Angular distributions of emitted particles by laser ablation of silver at 355 nm

2 to 8 J/cm². The distribution is strongly peaked in the forward direction corresponding to cos^pθ, where p varies from 5 to 12 for the largest beam spot, but is less peaked for the smallest beam spots. The total collected yield of ablated atoms is about 2×10¹⁵ Ag atoms per pulse for the highest pulse energies. Received: 28 April 1997/Accepted: 8 September 1997     

355 nm纳秒紫外激光辐照下熔石英前后表面损伤的对比研究

为了理解前后表面损伤不对称性的物理内涵, 利用阴影成像技术研究了纳秒紫外激光诱使熔石英光学元件表面损伤的时间分辨动力学过程.研究表明,纳秒紫外激光与熔石英作用过程中前后表面损伤的物理机理是完全不同的.前表面处空气中等离子体和冲击波较强, 等离子体的屏蔽作用抑制了余脉冲能量的沉积, 降低了元件损伤程度.而后表面处等离子体吸收激光能量膨胀, 对后表面冲击作用更为严重, 形成的等离子体电子密度可达到10²³cm^-3以上, 反射部分激光能量与入射的激光余脉冲干涉, 使得 关键词： 熔石英 激光诱使损伤 阴影成像技术 光学元件表面     

355 nm皮秒激光辐照下熔石英的损伤特性

利用光学元件激光损伤测试平台,测试了355 nm皮秒激光辐照下熔石英光学元件的初始损伤及损伤增长情况,并通过荧光检测分析了损伤区缺陷。研究结果表明：皮秒激光较高的峰值功率导致熔石英损伤阈值较低,前表面损伤阈值为3.98 J/cm2,后表面损伤阈值为2.91 J/cm2;前后表面损伤形貌存在较大差异,后表面比前表面损伤程度轻且伴随体内丝状损伤;随脉冲数的增加后表面损伤直径增长缓慢,损伤深度呈线性增长;皮秒激光的动态自聚焦和自散焦导致熔石英体内损伤存在细丝和炸裂点重复的现象;与纳秒激光损伤相比,损伤区缺陷发生明显改变。     

355 nm皮秒激光辐照下熔石英的损伤特性

利用光学元件激光损伤测试平台,测试了355 nm皮秒激光辐照下熔石英光学元件的初始损伤及损伤增长情况,并通过荧光检测分析了损伤区缺陷。研究结果表明:皮秒激光较高的峰值功率导致熔石英损伤阈值较低,前表面损伤阈值为3.98 J/cm2,后表面损伤阈值为2.91 J/cm2;前后表面损伤形貌存在较大差异,后表面比前表面损伤程度轻且伴随体内丝状损伤;随脉冲数的增加后表面损伤直径增长缓慢,损伤深度呈线性增长;皮秒激光的动态自聚焦和自散焦导致熔石英体内损伤存在细丝和炸裂点重复的现象;与纳秒激光损伤相比,损伤区缺陷发生明显改变。     

355 nm脉冲激光在甲烷中的高效多波长拉曼转换

 研究了脉冲Nd:YAG激光（355 nm）泵浦的甲烷中多级Stokes光的产生和惰性气体对其转换效率的影响,其中一级和二级Stokes光的最大能量转换效率分别可达71%和38%（对应量子效率为79%和48%）,大大高于已往文献报道的20%。在0.5 MPa下,可同时获得322 nm（3.6%）,355 nm（24.5%）,396 nm（24.3%）,448 nm（22.3%）和515 nm（9.3%）的多波长输出。甲烷压力对多级Stokes转换有显著影响：高气压利于产生高效的一级Stokes光,而低气压则适合于高级Stokes光的产生。根据级联受激拉曼散射(SRS)和四波混频(FWM)理论对实验结果进行了分析,结果表明甲烷中高级Stokes光的产生是SRS和FWM协同作用的结果。加入的氦气增强了甲烷中Stokes光的转换效率,而氩气的作用恰恰相反,利用热透镜效应可以很好地解释这些现象。     

355 nm脉冲激光在甲烷中的高效多波长拉曼转换

研究了脉冲Nd:YAG激光（355 nm）泵浦的甲烷中多级Stokes光的产生和惰性气体对其转换效率的影响,其中一级和二级Stokes光的最大能量转换效率分别可达71%和38%（对应量子效率为79%和48%）,大大高于已往文献报道的20%。在0.5 MPa下,可同时获得322 nm（3.6%）,355 nm（24.5%）,396 nm（24.3%）,448 nm（22.3%）和515 nm（9.3%）的多波长输出。甲烷压力对多级Stokes转换有显著影响：高气压利于产生高效的一级Stokes光,而低气压则适合于高级Stokes光的产生。根据级联受激拉曼散射(SRS)和四波混频(FWM)理论对实验结果进行了分析,结果表明甲烷中高级Stokes光的产生是SRS和FWM协同作用的结果。加入的氦气增强了甲烷中Stokes光的转换效率,而氩气的作用恰恰相反,利用热透镜效应可以很好地解释这些现象。     

355 nm激光作用下熔石英损伤增长

 用355 nm脉冲激光分别辐照位于熔石英前后表面的损伤点,用Mias软件采集了损伤增长的图像并测量了每脉冲辐照后损伤点的面积。实验结果表明：位于熔石英样片后表面的损伤点面积随激光辐照脉冲数呈指数增长关系,而位于前表面的损伤点面积与激光辐照脉冲次数呈线性增长关系。     

Pulsed laser deposition of aluminum-doped ZnO films at 355 nm

Conducting, transparent films of aluminium-doped ZnO (AZO) have been produced at the laser wavelength 355 nm. The most critical property, the electric resistivity, is up to a factor of 8 above that for films produced at shorter wavelengths. In contrast, the transmission of visible light through the films is about 0.9 which is comparable to the transmission through films deposited with short-wavelength lasers. The polycrystalline structure of the films is similar to that of films produced by shorter wavelengths as well. PACS 81.15 Fg; 68.55.-a; 73.61.Le     

Transparent conducting AZO and ITO films produced by pulsed laser ablation at 355 nm

Thin films of aluminium-doped zinc oxide (AZO) and indium tin oxide (ITO) were deposited on glass substrates by laser ablation in an oxygen environment. The electrical and optical properties of films grown at various oxygen pressures were compared. With no substrate heating, highly transparent and conducting films were obtained with oxygen pressures between 15 and 23 mTorr for both materials. We obtained a specific resistivity of 1.8᎒^-3 Q cm for AZO and 1.1᎒^-3 Q cm for ITO. By heating the substrate to 160 °C or 200 °C, the resistivity was further reduced to 1.1᎒^-3 Q cm for AZO and 3.9᎒^-4 Q cm for ITO. The average transmission of visible light (450-750 nm) was between 82% and 98% in most cases. The results suggest that AZO is a promising alternative to ITO.     

Effect of multiple laser irradiations on silica at 1064 and 355 nm

We analyze laser damage precursor evolution under multiple irradiations by changing test parameters such as shot number, wavelength, shot frequency, and test location (bulk or surface). The experimental data exhibit different behaviors under repetitive shots regarding the damage precursor densities and thresholds. The results provide new information for understanding the laser damage initiation process in silica. Furthermore, the data permit us to predict the lifetime of optical components under multiple irradiations.     

Deposition and characterization of ITO films produced by laser ablation at 355 nm

Indium tin oxide (ITO) films have been deposited by pulsed laser deposition (PLD) at 355 nm. Even though the absorption of laser light at the wavelength 355 nm is much smaller than that of the standard excimer lasers for PLD at 248 nm and 193 nm, high-quality films can be produced. At high fluence and at high substrate temperatures, the specific resistivity of the films, 2–3×10^-4 Ω cm, is comparable to values obtained with excimer lasers, whereas the resistivities obtained at room temperature are somewhat higher than those of films produced by excimer lasers. The transmission coefficient of visible light, about 0.9, is also comparable to values for films deposited by excimer lasers. The crystalline structure of films produced at 355 nm is similar to that of samples produced by these lasers. Received: 16 January 2001 / Accepted: 24 July 2001 / Published online: 17 October 2001     

预处理对355nm激光作用下熔石英损伤增长的影响

测试了经化学蚀刻、紫外激光预处理及其共同处理后的熔石英355 nm激光损伤阈值;研究了处理前后其损伤斑面积随激光辐照脉冲数的增长情况。结果表明,处理后熔石英355 nm激光损伤阈值得到了提高,且损伤斑面积增长变慢。利用CO2激光对熔石英表面损伤点进行了修复处理,修复后的损伤点R-on-1抗损伤阈值和基底阈值相当,损伤增长得到有效抑制。     

预处理对355 nm激光作用下熔石英损伤增长的影响

测试了经化学蚀刻、紫外激光预处理及其共同处理后的熔石英355 nm激光损伤阈值;研究了处理前后其损伤斑面积随激光辐照脉冲数的增长情况。结果表明,处理后熔石英355 nm激光损伤阈值得到了提高,且损伤斑面积增长变慢。利用CO2激光对熔石英表面损伤点进行了修复处理,修复后的损伤点R-on-1抗损伤阈值和基底阈值相当,损伤增长得到有效抑制。     

Absorption and luminescence spectroscopy of fused silica by multiple pulses irradiation at 355 nm

In this work, the effects of laser irradiation on fused silica at 355 nm are investigated by using transient absorption spectroscopy and luminescence spectroscopy. Our result shows that no transient absorption or luminescence in the spectra range from 400 nm to 600 nm is observed when laser energy density is below the damage threshold. When the laser energy density reaches the threshold, an initial damage site will be created. After subsequent laser pulses irradiation, the damage size grows. At the same time, the intensity of the transient absorption and luminescence spectra at the damage site also raises remarkably with the laser pulse number increasing. The absorption band from 420 nm to 520 nm is probably related to the absorption of impurity such as metal ion of iron, cerium and copper. Laser modified fused silica exhibits intense broad luminescence bands due to oxygen-deficiency centers at 444 nm and 580 nm.     

410～355 nm内四甲基硅的多光子解离和电离研究

利用平行板电极装置研究了四甲基硅在410～378 nm内的MPI光谱;利用TOF质谱仪研究了该分子在402～371 nm内若干个波长点处的TOF质谱;利用四极质谱装置研究了它在355 nm处的MPI质谱.测得了355 nm下Si(CH3)+n(n=1,2,3,4)及Si+的激光光强指数,以及其信号强度占总信号强度的分支比随光强的变化关系.据此,讨论了该分子MPI过程的可能通道,得出了Si+主要来自于母体分子的多光子解离-硅原子的电离、Si(CH3)+n(n=1,2,3)主要来自于Si(CH3)n(n=1,2,3)的自电离、Si(CH3)+4来自于母体分子的(3+1)电离的结论.     

酸蚀深度对熔石英三倍频激光损伤阈值的影响

 采用干涉仪和台阶仪测试蚀刻深度随时间的变化,结合材料去除速率测量,研究了HF酸蚀液对熔石英表面蚀刻的影响。测试了蚀刻后损伤阈值和表面粗糙度的变化。研究表明,熔石英表面重沉积层厚度约16 nm,亚表面缺陷层大于106 nm;重沉积层去除后损伤阈值增大,随亚表面缺陷层暴露其阈值先降低后又增加,最后趋于稳定;然而,随蚀刻时间的增加,其表面粗糙度增大。分析表明,蚀刻到200 nm能有效地提高熔石英的低损伤阈值,有利于降低初始损伤点数量和提高熔石英表面的机械强度。     

Removal of submicron particles from nickel-phosphorus surfaces by pulsed laser irradiation

Pulsed laser cleaning was demonstrated to be an efficient way for removing submicron particles from the nickel-phosphorus (NiP) surface both experimentally and theoretically. Experimentally, it is found that using KrF excimer laser with a pulse width of 23 ns the cleaning threshold is about 20 mJ / cm² for removing quartz particles from the NiP surface and laser cleaning efficiency increases rapidly with increasing laser fluence. The theoretical analysis shows that the peak cleaning force (per unit area) is larger than the adhesion force (per unit area) for submicron quartz particles on the NiP surface when it is irradiated by excimer laser with a fluence above 10 mJ / cm². Therefore, it is possible to remove submicron quartz particles from NiP surfaces by laser irradiation. The difference between the cleaning force (per unit area) and the adhesion force (per unit area) increases with increasing laser fluence, leading to a higher cleaning efficency for quartz particles on the NiP surface.     

Tantalum irradiation by high power pulsed laser at 1315 and 438 nm wavelengths

The high power pulsed laser Prague asterix laser system (PALS), operating at the fundamental (1ω) and third (3ω) harmonics (1315 and 438 nm wavelengths, respectively), is employed in a single-shot mode to irradiate tantalum targets in vacuum. The laser pulse width is 400 ps and the laser pulse energy ranges between 43 and 736 J at 1ω and between 12 and 230 J at 3ω. High ablation yields (0.1–0.6 mg per pulse) are measured as a function of the laser pulse energy at both wavelengths; at 438 nm higher etching rates are observed. The produced craters are analysed by the scanning electron microscope (SEM) and by the high sensitivity surface profiler system. They are investigated in dimension, shape and angle aperture as a function of the incident laser energy. Different possible mechanisms responsible for the different crater shapes are presented and discussed.     

355nm激光作用下丁酮多光子电离质谱信号分析

为研究由氢键形成的超分子体系内的质子化构型,利用355nm共振增强多光子电离(REMPI)技术结合飞行时间质谱(TOF-MS)得到丁酮多光子电离系列团簇质谱.实验没有观测到丁酮母体的团簇信号,只测到丁酮解离、异构后的异丙醇团簇离子,为丁酮解离、异构提供了很有意义的实验数据.     

355 nm激光光电离甲醛飞行时间质谱的研究

利用脉宽为5 ns脉冲Nd: YAG 355 nm激光在功率密度为10¹¹–10¹² W/cm²条件下实现了甲醛含水团簇多光子电离, 并用飞行时间质谱对其电离产物和电离过程进行了研究. 实验中观测到了甲醛的质子化团簇系列 (CH₂O)_nH⁺(n=1–4), 甲醛的去质子化团簇系列(CH₂O)_nCHO⁺ (n=1–3), 以及两个起源于H₂CO去质子和质子化的含水团簇系列HCO⁺(H₂O)_n(n=1,3,5)和H₃CO⁺(H₂O)_n(n=1,3,5), 并对其中的一些团簇结构构型进行了猜测. 研究在不同的激光功率密度下甲醛团簇质谱峰的变换情况, 当激光密度达到9.3× 10¹¹ W/cm², 开始出现CH₂O和H₂O本体及其光致碎片的信号, 但对应的各质量峰没有明显地分辨开, 而是以包络的形式出现, 这是激光电离产生高能离子释放的一种表现, 提出认等离子体动力学鞘层加速机制(模型)来解释高能离子形成的物理机制. 关键词： 甲醛 团簇 飞行时间质谱 激光电离