Mixed-gas inductively coupled plasma atomic emission spectrometry using a direct injection high efficiency nebulizer

Experimental studies and computer simulations were conducted to identify plasma operating conditions and to explore and contrast the excitation conditions of Ar, Ar-O2, and Ar-He inductively coupled plasmas (ICPs) for the introduction of microliter volumes of sample solutions with a direct injection high efficiency nebulizer (DIHEN). The best MgII 280.270 nm/MgI 285.213 nm ratio (6.6) measured with Ar ICP atomic emission spectrometry for the DIHEN (RF power = 1500 W; nebulizer gas flow rate = 0.12 L min(-1)) was less than the ratio (8.2) acquired on the same instrument for conventional nebulization (1500 W and 0.6 L min(-1)). Addition of small amounts of O2 or He (5%) to the outer gas flow improved excitation conditions in the ICP, that is, a more robust condition (a MgII/MgI ratio of up to 8.9) could be obtained by using the DIHEN with Ar-O2 and Ar-He mixed-gas plasmas, thereby minimizing some potential spectroscopic and matrix interferences, in comparison to Ar ICPAES.     

Emission spectroscopic studies of Grimm-type glow discharge plasma with argon-helium gas mixtures

The effect of argon/helium pressure ratios on the emission intensity of various Ar II lines is investigated for a Grimm-type glow discharge radiation source, operated with Ar-He mixtures. The relative intensities of the Ar II lines are altered significantly by mixing helium with argon. It is found that the population of the Ar⁺ excited states can be redistributed through He-Ar collisional energy transfer. The energy level of the He singlet metastable state (¹S₀,20.62 eV) is very important for these processes. If the excitation energy of Ar II lines is higher than that of the He singlet metastable, strong quenching of the Ar II line intensity is observed. However, when the excitation energy is slightly lower, some of the Ar II lines are enhanced by adding helium to the argon plasma. Energy exchanges between the Ar⁺ doublet term states and the He singlet metastable are favoured because the total spin remains unchanged before and after the He-Ar collisions. Furthermore, the helium mixing also exerts a great influence on the emission intensities of the elements sputtered from the cathode of the discharge lamp. The enhancement of Al I and Al II emission intensities at suitable Ar-He mixture ratios is discussed for when aluminum is employed as a cathode material.     

Bias-current modulation technique of a radio-frequency glow discharge plasma for atomic emission analysis associated with a fast Fourier transform analyzer

A measuring method using a fast Fourier transform (FFT) analyzer is suggested to estimate the emission intensity from a radio-frequency (RF)-powered glow discharge plasma for atomic emission analysis. The FFT analyzer has an ability to disperse the components by frequency from an overall signal, and thus works as a selective detector in modulation spectroscopy. In the RF glow discharge plasma, a dc bias current can be introduced by connecting an external electric circuit with the discharge lamp, which predominantly enhances the emission intensities. Further, the bias current can be pulsated with a switching device to modulate the emission intensities, and then the modulated component was selectively detected with the FFT analyzer. This method greatly improved the data precision. The emission intensity of the Cu I 324.75-nm line in an Fe-based alloy sample containing 0.043 mass% Cu could be estimated with a relative standard deviation of 0.20%. The 3σ detection limits of Cu in Fe-based alloys could be obtained to be 2.3 × 10^− 6 mass% Cu for Cu I 324.75 nm and 6.8 × 10^− 6 mass% Cu for Cu I 327.40 nm.     

Characterization of laser induced breakdown plasmas used for measurements of arsenic,antimony and selenium hydrides

Studies have been performed to characterize laser induced breakdown spectroscopy (LIBS) plasmas formed in Ar/H₂ gas mixtures that are used for hydride generation (HG) LIBS measurements of arsenic (As), antimony (Sb) and selenium (Se) hydrides. The plasma electron density and plasma excitation temperature have been determined through hydrogen, argon and arsenic emission measurements. The electron density ranges from 4.5 × 10¹⁷ to 8.3 × 10¹⁵ cm^?3 over time delays of 0.2 to 15 μs. The plasma temperatures range from 8800 to 7700 K for Ar and from 8800 to 6500 K for As in the HG LIBS plasmas. Evaluation of the plasma properties leads to the conclusion that partial local thermodynamic equilibrium conditions are present in the HG LIBS plasmas. Comparison measurements in LIBS plasmas formed in Ar gas only indicate that the temperatures are similar in both plasmas. However it is also observed that the electron density is higher in the Ar only plasmas and that the emission intensities of Ar are higher and decay more slowly in the Ar only plasmas. These differences are attributed to the presence of H₂ which has a higher thermal conductivity and provides additional dissociation, excitation and ionization processes in the HG LIBS plasma environment. Based on the observed results, it is anticipated that changes to the HG conditions that change the amount of H₂ in the plasma will have a significant effect on analyte emission in the HG LIBS plasmas that is independent of changes in the HG efficiency. The HG LIBS plasmas have been evaluated for measurements of elements hydrides using a constant set of HG LIBS plasma conditions. Linear responses are observed and limits of detection of 0.7, 0.2 and 0.6 mg/L are reported for As, Sb and Se, respectively.     

Comparison in the analytical performance between krypton and argon glow discharge plasmas as the excitation source for atomic emission spectrometry

The emission characteristics of ionic lines of nickel, cobalt, and vanadium were investigated when argon or krypton was employed as the plasma gas in glow discharge optical emission spectrometry. A dc Grimm-style lamp was employed as the excitation source. Detection limits of the ionic lines in each iron-matrix alloy sample were compared between the krypton and the argon plasmas. Particular intense ionic lines were observed in the emission spectra as a function of the discharge gas (krypton or argon), such as the Co II 258.033 nm for krypton and the Co II 231.707 nm for argon. The explanation for this is that collisions with the plasma gases dominantly populate particular excited levels of cobalt ion, which can receive the internal energy from each gas ion selectively, for example, the 3d⁷4p ³G₅ (6.0201 eV) for krypton and the 3d⁷4p ³G₄ (8.0779 eV) for argon. In the determination of nickel as well as cobalt in iron-matrix samples, more sensitive ionic lines could be found in the krypton plasma rather than the argon plasma. Detection limits in the krypton plasma were 0.0039 mass% Ni for the Ni II 230.299-nm line and 0.002 mass% Co for the Co II 258.033-nm line. However, in the determination of vanadium, the argon plasma had better analytical performance, giving a detection limit of 0.0023 mass% V for the V II 309.310-nm line.     

The application of a double voltage modulation technique to a glow discharge source with a supplementary electrode

The Ar spectral lines are suppressed in glow discharge source atomic emission spectroscopy by a double voltage modulation technique with a supplementary electrode. The voltage is modulated between two levels, typically 350 and 700 V. At the lower voltage level mainly the Ar emission occurs where at the higher voltage level both the Ar and the metal atoms sputtered from the sample contribute to the emission. The power supply of the supplementary electrode is switched on when the glow discharge passes from operation at 700 V to 350 V. The intensity of argon gase lines is regulated by the current applied to the supplementary electrode at that period. Therefore, there is no need for electronical amplification and lower voltage adjustment of two operation modes. This modified DVM technique has been applied to the determination of Si and Cu in Al- samples. The suppression of Ar lines is possible, and the elements can be determined without Ar interferences.     

The application of a double voltage modulation technique to a glow discharge source with a supplementary electrode

The Ar spectral lines are suppressed in glow discharge source atomic emission spectroscopy by a double voltage modulation technique with a supplementary electrode. The voltage is modulated between two levels, typically 350 and 700 V. At the lower voltage level mainly the Ar emission occurs where at the higher voltage level both the Ar and the metal atoms sputtered from the sample contribute to the emission. The power supply of the supplementary electrode is switched on when the glow discharge passes from operation at 700 V to 350 V. The intensity of argon gase lines is regulated by the current applied to the supplementary electrode at that period. Therefore, there is no need for electronical amplification and lower voltage adjustment of two operation modes. This modified DVM technique has been applied to the determination of Si and Cu in Al- samples. The suppression of Ar lines is possible, and the elements can be determined without Ar interferences.     

Determination of Arsenic by Hydride Generation—Laser-Induced Breakdown Spectroscopy: Characterization of Interelement Interferences

In this study, interelement interferences were evaluated for the determination of arsenic in aqueous samples through laser-induced breakdown spectroscopy (LIBS) hyphenated with a hydride generation sample introduction system. Optimum instrumental and chemical parameters were selected and variation in LIBS signal intensity was recorded for As solution in the presence of comparable concentrations of interfering elements. No significant change in the signal intensity of As(I) 228.8?nm line was observed in the presence of alkali/alkali earth metals; however, the presence of hydride-forming elements has shown a noticeable decrease in the line emission strength of arsenic. The least variation in arsenic signal was observed in the presence of Ge, the most volatile of all. However, the signal has decreased to a greater extent in the presence of Sn, Sb, and Pb. The presence of interfering elements on electron temperature and electron number density of arsenic plasma has also been studied. Plasma temperatures calculated using both As and Ar emission lines in the Boltzmann equation were similar, being around 5000?K. The McWhirter criterion for stationary and homogenous plasmas was utilized for the establishment of the local thermodynamic equilibrium under the plasma conditions studied. Applicability of the technique for multielemental analysis of water samples was tested through spiking experiments. Arsenic signal showed 26% decrease in the multielemental mixture solution. LIBS is among a few atomic spectroscopic techniques that facilitate rapid and simultaneous multielemental analysis without extensive sample preparation steps. However, the analytical performance of the technique still requires more serious efforts to compete with other conventional techniques for routine analysis of environmental samples.     

Evaluation of continuous hydride generation combined with helium and argon microwave induced plasmas using a surfatron for atomic emission spectrometric determination of arsenic,antimony and selenium

The direct coupling of continuous hydride generation with both Ar and He microwave induced plasmas (MIP) sustained in a surfatron has been optimized for the simultaneous determination of arsenic, antimony and selenium with atomic emission spectrometry. While a discharge tube of quartz was found suitable for the Ar plasma, the use of an Al₂O₃ tube led to improved performance of the He plasma. The He MIP was found to be less tolerant to the introduction of hydrogen than the Ar MIP, and correspondingly the hydride generation should be operated at a lower flow rate of 0.5% NaBH₄ solution. The introduction of the H₂O vapour produced during hydride generation into both discharges was found to greatly decrease the sensitivities and to degrade the measurement precision. It could be effectively removed with trapping by concentrated H₂SO₄. The detection limits (3σ) for As, Sb and Se are 1, 0.4 and 1 ng ml⁻¹ with the Ar MIP, and 2, 0.3 and 6 ng ml⁻¹ with the He MIP, respectively. The calibration curves are linear over three decades of concentration. The mutual interferences from As(III), Sb(III), Se(IV), Bi(III) and Sn(IV) were found to be negligible at interferent concentrations below 1 μg ml⁻¹ and in most cases the tolerable interferent concentrations are up to 20 μg ml⁻¹. The proposed method has been applied to the determination of As, Sb and Se in tea samples at μg g⁻¹ levels.     

微波辅助消解-原子荧光法测定玻璃中的镉砷铅

光学玻璃中的各种元素对玻璃的光学性能有不同的影响。如加入镉可以提高玻璃折射率;砷的引入能增加玻璃的透光度,含铅玻璃具有低成本、高折射性等优点。但是镉、砷、铅均为有毒元素,玻璃加工和处理过程以及毒废弃物的处理都可能引起水、土壤、大气的污染并给人体带来一定的危害     

Emission and sputtering characteristics of Ne-Ar mixed gas glow discharge plasmas.

The emission characteristics of several Cu lines emitted from a Ne-Ar mixed gas glow discharge plasma were investigated. The addition of small amounts of Ar to a Ne plasma increases the sputtering rate of a Cu sample because Ar ions, which work as the impinging ions for cathode sputtering, are predominantly produced through Penning ionization collisions between Ne metastables and Ar atoms. Ar addition also elevates the number density of electrons in the plasma. These changes occurring in the Ne-Ar mixed gas plasma result in enhanced emission intensities of the Cu lines. The Cu II 270.10-nm and the Cu II 224.70-nm lines yield different intensity dependence on the Ar partial pressure added. This phenomenon is because these Cu II lines are excited principally through different charge transfer processes: collisions with Ne ions for the Cu II 270.10-nm line and collisions with Ar ions for the Cu II 224.70-nm line. The shape of sputtered craters in the Ne-Ar glow discharge plasma was measured. The depth resolution was improved when Ar was added to a Ne plasma because the crater bottoms were flatter with larger Ar partial pressures.     

Furnace atomization plasma emission spectrometry with He/Ar mixed gas plasmas

The influence of plasma gas composition on the operating and analytical characteristics of a furnace atomization plasma emission source (FAPES) is presented. He I and Ar I excitation temperatures increase 30% in the mixed gas plasmas whereas argon ion excitation temperatures decrease from 33 000 K to 26 000 K in the presence of He. Collisional exchange of internal energy between excited states of Ar and He accounts for these changes. Average analyte ionization temperatures (for Cr, Mn, Mg, Co, Fe, Cd and Zn), derived from the relative emission intensities of their ionic and atomic lines in a 40-MHz 50-W plasma, increase from 5270 K to 6740 K with the addition of Ar to He. Ionic line intensities increase from 10-fold (Mn) to 40-fold (Cd, Zn) with addition of Ar to the plasma while atomic line intensities increase only twofold. Limits of detection remain substantially unaltered for atomic transitions due to increased noise but are improved twofold (Cd) to 24-fold (Mn) for ionic transitions. The analytical advantages and disadvantages of mixed gas plasmas are discussed. The Ne I excitation temperature at 40 MHz and 50 W was determined to be 4330±80 K.     

A helium inductively coupled plasma for atomic emission spectrometry

An annular helium inductively coupled plasma (He ICP) was generated at atmospheric pressure. No external cooling was used to stabilize the plasma. Aqueous solution was injected into the plasma without any difficulty. Preliminary results revealed that the annular He ICP was capable of exciting elements such as Cl and Br which possess high excitation energies. Atomic emission detection limits for Cl and Br were improved by factors of 63 and 34, respectively, as compared to the results obtained from the argon inductively coupled plasma. The excitation temperature of the annular He ICP (4180 K) was less than that of an Ar ICP (5570 K).     

Effect of the driving frequency on the emission characteristics of a radio-frequency glow discharge excitation source boosted by the introduction of a d. c. bias current.

In a radio-frequency-powered glow discharge lamp, a d.c. bias current which is driven by a self-bias voltage can lead to an enhancement of the emission intensities excited by the plasma. The driving frequency of the r.f. plasma is an important parameter to determine the self-bias voltage; lower r.f. frequencies induce greater self-bias voltages. The effects of the bias current introduction on the emission characteristics were compared between a 13.56-MHz plasma and a 6.78-MHz plasma. As a result, the 6.78-MHz plasma offered a better analytical performance, probably due to higher self-bias voltages, if the introduced Ar pressure was optimized. This method was applied to a Mo determination in Fe-matrix alloy samples. At bias currents of 40 - 50 mA, the emission intensities of the Mo I 379.82-nm line were about 10-times larger than those obtained with the conventional plasma when the 6.78-MHz plasma was produced at an r.f. power of 60 W. The detection limit obtained for this calibration was 2.0 x 10(-4) mass % Mo at an 80-W r.f. power and at a d.c. bias current of 68 mA.     

Application of hydride generation to the determination of trace concentrations of arsenic by inductively-coupled plasma atomic emission spectrometry

A method is described for the determination of traces of arsenic, based on sodium tetrahydroborate reduction of arsenic and introduction of the arsine formed to a relatively low-powered (1.6 kW) inductively-coupled plasma where the arsenic atomic emission is generated, Inter-element interference effects are described; many can be eliminated by addition of potassium iodide to the sample solutions, but the standard additions method is recommended for accurate arsenic determination. Potassium iodide is also used for prereducing arsenic(V) to arsenic(III). The method has a detection limit of 0.1 ng As ml^-1 and the linear calibration range spans nearly four orders of magnitude. The proposed method is applied to the determination of ng ml^-1 levels of arsenic in waste waters.     

低功率微波等离子体炬原子发射光谱法的研究——超声雾化进样测定金、银、铂、铑、钯

本文提出一种测定贵金属元素的微波等离子体炬原子发射光谱法(MPTAES)。采用自制的超声雾化微量进样装置进样,以氩气为工作气体,探讨了观察高度,微波功率、体系介质、氩气流量和共存元素对被测元素发射信号的影响。选用合适的分析线和MPT光源的工作参数,其方法的检出限分别为5.8(Au)、0.5(Ag)、12(Pt)、1.6(Rh)和t 1.0ng/ml(Pd)。实际样品中金和银的测定结果是令人满意的。     

Optimization of electrochemical hydride generation in a miniaturized electrolytic flow cell coupled to microwave-induced plasma atomic emission spectrometry for the determination of selenium

The optimization of a continuous flow system for electrochemical hydride generation coupled to microwave-induced plasma atomic emission spectrometry (MIP-AES) for the determination of Se is presented. A small electrolytic cell with a porous glassy carbon working electrode was used for hydride generation. When using an Ar MIP operated in a TE101 cavity a detection limit of 0.6 ng mL(-1) (3sigma) could be achieved. The calibration curve was linear up to 1 microgram mL(-1). A standard deviation of less than 2% (10 replicate analyses) could be achieved. It was shown that interferences of transition metals are of the same order of magnitude as with a larger electrolysis cell described earlier, and light elements hardly caused any signal depression as tested. It was possible to distinguish between Se(IV) and Se(VI) species and seleno-DL-methionine, because under optimized conditions of an electrolysis current of 10 mA, a microwave power of 210 W, an Ar flow rate of 15 L h(-1) and a sample flow rate of 2.5 mL min(-1) only Se(IV) was transformed to H2Se and transferred into the plasma. Finally, the possibility of an electrochemical pre-enrichment was shown to enable it to further decrease the detection limit.     

Interferences by transition metals and their elimination by cyanide as a complexing agent in the determination of arsenic using continuous flow HG-ICP-AES

The interfering effects of various foreign ions on the determination of arsenic were studied by hydride generation inductively coupled plasma atomic emission spectrometry (HG-ICP-AES). There were serious inhibiting interferences by Cu, Pb, Co, Au, Pd and Ni. However, by using cyanide as a complexing agent these interferences could be completely eliminated over a wide range of interferent concentration. The optimum chemical parameters for continuous arsine generation were studied. A major advantage of this technique is that it only needs low acid concentrations and produces less hazardous waste. Sensivity, selectivity and accuracy of the determination of arsenic by HG-ICP-AES were investigated. The detection limit (in 1 mol/l HCl medium) for arsenic(III) was 0.82 ng/ml. The relative standard deviation for ten determinations of a solution containing 50 ng/ml arsenic was 1.3%.     

Plasma diagnostic on a low-flow plasma for inductively coupled plasma optical emission spectrometry

In order to elucidate the fundamental properties of a low-flow inductively coupled plasma (ICP) operated under total Ar consumption of 0.6 L min^− 1, excitation temperatures, rotational temperatures, ionization temperatures, electron temperatures, and electron number densities were studied with optical emission based methods. The plasma was operated in the SHIP torch (Static High Sensitivity ICP), which was designed for optical emission spectrometric detection.     

Charge-injection device detection for improved performance in atomic-emission spectroscopy

Studies into the use of simultaneous multiwavelength detection over a broad wavelength region (220-520 nm) demonstrate the power and flexibility offered by a charge-injection device for detection in atomic-emission spectrometry. An echelle monochromator and a charge-injection device utilizing the general electric CID17B array detector are used in conjunction with a direct current plasma source to perform multi-line analysis for Mg, Sr, Fe, Dy, Ho and Yb, increasing the sensitivity and limits of detection. By monitoring the 341-nm OH band and background Ar emission lines, changes in the nebulization and excitation conditions are easily detected. The presence of an organic matrix component not present in the standards is detected by observing the C(I) emission at 247.8 nm. These diagnostic tools can be combined with the use of an internal standard to obtain a reliability not previously available in automated AES instrumentation.