Unoccupied Electron States of Ultrathin Quaterphenyl Films on the Surfaces of Layered CdS and Oxidized Silicon

Physics of the Solid State - Some results of studying the unoccupied electron states and the formation of a boundary potential barrier during the thermal vacuum deposition of ultrathin...     

氧等离子体处理对GaAs表面单层自组装SiO2纳米球薄膜的影响

二维纳米阵列结构因其重要的光学性能被广泛应用于各类光电子器件。本文对自组装单层SiO2纳米球掩模刻蚀法制备GaAs纳米柱二维阵列结构的关键工艺技术进行了研究。采用旋涂法在GaAs表面制备自组装单层SiO2纳米球,重点研究了GaAs表面氧等离子体亲水处理工艺对纳米球排列特性的影响,获得最佳工艺条件为功率配比100 W+80 W、腔室压力4 Pa、氧气流量20 mL/min、处理时间1200 s,并最终得到排列紧密的大面积单层纳米球薄膜。以单层纳米球为掩模,采用感应耦合等离子体刻蚀技术在GaAs表面制备了纳米柱阵列并测试了其表面光反射谱。测试结果表明,GaAs纳米柱阵列在特定波段的反射率降低至5%,远低于表面无纳米结构的薄膜材料表面高达40%的光反射。分析表明纳米柱可以激发米氏散射共振效应,从而有效降低反射率并提升光吸收。     

Development of GaAs Epitaxy from Bulk to Ultrathin Films. Growth for Nanostructure Devices

The effects of stoichiometry on various features of III–V compounds are investigated. It is shown experimentally that the optimum vapor pressure of V elements minimizes the deviation from the stoichiometric composition. Vapor pressure control technology is applied not only to the liquid phase epitaxy and bulk crystal growth but also to the surface reaction in molecular-layer epitaxy. The surface reactions of monomolecular layer growth by using chemical adsorption of precursors were investigated for GaAs, InP, Si, etc. The atomic scale controlled epitaxy of these materials has been studied with the study of surface reaction mechanism. The self-limiting growth in atomic or molecular layer was achieved with doping technology in each materials developed by choosing precursor materials.     

SiO2-GeO2薄膜二次谐波产生的稳定性研究

利用溶胶－凝胶（ｓｏｌ－ｇｅｌ）方法制备了ＳｉＯ２－ＧｅＯ２薄膜,并测量了薄样品电场极化后光学二次谐波信号的相对大小和时间弛以豫特性,通过对汪同衬底材料及不同温度下电场极化薄膜样品二次谐波信号的时间弛豫特性比较,表明薄膜与衬底之间界面电荷的稳定性受衬底材料体电导率的影响,从而影响了薄薄膜样品二次谐波信号的稳定性。     

Plasma Chemical Synthesis of Amorphous Hydrocarbon Films Alloyed by Silicon,Oxygen and Nitrogen

Russian Physics Journal - The paper presents the synthesis of amorphous hydrocarbon (a-C:H) films alloyed by silicon, oxygen and nitrogen. The films obtained in polyphenyl methylsiloxane vapor and...     

Silicon Dioxide Coating Deposited by PDPs on PET Films and Influence on Oxygen Transmission Rate

A silicon dioxide film is deposited on the polyethyleneterephtMate （PET） by a penning discharge plasma source at ambient temperature in a high vacuum chamber. Hexamethyldisiloxane and oxygen are adopted as precursor and reactive reagent to grow a nano-scale silicon dioxide layer on polymer surfaces. For the chemical structure analysis X-ray photoelectron spectroscopy is performed to demonstrate the content of Si, 0 and C elements. It is noticed that a higher silicon concentration is contained if Ar plasma is used for pretreatment. X-ray diffraction analysis shows that a micro-crystal silicon dioxide is formed by peak patterns at 25,84° and 21.8°. The barrier properties examined by oxygen transmission rate show that the permeation parameter of the 12-μm-thick PET film drastically decreases from 135 cc/m^2 per day for the control one to O. 713 cc/m^2 per day for the as-deposited one after Ar plasma treatment. The surface morphology related to the barrier properties of SiOx-coated polymers os also investigated by scanning electron microscopy and atomic force microscopy.     

富硅氮化硅薄膜的荧光发射

室温下在3．45eV的激光激发下,对950℃温度下淀积的LPCVD富硅的SiNx薄膜中,观测到5个高强度的可见荧光的发射。其峰位位置分别为2．7,2．69,2．4,2．3,2．1eV。通过TEM、IR、XPS等的分析研究表明,该样品为纳米硅镶嵌结构的a-SiNx：H复合膜,分析了其微结构的成因及其与膜内应力之间的相互关系。经过1000～1200℃快速退火(RTA)处理,原PL谱蓝移并只出现了峰位为3．0,2．8eV的两个紫蓝色荧光的发射,用能隙态模型对此结果做了初步的分析和讨论。认为薄膜中纳米硅团簇的密度、尺寸的变化和亚稳态缺陷态对其PL峰以及膜应力起着十分重要的作用。     

硅片上超薄氧化硅层厚度测量的XPS标准曲线法

提出一种新的处理方法-XPS标准曲线法来测量硅片上超薄氧化硅层(SiO2/Si)的厚度。该方法利用一系列氧化硅厚度(d)准确已知的SiO2/Si标准样品,分别记录其氧化硅和元素硅的Si(2p)谱线,并得到峰高比(R),然后将厚度(d)对峰高比(R)作图得到标准曲线。在相同的实验条件下,测得未知样品氧化硅和元素硅的Si(2p)谱线并计算其峰高比,通过插入法在标准曲线上得到相应的氧化硅层厚度。SiO2/Si标准样品由设备一流和经验丰富的权威实验室提供,其氧化硅厚度采用多种方法进行测量比对。实验表明:基于氧化硅厚度准确知道的标准样品制作的XPS标准曲线,用于硅片上超薄氧化硅层厚度测量时具有快速、简便和比较准确等优点,有较好的实用价值。     

Optical Constants of SiO2 Films Deposited on Si Substrates

SiO2 films were deposited on single-crystalline silicon substrates by ion beam sputtering technology. Optical constants of SiO2 films are calculated from spectroscopic ellipsometry data, transmittance spectra and reflectance spectra by WVASE32 software, and the best fitted method is oStained for calculating optical constants of dielectric materials in the ultraviolet-visible-infrared （UV-VIS-IR） range. In the UV-VIS-NIR spectral range, refractive indices of SiO2 films are calculated separately by both ellipsometry data and reflectance spectra, and the obtained results are almost the same. Complex dielectric functions of SiO2films in the IR spectral range are accurately calculated with infrared transmission spectra using the GenOsc model. The obtained accuracy complex refractive index of SiO2 films in the wavelength region from 0.19μm to 25 #m is of great importance for the design of high quality coatings, such as ultra-low loss coating.     

SiO2薄膜中咔唑的发光特性

利用溶胶-凝胶工艺制备了含咔唑的SiO2薄膜,实验测量了薄膜样品的光致发光特性.结果发现：样品不仅能发射红光,并且当激发波长从610 nm连续减小到400 nm时,其发射谱峰位又能从760 nm连续蓝移到550 nm左右.薄膜样品的荧光特性随激发波长而改变的现象可归因于咔唑分子被紧缩在凝胶内部的微孔中受到挤压而导致共轭尺寸发生变化.     

纳米锗颗粒镶嵌薄膜的吸收光谱研究

用离子束溅射技术和热处理方法，制备出颗粒尺寸和镶嵌密度均可控制的高质量Ｇｅ－ＳｉＯ２纳米颗粒镶嵌薄膜，在室温下测量了不同粒度纳米锗颗粒镶嵌薄膜样品的吸收光谱，观测到在可见光区有较强的光吸收和吸收带边蓝移。研究表明：镶嵌在经缘介质薄膜中的纳米锗颗粒的能量带是量子化的，随着纳米锗粒子平均尺寸的减小，其吸收带隙增加，吸收带边蓝移的程序相应增大。     

(Si,Er)双注入热氧化硅的光致发光

采用强流金属蒸汽真空弧（MEVVA）离子源注入机，先将Si大束流注入热氧化SiO2/单晶硅，直接形成镶嵌在SiO2中的纳米晶Si，再小束流注入Er。Er离子在掺杂层中的浓度可达10^21cm^-3量级，大大地提高了作为孤立发光中心的Er^3 浓度。在77K和室温下，观察到了Er^3 的1.54цm特征发射。     

锗/多孔硅和锗/氧化硅薄膜光致发光的比较研究

采用磁控溅射技术,以锗为溅射靶,在多孔硅上沉积锗薄膜,沉积时间分别为4,8和12 min,及以锗-二氧化硅复合靶为溅射靶,在n型硅衬底上沉积了含纳米锗颗粒的氧化硅薄膜,锗与总靶的面积比分别为5%,15%,30%.各样品在氮气氛中分别经过300,600及900℃退火30 min.对锗/多孔硅和锗/氧化硅薄膜进行了光致发光谱的对比研究,用红外吸收谱分析了锗/多孔硅的薄膜结构.实验结果显示,锗/多孔硅薄膜的发光峰位于517 nm附近,沉积时间对发光峰的强度有显著影响,锗层越厚峰强越弱.锗/氧化硅薄膜的发光峰位于580 nm附近,锗与总靶的面积比对发光峰的强度影响较大,锗/氧化硅薄膜中的锗含量越高峰强越弱.不同的退火温度对样品的发光峰强及峰位均没有明显影响.可以认为锗/多孔硅的发光峰是由多孔硅与孔间隙中的锗纳米晶粒两者界面的锗相关缺陷引起的,而锗/氧化硅的发光峰来自于二氧化硅的发光中心.     

A Micromachined SiO2/Silicon Probe for Neural Signal Recordings

The development of an implantable five channel microelectrode array is presented for neural signal recordings. The detailed fabrication process is outlined with four masks used. The SEM images show that the probe shank is 1.2mm long, 100μm wide and 30μm thick with the recording sites spaced 200μm apart for good signal isolation. The plot of the single recording site impedance versus frequency is shown by test in vitro and the impedance declines with the increasing frequency. Experiment in vivo using this probe is under way.     

Electron Transport Properties of Two-Dimensional Monolayer Films from Au-P-Au to Au-Si-Au Molecular Junctions

We investigate the electronic-transport properties of two-dimensional monolayer films from Au-P-Au molecular junction to Au-Si-Au molecular junction using elastic scattering Green's function theory. In the process of replacing the P atoms with Si atoms every other line from the middle of monolayer blue phosphorus molecular structure, the substitution of Si atoms changes the properties of Au-P-Au molecular junction significantly. Interestingly, the current value has a symmetric change as a parabolic curve with the peak appearing in Au-Si_1P_1-Au molecular junction, which provides the most stable current of 15.00 nA in a wide voltage range of 0.70-2.70 V.Moreover, the current-voltage characteristics of the structures indicate that the steps tend to disappear revealing the property similar to metal when the Si atoms dominate the molecular junction.     

氧化硅薄膜中掺杂Tb~(3+)离子的发光敏化

采用溶胶-凝胶法在硅片上制备了掺杂稀土离子Tb~(3+)的SiO_2薄膜,并用荧光分析方法研究了薄膜的发光特性,对发光效果的提升途径做了探索和分析。在245 nm波长的激发下,能够观察到Tb~(3+)的5D4-7FJ(J=6,5,4,3)的跃迁发射峰。对于Tb~(3+)离子的高浓度掺杂体系,在掺入富Si或Al~(3+)离子后,浓度猝灭效应能得到明显改善。同时掺入两种激活剂的样品发光强度较只掺Al~(3+)的样品大了近一倍。此外,氩气氛退火引入氧空位缺陷也能使样品的发光强度有较大提升,氩气氛退火的最佳温度为1 200℃。