Surface fluorination of paper in CF4-RF plasma environments

Plasma-based technologies are an exciting alternative for cellulose andpaper modification. Barrier coatings and surface functionalization of celluloseenhances properties and creates new possibilities for cellulose-based products.A parallel plate radio frequency (RF)-plasma reactor was used to modify papersubstrates under discharge parameters such as power, time and pressure. Carbontetrafluoride RF-plasma treatment of paper caused intense fluorination and itwas demonstrated that the fluorination reaction mechanisms can be controlled bythe external plasma parameters. Fluorine contents as high as 51.3% (contactangle=147°) were obtained for the treated cellulose. It was shown that eventreatment times as low as 30 s can generate relative surface fluorineatomic concentrations as high as 30%. High resolution ESCA and ATR-FTIRanalysisindicated covalently bound CF_x functional groups with CF₄treatment. It was found that under certain experimental conditionssuper-hydrophobic paper surfaces are created by combining the high surfacefluorine atomic concentrations with specific plasma-generated surfacetopographies.     

Surface Modification of Silicone Rubber by CF<Subscript>4</Subscript> Radio Frequency Plasma Immersion

Silicone rubber samples were treated by CF₄ capacitively coupled plasma at radio frequency (RF) power of 60, 100 and 200 W for a treatment time up to 20 min under CF₄ flow rate of 20 sccm, respectively. Static contact angle, ATR-FTIR and XPS, and AFM were employed to characterize the changes of surface on hydrophobicity, functional groups, and topography. The results indicate the static contact angle is improved from 100.7 to 150.2°, and the super-hydrophobic surface, which corresponds to a static contact angle of 150.2°, appears at RF power of 200 W for a 5 min treatment time. It is suggested that the formation of super-hydrophobic surface is ascribed to the co-action of the increase of surface roughness created by the ablation reaction of CF₄ plasma and the formation of [–SiF _x (CH₃)_2−x –O–] _n (x = 1, 2) structure produced by the direct attachment of F atoms to Si.     

Angle‐resolved XPS of fluorinated and semi‐fluorinated side‐chain polymers

Angle‐resolved XPS data (elemental quantification and high‐energy‐resolution C 1s) are presented for ten polymers with side‐chains of the form ? OCO(CF₂)_yF, ? COO(CH₂)₂OCO(CF₂)_yF (y = 1, 2, 3) and ? COO(CH₂)_x(CF₂)_yF (x = 1, y = 1, 2, 3; x = 2, y = 8). Particular attention was paid to charge compensation and speed of data acquisition, with co‐addition from multiple fresh samples to give spectra with good energy resolution and good signal‐to‐noise ratio free from the effects of x‐ray‐induced degradation. Water contact angles for the polymers are also reported. The XPS data demonstrate preferential surface segregation of fluorine‐containing groups for all but the shortest side‐chain polymer, where the ? OCOCF₃ side‐chain either does not surface segregate or is too short for surface segregation to be detectable by angle‐resolved XPS. In the other polymers studied the relative positions of functional groups in the side‐chains correlate with the angle‐resolved behaviour of the corresponding C 1s components. This shows that the surface side‐chains are oriented towards the polymer surface. For the ? COO(CH₂)₂OCO(CF₂)_yF (y = 1) side‐chain, the angle‐resolved C 1s data suggest reduced ordering and linearity compared with y = 2 and 3. For any particular series of polymers, e.g. ? COO(CH₂)_x(CF₂)_yF, the water contact angles increase with y, consistent with burying of the hydrophilic ester groups as y increases. For any particular value of y the sequence of water contact angles is ? COO(CH₂)_x(CF₂)_yF > ? OCO(CF₂)_yF ～ ? COO(CH₂)₂OCO(CF₂)_yF, suggesting greater ordering and density of fluorocarbon species at the surface of the ? COO(CH₂)_x(CF₂)_yF side‐chain polymers compared with the other polymers studied. For the ? COO(CH₂)₂(CF₂)₈F polymer a water contact angle of 124° is measured, which is greater than that of poly(tetrafluoroethene). The ? COO(CH₂)₂OCO(CF₂)F polymer is unusual in that it shows a particularly low water contact angle (83° ), suggesting that the probe fluid is able to sense both ester groups, consistent with the reduced ordering of the side‐chain detected by angle‐resolved XPS. Copyright © 2004 John Wiley & Sons, Ltd.     

Rate constants for the reactions of OH radicals with CH3OCF2CF3, CH3OCF2CF2CF3, and CH3OCF(CF3)2

The rate constants for the reactions of OH radicals with CH₃OCF₂CF₃, CH₃OCF₂CF₂CF₃, and CH₃OCF(CF₃)₂ have been measured over the temperature range 250–430 K. Kinetic measurements have been carried out using the flash photolysis, laser photolysis, and discharge flow methods combined respectively with the laser induced fluorescence technique. The influence of impurities in the samples was investigated by using gas‐chromatography. The following Arrhenius expressions were determined: k(CH₃OCF₂CF₃) = (1.90) × 10⁻¹² exp[−(1510 ± 120)/T], k(CH₃OCF₂CF₂CF₃) = (2.06) × 10⁻¹² exp[−(1540 ± 80)/T], and k(CH₃OCF(CF₃)₂) = (1.94) × 10⁻¹² exp[−(1450 ± 70)/T] cm³ molecule⁻¹ s⁻¹. © 1999 John Wiley & Sons, Inc. Int J Chem Kinet 31: 846–853, 1999     

A comparative study of CH4 and CF4 rf discharges using a consistent plasma physics and chemistry simulator

A self-consistent, one-dimensional simulator for the physics and chemistry of radio frequency (rf) plasmas was developed and applied for CH₄ and CF₄. The simulator consists of a fluid model for the discharge physics, a commercial Boltzmann equation solver for calculations of electron energy distribution fuction (EEDF), a generalized plasma chemistry code, and an interface module among the three models. The CH₄ and CF₄ discharges are compared and contrasted: CH₄ plasmas are electropositive, with negative ion densities one order of magnitude less than those of electrons, whereas CF₄ plasmas are electronegative, with ten times more negative ions than electrons. The high-energy tail of tire EEDF in CH₄, lies below both the Druyvensteyn and Maxwell distributions, whereas tire EEDF high-energy tail in CF₄ lies between the two. For CH₄, the chemistry model was applied for four species, namely, CH₄ CH₃ CH₂, and H, whereas for CF₄, five species were examined namely CF₄, CF₃, CF₂, CF, and F The predicted densities and profiles compare favorably with experimental data. Finally, the chemistry results were fedback into the physics model until convergence was obtained.     

Darstellung von Trifluormethylhalogen-Iodaten(I) des Typs (CH3)4N+CF3IX− (X = F,Cl, Br) und Trifluormethyltrifluormethoxyiodat(I) (CH3)4N+CF3IOCF3−

Preparation of Trifluormethylhalogen Iodate(I) Salts (CH₃)₄N⁺CF₃IX^? (X = F, Cl, Br) and Trifluormethyltrifluormethoxy Iodate(I) (CH₃)₄N⁺CF₃IOCF₃^? We describe the preparation of new trifluormethyliodate(I) salts CF₃IX^? (X = F, Cl, Br, OCF₃). (CH₃)₄N⁺CF₃ICl^? and (CH₃)₄N⁺CF₃IBr^? are obtained via addition of CF₃I with the corresponded tetramethylammonium halogenide. (CH₃)₄N⁺CF₃IOCF₃^? is synthesized by comproportionation of (CH₃)₄N⁺CF₃ICl^? with CF₃OCl under formation of Cl₂ at ?78°C. (CH₃)₄N⁺CF₃IF^? is formed either, through thermolysis of (CH₃)₄N⁺ CF₃IOCF₃^? under separation of COF₂, or reaction of CF₃I with (CH₃)₄N⁺ OCF₃^?. The thermolabile compounds have been characterized by i.r., Raman, ¹⁹F-, ¹³C NMR spectroscopy.     

Penetration of plasma surface modification. II. CF4 and C2F4 low-temperature cascade arc torch

The depth of surface modification by low-temperature cascade arc torch is investigated. A stack of 10 sheets of nonwoven fabrics of polyester fibers is exposed to a low-temperature cascade arc torch containing CF₄ or C₂F₄, and the fluorination effect is examined by ESCA. It is shown that interaction of chemically reactive species, created in a low-temperature cascade arc torch, with the surface is not limited to the surface contacted by the torch (flame). The results indicate that the fluorination effect is observed on surfaces which are shadowed from the torch by overlying fibers. The highest degree of fluorination is found on the second layer, rather than on the first layer which the torch contacts directly. No significant differences in the trends of penetration of CF₄ and C₂F₄ treatment through porous samples are observed. However, ESCA data show principal differences in chemical structures of the surfaces treated with CF₄ (nonpolymer-forming gas) and C₂F₄ (polymer-forming gas). These results indicate that chemically reactive species induced by the excited species of argon rather than primary species created by the ionization process seem to play predominant roles in the surface treatment as well as the low-temperature cascade arc torch polymerization of perfluorinated compounds. © 1994 John Wiley & Sons, Inc.     

(CF3)2PAsH2 und (CF3)2AsAsH2

(CF₃)₂PAsH₂ and (CF₃)₂AsAsH₂ (CF₃)₂PAsH₂ is obtained in yields between 30 and 60% according to eq. (1) (CF₃)₂AsAsH₂ is formed by the analogous reaction with (CF₃)₂AsI, but is not sufficiently stable to be isolated. Both compounds are decomposed according to eq. (2) (CF₃)₂PAsH₂ can be studied in solution below ?40°C; it is characterized by molar mass determination and by its n.m.r. spectra (¹H, ¹⁹F, ³¹P). Reactions with polar [HBr, (CH₃)₂AsH, (CH₃)₂PN(CH₃)₂] and nonpolar [Br₂, As₂(CH₃)₄] reagents proceed by cleavage of the P? As bond.     

Kinetics for the gas‐phase reactions of OH radicals with the hydrofluoroethers CH2FCF2OCHF2, CHF2CF2OCH2CF3, CF3CHFCF2OCH2CF3, and CF3CHFCF2OCH2CF2CHF2 at 268–308 K

Rate constants were determined for the reactions of OH radicals with the hydrofluoroethers (HFEs) CH₂FCF₂OCHF₂(k₁), CHF₂CF₂OCH₂CF₃ (k₂), CF₃CHFCF₂OCH₂CF₃(k₃), and CF₃CHFCF₂OCH₂CF₂CHF₂(k₄) by using a relative rate method. OH radicals were prepared by photolysis of ozone at UV wavelengths (>260 nm) in 100 Torr of a HFE–reference–H₂O–O₃–O₂–He gas mixture in a 1‐m³ temperature‐controlled chamber. By using CH₄, CH₃CCl₃, CHF₂Cl, and CF₃CF₂CF₂OCH₃ as the reference compounds, reaction rate constants of OH radicals of k₁ = (1.68) × 10^?12 exp[(?1710 ± 140)/T], k₂ = (1.36) × 10^?12 exp[(?1470 ± 90)/T], k₃ = (1.67) × 10^?12 exp[(?1560 ± 140)/T], and k₄ = (2.39) × 10^?12 exp[(?1560 ± 110)/T] cm³ molecule^?1 s^?1 were obtained at 268–308 K. The errors reported are ± 2 SD, and represent precision only. We estimate that the potential systematic errors associated with uncertainties in the reference rate constants add a further 10% uncertainty to the values of k₁–k₄. The results are discussed in relation to the predictions of Atkinson's structure–activity relationship model. The dominant tropospheric loss process for the HFEs studied here is considered to be by the reaction with the OH radicals, with atmospheric lifetimes of 11.5, 5.9, 6.7, and 4.7 years calculated for CH₂FCF₂OCHF₂, CHF₂CF₂OCH₂CF₃, CF₃CHFCF₂OCH₂CF₃, and CF₃CHFCF₂OCH₂CF₂CHF₂, respectively, by scaling from the lifetime of CH₃CCl₃. © 2003 Wiley Periodicals, Inc. Int J Chem Kinet 35: 239–245, 2003     

Tetrakis(trifluormethyl)tellur (CF3)4Te [1]

(CF₃)₄Te is formed from the reaction of (CF₃)₂TeCl₂ with (CF₃)₂Cd·glyme in CH₃CN at ?10°C via the intermediate (CF₃)₃TeCl as a yellow liquid and identified by n.m.r. and mass spectra.     

Combination of glow-discharge and arc plasmas for CF4 abatement

Decomposition of CF₄ by glow-discharge and arc plasmas was studied using a tubular quartz reactor, a disk type, and a T-type quartz reactor. The effects of different metal electrodes, input voltage, and reactor type on the efficiency of CF₄ total destruction (DRE) were studied. The T-shape reactor was more efficient in CF₄ destruction than either the disk or tubular type due to a combined effect of glow discharge and arc plasmas. Several hydrogen and oxygen sources, such as H₂O, H₂, O₂, and CH₄, were used to convert CF₄. Using H₂ and O₂ as the hydrogen and oxygen sources presented better DRE than using H₂O. The effect of different hydrogen and oxygen sources on the conversion of CF₄ followed the trend: (H₂ + O₂) > (CH₄ + O₂) > H₂O. The maximum DRE of 95% was observed with 0.5% CF₄ using H₂ and O₂. A mass spectrometer and an emission spectroscope equipped with a charge-coupled detector (CCD) were used to characterize the products and intermediates. Mass spectrometric studies indicated that the reaction products were HF, CO₂, and trace amounts of NO. N₂ first negative and second positive emission lines were observed in the glow discharge plasmas as well as in the arc plasmas of N₂. However, C and F intermediates were observed only in arc plasmas of CF₄. Reactions occurring in the glow discharge plasmas and arcs seem to follow different mechanisms.     

Surface modification of polypropylene with CF4, CF3H,CF3Cl,and CF3Br plasmas

ESCA and contact angle measurements were used to characterize the surfaces of polypropylene and glass substrates exposed to CF₄, CF₃H, CF₃Cl, and CF₃Br plasmas. The use of both organic and inorganic substrates allowed clear distinction between treatments which led to plasma polymerization and treatments which caused grafting of functional groups directly to the substrate surfaces. CF₄ plasmas were the only treatments studied which fluorinated polypropylene surfaces directly, without the deposition of a thin, plasma-polymerized film. CF₃H polymerized in a plasma, while CF₃Cl and CF₃Br plasmas caused chlorination and bromination of polypropylene surfaces, respectively. Correlations were made between the active species present in the plasmas and the surface chemistry observed on the treated polypropylene substrates.     

(Trifluoromethyl)germanes. Preparation and properties of (CF3)2GeHX (X = H,D, F,Cl, Br,I, CH3) and CF3GeHnX3-n (X = H,D, CF2H,CH3)

The hydrogenation of (CF₃)_nGeX_4-n (X = halogen, n = 1–3) with NaBH₄ in an acidic medium has been investigated. Deuteration with NaBD₄ and D₃PO₄ gave the partially deuterated species CF₃GeH_nD_3-n and (CF₃)₂GeH_nD_2-n in reasonable isotopic purity. The (CF₃)₂GeHBr was isolated and converted into the halides (CF₃)₂GeHX (X = F, Cl, I) by treatment with AgX or HX. Insertion of CF₂ into a GeH bond has been observed, and (CF₃)(CF₂H)GeH₂ has been characterized. Direct alkylation of GeH bonds was brought about by reaction with a mixture of RI and R′₂Zn (R, R′= CH₃, C₂H₅), and the methyl(trif]uoromethyl)germanes CF₃GeH₂(CH₃), CF₃GeH(CH₃)₂ and (CF₃)₂GeH(CH₃) were isolated. For R = CD₃, R′ = CH₃ the product distribution can be accounted in terms of two competing mechanisms.     

Preparation and Structure of [Me3N(CF3)2BCCB(CF3)2NMe3]

Bis‐trimethylamine‐ethynyl‐di‐bis(trifluoromethyl)borane [Me₃N(CF₃)₂BCCB(CF₃)₂NMe₃] ( 1 ) has been prepared from trimethylamine‐ethynyl‐bis(trifluoromethyl)borane, [HCCB(CF₃)₂NMe₃], and dimethylamino‐bis(trifluoromethyl)borane, (CF₃)₂BNMe₂. The structure of 1 has been determined by x‐ray crystallography. In the solid state the molecule possesses crystallographic C_i symmetry. The acetylenic attachment to the boron atom is characterized by a short B–C bond length of 1.565(4) Å and an essentially linear B–C–C′ bond angle of 178.1(4)°.     

Synthesen und NMR‐Untersuchungen von Salzen mit den neuen Anionen [PtXn(CF3)6‐n]2— (n = 0 ‐ 5, X = F,OH, Cl,CN) und die Kristallstrukturanalyse von K2[(CF3)2F2Pt(μ‐OH)2PtF2(CF3)2]·2H2O

Syntheses and NMR Spectroscopic Ivestigations of Salts containing the Novel Anions [PtX_n(CF₃)_6‐n]^2— (n = 0 ‐ 5, X = F, OH, Cl, CN) and Crystal Structure of K₂[(CF₃)₂F₂Pt(μ‐OH)₂PtF₂(CF₃)₂]·2H₂O The first syntheses of trifluoromethyl‐complexes of platinum through fluorination of cyanoplatinates are reported. The fluorination of tetracyanoplatinates(II), K₂[Pt(CN)₄], and hexacyanoplatinates(IV), K₂[Pt(CN)₆], with ClF in anhydrous HF leads after working up of the products to K₂[(CF₃)₂F₂Pt(μ‐OH)₂PtF₂(CF₃)₂]·2H₂O. The structure of the salt is determined by a X‐ray structure analysis, P2₁/c (Nr. 14), a = 11.391(2), b = 11.565(2), c = 13.391(3)Å, β = 90.32(3)°, Z = 4, R₁ = 0.0326 (I > 2σ(I)). The reaction of [Bu₄N]₂[Pt(CN)₄] with ClF in CH₂Cl₂ generates mainly cis‐[Bu₄N]₂[PtCl₂(CF₃)₄] and fac‐[Bu₄N]₂[PtCl₃(CF₃)₃], but in contrast that of [Bu₄N]₂[Pt(CN)₆] with ClF in CH₂Cl₂ results cis‐[Bu₄N]₂[PtX₂(CF₃)₄], [Bu₄N]₂[PtX(CF₃)₅] (X = F, Cl) and [Bu₄N]₂[Pt(CF₃)₆]. In the products [Bu₄N]₂[PtX_n(CF₃)_6‐n] (X = F, Cl, n = 0—3) it is possibel to exchange the fluoro‐ligands into chloro‐ and cyano‐ligands by treatment with (CH₃)₃SiCl und (CH₃)₃SiCN at 50 °C. With continuing warming the trifluoromethyl‐ligands are exchanged by chloro‐ and cyano‐ligands, while as intermediates CF₂Cl and CF₂CN ligands are formed. The identity of the new trifluoromethyl‐platinates is proved by ¹⁹⁵Pt‐ and ¹⁹F‐NMR‐spectroscopy.     

The microwave spectrum and structure of 1,1,1,3,3,3-hexafluoropropane,freon R236fa

The microwave spectra of three isotopic species of 1,1,1,3,3,3-hexafluoropropane (R236fa) (CF₃CH₂CF₃, ¹³CF₃CH₂CF₃ and CF₃¹³CH₂CF₃) were observed in the region from 4.5 to 18 GHz using a molecular beam Fourier transform microwave spectrometer (MB-FTMW). The rotational and centrifugal distortion constants were determined. The r_s (C–C) bond length and bond angle (C–C–C) of the molecule were determined to be 1.56(5) and 109(3) Å, respectively. The ab initio calculation of R236fa was executed at the MP2/6-31G(d,p) level. Comparison of the bond length and bond angle of R236fa with those in the other fluoropropanes revealed trends for the C–C bond length and CCC angle, depending on the number of fluorine atoms attached to the central carbon. A similar idea had been noted by Mack et al. from the electron diffraction studies of fluoropropanes.     

Synthesis of highly branched perfluoroethers by direct fluorination,promising new materials based on the hexafluoroacetone–ethylene copolymer

Direct fluorination of the hexafluoroacetone-ethylene copolymer, [CH₂CH₂OC(CF₃)₂]_n, under conditions designed to promote fragmentation of the polymer chain has led to the synthesis of a number of structurally unusual branched perfluoropolyethers [? CF₂? CF₂? O-C(CF₃)₂? ]_n. These new perfluoropolyethers have been characterized by ¹⁹F-NMR, and their physical properties are reported. Direct fluorination under milder conditions yields a high-molecular-weight perfluoropolyether.     

Excited states of CF4 plasma for polymerization of TMPTA monomer

The F and CF₂–CF₂⁺ excited states have been detected by emission spectroscopy in CF₄RF plasmas used for TMPTA polymerization. These excited states are related through electron collision to F and CF₂ ground states. The temporal variation of the F and CF₂–CF₂⁺ radiative states near the substrate reveals that the F atoms disappear first by incorporation in the monomer during the polymerization phase and, then, by a third body recombination process enhanced by the polymer surface. The CF₂–CF₂⁺ radiative states are varying as the inverse of the F states indicating a strong destruction mechanism of CF₂ radicals by F atoms.     

Substituent effects on the disproportionation‐combination rate constant ratios for gas‐phase halocarbon radicals. IV. Reactions of ·CF3 + CF3CH2CF2· and CF3CH2CF2· + CF3CH2CF2·

Rate constant ratios, k_d/k_c, for the disproportionation/combination reaction at a temperature of 295 ± 2 K, have been measured as 0.034 ± 0.009 for the collision between CF₃CH₂CF₂ + CF₃ radicals and as 0.075 ± 0.019 for CF₃CH₂CF₂ + CF₃CH₂CF₂ radicals. The effect of the two fluorine substituents on the rate constant ratio is compared to previous k_d/k_cs with CF₃CH₂CH₂, CF₃CH₂CHCl, and CF₃CH₂CHCF₃ radicals. © 1999 John Wiley & Sons, Inc. Int J Chem Kinet: 31: 237–243, 1999     

Difluoromethylation of Amines with Zn(CF3)Br · 2 CH3CN,Cd(CF3)2 · 2 CH3CN and the System Bi(CF3)3/AlCl3

The reactions of Zn(CF₃)Br · 2 CH₃CN, Cd(CF₃)₂ · 2 CH₃CN or Bi(CF₃)₃/AlCl₃ with tertiary amines lead to the formation of quaternary ammonium salts of the general formula [R₃NCF₂H]X. The reaction of 4‐N,N‐dimethylaminopyridine with Zn(CF₃)Br · 2 CH₃CN yields (N‐difluoromethyl)‐4‐N,N‐dimethylaminopyridinium bromide. Bi(CF₃)₃/AlCl₃ reacts with 1,4‐diazabicyclo[2.2.2]octane to form a mixture of mono‐ and bis(difluoromethylammonium) salts.