硒化技术对CuInSe2薄膜表面形貌和晶相的影响

以共溅射法制备的Cu-In预制膜为衬底材料,以硒粉为原料,尝试了几种特殊的硒化方案,包括单源硒化法、双源硒化法、表面喷粉硒化法、分步硒化退火和同步硒化退火等5种具有代表性和创新性的方案,研究了硒源的摆放方式、升温方法对薄膜质量的影响,比较了不同方法制备的CuInSe2(CIS)薄膜在形貌、成分、相结构等方面的异同.系统地分析了硒化温度、退火温度和退火时间对CuInSe2薄膜成分的影响,研究了各元素的百分含量随硒化退火条件的变化规律,为更准确地把握CIS薄膜的成分和相结构提供有益的借鉴.     

硒化温度对共溅射法制备的CZTSSe薄膜与电池性能的影响

采用共溅射法结合后硒化成功制备出CZTSSe薄膜,主要研究了不同的硒化温度对CZTSSe薄膜与电池性能的影响。分别采用X射线衍射仪、拉曼光谱仪、扫描电子显微镜、紫外-可见-近红外分光光度计、霍尔效应测量仪及数字电源表对不同硒化温度下制备的CZTSSe薄膜的结构、形貌、光电与太阳电池性能进行了表征与分析。结果表明,当硒化温度为580℃时,CZTSSe薄膜的结晶性最好,薄膜表面均匀致密且其电阻率和载流子浓度达到最小值和最大值,分别为1.57Ω·cm和8.2×10~(17)cm~(-3),该硒化温度下制备得到的CZTSSe太阳电池的短路电流和转换效率最高达到30.68 m A/cm~2和5.17%。相对于550℃和600℃硒化温度下的CZTSSe太阳电池,其光电转换效率分别提高了36%和6%。另外,随着硒化温度的升高,CZTSSe薄膜在XRD中的(112)峰位和Raman中的A1模式振动峰位都向小衍射角和短波数方向移动,薄膜的禁带宽度也从1.26 e V减小至1.21 e V。     

非晶Ni88P12合金薄膜的表面形貌特征与晶化行为的研究

采用化学镀的方法在363K和p型Si（100）衬底上制得非晶Ni₈₈P₁₂合金薄膜．利用X射线衍射、X射线光电子能谱、扫描隧道显微镜和原子力显微镜对非晶合金薄膜及其经处理后形成的氧化态、还原态和晶态的结构、组分和表面的形貌特征作了研究，并对它的晶化行为作了初步探讨．结果表明，非晶合金薄膜是由纳米级微粒聚集成微米级颗粒组成；在低于晶化温度条件下经氧化和还原处理后的薄膜表面晶化；在晶化过程中，合金薄膜的非晶纳米微粒转变为微晶后长大成晶粒，其表面结构光滑平坦，几何边界 关键词：     

不同晶相结构和形貌TiO2负载Ru催化剂的CO选择甲烷化

用水热法得到的钛酸纳米纤维前体,通过不同后处理方法合成了多种纳米结构的TiO₂．采用N₂等温吸附和BET比表面、X射线衍射、透射电镜和能量分散X射线分析表征了TiO₂及负载Ru催化剂的微结构,包括比表面、晶相结构和形貌以及Ru纳米颗粒尺寸分布等．对负载Ru催化剂在富氢条件下CO选择甲烷化反应活性测试表明：金红石相TiO₂和TiO₂-B为载体负载的Ru催化剂比锐钛矿相TiO₂负载的Ru催化剂表现出更高的反应性能．其活性区别说明了不同晶相结构和形貌TiO₂载体与Ru纳米颗粒的相互作用存在差异．     

高温处理对CNx薄膜晶化的影响

利用直流磁控溅射制得非晶态氮化碳膜,然后在高温下、常压Ｎ气氛中进行热处理,利用ＤＴＡ,ＸＲＤ和Ａｕｇｅｒ研究晶化前后氮化碳成分、结构以及键态的变化．实验结果表明：在１１８６℃附近出现了晶化现象,高温晶化处理可以促进无定形氮化碳向晶态转变,在ＸＲＤ图谱上出现α Ｃ３Ｎ４衍射峰．Ａｕｇｅｒ实验结果表明膜中出现富Ｃ,Ｓｉ,Ｎ的区域 关键词：     

电场热处理条件下TiO2薄膜的晶化行为研究

利用溶胶-凝胶法和电场热处理工艺在玻璃表面制备出一层TiO₂薄膜，采用DTA ，Raman光 谱，XRD和AFM等测试手段分析了TiO₂薄膜在电场热处理过程中的晶化行为.然后 在理论上 分析了外电场对TiO₂薄膜热处理过程的影响，提出了通过引入外电场促进TiO2薄膜从无 定形到锐钛矿的相转变的方法.通过甲基橙水溶液的光催化降解实验表明：在520℃电场热处 理条件下的TiO₂薄膜的光催化效率高于未引入电场热处理的TiO₂薄 膜. 关键词： 薄膜 晶化 电场 2')" href="#">TiO₂     

CuInSe2电子结构与光学性质的第一性原理计算

从头计算了CuInSe₂(CIS)体相的性质，参数设定和性质计算都基于密度泛函理论，交换相关能采用GGA，泛函形式为PBE，原子间相互作用的描述采用超软赝势.计算发现CIS中存在共价键，是一种非典型的离子型晶体，在整个晶体内存在共用电子对，Cu原子和Se原子的作用大于Se原子和In原子.CIS是一种典型的直接带隙半导体，计算得到了光学性质的各项参数，包括折射指数和反射率，吸收系数以及介电函数与光子能量的关系，发现CIS的主要光吸收峰有6个，分别为：3.1，7.6，10.0，16.1，19.0，21.0eV，理论上最强吸收峰在紫外光区.     

SiO2的赝晶化及AlN/SiO2纳米多层膜的超硬效应

采用反应磁控溅射法制备了一系列不同SiO₂层厚度的AlN/SiO₂纳米多层膜，利用X射线衍射仪、高分辨透射电子显微镜和微力学探针表征了多层膜的微结构和力学性能，研究了SiO₂层在多层膜中的晶化现象及其对多层膜生长方式及力学性能的影响. 结果表明，由于受AlN六方晶体结构的模板作用，溅射条件下以非晶态存在的SiO₂层在其厚度小于0.6 nm时被强制晶化为与AlN相同的六方结构赝晶体并与AlN形成共格外延生长. 由于不同模量的两调制层存在晶格错配度，多层膜中产生了拉、压交变的应力场，使得多层膜产生硬度升高的超硬效应. SiO₂随层厚的进一步增加又转变为以非晶态生长，多层膜的外延生长结构受到破坏，其硬度也随之降低. 关键词： 2纳米多层膜')" href="#">AlN/SiO₂纳米多层膜 赝晶化 应力场 超硬效应     

H2及H+对CxH1-x薄膜表面状态的影响

系统研究了H2流量和H+原位处理CxH1-x薄膜的时间对CxH1-x薄膜的稳定时间、表面悬挂键密度和表面电子局域化程度的影响,表明CxH1-x薄膜的长时间H+原位处理是减小CxH1-x薄膜表面悬挂键密度的有效途径。     

Mo2C膜表面快速粗糙化现象研究

介绍了Mo₂C膜表面粗糙度的测量结果,引入晶粒边界修正,对Mo₂C 膜的表面快速粗糙化现象给予理论解释. 关键词： 2C膜')" href="#">Mo₂C膜 快速粗糙化 粗糙化指数     

Solvent-free synthesis of oxides for CuInSe2 thin films fabrication

A low-cost non-vacuum process for fabrication of CuInSe₂ (CIS) films by solvent-free mechanochemical method and spin-coating process is described. First, highly monodisperse Cu, In oxides nanoparticles are synthesized via a facile, solvent-free route, which is the first applied in the CIS solar cells. Second, the oxide particulate precursors are deposited in a thin layer by spin-coating technique. Finally, the dry layers are sintered into CIS thin films with composition control by sequential reduction and selenization. Through X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS), it is found that near stoichiometric CIS films with a micron-sized dense grains are obtained in our work. Three types of mixed nitrates are used to fabricate oxides, the influence of the degree of mixing on the CIS films have been investigated.     

rf reactive co-sputtered Au-Ag alloy nanoparticles in SiO2 thin films

We have studied formation of Au-Ag alloy nanoparticles in sputtered SiO₂ thin films. Silica thin films containing Au-Ag nanoparticles were deposited on quartz substrates using rf reactive magnetron co-sputtering technique. The films heat-treated in reducing Ar + H₂ atmosphere at different temperatures. They were analyzed by using UV-vis spectrophotometry, atomic force microscopy and X-ray photoelectron spectroscopy (XPS) methods for their optical, surface morphological as well as structural and chemical properties. The optical absorption of the Au-Ag alloy nanoparticles illustrated one plasmon resonance absorption peak located at 450 nm between the absorption bands of pure Au and Ag nanoparticles at 400 and 520 nm, respectively, for the thin films annealed at 800 °C. XPS results showed that the alloys were in metallic state, and they had a greater tendency to lose electrons as compared to their corresponding monometallic state. Using lateral force microscopy analysis, we have found that the alloy particles were uniformly distributed on the surface with grain size of about 20 nm.     

Strain induced phase separation on La0.5Ca0.5MnO3 thin films

The effect of epitaxial strain on La_0.5Ca_0.5MnO₃ films of various thicknesses grown on SrTiO₃, SrLaAlO₄, and SrLaGaO₄ substrates is studied by Raman spectroscopy, magnetic, and resistivity measurements. The transport and magnetic properties as well as Raman spectra of the films are affected by epitaxial strains. The energy of the A_g(2) mode and the tilting angle of the MnO₆ octahedra is affected by the strain imposed by the substrate. In the spectra of the films deposited on the (1 0 0) SrTiO₃ substrate strong Jahn-Teller (JT) modes appear, which couple with charge-ordering. In all other films these modes are suppressed and no additional Raman lines are present at low temperatures contrary to the bulk compound. The low frequency continuum scattering decreases at low temperatures indicating a coupling with both the charge and orbital transitions. Comparison of the Raman spectra with the magneto-transport properties suggests an interpretation in terms of a strain induced phase separation between ferromagnetic metallic and antiferromagnetic insulating states.     

Influence of Si substrate preparation on surface chemistry and morphology of L-CVD SnO2 thin films studied by XPS and AFM

Results of experimental studies of the influence of substrate preparation on the surface chemistry and surface morphology of the laser-assisted chemical vapour deposition (L-CVD) SnO₂ thin films are presented in this paper. The native Si(1 0 0) substrate cleaned by UHV thermal annealing (TA) as well as thermally oxidized Si(1 0 0) substrate cleaned by ion bombardment (IBA) have been used as the substrates. X-ray photoemission spectroscopy (XPS) has been used for the control of surface chemistry of the substrates as well as of deposited films. Atomic force microscopy (AFM) has been used to control the surface morphology of the L-CVD SnO₂ thin films deposited on differently prepared substrates. Our XPS shows that the L-CVD SnO₂ thin films deposited on thermally oxidized Si(1 0 0) substrate after cleaning with ion bombardment exhibit the same stoichiometry, i.e. ratio [O]/[Sn] = 1.30 as that of the layers deposited on Si(1 0 0) substrate previously cleaned by UHV prolonged heating. AFM shows that L-CVD SnO₂ thin films deposited on thermally oxidized Si(1 0 0) substrate after cleaning with ion bombardment exhibit evidently increasing rough surface topography with respect to roughness, grain size range and maximum grain height as the L-CVD SnO₂ thin films deposited on atomically clean Si substrate at the same surface chemistry (nonstoichiometry) reflect the higher substrate roughness after cleaning with ion bombardment.     

Cu2ZnSnSe4 thin films prepared by selenization of co-electroplated Cu-Zn-Sn precursors

A novel technique for growth of high quality Cu₂ZnSnSe₄ (CZTSe) thin films is reported in our work. The CZTSe thin films were fabricated onto Mo layers by co-electroplating Cu-Zn-Sn precursors followed by annealing in the selenium vapors at the substrate temperature of 550 °C. The morphology and structure of CZTSe thin films were characterized using scanning electron microscopy (SEM), energy dispersive spectrometer (EDS), X-ray diffraction (XRD) and Raman scattering spectrum, respectively. The results revealed that the single phase was in the CZTSe thin films, and the other impurities such as ZnSe and Cu₂SnSe₃ were not existed though they were difficult to distinguish both from EDS and XRD.     

Magnetoelectric properties of Mn-substituted BiFeO3 thin films with a TiO2 barrier

Multiferroic thin films with the general formula TiO₂/BiFe_1−xMn_xO₃ (x=0.00, 0.05, 0.10 and 0.15) (TiO₂/BFMO) were synthesized on Au/Ti/SiO₂/Si substrates using a chemical solution deposition (CSD) method assisted with magnetron sputtering. X-ray diffraction analysis shows the thin films contained perovskite structures with random orientations. Compared with BFMO films, the leakage current density of the TiO₂/BFMO thin films was found to be lower by nearly two orders of magnitude, and the remnant polarizations were increased by nearly ten times. The enhanced ferroelectric properties may be attributed to the lower leakage current caused by the introduction of the TiO₂ layer. The J-E characteristics indicated that the main conduction mechanism for the TiO₂/BFMO thin film was trap-free Ohmic conduction over a wide range of electric fields (0-500 kV/cm). In addition, ferromagnetism was observed in the Mn doped BFO thin films at room temperature. The origin of ferromagnetism is related to the competition between distortion of structure and decrease of grain size and decreasing net magnetic moment in films due to Mn doping.     

A new method to characterizing surface roughness of TiO2 thin films

Titanium dioxide (TiO₂) thin films have been widely coated in the self-cleaning glass for facade application. The benefit of these glasses is its ability to actively decompose organic compounds with the help of ultraviolet light. Understanding the surface roughness of TiO₂ thin films is important before manufacturing of self-cleaning glasses using TiO₂ thin films because surface roughness of TiO₂ thin films has highly significant influence on the photocatalytic performance. Traditional approach for measuring surface roughness of TiO₂ thin films is atomic force microscopy. The disadvantage of this approach include long lead-time and slow measurement speed. To solve this problem, an optical inspection system for rapidly measuring the surface roughness of TiO₂ thin films is developed in this study. It is found that the incident angle of 60° is a good candidate for measuring surface roughness of TiO₂ thin films and y=90.391x+0.5123 is a trend equation for predicting the surface roughness of TiO₂ thin films. Roughness average (Ra) of TiO₂ thin films (y) can be directly determined from the peak power density (x) using the optical inspection system developed. The results were verified by white-light interferometer. The measurement error rate of the optical inspection system developed can be controlled by about 8.8%. The saving in inspection time of the surface roughness of TiO₂ thin films is up to 83%.     

硒化前后电沉积贫铜和富铜的Cu(In1-xGax)Se2薄膜成分及结构的比较

采用电沉积法获得了接近化学计量比的贫铜和富铜的Cu（In_1-xGa_x）Se₂（CIGS）预置层,研究比较了两种预置层及其硒化处理后的成分和结构特性.得到了明确的实验证据证明,硒化后富铜薄膜中的Cu_xSe相会聚集凝结成结晶颗粒分散在表面.研究表明：在固态源硒化处理后,薄膜成分基本不变;当预置层中原子比Cu/（In+Ga）<11时,硒化后薄膜表面存在大量的裂纹;而当Cu/（In+Ga） >12时,可以消除裂纹的产生,形成等轴状小晶粒;富铜预置层硒化时蒸发沉积少量In,Ga和Se后,电池效率已达到68%;而贫铜预置层硒化后直接制备的电池效率大于2%,值得进一步深入研究. 关键词： 1-xGa_x）Se₂薄膜')" href="#">Cu（In_1-xGa_x）Se₂薄膜 电沉积 硒化处理 贫铜或富铜薄膜     

不同Sb含量p-SnO2薄膜的制备和特性

采用化学气相沉积方法, 利用Sb₂O₃/SnO作为源材料, 在蓝宝石衬底上制备出不同Sb掺杂量的SnO₂薄膜, 并在此基础上制作出p-SnO₂:Sb/n-SnO₂同质p-n 结器件. 研究表明, 随着Sb含量的增加, 样品表面变得平滑, 晶粒尺寸逐渐增大, 且晶体质量有所改善, 发现少量Sb的掺入可以起到表面活化剂的作用. Hall测量结果证实适量Sb的掺杂可以使SnO₂呈现p型导电特性, 当Sb₂O₃/SnO的质量比为1:5时, 其电学参数为最佳值. 此外, p-SnO₂:Sb/n-SnO₂同质p-n结器件展现出良好的整流特性, 其正向开启电压为3.4 V.