沉积电位对电沉积ZnS薄膜的影响

采用电沉积方法,在不同沉积电位条件下,在氧化锡铟(ITO)导电玻璃上沉积制备了ZnS薄膜,利用XRD、SEM和UV-VIS测试技术对在不同沉积电位所制备薄膜的晶相结构、表面微观形貌和光学性能进行了表征.研究结果表明:沉积电位在1.5 V—1.7 V范围内制备的ZnS薄膜呈非晶态,其可见光透过率从60 %降低到20 %,薄膜的光学带隙约为3.97 eV.在沉积电位为2.0 V条件下所沉积薄膜为ZnS结晶相和金属Zn混合相,薄膜透过率显著降低.     

Photophysical property and photostability of J-aggregate thin films of thiacyanine dyes prepared by the spin-coating method

By use of electrostatic interactions of dye molecules and poly(diallyldimethylammonium chloride) (PDDA), the spin-coating technique has been successfully applied to the preparation of stable J-aggregate thin films of thiacarbocyanine dyes on a polycarbonate or quartz plate. The J-aggregate thin films were prepared by the spin-coating of PDDA aqueous solution on dye thin films prepared on a substrate by the spin-coating of 2,2,3,3-tetrafluoro-1-propanol solution of dyes. Photophysical properties of the dye thin films and J-aggregate thin films were studied by measuring the fluorescence spectra, quantum yields, and lifetimes. Coherent size of the J-aggregates was estimated to be 3-12 by means of the absorption bandwidth (full width at half maximum) or radiative lifetime. Photostability of the J-aggregate thin films was also studied in terms of photodegradation efficiency under argon and oxygen in comparison with the dye thin films, and J-aggregate thin films were found to be more stable than the corresponding dye thin films.     

富勒醇与阳离子聚电解质复合薄膜的制备与表征

采用静电自组装技术制备了富勒醇与聚对亚苯亚乙烯基 (PPV)的前驱体、聚二烯丙基二甲基氯化铵(PDDA)的复合薄膜 ,利用紫外 可见光吸收光谱 (UV Vis)、原子力显微镜 (AFM )、透射电镜 (TEM)和X射线光电子能谱 (XPS)对薄膜进行了表征 .UV Vis吸收光谱显示 ,在特定波长下自组装薄膜的吸光度与薄膜的双层数成线性关系 ,组装过程具有一致性与重复性 .AFM图象显示富勒醇组装到基片表面后形成直径为几十到10 0多nm的团簇 .富勒醇溶液过滤后组装薄膜 ,薄膜具有较好的均匀性 ;富勒醇溶液不经过滤 ,直接组装薄膜 ,将在薄膜中引入C6 0 晶粒 .XPS分析结果提示C6 0 被羟基修饰并通过静电吸引机制与阳离子聚电解质组装成膜 .富勒醇与PPV的前驱体、PDDA具有很好的自组装性能 ,膜层间的结合力较强 ,所组装的薄膜具有较高的牢固度 .     

宽带隙Cu(In,Al)Se2薄膜的制备及表征

以特殊脉冲电沉积方法制备CuInSe2(CIS)前驱体薄膜, 通过真空蒸镀法在CIS薄膜上沉积Al膜, 经硒化退火后在氧化铟锡(ITO)基底上制备了Cu(InAl)Se2(CIAS)薄膜. 采用扫描电子显微镜(SEM)、X射线能谱(EDS)、X射线衍射(XRD)、X射线光电子能谱(XPS)、紫外-可见吸收光谱(UV-Vis)对其形貌、结构、成分及光学吸收性质进行了表征. 结果表明, 制备的CIAS薄膜颗粒均匀, 表面平整致密, 呈黄铜矿结构. 薄膜在可见光区具有良好的吸收, 带隙约为1.65 eV.     

淬火和退火对称三嵌段共聚物薄膜形貌和结构的Monte Carlo模拟

嵌段共聚物薄膜淬火形貌与初始化时嵌段共聚物熔体的状态相关,淬火得到的有序形貌有时存在缺陷,而退火则可以消除这些缺陷形成更规整的层状结构,且退火得到的嵌段共聚物分子的均方回转半径等都小于淬火得到的.与淬火比较,退火使高分子链充分松弛,增加了薄膜中有利于提高材料物理力学性能的桥键含量.不同于受限自由表面间的对称二嵌段共聚物首先在表面区域形成有序结构,三嵌段共聚物则在薄膜内部先形成有序的层状结构.     

超声搅拌化学浴沉积法制备大颗粒和致密的CdS薄膜

采用超声搅拌化学浴法(UCBD)在SnO2:F透明导电玻璃衬底上制备了CdS薄膜.研究了退火和CdCl2处理对UCBD-CdS薄膜的表面形貌、晶体结构和直接带隙的影响,比较了沉积时间对UCBD-CdS薄膜中CdS聚集体颗粒大小和堆积致密性的影响.结果表明,CdCl2处理可使CdS聚集体中的小颗粒重新熔合在一起,但CdS聚集体的大小并没有改变.在UCBD-CdS薄膜的沉积过程中,CdS薄膜的横向和纵向生长速率之比会随着沉积时间的不同而改变,且沉积时间是获得大颗粒的CdS聚集体和致密的UCBD-CdS薄膜的重要影响因素.当沉积时间为40min时,获得的UCBD-CdS薄膜较致密,CdS聚集体的大小为180nm,膜厚为80.8nm,适合作为薄膜太阳电池的窗口层.     

电化学沉积技术制备LiNiO2薄膜及表征

Well-crystallized LiNiO₂ thin films were prepared directly on nickel substrates in LiOH solution by constant current electrochemical deposition technique at 95 ℃. The as-prepared LiNiO₂ thin films were characterized by using XRD, SEM and XPS, and the results reveal that the as-prepared LiNiO₂ thin films are dense and uniform in surface and show hexagonal structure. The influence of processing parameters such as reaction temperature, duration, electrical current density as well as the concentration of LiOH solution on the structure and morphologies of as-prepared LiNiO₂ thin films were studied，and the preferable electrochemical processing conditions for preparing LiNiO₂ thin films were suggested.     

热处理对WO3纳米薄膜结构及其气致变色性能的影响

以钨粉和过氧化氢溶液为原料, 采用溶胶凝胶法制备了WO3溶胶, 并结合提拉镀膜法, 分别在普通玻璃载玻片和抛光硅片上制备了掺钯气致变色WO3纳米结构薄膜; 并分别在50, 150, 250, 350和450 ℃的空气氛围中对薄膜进行了热处理. 采用IR、双椭圆偏振光谱仪、AFM和XRD分析了薄膜的性质和微观结构, 观察了薄膜的表面形貌, 根据所得数据讨论了不同热处理温度对薄膜的结构和气致变色性能的影响.     

TiO2-MoO3复合纳米管阵列薄膜的制备及其可见光活性

通过阳极氧化的方法制备TiO₂纳米管薄膜, 在MoO₃存在的条件下对该薄膜进行热处理得到TiO₂-MoO₃复合纳米管阵列薄膜. 利用X射线衍射(XRD), 扫描电子显微镜(SEM), X射线光电子能谱(XPS), 电化学阻抗谱(EIS), Mott-Schottky 及光电化学方法对得到的薄膜进行了表征. XRD结果表明, TiO₂-MoO₃复合纳米管薄膜中的TiO₂主要为锐钛矿晶型. SEM实验证实了薄膜纳米管结构的存在, 样品中的MoO₃均匀地分散在TiO₂纳米管表面. 利用XPS方法分析了TiO₂-MoO₃复合纳米管薄膜元素的组成, 结果表明, MoO₃在TiO₂表面形成TiO₂-MoO₃复合纳米管薄膜. 研究了热处理温度以及热处理时间对样品的光电化学性能的影响, 相对于单纯TiO₂纳米管薄膜, 适量引入MoO₃提高了样品在可见光区的光电响应能力, 样品的平带电位负移. 在450 °C热处理60 min制得的TiO₂-MoO₃复合半导体纳米管阵列薄膜光电响应活性最高.     

Preparation and Characterization of Nano-Structured SiO2 Thin Films on Carbon Steel

Nano-structured SiO2 thin films were prepared on the surface of carbon steel for the first time by LPD. The compositions of the films were analyzed by XPS, and the surface morphology of the thin films were observed by AFM. The thin films were constituted by compact particles of SiO2, and there was no Fe in the films. In the process of film forming, the SiO2 colloid particles were deposited or absorbed directly onto the surface of carbon steel substrates that were activated by acid solution containing inhibitor, and corrosion of the substrates was avoided. The nano-structured SiO2 thin films that were prepared had excellent protective efficiency to the carbon.     

二氧化硅纳米粒子薄膜的制备及光学性能

以二氧化硅胶体和聚二烯丙基二甲基氯化铵(PDDA)为原料,利用静电自组装技术制备了PDDA/SiO2复合薄膜. TEM图象显示,薄膜中的SiO2纳米粒子为密堆积,薄膜均匀、致密;电子衍射实验结果显示,所组装的薄膜为非晶态膜.载玻片表面组装SiO2纳米粒子薄膜后,透射率随薄膜双层数增加呈现周期变化.薄膜具有增透作用,载玻片双面组装薄膜后在一定波长范围内的透射率可提高5％以上. PDDA/SiO2复合薄膜的光学性质主要由SiO2纳米粒子决定,每一双层的平均物理厚度小于SiO2纳米粒子的粒径,薄膜中存在层间穿插现象,逐层组装的复合薄膜具有单层光学薄膜的特性.     

Preparation and characterization of nanostructured Ni(OH)2 and NiO thin films by a simple solution growth process

Nanostructured Ni(OH)2 thin films were prepared by a simple solution growth process with F(-) and NH3 used as Ni2+ coordination agents, and ammonia hydroxide solution used as OH(-) supplier to accelerate the hydrolyzation of nickel complex species. The results showed Ni(OH)2 thin films were constructed mainly with hexagonal beta-Ni(OH)2 nanorods; the F(-) and NH3 in reactive solutions played important roles in the film growth process; and solution pH had great influence on the morphologies of thin films, which was explained by the competition of Ni(OH)2 nucleation and growth in solutions. NiO crystallinity thin films were obtained by annealing Ni(OH)2 thin films at 400 degrees C for 2 h and the morphologies of the Ni(OH)2 thin films were sustained well during the annealed process.     

多孔TiO2薄膜自洁净玻璃的亲水性和光催化活性

亲水性多孔TiO₂薄膜自洁净玻璃以含聚乙二醇的钛醇盐溶胶前驱体中通过浸渍提拉法制备;随着前驱物中聚乙二醇加入量的增加,多孔TiO₂薄膜表面的羟基含量也增加,薄膜表面的亲水性增强,水与薄膜表面的接触角下降为0°.该亲水性多孔TiO₂薄膜自洁净玻璃具有明显的自洁净和易清洗功能.紫外-可见光透过光谱分析表明,随着TiO₂薄膜中孔径的增大,光的散射增强,透光率减小.该TiO₂镀膜玻璃对于紫外线具有吸收作用.甲基橙水溶液的光催化降解实验表明,在TiO₂薄膜中引入适当大小的微孔可显著增强薄膜的光催化活性,但当孔径接近400nm时,薄膜的光催化活性减弱.     

醋酸处理对TiO_2纳米薄膜光催化性能的影响

用溶胶－凝胶方法在普通玻璃基体上制备了均匀透明的TiO_2纳米薄膜，并经 500℃煅烧2h，煅烧后的TiO_2薄膜在2 mol·L~(-1)的CH_3COOH水溶液中处理24h， 最后分别在100和500℃进行第二次热处理，醋酸处理前后的薄膜分别用UV－vis, SEM, XRD和XPS进行了表征，并用甲基橙水溶液的光催化降解评价TiO_2纳米薄膜 的光催化性能，结果发现：用醋酸处理后的TiO_2纳米薄膜的光催化活性高于处理 前薄膜的的光催化活性；而且，酸处理后经500℃热处理的TiO_2纳米薄膜的光催化 活性明显高于经100℃热处理的TiO_2纳米薄膜的光催化活性。     

两种表征金属有机双层膜络合和金属薄膜氧化反应动力学的方法

建立了两种新的薄膜反应动力学表征方法, 即透射光谱法和方块电阻法, 以克服传统动力学表征手段在薄膜体系氧化与络合反应过程中应用的局限性. 以透射光谱为表征手段, 得到了Ag/TCNQ(四氰基对醌二甲烷)金属有机双层薄膜的络合反应动力学曲线; 以方块电阻为表征手段, 得到了Cu薄膜的氧化反应动力学过程.     

Improved optical and electrical properties of sol–gel-derived boron-doped zinc oxide thin films

Sol–gel spin-coating was used to grow zinc oxide (ZnO) thin films doped with 0–2.5 at.% B on quartz substrates. The structural, optical, and electrical properties of the thin films were investigated using field-emission scanning electron microscopy, X-ray diffraction (XRD), photoluminescence (PL), ultraviolet–visible spectroscopy, and van der Pauw Hall-effect measurements. All the thin films had deposited well onto the quartz substrates and exhibited granular morphology. The average crystallite size, lattice constants, residual stress, and lengths of the bonds in the crystal lattice of the thin films were calculated from the XRD data. The PL spectra showed near-band-edge (NBE) and deep-level emissions, and B doping varied the PL properties and increased the efficiency of the NBE emission. The optical transmittance spectra for the undoped ZnO and boron-doped zinc oxide (BZO) thin films show that the optical transmittance of the BZO thin films was significantly higher than that of the undoped ZnO thin films in the visible region of the spectra and that the absorption edge of the BZO thin films was blue-shifted. In addition, doping the ZnO thin films with B significantly varied the absorption coefficient, optical band gap, Urbach energy, refractive index, extinction coefficient, single-oscillator energy, dispersion energy, average oscillator strength, average oscillator wavelength, dielectric constant, and optical conductivity of the BZO thin films. The Hall-effect data suggested that B doping also improved the electrical properties such as the carrier concentration, mobility, and resistivity of the thin films.     

掺杂Sb对纳米TiO2薄膜的超亲水性和微结构的影响

用溶胶-凝胶法将纳米TiO2:Sb薄膜沉积在玻璃基板上.研究了掺杂浓度对薄膜的光致超亲水性、薄膜结构和晶相转变的影响.结果表明,纯TiO2薄膜中， TiO2不仅以无定型态存在，而且还以板钛矿和锐钛矿的形式存在.掺杂Sb提高了TiO2由无定型向板钛矿和锐钛矿转变的速率.掺入适量的Sb后， TiO2薄膜表现出更好的光致超亲水性.由XRD谱可算出薄膜的晶粒大小为13.3～20.0 nm.     

基片温度对LiCoO2薄膜结构与电化学性能的影响

采用射频(RF)磁控溅射技术制备了用于全固态薄膜锂电池的非晶态和多晶LiCoO2阴极薄膜,利用XRD和SEM研究了沉积温度对LiCoO2薄膜结构和形貌的影响,并研究了高温退火后薄膜的电化学性能.研究结果表明,随著基片温度的不同,薄膜成分、表面形貌以及电化学行为有明显差异.室温沉积的薄膜很难消除薄膜中Li2CO3的影响,经过高温退火处理后也无法形成有效的多晶LiCoO2薄膜,而150℃沉积的薄膜经过高温退火后形成了有利于锂离子嵌入的多晶LiCoO2结构,薄膜显示出了较好的电化学性能.     

阳极氧化TiN薄膜制备N掺杂纳米TiO2薄膜及其可见光活性

室温下通过电泳沉积(EPD)的方法在Ti片表面制备TiN薄膜, 然后对TiN薄膜进行阳极氧化得到N掺杂多孔纳米结构的TiO2薄膜. 利用X射线衍射(XRD), X射线光电子能谱(XPS), 扫描电子显微镜(SEM)及光电化学方法对得到的薄膜进行表征. XRD测试结果表明, 经过阳极氧化并在350 ℃空气气氛中退火1 h的薄膜中存在锐钛矿晶型的TiO2. XPS的结果表明, 样品中的N元素取代部分O, 且N的摩尔分数为0.95%. SEM显示, 经阳极氧化后薄膜表面出现多孔纳米结构. 光电化学测试结果显示, 阳极氧化提高了N掺杂TiO2薄膜在可见光下的光电响应. 经阳极氧化并热处理的薄膜在0 V电位及可见光照射下光电流密度为2.325 μA·cm-2, 而单纯热处理的薄膜在相同条件下光电流密度仅为0.475 μA·cm-2. 阳极氧化得到纳米多孔结构提高了N掺杂纳米TiO2薄膜的表面积, 从而对可见光的响应增大.     

"Contact" of nanoscale stiff films

We investigated the contact behaviors of a nanoscopic stiff thin film bonded to a compliant substrate and derived an analytical solution for determining the elastic modulus of thin films. Microscopic contact deformations of the gold and polydopamine thin films (<200 nm) coated on polydimethylsiloxane elastomers were measured by indenting a soft tip and analyzed in the framework of the classical plate theory and Johnson-Kendall-Roberts (JKR) contact mechanics. The analysis of this thin film contact mechanics focused on the bending and stretching resistance of thin films and is fundamentally different from conventional indentation measurements where the focus is on the fracture and compression of the films. The analytical solution of the elastic modulus of nanoscopic thin films was validated experimentally using 50 and 100 nm gold thin films coated on polydimethylsiloxane elastomers. The technical application of this analysis was further demonstrated by measuring the elastic modulus of thin films of polydopamine, a recently discovered biomimetic universal coating material. Furthermore, the method presented here is able to quantify the contact behaviors of nanoscopic thin films, effectively providing fundamental design parameters, the elastic modulus, and the work of adhesion, crucial for transferring them effectively into practical applications.