共查询到19条相似文献,搜索用时 156 毫秒
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采用低压金属有机化学气相沉积(LP-MOCVD)技术,两步生长法在InP衬底上制备In0.82Ga0.18As材料.研究缓冲层InxGa1-xAs的In组分对In0.82Ga0.18As结晶质量和表面形貌的影响.X射线衍射(XRD)用于表征材料的组分和结晶质量.用扫描电子显微镜(SEM)观察样品的表面形貌.实验结果表明,低温生长的缓冲层InxGa1-xAs的In组分影响高温生长的外延层In0.82Ga0.18As的结晶质量和表面形貌.测量得到四个样品的外延层In0.82Ga0.18As的X射线衍射谱峰半峰全宽(FWHM)为0.596°,0.68°,0.362°和0.391°,分别对应缓冲层In组分x=0.28,0.53,0.82,0.88,当缓冲层In组分是0.82时,FWHM最窄,表明样品的结晶质量最好.SEM观察四个样品的表面形貌,当缓冲层In组分是0.82时,样品的表面平整,没有出现交叉平行线或蚀坑等缺陷,表面形貌最佳. 相似文献
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采用反应磁控溅射方法,在(0001)蓝宝石单晶衬底上,制备了纳米多晶Gd2O3掺杂CeO2(GDC)氧离子导体电解质薄膜,采用X射线衍射仪(XRD)、原子力显微镜(AFM)对薄膜物相、结构、粗糙度、表面形貌等生长特性进行了表征,利用交流阻抗谱仪测试了GDC薄膜不同温度下的电学性能;实验结果表明,GDC薄膜为面心立方结构,在所研究的衬底温度范围内,均呈强(111)织构生长;薄膜表面形貌随衬底温度发生阶段性变化:衬底温度由室温升高到300℃时,
关键词:
2O3掺杂CeO2电解质薄膜')" href="#">Gd2O3掺杂CeO2电解质薄膜
反应磁控溅射
生长特性
电学性能 相似文献
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利用低压-金属有机化学气相沉积(LP-MOCVD)设备,采用两步生长及缓冲层热退火处理在InP衬底上制备了高质量的In0.82Ga0.18As外延材料.研究了缓冲层退火前后In0.82Ga0.18As外延材料的低温电学性质,通过变温霍尔效应测试得到了载流子的浓度和迁移率随温度变化的关系,并利用位错散射、极化光学声子散射等对实验数据进行了拟合.结果表明,实验值与理论值符合较好,在较低温度下(150K),位错散射起主要作用,而在较高的温度下(250K),极化光学声子散射占主要地位. 相似文献
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用脉冲激光沉积法制备了非金属Te掺杂的钙钛矿锰氧化物La0.82Te0.18MnO3单晶薄膜.该薄膜从83 K升温至373 K过程中发生金属-绝缘体相变,转变点温度为283 K.其电阻率在T<TMI时符合电子-电子、电子-磁振子散射公式;在T>TMI时为小极化子输运.薄膜在低温段连续激光(波长为532 nm,40 mW)作用下电阻率显著增大,电阻变化率在253 K达到最大值51.1%,该变化率远大于相同条件下的空穴掺杂材料;在高温段产生了较小的光电导,电阻变化率小于10%.这些现象主要与激光激励下自旋系统和小极化子的变化有关.La0.82Te0.18MnO3薄膜在激光诱导下具有明显的与自旋相关的弛豫现象.激光开始作用时薄膜电阻率随时间的变化符合指数关系.
关键词:
0.82Te0.18MnO3薄膜')" href="#">La0.82Te0.18MnO3薄膜
光诱导
输运特性
电子掺杂 相似文献
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利用脉冲激光沉积的方法制备掺铒 Si/Al2O3多层结构薄膜,获得了由纳米结构的Si作为感光剂增强的Er3+在1.54 μm高效发光.利用拉曼散射、高分辨透射电镜和光致发光测量研究了在不同退火温度下(600—1000 ℃)纳米结构Si层的结晶形态变化,及对Er3+在1.54 μm的发光的影响特征.研究发现最佳发光是在退火温度600—700 ℃.在这个条件下纳米Si的尺寸和密度,Si和Er的作用距离以及Er3+
关键词:
铒
纳米硅
能量转移
氧化铝 相似文献
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设计并镀制了193nm Al2O3/MgF2反射膜,对它们在空气中分别进行了250—400℃的高温退火,测量了样品的透射率光谱曲线和绝对反射率光谱曲线.发现样品在高反射区的总的光学损耗随退火温度的升高而下降,而后趋于饱和.采用总积分散射的方法对样品在不同退火温度下的散射损耗进行了分析,发现随着退火温度的升高散射损耗有所增加.因此,总的光学损耗的下降是由于吸收损耗而不是散射损耗起主导作用.对Al2O3材料的单层膜进行了同等条件的退火处理,由它们光学性能的变化推导出它们的折射率和消光系数的变化,从而解释了相应的多层膜光学性能变化的原因.反射膜的反射率在优化联系、镀膜工艺与退火工艺的基础上达98%以上.
关键词:
193nm 反射膜
退火
光学损耗
吸收 相似文献
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Xia Liu Hang Song Hong Jiang Lianzhen Cao Xiaojuan Sun Yiren Chen 《Solid State Communications》2011,151(12):904-907
InAs0.6P0.4 epilayers grown on InP (100) substrates using two-step growth method by LP-MOCVD were investigated. A low temperature (450 °C) In0.18Ga0.82As buffer layer was introduced to relax the lattice mismatch between the InAs0.6P0.4 epilayer and the InP substrate. The influence of In0.18Ga0.82As buffer layer thickness and epilayer’s growth temperature on crystalline quality of InAs0.6P0.4 epilayer was characterized by Scanning electron microscopy, X-ray diffraction, Hall measurements, Transmission electron microscopy and Photoluminescence. The experimental results showed that the crystalline quality of InAs0.6P0.4 epilayers could be greatly improved by optimizing the In0.82Ga0.18As buffer layer thicknesses and the InAs0.6P0.4 epilayer’s growth temperatures. It was found that, when In0.82Ga0.18As buffer layer thickness was 100 nm and InAs0.6P0.4 epilayer’s growth temperature was 580 °C, the InAs0.6P0.4 epilayer exhibited the best crystalline quality and properties. 相似文献
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Xia Liu Hang Song Guoqing MiaoHong Jiang Lianzhen Cao Dabing LiXiaojuan Sun Yiren Chen 《Applied Surface Science》2011,257(6):1996-1999
In0.82Ga0.18As epilayers were grown on InP substrates using a two-step growth technique by LP-MOCVD. A homogeneous low-temperature (450 °C) In0.82Ga0.18As buffer layer was introduced to improve the crystalline quality of epilayers. The influence of low-temperature buffer layer deposition condition, such as thermal annealing duration, on the crystalline quality of the In0.82Ga0.18As epilayer was investigated. Double-crystal X-ray diffraction measurement, Hall measurement, and Raman scattering spectrum were used to evaluate the In0.82Ga0.18As epilayers. Atomic force microscope was used to study the surface morphology. It is found that the In0.82Ga0.18As epilayer, with buffer layer thermal annealing for 5 min, exhibits the best crystalline quality. The change of the surface morphology of the buffer layer after thermal annealing treatment was suggested to explain the phenomenon. 相似文献
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《中国物理 B》2018,(12)
We compare the effect of InGaAs/GaAs strained-layer superlattice(SLS) with that of GaAs thick buffer layer(TBL)serving as a dislocation filter layer. The InGaAs/GaAs SLS is found to be more effective than GaAs TBL in blocking the propagation of threading dislocations, which are generated at the interface between the GaAs buffer layer and the Si substrate. Through testing and analysis, we conclude that the weaker photoluminescence for quantum dots(QDs) on Si substrate is caused by the quality of capping In_(0.15)Ga_(0.85)As and upper GaAs. We also find that the periodic misfits at the interface are related to the initial stress release of GaAs islands, which guarantees that the upper layers are stress-free. 相似文献
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本文用光致发光(PL)研究了MOCVD(金属氧化物化学气相沉积)生长的有序Ga0.5In0.5P外延层的光学性质.发现有序程度较强的Ga0.5In0.5样品的PL谱中一峰的能量随温度升高,先增大而后又减小.根据已有的报道和本文的实验结果,提出了一个有序Ga0.5In0.5P的模型,模型中将有序Ga0.5In0.5P看作阶宽随机分布的Ⅱ型多量子阱结构,能带边之下存在带尾态,并用该模型对实验结果进行了较好的解释. 相似文献
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利用微区Raman散射技术研究了MOCVD-GaxIn1-xAsyP1-y/InPDBRs结构的晶格振动。在InP衬底上生长的与InP晶格匹配的四元合金Ga0.4In0.6As0.85P0.15中包含三种主要的振动模式,分别归属于类InAs、类GaAs和类GaInP。随着Ga0.4In0.6As0.85P0.15与InP交替生长构成的DBRs结构周期数增加,Raman散射谱中三种振动模式的谱线线型发生明显变化,类InAs振动强度不变,谱线窄化,峰值位置向低频方向移动,类GaAs和类GaInP振动强度逐渐减弱。同时类InAs与类GaAs振动强度比增大。Raman散射研究中声子的限制效应表明多层结构生长过程中界面存在非完整晶态。 相似文献
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Fang–Howard wave function modelling of electron mobility in AlInGaN/AlN/InGaN/GaN double heterostructures
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《中国物理 B》2021,30(9):97201-097201
To study the electron transport properties in InGaN channel-based heterostructures,a revised Fang-Howard wave function is proposed by combining the effect of GaN back barrier.Various scattering mechanisms,such as dislocation impurity(DIS) scattering,polar optical phonon(POP) scattering,piezoelectric field(PE) scattering,interface roughness(IFR) scattering,deformation potential(DP) scattering,alloy disorder(ADO) scattering from InGaN channel layer,and temperature-dependent energy bandgaps are considered in the calculation model.A contrast of AlInGaN/AlN/InGaN/GaN double heterostructure(DH) to the theoretical AlInGaN/AlN/InGaN single heterostructure(SH) is made and analyzed with a full range of barrier alloy composition.The effect of channel alloy composition on InGaN channel-based DH with technologically important Al(In,Ga)N barrier is estimated and optimal indium mole fraction is 0.04 for higher mobility in DH with Al_(0.4)In_(0.07)Ga_(0.53)N barrier.Finally,the temperature-dependent two-dimensional electron gas(2 DEG) density and mobility in InGaN channel-based DH with Al_(0.83)In_(0.13)Ga_(0.0)4 N and Al_(0.4)In_(0.07)Ga_(0.53)N barrier are investigated.Our results are expected to conduce to the practical application of InGaN channel-based heterostructures. 相似文献
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Hydrodynamic calculations of the chaotic behaviors in n^+nn^+In0.53Ga0.47As devices biased in terahertz(THz)electric field have been carried out.Their different transport characteristics have been carefully investigated by tuning the n-region parameters and the applied ac radiation.The oscillatory mode is found to transit between synchronization and chaos,as verified by the first return map.The transitions result from the mixture of the dc induced oscillation and the one driven by the ac radiation.Our findings will give further and thorough understanding of electron transport in In0.53Ga0.47As terahertz oscillator,which is a promising solid-state THz source. 相似文献
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设计并模拟计算了延伸波长至2.6 μm的复合盖层材料PIN结构In0.82Ga0.18As红外探测器,即PNN型盖层、PIN结构的In0.82Ga0.18As红外探测器。研究了不同厚度及载流子浓度的PNN盖层对探测器性能的影响。研究结果表明:在In0.82Al0.18As厚度为200 nm且载流子浓度为2E18、InAs0.6P0.4 厚度为50 nm且载流子浓度为2E17、In0.82Ga0.18As厚度为50 nm且载流子浓度为2E16时,探测器表现出最佳的性能。与传统PIN结构探测器相比,其相对光谱响应度仅降低10%,暗电流降低了1个数量级。计算分析了不同工作温度下的暗电流,结果显示:在120~250 K时,暗电流主要为缺陷隧穿电流;在250~300 K时,暗电流主要为带间隧穿电流;当温度大于300 K时,暗电流主要为产生-复合电流和扩散电流。 相似文献