纳秒级脉冲激光诱导Zn掺杂过程中GaN/Al2O3 材料的温度分布及热形变解析分析

分析了纳秒级脉冲激光作用下GaN的激光诱导Zn的掺杂过程.利用简化的一维模型,给出一种比较直观的脉冲激光辐照下GaN/Al2O3材料温度分布的解析形式,得到了GaN材料表面温度与激光辐照时间的关系以及材料形变与深度的关系.在激光脉冲作用时,GaN材料表面的温度与辐照时间的平方根成正比.脉冲过后,材料温度分布梯度和热形变分布随深度发生变化,接近表面的温度梯度最大,热形变量也最大.而在连续脉冲作用时表面的温度呈锯齿状不断升高.     

连续激光诱导Zn/InP掺杂过程中温度分布的解析计算

在实验的基础上，分析表面蒸发Zn的InP样品在连续激光诱导下掺杂Zn过程.在一维热传导问题的第三类边界条件下，给出激光辐照有限厚双层材料Zn/InP温度分布的一种直观简洁的解析形式. 关键词： 激光诱导掺杂 Zn/InP 温度分布     

12CaO·7Al2O3/5CaO·3Al2O3：Sm3+新型红色荧光粉的制备及发光性质

采用自蔓延燃烧法制备了不同Sm³⁺掺杂浓度的12CaO·7Al₂O₃（C12A7：x%Sm³⁺）荧光粉。在404 nm近紫外光激发下,观察到了位于565,599,648 nm附近的3个光发射峰,分别归属于Sm³⁺的⁴G_5/2→⁶H_J/2（J=5,7,9）能级跃迁。随着Sm³⁺掺杂浓度增加,红光发射强度呈现了先增大后减小的规律,优化的Sm³⁺掺杂摩尔分数为1.5%,发光的浓度猝灭效应可归因于Sm³⁺之间发生了交叉弛豫过程。采取混相策略,通过降低初始粉体的煅烧温度至900℃获得了12CaO·7Al₂O₃/5CaO·3Al₂O₃：1.5%Sm³⁺（C12A7/C5A3：Sm³⁺）混相荧光粉,进一步提高了红光发射强度。利用变温光致发光谱计算得到混相样品的热激活能约为200 meV,结果表明该混相荧光粉具有良好的热稳定性。     

MoO3/Al2O3催化剂中Mo分散的正电子研究

用浸渍法制备了一系列不同Mo含量的MoO₃/Al₂O₃催化剂.测量了这些样品的正电子湮没寿命谱(PALS)与符合多普勒展宽(CDB)谱,以研究其孔洞结构以及Mo分散.正电子寿命测量结果表明,Al₂O₃载体中存在两种不同尺寸的孔洞.掺入MoO₃之后,Mo原子主要进入Al₂O₃的大孔中,使孔洞体积减小.符合多普勒展宽谱结果表明,当MoO 关键词： 3/Al₂O₃催化剂')" href="#">MoO₃/Al₂O₃催化剂 正电子湮没寿命谱 符合多普勒展宽 Mo 分散     

Fe离子注入多晶Al2O3的光电子能谱研究

本文应用光电子能谱(XPS)方法分析Fe离子注入多晶Al₂O₃样品中各离子的存在状态。通过微机对谱峰进行高斯拟合处理,得出注入离子Fe不同价态的相对含量。 关键词：     

关于MgB2/Al2O3超导薄膜电阻转变和各向异性的研究

利用电子束蒸发方法将MgB₂超导薄膜沉积到Al₂O₃(001)衬底上.采用标准的四引线法研究了磁场平行和垂直超导薄膜ab平面下的电阻转变.一个激活能模型 U(T,H)=U₀(1-T/(T_c+δ))ⁿ(1-H/H 关键词： 2/Al₂O₃')" href="#">MgB₂/Al₂O₃ 超导体 电阻转变 各向异性     

Al2O3绝缘栅AlGaN/GaN MOS-HEMT器件温度特性研究

采用原子层淀积(ALD)实现了10nm Al₂O₃为栅介质的高性能AlGaN/GaN金属氧化物半导体高电子迁移率晶体管(MOS-HEMT). 通过对MOS-HEMT器件和传统MES-HEMT器件室温特性的对比,验证了新型MOS-HEMT器件饱和电流和泄漏电流的优势. 通过分析MOS-HEMT器件在30—180℃之间特性的变化规律,与国内报道的传统MES-HEMT器件随温度退化程度对比,得出了器件饱和电流和跨导的退化主要是由于输运特性退化造成的,证明栅介质减小了引 关键词： 原子层淀积 AlGaN/GaN MOS-HEMT器件 温度特性     

Al2O3-Y2O3-ZrO2三相复合陶瓷的介电谱研究

采用传统的固相反应法,在1400–1500 ℃下烧结,制备得到Al₂O₃-Y₂O₃-ZrO₂三相复合陶瓷.样品的结构、形貌和电性能分别用X射线衍射(XRD)、扫描电子显微镜(SEM)及介电谱表征.XRD表明此三相复合体系无其他杂相,加入Y₂O₃及ZrO₂后使得Al₂O₃成瓷温度降低;SEM表明此体系晶粒直径为200–500 nm,并且样品随烧结温度的升高而变得更加致密,晶界更加清晰;介电损耗谱中出现峰值弛豫现象,根据Cole-Cole复阻抗谱得出其为非德拜弛豫. 关键词： 2O₃-Y₂O₃-ZrO₂三相陶瓷')" href="#">Al₂O₃-Y₂O₃-ZrO₂三相陶瓷 介电弛豫 阻抗谱 热导率     

强冲击压缩下LiF，Al2O3和LiTaO3单晶的透光性

在二级轻气炮上，用高速电子相机扫描照相技术和改进的Mallory实验装置，对z切LiF，Al₂O₃(蓝宝石)和LiTaO₃单晶材料的冲击透光性进行了对比测量，并用黑密度计提取出动态图像定量化的光强对比度变化曲线.结果表明，LiF单晶在102 GPa压强下能够保持长时间的初始透光性不变，与公认的LiF具有优良的高压下透明性的认识一致.LiTaO₃单晶在实验压力(139GPa)下变成基本不透明.而Al_{关键词： 2}O₃')" href="#">Al₂O₃ LiF 3')" href="#">LiTaO₃ 光学透明性     

Al2O3隧道结势垒参数与上电极金属的相关性

本文采用两种极端情况的梯形势垒模型对上电极分别为Au,Ag和Cu的三种Al-Al₂O₃-M隧道结势垒参数进行了研究,通过用上述模型对77K温度下结的伏安特性进行拟合计算表明:这两种模型都能很好地解释实验结果;所得到的势垒参数表现出与结上电极金属的原子半径、金属材料的脱出功以及Al₂O₃绝缘介质的电子亲合势有关。 关键词：     

The improvement of Al2O3/AlGaN/GaN MISHEMT performance by N2 plasma pretreatment

This paper discusses the effect of N 2 plasma treatment before dielectric deposition on the electrical performance of a Al2O3 /AlGaN/GaN metal-insulator-semiconductor high electron mobility transistor(MISHEMT),with Al2O3 deposited by atomic layer deposition.The results indicated that the gate leakage was decreased two orders of magnitude after the Al2O3 /AlGaN interface was pretreated by N 2 plasma.Furthermore,effects of N 2 plasma pretreatment on the electrical properties of the AlGaN/Al2O3 interface were investigated by x-ray photoelectron spectroscopy measurements and the interface quality between Al2O3 and AlGaN film was improved.     

Al2O3绝缘层的AlGaN/GaN MOSHEMT器件研究

在研制AlGaN/GaN HEMT器件的基础上,采用ALD法制备了Al₂O₃ AlGaN/GaN MOSHEMT器件.通过X射线光电子能谱测试表明在AlGaN/GaN异质结材料上成功淀积了Al₂O₃薄膜.根据对HEMT和MOSHEMT器件肖特基电容、器件输出以及转移特性的测试进行分析发现：所制备的Al₂O₃薄膜与AlGaN外延层间界面态密度较小,因而MOSHEMT器件呈现出较 关键词： 2O₃')" href="#">Al₂O₃ ALD GaN MOSHEMT     

A study on Al2O3 passivation in GaN MOS-HEMT by pulsed stress

This paper studies systematically the drain current collapse in AlGaN/GaN metal-oxide-semiconductor high electron mobility transistors （MOS-HEMTs） by applying pulsed stress to the device. Low-temperature layer of Al2O3 ultrathin film used as both gate dielectric and surface passivation layer was deposited by atomic layer deposition （ALD）. For HEMT, gate turn-on pulses induced large current collapse. However, for MOS-HEMT, no significant current collapse was found in the gate turn-on pulsing mode with different pulse widths, indicating the good passivation effect of ALD Al2O3. A small increase in Id in the drain pulsing mode is due to the relieving of self-heating effect. The comparison of synchronously dynamic pulsed Id - Vds characteristics of HEMT and MOS-HEMT further demonstrated the good passivation effect of ALD Al2O3.     

Chemical quenching of positronium in Fe2O3/Al2O3 catalysts

Fe₂O₃/Al₂O₃ catalysts were prepared by solid state reaction method using α-Fe₂O₃ and γ-Al₂O₃ nano powders. The microstructure and surface properties of the catalyst were studied using positron lifetime and coincidence Doppler broadening annihilation radiation measurements. The positron lifetime spectrum shows four components. The two long lifetimes τ₃ and τ₄ are attributed to positronium annihilation in two types of pores distributed inside Al₂O₃ grain and between the grains, respectively. With increasing Fe₂O₃ content from 3 wt% to 40 wt%, the lifetime τ₃ keeps nearly unchanged, while the longest lifetime τ₄ shows decrease from 96 ns to 64 ns. Its intensity decreases drastically from 24% to less than 8%. The Doppler broadening S parameter shows also a continuous decrease. Further analysis of the Doppler broadening spectra reveals a decrease in the p-Ps intensity with increasing Fe₂O₃ content, which rules out the possibility of spin-conversion of positronium. Therefore the decrease of τ₄ is most probably due to the chemical quenching reaction of positronium with Fe ions on the surface of the large pores.     

Creation of nanoparticles and luminescence in Al2O3 crystal by Zn ion implantation

Single crystal α-Al₂O₃ wafers were implanted with 45 keV Zn ions up to a fluence of 1×10¹⁷ ions/cm², and were then subjected to furnace annealing in oxygen atmosphere at different temperatures. Various techniques have been applied to study the creation of nanoparticles (NPs), defects and their thermal evolutions, as well as their effects on optical properties of Al₂O₃. Our results clearly show that Zn NPs have been synthesized in the as-implanted sample and they begin to be oxidized at 500 °C. Two broad photoluminescence bands appear in the Zn ion-implanted samples and their intensities depend on the annealing temperatures. The results have been interpreted in view of creation of the defects and NPs, Zn atoms diffusion as well as their thermal evolution during annealing.     

Mg，Ti共掺Al2O3透明多晶陶瓷光谱性能研究

采用传统无压烧结工艺制备Mg，Ti共掺透明氧化铝陶瓷，测定了其吸收光谱、荧光光谱和激发光谱，结果表明，由于Mg²⁺的电荷补偿，当Ti掺入量较小时，Ti主要以Ti⁴⁺形式存在，(Mg，Ti):Al₂O₃透明陶瓷只在250nm的紫外波段有吸收峰，为O^2-→Ti⁴⁺的电荷转移跃迁产生的吸收，并产生Ti⁴⁺离子在280—290nm和410—420nm的荧光发射峰     

有机金属化学气相沉积法制备的Ni/Al2O3纳米复合材料的氢吸附

研究了通过有机金属化学气相沉积技术及单源分子前躯体方法制备的Ni/Al₂O₃纳米复合材料的氢吸附(存储). 在冷壁的有机金属化学气相沉积反应器中,通过降解Ni(acac)₂粉末基底上的[H₂Al(OtBu)]₂制备的Ni/Al₂O₃纳米复合材料. 通过X射线粉末衍射、扫描电镜、透射电镜以及能量色散型X射线荧光光谱等技术表征该复合材料. 采用自制Sievert's设备研究该复合材料的氢吸附(存储),可以储存约2.9%(重量比)的氢.     

Effect of chloride doping concentration on enhancement of protonic conductivity of mesoporous Al2O3

Mesoporous Al₂O₃ was prepared by a sol-gel method with doping different amount of LaCl₃. The proton conductivity of mesoporous Al₂O₃ increased with increasing the doping concentration up to the optimum doping, 0.1 Cl/Al mole ratio. The surface acidities of different samples were investigated by NH₃-TPD method. The change trends of surface acidity are consistent with that of proton conductivity. It indicates that the proton conductivity of mesoporous Al₂O₃ can be increased by enhancing its surface acidity via the chloride doping.     

Interfacial reactions and oxidation behavior of Al2O3 and Al2O3/Al coatings on an orthorhombic Ti2AlNb alloy

The uniform and dense Al₂O₃ and Al₂O₃/Al coatings were deposited on an orthorhombic Ti₂AlNb alloy by filtered arc ion plating. The interfacial reactions of the Al₂O₃/Ti₂AlNb and Al₂O₃/Al/Ti₂AlNb specimens after vacuum annealing at 750 °C were studied. In the Al₂O₃/Ti₂AlNb specimens, the Al₂O₃ coating decomposed significantly due to reaction between the Al₂O₃ coating and the O-Ti₂AlNb substrate. In the Al₂O₃/Al/Ti₂AlNb specimens, a γ-TiAl layer and an Nb-rich zone came into being by interdiffusion between the Al layer and the O-Ti₂AlNb substrate. The γ-TiAl layer is chemically compatible with Al₂O₃, with no decomposition of Al₂O₃ being detected. No internal oxidation or oxygen and nitrogen dissolution zone was observed in the O-Ti₂AlNb alloy. The Al₂O₃/Al/Ti₂AlNb specimens exhibited excellent oxidation resistance at 750 °C.