磷化铟复合沟道高电子迁移率晶体管击穿特性研究

用密度梯度量子模型定量研究了磷化铟(InP)复合沟道高电子迁移率晶体管(HEMT)的击穿特性，考虑了复合沟道内碰撞电离以及沟道量子效应，重点研究了器件击穿电压随In_0.7Ga_0.3As沟道厚度的变化关系，提出了提高击穿电压的方法，采用商用器件模拟软件Sentaurus模拟了器件的开态击穿电压，对比了实验和模拟的结果. 研究表明：适当减小In_0.7Ga_0.3As沟道层的厚度可以在保持器件饱和电流基本不变的前提下大幅度提高开态击穿电压，这对于提高InP基HEMT的功率性能具有重要意义. 关键词： 磷化铟 高电子迁移率晶体管 密度梯度模型 击穿     

AlGaN/AlN/GaN结构中二维电子气的输运特性

对使用金属有机物汽相沉积法生长的AlGaN/AlN/GaN结构进行的变温霍尔测量，测量结果指出在AlN/GaN界面处有二维电子气存在且迁移率和浓度在2K时分别达到了1.4×10⁴cm²·V^-1·s^-1和9.3×10¹²cm^-2，且在200K到2K范围内二维电子气的浓度基本不变，变磁场霍尔测量发现只有一种载流子(电子)参与导电.在2K温度下，观察到量子霍尔效应，Shubnikov-de Haas (SdH) 振荡在磁场约为3T时出现，证明了此结构呈现了典型的二维电子气行为.通过实验数据对二维电子气散射过程的半定量分析，推出量子散射时间为0.23ps，比以往报道的AlGaN/GaN结构中的散射时间长，说明引入AlN层可以有效减小合金散射，进一步的推断分析发现低温下以小角度散射占主导地位.     

Ge组分对应变Si1-xGe x 沟道p-MOSFET电学特性影响

利用二维数值模拟方法,研究了不同Ge组分应变Si_1-xGe _x 沟道p-MOSFET的电容-电压特性以及阈值电压的变化情况.计算结果表明:提高应变Si_1-xGe _x 沟道层中的Ge组分,器件亚阈值电流明显增大;栅电容在器件进入反型状态时产生显著变化;阈值电压的改变量与Ge组分基本成线性关系.通过改变Si_1-xGe _x 沟道的长度,并结 关键词： 1-xGe _x 沟道')" href="#">应变Si_1-xGe _x 沟道 p-MOSFET 空穴迁移率 栅电容     

不同量子阱宽度的InP基In0.53GaAs/In0.52AlAs高电子迁移率晶体管材料二维电子气的性能研究

用Shubnikov-de Haas(SdH)振荡效应，研究了在1.4 K下不同量子阱宽度(10—35 nm)的InP基高电子迁移率晶体管材料的二维电子气特性.通过对纵向电阻SdH振荡的快速傅里叶变换分析，得到不同阱宽时量子阱中二维电子气各子带电子浓度和量子迁移率.研究发现，在Si掺杂浓度一定时，阱宽的改变对于量子阱中总的载流子浓度改变不大，但是随着阱宽的增加，阱中的电子从占据一个子带到占据两个子带，且第二子带上的载流子迁移率远大于第一子带迁移率.当量子阱宽度为20 nm时，处在第二子能级上的电子数与处在 关键词： 量子阱宽 二维电子气 Shubnikov-de Haas振荡 高电子迁移率晶体管     

高迁移率In0.6Ga0.4As沟道MOSHEMT与MOSFET器件特性的研究

从模拟和实验两个方面对高迁移率In_0.6Ga_0.4As沟道金属氧化物半导体高电子迁移率晶体管（MOSHEMT）和金属氧化物半导体场效应晶体管（MOSFET）器件开展研究工作.研宄发现InAlAs势垒层对Ino_0.6Ga_0.4AsMOSHEMT的特性具有重要影响.与Ino_0.6Ga_0.4As MOSFET相比,Ino_0.6Ga_0.4As MOSHEMT表现出优异的电学特性.实验结果表明,In_0.6Ga_0.4As MOSHEMT的有效沟道迁移率达到2812 cm²/V.s^-1,是In_0.6Ga_0.4As MOSFET的3.2倍.0.02 mm栅长的MOSHEMT器件较相同栅长的MOSFET器件具有更高的驱动电流、更大的跨导峰值、更大的开关比、更高的击穿电压和更小的亚阈值摆幅.     

AlGaN/GaN高电子迁移率晶体管温度传感器特性

本文制作了基于无栅AlGaN/GaN高电子迁移率晶体管结构的温度传感器,并对其温度相关的电学特性进行了表征.实验测试了器件从50℃到400℃的变温电流-电压特性,研究了器件灵敏度随着器件沟道长宽比的变化,并研究了在300—500℃高温的空气和氮气中经过1 h恒温加热后器件的电学特性变化.理论与实验研究结果表明,随着器件沟道长宽比的增大,器件的灵敏度会随之上升;在固定电流0.01 A下,器件电压随温度变化的平均灵敏度为44.5 mV/℃.同时,稳定性实验显示器件具有较好的高温保持稳定性.     

SiC电子输运特性的Monte Carlo数值模拟

利用系综MonteCarlo法研究了2H ,4H和6HSiC的电子输运特性.在模拟中考虑了对其输运过程有着重要影响的声学声子形变势散射、极化光学声子散射、谷间声子散射、电离杂质散射以及中性杂质散射.通过计算,获得了低场下这几种不同SiC多型电子迁移率同温度的关系,并以4H SiC为例,重点分析了中性杂质散射的影响.最后对高场下电子漂移速度的稳态和瞬态变化规律进行了研究.将模拟结果同已有的实验数据进行了比较,发现当阶跃电场强度为10×106V·cm-1时,4H Sic电子横向瞬态速度峰值接近33×107cm·s^-1,6H Sic接近30×107cm·s^-1.     

晶格匹配InAlN/GaN和InAlN/AlN/GaN材料二维电子气输运特性研究

文章研究了InAlN/GaN和引入AlN界面插入层形成的InAlN/AlN/GaN材料的输运性质. 样品均在蓝宝石上以脉冲金属有机物化学气相淀积法生长,霍尔迁移率变温特性具有典型的二维电子气(2DEG)特征. 综合各种散射机理包括声学形变势散射、压电散射、极性光学声子散射、位错散射、合金无序散射和界面粗糙度散射,理论分析了温度对迁移率的影响,发现室温下两种材料中2DEG支配性的散射机理都是极性光学波散射和界面粗糙度散射;AlN插入层对InAlN/GaN材料迁移率的改善作用一方面是免除2DEG的合金无序散射,另外还显著改善异质界面,抑制了界面粗糙度散射. 考虑到2DEG密度也是影响其迁移率的重要因素,结合实验数据给出了晶格匹配InAlN/GaN和InAlN/AlN/GaN材料的2DEG迁移率随电子密度变化的理论上限. 关键词： InAlN/GaN 二维电子气 迁移率     

负带隙HgCdTe体材料的磁输运特性研究

通过单晶生长了Cd组分为0.1的p型HgCdTe体材料,并制备了具有倒置型能带序的HgCdTe场效应器件.通过磁输运测试,在负带隙HgCdTe体材料中观察到明显的量子霍尔平台效应和Shubnikov-de Haas(SdH)振荡效应,证明样品具有较好的质量.利用SdH振荡对1/B关系的快速傅里叶变换,得到了样品的零场自旋分裂能约为26.55 meV,证明样品中存在强自旋-轨道耦合作用.进一步分析SdH中的拍频节点估算了样品中的有效g因子约为–11.54.     

磷化铟高电子迁移率晶体管外延结构材料抗电子辐照加固设计

为研究磷化铟高电子迁移率晶体管(InP HEMT)外延结构材料的抗电子辐照加固设计的效果,本文采用气态源分子束外延法制备了系列InP HEMT外延结构材料.针对不同外延结构材料开展了1.5 MeV电子束辐照试验,在辐照注量为2×10¹⁵ cm^-2条件下,并测试了InP HEMT外延结构材料二维电子气辐照前后的电学特性,获得了辐照前后不同外延结构InP HEMT材料二维电子气归一化浓度和电子迁移率随外延参数的变化规律,分析了InP HEMT二维电子气辐射损伤与Si-δ掺杂浓度、InGaAs沟道厚度和沟道In组分以及隔离层厚度等结构参数的关系.结果表明:Si-δ掺杂浓度越大,隔离层厚度较薄,InGaAs沟道厚度较大,沟道In组分低的InP HEMT外延结构二维电子气辐射损伤相对较低,具有更强的抗电子辐照能力.经分析原因如下:1)电子束与材料晶格发生能量传递,破坏晶格完整性,且在沟道异质界面引入辐射诱导缺陷,增加复合中心密度,散射增强导致二维电子气迁移率和浓度降低;2)高浓度Si-δ掺杂和薄隔离层有利于提高量子阱二维电子气浓度,降低二维电子气受辐射...     

Numerical simulation of the transport properties of indium antimonide

A systematic investigation of the behavior of the transport coefficients of n-InSb over wide ranges of temperatures and concentrations of dopant atoms has been performed using the numerical solution of the Boltzmann transport equation. The thermoelectric characteristics of indium antimonide have been analyzed. The influence of different mechanisms of scattering of charge carriers on the transport coefficients and efficiency of thermoelectric energy conversion has been considered. The nature of the specific features of the temperature and concentration dependence of the transport and thermoelectric properties of n-InSb has been revealed.     

Electron transport for a laser-irradiated quantum channel with Rashba spin--orbit coupling

We investigate theoretically the electron transport for a two-level quantum channel (wire) with Rashba spin--orbit coupling under the irradiation of a longitudinally-polarized external laser field at low temperatures. Using the method of equation of motion for Keldysh nonequilibrium Green function, we examine the time-averaged spin polarized conductance for the system with photon polarization parallel to the wire direction. By analytical analysis and a few numerical examples, the interplay effects of the external laser field and the Rashba spin--orbit coupling on the spin-polarized conductance for the system are demonstrated and discussed. It is found that the longitudinally-polarized laser field can adjust the spin polarization rate and produce some photon sideband resonances of the conductance for the system.     

Electron scattering with spin flip in indium antimonide and indium arsenide

The longitudinal magnetoresistance has been investigated at temperatures in the range from 2.8 to 200 K in a magnetic field of up to 200 kOe with the aim of determining the temperature range and the magnetic field strength at which charge carrier scattering with spin flip occurs in n-type indium arsenide and n-type indium antimonide. It is established that quantum oscillations of the longitudinal magnetoresistance of indium arsenide exhibit weak zero maxima due to electron scattering with spin flip at temperatures in the range from 4 to 35 K in a magnetic field of 146 kOe. For the longitudinal magnetoresistance of indium antimonide, zero maxima caused by electron scattering with spin flip are revealed in the temperature range from 60 to 80 K in a magnetic field of 132 kOe.     

Electron transport in the conduction channel of the HEMT

The electron transport in the conduction channel of the HEMT is investigated using an Ensemble Monte Carlo method, which includes the first two subbands in the quantum well. The interaction between the channel and the rest of the device is accounted for, including intravalley and intervalley transitions between confined and 3-D states. The model allows an evaluation of the real-space transfer effects.     

双δ掺杂In0.65Ga0.35As/In0.52Al0.48As赝型高迁移率晶体管材料子带电子特性研究

研究了基于InP基的In0.65Ga0.35As/In0.52Al0.48As赝型高迁移率晶体管材料中纵向磁电阻的Shubnikov-deHaas(SdH)振荡效应和霍耳效应,通过对纵向磁电阻SdH振荡的快速傅里叶变换分析,获得了各子带电子的浓度,并因此求得了各子带能级相对于费米能级的位置.联立求解Schrdinger方程和Poisson方程,自洽计算了样品的导带形状、载流子浓度分布以及各子带能级和费米能级位置.理论计算和实验结果很好符合.实验和理论计算均表明,势垒层的掺杂电子几乎全部转移到了量子阱中,转移率在95%以上.     

径向压缩碳纳米管的电子输运性质

研究径向压缩形变对碳纳米管电子输运性质的影响对搭建微纳碳基电子器件具有重要意义.本文利用分子动力学模拟方法研究了碳纳米管与金属界面接触构型,得出碳纳米管径向压缩形变的规律.模拟结果表明:碳纳米管在水平接触金属表面后,其稳定状态下的径向压缩形变大小会受接触长度、管径大小、金属种类和片层数量的影响.基于紧束缚密度泛函理论和...     

Quantum transport properties of the three-dimensional Dirac semimetal Cd_3As_2 single crystals

The discovery of the three-dimensional Dirac semimetals have expanded the family of topological materials,and attracted massive attentions in recent few years.In this short review,we briefly overview the quantum transport properties of a well-studied three-dimensional Dirac semimetal,Cd_3As_2.These unusual transport phenomena include the unexpected ultra-high charge mobility,large linear magnetoresistivity,remarkable Shubnikov-de Hass oscillations,and the evolution of the nontrivial Berry's phase.These quantum transport properties not only reflect the novel electronic structure of Dirac semimetals,but also give the possibilities for their future device applications.     

Electron transport properties of three-dimensional topological insulators

We review experimental advances in the study of the electron transport in three-dimensional topological insulators with emphasis on experiments that attempted to identify the surface transport. Recent results on transport properties of topological insulator thin films will be discussed in the context of weak antilocalization and electron-electron interactions. Current status of gate-voltage control of the chemical potential in topological insulators will also be described.     

Electron transport properties of magnetic granular films

In this paper,we present a review of electron transport properties of magnetic granular films.Magnetic granular films are nanocomposite materials which consist of magnetic nanoparticles embedded in a nonmagnetic matrix or assembling of magnetic nanoparticles.According to the style of the nonmagnetic matrix,microstructure and the electron transport mechanism of the films,the magnetic granular films were divided into three groups:(1) magnetic metal-metal granular films,(2) magnetic metal-insulator granular films and(3) magnetic nanocluster-assembled granular films.Moreover,we also systematically review the magnetic properties,transport properties and magnetoresistance effect of size-monodispersed Co and Fe nanocluster-assembled films.