Sn doping effects on the electro-optical properties of sol gel derived transparent ZnO films

Undoped and tin (Sn) doped ZnO films have been deposited by sol gel spin coating method. The Sn/Zn nominal volume ratio was 1, 3 and 5% in the solution. The effect of Sn incorporation on structural and electro-optical properties of ZnO films was investigated. All the films have polycrystalline structure, with a preferential growth along the ZnO (002) plane. The crystallite size was calculated using a well-known Scherrer's formula and found to be in the range of 26-16 nm. X-ray diffraction patterns of the films showed that Sn incorporation leads to substantial changes in the structural characteristics of ZnO films. The SEM measurements showed that the surface morphology of the films was affected from the Sn incorporation. The highest average optical transmittance value in the visible region was belonging to the undoped ZnO film. The optical band gap and Urbach energy values of these films were determined. The absorption edge shifted to the lower energy depending on the Sn dopant. The shift of absorption edge is associated with shrinkage effect. The electrical conductivity of the ZnO film enhanced with the Sn dopant. From the temperature dependence of conductivity measurements, the activation energy of ZnO film increased with Sn incorporation.     

Ag-Sn金属薄膜在升温过程中的结构变化

借助TEM和HVEM观察了碳膜上Ag-Sn薄膜在加热到640℃的过程中的结构变化。升温到200—250℃时,Ag和Sn迅速反应变为γ相Ag₃Sn。γ相在480℃以上迅速转变成具有片层状组织的β相。在510℃左右,β相薄膜开始产生缩聚。还用扫描电子显微镜观察了GaAs基底上Ag-sn膜加热后的表面形态。结果表明,若Sn含量(20—65Wt％)越多、合金温度越高,则合金膜表层缩聚越严重。 关键词：     

Improvement of Nickel-Stanogermanide Contact Properties by Platinum Interlayer

We report an effective method to improve the formation of nickel stanogermanide(Ni Ge Sn) by the incorporation of a platinum(Pt) interlayer. After the Ni/Pt/Ge Sn samples are annealed we obtain uniform Ni Ge Sn thin films,which are characterized by means of sheet resistance, atomic force microscopy, scanning electron microscopy,cross-section transmission electron microscopy, and energy dispersive x-ray spectroscopy. These results show that the presence of Pt increases the smoothness and uniform morphology of Ni Ge Sn films.     

Transmission electron microscopy study of defects in Sn-doped GaAs films grown by molecular beam epitaxy

Films of GaAs, heavily doped with Sn, which have been grown by molecular-beam epitaxy are found to contain single-crystal Sn particles situated in the nearsurface region of the epilayer GaAs. The morphology and chemical composition of the particles have been examined by using cross-section transmission electron microscopy combined with energy-dispersive x-ray spectroscopy. Different growth conditions were used to study the Sn-particle formation and high-resolution transmission electron microscopy was used to investigate microstructures. The observations are discussed in terms of several models previously proposed for these phenomena.     

氢对GaAs薄膜的钝化作用

报导了射频磁控溅射与沉积气氛掺氢相结合制备单层(13~20 nm厚)高质量GaAs多晶态纳米薄膜的方法,研究了氢钝化对薄膜微观结构及光学性质的影响.对GaAs薄膜进行了X射线衍射、原子力显微镜、吸收光谱、光致荧光谱的研究分析.结果表明,衬底温度500℃的掺氢薄膜和520℃的薄膜呈面心立方闪锌矿结构,薄膜的晶团尺寸较大,微观表面较为粗糙,其吸收光谱出现了吸收边蓝移和明显的激子峰,带隙光致荧光峰强明显增加,说明氢在衬底温度500℃~520℃下对薄膜有重要的钝化作用.     

Structural and optical studies of thin films of aluminum nitride grown via ion-plasma sputtering on gallium arsenide substrates with different orientations

IR and UV spectroscopy is used to study the properties of nanostructured aluminum nitride films obtained via reactive ion-plasma sputtering on GaAs substrates with different orientations. Nanostructured thin (100–200 nm) films of cubic aluminum nitride with optical bandgaps of ~5 eV and refractive indices varying from 1.6 to 4.0 in the wavelength range of ~250 nm are fabricated. Growth on a misoriented GaAs(100) substrate (4° with respect to the [110] plane) makes it possible to synthesize AlN films with smaller grains and higher refractive indices (n ~ 4). It is shown that misoriented GaAs substrates allow us to control the morphology, surface composition, and optical functional characteristics of AlN/GaAs heterophase systems.     

Polyethylene glycol-assisted growth of Cu2SnS3 promising absorbers for thin film solar cell applications

In this paper, we report, for the first time, the results of the polyethylene glycol- (PEG) assisted preparation and characterization of high-quality and well-crystallized Cu₂SnS₃ (CTS) thin films obtained using sol–gel spin-coating method and a subsequent annealing in a sulphur atmosphere. Structural, morphological, compositional, electrical and optical investigations were carried out. The X-ray diffraction patterns of the samples proved the polycrystalline nature and preferred crystallization of the films. No peak referring to other binary or ternary phases were detected in the patterns. The intensity of the preferred orientation and crystallite size of the films increased with increasing PEG content. This trend yielded an improvement in photo-transient currents of the PEG-assisted growth of CTS films. The scanning electron microscopy images revealed that the CTS films have continuous, dense and agglomeration-like morphology. Through energy dispersive X-ray spectroscopy studies, it has been deduced that the samples consist of Cu, Sn and S of which atomic percentages were consistent with Cu/Sn and S/metal initial ratios. The agglomerated morphology of the samples has been attributed to increasing PEG content. A remarkable enhancement was observed in photo-transient currents of p-n junction of the produced films along with increasing PEG content. Through resistivity-temperature measurements, three impurity level electrical activation energy values for each film were found. Optical band gap values of the films were estimated via absorbance-wavelength behaviours and decreased with increasing PEG content. It has been revealed that PEG-assisted growth of CTS thin films is a promising way to improve its photovoltaic characteristics.     

Surfactant-mediated molecular beam epitaxy of high-quality (111)B-GaAs

We present a novel approach to the molecular beam epitaxy of [111]-oriented GaAs. Surface-segregating In employed as an isoelectronic surfactant allows us to achieve mirror-like (111) GaAs surfaces within a wide range of growth conditions. Scanning electron and atomic force microscopy confirm the excellent morphology of the resulting samples. High-resolution X-ray diffraction shows the incorporation of In into the films to be negligible. Finally, we demonstrate a 10 Å-In_0.2Ga_0.8As/300 Å-GaAs superlattice based on surfactant-grown GaAs with a photoluminescence linewidth as narrow as 4.2 meV.     

Surface chemistry and growth mechanisms studies of homo epitaxial (1 0 0) GaAs by laser molecular beam epitaxy

In this paper, GaAs thin film has been deposited on thermally desorbed (1 0 0) GaAs substrate using laser molecular beam epitaxy. Scanning electron microscopy, in situ reflection high energy electron diffraction and in situ X-ray photoelectron spectroscopy are applied for evaluation of the surface morphology and chemistry during growth process. The results show that a high density of pits is formed on the surface of GaAs substrate after thermal treatment and the epitaxial thin film heals itself by a step flow growth, resulting in a smoother surface morphology. Moreover, it is found that the incorporation of As species into GaAs epilayer is more efficient in laser molecular beam epitaxy than conventional molecular beam epitaxy. We suggest the growth process is impacted by surface chemistry and morphology of GaAs substrate after thermal treatment and the growth mechanisms are discussed in details.     

缓冲层对InSb/GaAs薄膜质量的影响

InSb是制作3~5μm红外探测器的重要材料。在GaAs衬底上外延生长InSb,存在的主要问题在于两种材料间14.6%的晶格失配度,会引入较大的表面粗糙度以及位错密度,使外延材料的结构和电学性能均会受到不同程度的影响。通过系列实验,研究了在生长过程中缓冲层对薄膜质量的影响。利用高能电子衍射仪(RHHEED)得到了合适的生长速率和Ⅴ/Ⅲ比,研究了异质外延InSb薄膜生长中低温InSb缓冲层对材料生长质量以及不同外延厚度对材料电学性质的影响。采用原子力显微镜(AFM)、透射电子显微镜(TEM)、X射线双晶衍射(DCXRD)等方法研究了InSb/GaAs薄膜的表面形貌、界面特性以及结晶质量。通过生长合适厚度的缓冲层,获得了室温下DCXRD半高峰宽为172″,77 K下迁移率为64300 cm²·V^-1·s^-1的InSb外延层。     

Effect of pit formation and surface roughness on size-dependent thermal conductivity of nanometer-thick semiconducting films

In this work, the thermal conductivity variation due to pit formation and surface roughness in nanometer-thick semiconducting films has been studied. It is shown that the thermal conductivity of thin films is reduced due to the presence of these effects in the films. This reduction in thermal conductivity is dependent on film thickness. The present analysis has been done on GaAs nanometer-thick films using the available experimental data.     

Magnetic force microscopy of GaAs:Mn ferromagnetic semiconductors

The dependence of magnetic properties of GaAs:Mn and MnAs epitaxial films grown on GaAs (001) by laser ablation of Mn and undoped GaAs in a hydrogen atmosphere under the growth conditions has been studied by magnetic force microscopy (MFM). Magnetic probe calibration for quantitative MFM measurements was performed by scanning across the slit of the magnetic-head of a tape recorder through which controlled direct current was passed. The dipole approximation was used to describe the magnetic properties of the MFM probe. Nonuniformity of the magnetization of GaAs:Mn films related to the formation of MnAs nanoinclusions, which are ferromagnetic at 300 K, has been observed. The typical scales of the spatial nonuniformity of the magnetization of GaAs:Mn films were varied from 270 to 550 nm depending on the film-growth conditions. The MnAs phase was identified by MFM measurements at an elevated temperature (up to 80°N).     

Heteroepitaxial III–V films on fianite substrates and buffer layers

GaAs, GaSb, AlGaAs, and InGaAs epitaxial films and multilayer AlGaAs/InGaAs/GaAs heterostructures for PHEMT field-effect transistors have been obtained on fianite substrates by metal-organic vapour phase epitaxy. Films of different III–V compounds, including GaN, were grown on Si and GaAs substrates with a simple single buffer layer (fianite) and double buffer layer (fianite on porous Si and GaAs). It is established that the use of a two-layer buffer improves the structural quality and homogeneity of III–V films. A possibility of controlling the phase composition of GaN films using a corresponding buffer layer is shown. It is found that the use of a two-layer buffer increases the electrical homogeneity and decreases the electrical activity of defects in GaN films.     

Spectral image cathodoluminescence,photoluminescence and Raman study of GaAs layers grown on Si substrates

GaAs layers grown on Si substrates by the conformal method were investigated by means of Raman, photoluminescence and cathodoluminescence spectroscopies. The combination of these optical techniques allows a better knowledge of the properties of these layers, with special emphasis on the stress distribution and the incorporation of dopants. In particular, samples intentionally doped, with alternate doped and undoped fringes, have been analyzed. The effective incorporation of Si atoms in the GaAs structure to produce n-type layers and the formation of Si complexes are determined by Raman and cathodoluminescence data. The lateral quasi-periodic stress distribution, typically observed in these layers, is shown to affect the Si incorporation.     

太阳电池用Cu2ZnSnS4薄膜的反应溅射原位生长及表征

通过直流反应磁控溅射技术,原位生长制备了太阳电池用Cu₂ZnSnS₄(CZTS)薄膜.采用X射线能量色散谱仪、扫描电镜、X射线衍射仪、紫外可见分光光度计和霍尔效应测试系统对薄膜进行了表征.结果表明,原位生长的CZTS薄膜具有均质、致密和平整的形貌,且由贯穿整个薄膜厚度的柱状颗粒组成.不同基底温度下生长所得薄膜的Cu/(Zn+Sn) 值均约为1,而Zn/Sn值均大于1且随着基底温度升高而减小.所得薄膜在(112)方向上择优取向明显,且结构特征受基底温度和Cu/(Zn+Sn)的共同影响.所得薄膜均具有高达10⁴cm^-1的光吸收系数,其带隙宽度随着生长温度的增加而降低,并且在500℃时为(1.51±0.01)eV.薄膜的导电类型均为p型,且具有与器件级Cu(In,Ga)Se₂(CIGS)相当的载流子浓度. 关键词： 2ZnSnS₄')" href="#">Cu₂ZnSnS₄ 直流反应磁控溅射 原位生长 太阳电池     

Effect of thermal annealing on r.f. sputtering-deposited nanocrystalline GaN<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>As<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript> thin films

GaNAs thin films were deposited on Corning glass substrates by radio frequency (r.f.) sputtering in molecular nitrogen ambient. The stoichiometry in the GaNAs alloy was controlled by changing the nitrogen incorporation in the film during the growth process, through the variation of the r.f. power in the range 30–80 watts which produced films with N concentrations in the range: x = 0.85–0.90. The structural and optical properties of the GaNAs thin films were studied by X-ray diffraction (XRD), photoacoustic (PA) and photoluminescence (PL) spectroscopies. XRD measurements show a broad diffraction band with a peak close to the (002) diffraction line of the GaN hexagonal phase, and a slight shoulder at the position corresponding to the (111) GaAs cubic phase. The PA absorption spectra showed a remarkable shift to higher energies of the absorption edge as the r.f. power decreases corresponding to the films with higher N concentrations. Thermal annealing of the GaNAs films at temperatures of 450 °C produced a GaAs nanocrystalline phase with grain sizes in the range 10–13 nm, as confirmed by the XRD measurements that showed a well-defined peak in the (111) GaAs direction, and also by the PA spectra which showed an absorption band at energies around 1.45 eV due to the quantum confinement effects. PL spectra of thermal-annealed GaNAs films showed a very intense emission at 1.5 eV which we have associated to transitions between the first electron excited level and acceptor states in the GaAs nanocrystallites.     

Molecular beam epitaxy of GaSb on ZnTe/GaAs: Influence of the chemical composition of ZnTe surface

We have studied the molecular beam epitaxy (MBE) of GaSb films on GaAs (0 0 1) substrates by using ZnTe as a new buffer layer. GaSb films were grown on two distinct ZnTe surfaces and the influence of surface chemical composition of ZnTe on the morphological and structural properties of GaSb films has been investigated. Initial 2-dimensional (2D) growth of GaSb films is obtained on Zn-terminated surface consequently smooth morphology and high crystal quality GaSb films are achieved. The thin GaSb film (0.4 μm) grown on Zn-terminated ZnTe surface reveals considerably narrow X-ray diffraction linewidth (113 arcsec) along with small residual strain, which strongly supports the availability of ZnTe buffer for the growth of high-quality GaSb film.     

Kinetic limitations to surface segregation during MBE growth of III–V compounds: Sn in GaAs

The incorporation of Sn as a dopant in GaAs has been studied in the temperature range of 500°–650° C, over a wide range of Ga and As fluxes, the latter being incident as either As₄ or As₂ molecules. The results are explained in terms of a surface segregation model in which the behaviour at high growth temperatures (above 600 °C) approaches thermal equilibrium, but growth at lower temperatures involves a kinetic limitation to the segregation process.     

Manipulation of magnetic nanostructures through low temperature metal–oxygen chemistry: Co/CoO exchange biased nanodonuts and Co nanotips

Dense nanodonut and nanotip type morphologies are shown to self-evolve in ultrathin cobalt films during growth under vacuum, depending on the level of oxygen incorporation and temperature. The nanodonut morphology forms at room temperature and the corresponding magnetic hysteresis shows exchange bias (～35 Oe shift along the field axis), which is attributed to the presence of CoO and its exchange coupling with cobalt. The morphology evolves into nanotip features with increase of growth temperature, with concurrent elimination of the oxide component and exchange bias.     

Synthesis and conductive properties of nanoisland Sn,Al, and Cu films

Nanoisland Sn, Al, and Cu films were synthesized on dielectric substrates and their morphology and conductive properties were investigated. It is shown that the initial effective film thickness significantly affects the morphological parameters of nanoislands. Study of the surface conductivity of the films at the condensation stage revealed the conductivity drop after termination of the deposition, which is related to the nanostructuring processes. It was found that the temperature dependences of the film conductivity include three portions: the low-temperature portion of the activation growth, the decrease upon nanostructuring, and the high-temperature portion of the activation growth.