
完整建立一个关于射频辉光放电CH4等离子体的流体动力学模型.模型包括基于迁移-扩散近似的粒子平衡方程、电子能量平衡方程,共包含了20种粒子(环境气体粒子,激发态粒子,离子和电子)和49类化学反应(电子-中性环境粒子、离子-中性环境粒子、激发态粒子-激发态粒子(中性环境粒子)).结果表明,在强电场区域有较高的电子反应率系数;等离子体中除源气体CH4外,H2,C2H6,C3H8,C2H4和C2H2也有较高的密度含量;激发态粒子中,CH3含量最高,密度约为1019m-3;在较低放电压力时(如18 Pa),CH5+在离子成分中密度含量最高,当放电压力较高时(如67Pa),C2H5+在离子成分中占主导地位;除C2H5+外,其它各离子和激发态粒子在极板上的粒子流量随功率的增大逐渐升高. 相似文献
7.
对高气压(约100 Torr) 直流辉光碳氢等离子体的气相过程进行了光谱和质谱原位诊断. 在高气压下, 等离子体不同区域光发射特性存在明显差异. 正柱区存在着以C2和CH为主的多个带状谱和分立谱线, 阳极区粒子发射谱线明显减少, 而在阴极区则出现大量复杂的光谱成分, 表明高气压情形下等离子体与阴极间强烈的相互作用将导致复杂的原子分子过程. 从低气压到高气压演变过程中, 电子激发温度降低而气体分子转动温度升高. 在高气压下, 高甲烷浓度导致C2, C2H2及C2H4增多而C2H6减少. 表明在高气压条件下, 气体温度对气相过程的影响作用显著增强.
关键词:
高气压直流等离子体
光发射谱
质谱 相似文献
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采用一维的等离子体流体力学模型研究了氦气-氧气高气压下电容耦合放电过程。分别给出了间隙为1.6,2.4和3.2 mm时外加电压的有效值与放电电流有效值特征曲线,并与已有的实验数据作对比,结果表明计算得到的电压-电流特征曲线与实验数据符合得很好。研究发现:氦气-氧气高气压下电容耦合放电过程中荷质比较大的离子在鞘层中的分布随着外电场的变化而变化,而荷质比较小的粒子在整个放电区域基本不随外电场变化而变化;同时杂质形成正负离子在主等离子体区域两端出现了峰值。 相似文献
10.
预试环中H_2及掺杂甲烷的辉光放电清洗 总被引:1,自引:1,他引:0
曾建尔 《核聚变与等离子体物理》1986,(2)
本文给出了在预试环中产生和维持辉光放电的基本参数、氢气(H_2)及氢气掺杂甲烷(H_2/CH_4)辉光放电清洗过程中的质谱分析结果以及氢气辉光放电清洗处理后的样品表面SIMS(二次离子质谱)结果,并进行了讨论。 相似文献
11.
采用三倍频射频辉光放电聚合技术,利用低压等离子聚合装置在不同功率条件下制备辉光放电聚合物(GDP)薄膜. 利用表面轮廓仪、Fourier变换红外光谱仪表征所制备薄膜在不同功率下的生长速率和化学结构, 讨论了功率变化对薄膜生长速度和化学结构的影响.利用元素分析仪和紫外可见光谱仪表征GDP薄膜中碳氢原子比和光学性质. 研究表明:薄膜的生长速率随射频功率的增大先增加后减少,功率为40 W时,生长速率可达到0.34 μm/h. 在波长大于500 nm的可见光区, GDP薄膜的光学透过率都在90%以上. GDP薄膜的光学间隙随射频功率的增大先减少后增加,射频功率为50 W时制备GDP薄膜的光学间隙最小. 相似文献
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用激光诱导荧光方法对SiH_4/N_2混合气体射频放电等离子体进行了研究,实验上首次检测到SiH_4分子射频放电离解过程的中间产物Si_2. 相似文献
15.
A. K. Shuaibov 《Journal of Applied Spectroscopy》1999,66(2):256-262
Survey emission spectra in the region of 190–600 nm and time and service-life characteristics of a transverse nanosecond discharge
in He/Ar/CF2Cl2(CCl4) mixtures at a pressure of 10–100 kPa are investigated. In the emission spectra, excited products of the decomposition of
freons—C2(A−X), CN(B−X), Cl
2
*
, C*, Cl*, and Cl+*— and the emission of ArF at λ=193 nm are revealed. The emissions of Cl
2
*
at λ=258 nm and ArF at λ=193 nm were the most intense. The discharge in the He/Ar/CF2Cl2 mixture is a multiwave emission source with λ=258 nm Cl
2
*
193 nm ArF, and probably, 175 nm Arcl. It is of interest for applications in UV-VUV-range pulse photometry. The duration
of the emission on Cl
2
*
, ArF, ArI, ClI, and ClII transitions in the discharge in the Ar/CF2Cl2 mixture (P=10–20 kPa) was 200–300 nsec. With adding He and increasing pressure to 100 kPa the duration of the emission decreased
by a factor of 1.5–2. The basic mechanisms of the formation of Cl2, ArF, and CN(B) molecules in the transverse-discharge plasma are considered.
Uzhgorod State University, 46, Pidgirna Str., Uzhgorod, 294000, Ukraine. Translated from Zhurnal. Prikladnoi Spektroskopii,
Vol. 66, No. 2, pp. 241–246, March–April, 1999. 相似文献
16.
Comparative Plasma Chemical Reaction Studies of CH4/Ar and C2Hm/Ar (m = 2,4,6) Gas Mixtures in a Dielectric Barrier Discharge 下载免费PDF全文
Plasma chemical reactions in CH4/Ar and C2Hm/Ar (m = 2, 4, 6) gas mixtures in a dielectric barrier discharge at medium pressure (300 mbar) have been investigated. From mass spectrometry the production of H2 and formation of larger hydrocarbons such as CnHm with up to n = 12 is inferred. Hydrogen release is most pronounced for CH4 and C2H6 gas mixtures. Fourier Transform InfraRed (FTIR) spectroscopy reveals the formation of substituted alkane (sp3), alkene (sp2), and alkyne (sp) groups from the individual gases which are used in this work. Abundant formation of acetylene occurs from C2H4 and to a lesser extent from C2H6 and CH4 precursor gases. The main reaction pathway of acetylene leads to the formation of large molecules via C4H2 and, eventually, to nano‐size particles. The experimental results are in reasonable agreement with simulations which predict a pronounced electron temperature and gas pressure dependency. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) 相似文献
17.
Characteristics of an atmospheric‐pressure radio frequency‐driven Ar/H2 plasma discharge with copper
wire in tube 下载免费PDF全文
This paper investigates a plasma discharge driven by a 13.56 MHz radio frequency (RF) power supply at atmospheric pressure, in which a copper wire is inserted in the discharge tube for the deposition of Cu films. The results show that the jet plasma formation originates from the discharge between the copper wire and induction coil because of its electrostatic field. The axial distribution of the plasma parameters in the RF plasma jet, namely the gas temperature, excitation temperature, and electron number density, is determined by diatomic molecule OH fitting, Boltzmann slope, and Hβ Stark broadening, respectively. The discharge current significantly declines when a small amount of hydrogen is added to the argon as the plasma‐forming gas, and the gas temperature of discharge plasma increases considerably. 相似文献
18.
Influence of ambient pressure on the performance of an arc discharge plasma actuator 总被引:1,自引:0,他引:1 下载免费PDF全文
The arc discharge plasma actuator (ADPA) has wide application prospects in high‐speed flow control because of its local heating effect and strong disturbance. In this paper, the influence of ambient pressure, which ranges from 3 to 20 kPa, on the performance of a two‐electrode ADPA is investigated by a schlieren system. The duration of the arc heated region, as well as its area, is extracted by image processing. As the ambient pressure increases, different flow field evolutions occur. The duration of the ADPA heated region increases with the ambient pressure. The maximum duration reaches 1185.3 µs at 20 kPa. The velocity of the discharge‐induced blast shock wave first decreases gradually and then remains at 345 m/s for all air pressures. The blast shock wave has a higher velocity at lower pressures when it is freshly produced. A maximum blast shock wave velocity of 582 m/s is observed at the pressure of 7 kPa. The arc heated region is not sensitive to ambient pressure, but the deposited energy from the arc increases when the pressure increases. 相似文献