掺硼p型非晶硅薄膜的制备及光学性能的表征

以高氢稀释的硅烷(SiH₄ )为反应气体,硼烷(B₂H₆)为掺杂气体,利用RF-PECVD方法,在玻璃衬底上制备出掺硼的氢化非晶硅(a-Si:H)薄膜,研究了硼掺杂量对氢化非晶硅(a-Si:H)薄膜的光学性能的影响.利用NKD-7000 W光学薄膜分析系统测试薄膜的透射谱和反射谱,并利用该系统的软件拟合得出薄膜的折射率、消光系数、吸收系数等光学性能参数,利用Tauc法计算掺硼的非晶硅薄膜的光学带隙.实验结果表明,随着硼掺杂量的增加,掺杂非晶硅薄膜样品在同一波长处的折射率先增大后减小,而且每一样品均随着入射光波长的增加而减小,在波长500 nm处的折射率均达到4.3以上;薄膜的消光系数和吸收系数随着硼掺杂量的增大而增大,在500 nm处的吸收系数可高达1.5×10⁵cm^-1.在实验的硼掺杂范围内,光学带隙从1.81 eV变化到1.71 eV.     

Optical band gap and conductivity measurements of polypyrrole-chitosan composite thin films

Electrical conductivity and optical properties of polypyrrole-chitosan（PPy-CHI） conducting polymer composites have been investigated to determine the optical transition characteristics and energy band gap of composite films.The two electrode method and I-V characteristic technique were used to measure the conductivity of the PPy-CHI thin films,and the optical band gap was obtained from their ultraviolet absorption edges.Depending upon experimental parameter,the optical band gap（E_g） was found within 1.30-2.32 eV as estimated from optical absorption data.The band gap of the composite films decreased as the CHI content increased.The room temperature electrical conductivity of PPy-CHI thin films was found in the range of 5.84×10^-7-15.25×10^-7 S·cm^-1 depending on the chitosan content.The thermogravimetry analysis（TGA） showed that the CHI can improve the thermal stability of PPy-CHI composite films.     

Optical properties of thermally evaporated 4-(4-nitrobenzalideneamino) antipyrine Schiff base thin films

4-(4-nitrobenzalideneamino) antipyrine (NBAA) have been synthesized by refluxed ethanolic solution of 4-aminoantipyrine and p-nitrobenzaldehyde for 4 h and characterized with various physico-chemical techniques. Thin films of NBAA have been prepared by the thermal deposition technique in a vacuum of 1.5 × 10⁻⁵ mbar onto optical flat glass substrates. X-ray diffraction patterns show amorphous nature for all NBAA thin films except UV irradiated thin film which shows amorphous nature with some crystallinity but with small amount. The optical constants of thermally deposited NBAA thin film were investigated in the wavelength range 200–2500 nm. The type of optical transition near the edge of the band gap is found to be indirect allowed transition. The effect of UV irradiation as well as the effect of annealing on the optical properties of NBAA thin films was investigated. The value of the energy gap for thin films under investigation is calculated and found to be 1.56 eV for as-deposited, 1.45 eV for annealed and 1.82 eV for UV irradiation.     

Characteristics of SnO2 thin films prepared by SILAR

SnO₂ thin films were deposited on glass substrates by using Successive Ionic Layer Adsorption and Reaction (SILAR) method at room temperature. The film thickness effect on characteristic parameters such as structural, morphological, optical and electrical properties of the films was studied. Also, the films were annealed in oxygen atmosphere (400 °C, 30 min) and characteristic parameters of the films were investigated. The X-ray Diffraction (XRD) and Scanning Electron Microscopy (SEM) studies showed that all the films exhibited polycrystalline nature with tetragonal structure and were covered well on glass substrates. After the investigation of the crystalline and surface properties of the films, it was found that they were improving with increasing film thickness. Optical band gap decreased from 3.90 eV to 3.54 eV and electrical conductivity changed between 0.015–0.815 (Ω-cm)⁻¹ as the film thickness increased from 215 to 490 nm. The refractive index (n), optical static and high frequency dielectric constants (ɛ_o, ɛ_∞) values were calculated by using the optical band gap values as a function of the film thickness.     

衬底温度对用RF-PECVD法制备的非晶硅薄膜光学性能影响

采用射频等离子增强化学气相沉积(RF-PECVD)工艺制备非晶硅(a-Si:H)薄膜, KBr衬底在175-275 ℃范围内变化, 用傅立叶红外光谱仪(FTIR)测试KBr衬底上的薄膜红外光谱峰随衬底温度的变化情况, 结合红外光谱峰的理论分析确定薄膜中氢含量随衬底温度的变化规律. 光谱式椭圆偏振仪中用Forouhi Bloomer (FB)模型拟合得到薄膜的折射率(n), 消光系数(k), 膜厚及光学禁带宽度(Eg), 并用扫描电镜(SEM)断面分析对椭偏仪测试结果的准确性进行验证. 根据Tauc公式推出薄膜的Eg和截止波长, 并和FB模型得到的结果进行了比较, Eg(FB)和Eg(Tauc)的差值在0.015 eV内.     

Synthesis,Ferroelectric and Optical Properties of (Pb,Ca)TiO3 Thin Films by Soft Solution Processing

Calcium modified lead titanate sol was synthesized using a soft solution processing, the so-called polymeric precursor method. In soft chemistry method, soluble precursors such as lead acetate trihydrate, calcium carbonate and titanium isopropoxide, as starting materials, were mixed in aqueous solution. Pb_0.7Ca_0.3TiO₃ thin films were deposited on platinum-coated silicon and quartz substrates by means of the spinning technique. The surface morphology and crystal structure, dielectric and optical properties of the thin films were investigated. The electrical measurements were conducted on metal-ferroelectric-metal (MFM) capacitors. The typical measured small signal dielectric constant and dissipation factor at a frequency of 100 kHz were 299 and 0.065, respectively, for a thin film with 230 nm thickness annealed at 600°C for 2 h. The remanent polarization (2P_r) and coercive field (E _c) were 32 C/cm² and 100 kV/cm, respectively. Transmission spectra were recorded and from them, refractive index, extinction coefficient, and band gap energy were calculated. Thin films exhibited good optical transmissivity, and had optical direct transitions. The present study confirms the validity of the DiDomenico model for the interband transition, with a single electronic oscillator at 6.858 eV. The optical dispersion behavior of PCT thin film was found to fit well the Sellmeir dispersion equation. The band gap energy of the thin film, annealed at 600°C, was 3.56 eV. The results confirmed that soft solution processing provides an inexpensive and environmentally friendly route for the preparation of PCT thin films.     

Nanoscale measurements of conducting domains and current-voltage characteristics of chemically deposited polyaniline films

Spatial variations in electric conductivity and evolutions of band structures of polyaniline (PANI) films have been studied by use of a so-called current-sensing atomic force microscope (CS-AFM) or atomic force microscope current image tunneling spectroscopy (AFM-CITS). PANI films were deposited chemically onto indium-tin oxide- (ITO-) glass substrates, and their thickness and doping levels were controlled by polymerization and acid-doping conditions. The conducting uniformity of the PANI films depends on their doping level and thickness. Conducting domains were observed in fully doped PANI film, even when the bias voltage was reduced to as small as 30 mV. High current flowing regions gradually disappeared when conducting PANI films were partially dedoped. The point-contact current-voltage (I-V) characteristics of conducting tip-polymer/ITO systems were investigated on PANI films with different thickness and degree of doping. Various types of I-V curves representing metallic, semiconducting, and insulating states were obtained depending on the aggregation of polymer chains and doping level of the polymer film. The band gap energies (estimated from the I-V or dI/dV-V curves) of emeraldine base (EB) (undoped polyaniline) films are all higher than 3.8 eV, and a wide distribution of the band gap energies (0-1.1 eV and 0.75-1.8 eV for fully and partially doped PANI thin films, respectively) was found in a single polymer film.     

Synthesis and characterization of chemically grown electrochromic tungsten oxide

Tungsten oxide thin films, which are cathodic coloration materials that are used in electrochromic devices, were prepared by a chemical growth method and their electrochromic properties were investigated. The thin films of WO₃ were deposited onto electrically conducting substrates: fluorine doped tin oxide coated glass (FTO) with sheet resistance of about 10 Ω/cm. Transparent, uniform and strongly adherent thin film samples of WO₃ were studied for their structural, morphological, optical and electrochromic properties. The XRD data confirmed the monoclinic crystal structure of WO₃ thin films. The direct band gap Eg for the films was found to be 2.95 eV which is good for electrochromic device application. The electrochromism of WO₃ thin film was evaluated in 0.5 M LiClO₄/propylene carbonate for Li⁺ intercalation. Electrochromic properties of WO₃ thin films were studied with the help of Cyclic Voltammetry (CV), Chronoamperometry (CA) and Chronocoulometry (CC) techniques.     

Band gap tailoring of chemically synthesized lead sulfide thin films by in situ Sn doping

In the present report, undoped and tin (Sn)‐doped lead sulfide thin films were synthesized via chemical bath deposition method. The effects of Sn molar concentration on the optical, structural, and morphological properties were systematically studied. The concentration of Sn in the chemical bath was characterized by the ratio of [Sn⁺²]/[Pb⁺²] and varied from 0 to 15 at.%. Both doped and undoped thin films were polycrystalline in nature with a face‐centered cubic crystal structure; however, the preferred orientations of the crystallites were varied along the (111) and (200) planes with Sn‐doping concentration. The X‐ray powder diffraction results also showed that peak intensities and the crystalline size were decreased with increasing Sn concentration. The lattice constant varied with Sn concentration and found in the range of 6.020 to 5.944 Å. The variation of Sn concentration in PbS:Sn thin films were confirmed by energy dispersive X‐ray analyses study. The scanning electron microscope and atomic force microscopy studies revealed that Sn doping had a critical role on the surface roughness and morphology of the PbS:Sn thin films. The optical band gap study showed that the band gap of PbS:Sn thin films were engineered from 0.676 to 1.345 eV because of incorporation of Sn⁺² ions via cost‐effective chemical route. Room temperature photoluminescence spectra showed a well‐defined peak at 427 nm and shoulders at 405 and 462 nm for all Sn‐doped and undoped PbS samples.     

The optical properties of a novel metal-free phthalocyanine

In the present work, 4-(4′-dodecyloxycarbonyl) phenoxy phthalonitrile was synthesized and then this phthalonitrile derivative was cyclotetramerized in dodecanol resulting a new metal-free phthalocyanine. The optical properties of this phthalocyanine were investigated. Novel metal-free phthalocyanine thin films were deposited on indium tin oxide-coated glass substrates by spinning method. Surface and microstructural properties of the films were characterized by atomic force microscopy and scanning electron microscopy. Both the transmittance and reflectance spectra of the deposited films were recorded using an NKD analyser. The optical band gap energy, the thickness of thin films, refractive index (n) and extinction coefficient (k) were calculated as 2.7 eV, 300 nm, 1.47 and 0.02, respectively.     

A study on solution deposited CuSCN thin films: Structural,electrochemical, optical properties

A cost-effective successive ionic layer adsorption and reaction (SILAR) method was used to deposit copper (I) thiocyanate (CuSCN) thin films on glass and steel substrates for this study. The deposited thin films were characterized for their structural, morphological, optical and electrochemical properties using X-ray diffraction (XRD), scanning electron microscopy (SEM), UV–visible spectroscopy and VersaSTAT potentiostat. A direct band gap of 3.88 eV and 3.6 eV with film thickness of 0.7 μm and 0.9 μm was obtained at 20 and 30 deposition cycles respectively. The band gap, microstrain, dislocation density and crystal size were observed to be thickness dependent. The specific capacitance of the CuSCN thin film electrode at 20 mV/s was 760 F g⁻¹ for deposition 20 cycles and 729 F g⁻¹ for deposition 30 cycles.     

Enhanced Property of Thin Cuprous Oxide Film Prepared through Green Synthetic Route

Thin cuprous oxide films have been prepared by chemical vapor deposition (pulsed spray evaporation-chemical vapor deposition) method without post-treatment. The synthesis ofcuprous oxide was produced by applying a water strategy effect. Then, the effect of water on the morphology, topology, structure, optical properties and surface composition of the obtained films has been comprehensively investigated. The results reveal that a pure phase of Cu₂O was obtained. The introduction of a small quantity of water in the liquid feedstock lowers the band gap energy from 2.16 eV to 2.04 eV. This finding was mainly related to the decrease of crystallite size due to the effect of water. The topology analyses, by using atomic force microscope, also revealed that surface roughness decreases with water addition, namely more uniform covered surface. Moreover, theoretical calculations based on density functional theory method were performed to understand the adsorption and reaction behaviors of water and ethanol on the Cu₂O thin film surface. Formation mechanism of the Cu₂O thin film was also suggested and discussed.     

Structural and optical properties of ZnO thin films by the spin coating Sol-Gel method

ZnO thin films were deposited onto glass subsrates by a Sol-gel spin coating method. The structural and optical properties of ZnO thin films were investigated. The molar ratios of the zinc acetate dihydrate to Monoethanolamine were maintained 1:1. The as-grown film was sintered 250 °C for 10 min, then annealed in air at 500 °C for 30 min. The XRD results indicate that ZnO films were strongly oriented to the c-axis of the hexagonal nature. Absorption measurements were carried out as a function of temperature with 10 K steps in the range 10–320 K. The band gap energy was measured 3.275 and 3.267 eV for 0.5 and 1.0 molarity (M) ZnO thin films at 300 K. The steepness parameters were observed between 10 and 320 K and their extrapolations converged at (E₀, α₀) = 3.65 eV, 172,819 cm⁻¹ and 3.70 eV, 653,436 cm⁻¹ for 0.5 and 1.0 M ZnO thin films, respectively.     

CdS thin film: Synthesis and characterization

CdS thin films have been deposited by dip technique using succinic acid as a complexing agent. The structural characterizations of films have been studied by X-ray diffraction. X-ray diffraction pattern prove crystallinity of the deposited films that crystallize in the cubic phase of CdS. The films show high absorption and band gap value which were found to be 2.58 eV. The specific conductivity of the film was found to be in the order of 10^?7 (Ω cm)^?1.     

Triton-X mediated interconnected nanowalls network of cadmium sulfide thin films via chemical bath deposition and their photoelectrochemical performance

Thin films of cadmium sulfide (CdS) have been wet chemically deposited onto fluorine-doped tin oxide (FTO) coated conducting glass substrates by using non-ionic surfactant; Triton-X 100. An aqueous solution contains cadmium sulphate as a cadmium and thiourea as sulphur precursor. Ammonia used as a complexing agent. The results of measurements of the x-ray diffraction, Raman spectroscopy, optical spectroscopy, energy dispersive spectroscopy, scanning electron microscopy, Brunauer Emmett Teller (BET) surface areas and atomic force microscopy were used for the characterization of the films. These results revealed that the films are polycrystalline, consisting of CdS cubic phase. The films show a direct band gap with energy 2.39 eV. The films show interconnected nanowalls like morphology with well-defined surface area. Finally, the photoelectrochemical (PEC) performance of Triton-X mediated CdS thin film samples were studied. The sample shows photoelectrochemical (PEC) performance with maximum short circuit current density (J_sc) 1.71 mA/cm² for larger area (1 cm²) solar cells.     

Microwave assisted novel MoBi2S5 nanoflowers: Synthesis,characterization, photoelectrochemical performance

In the present article, we have studied the effect of post annealing treatment on microstructural, optical and photoelectrochemical (PEC) properties of MoBi₂S₅ thin films synthesized by microwave assisted technique. The synthesized thin films are vacuum annealed for 4 h at 473 K temperature. The X-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDS), scanning electron microscopy (SEM) and UV–Vis–NIR spectrophotometer techniques were used for characterization of the as deposited and annealed MoBi₂S₅ thin films. The XRD patterns confirm the synthesized and annealed thin films have nanocrystalline nature with rhombohedral-orthorhombic crystal structure. SEM micrographs indicate that, nanoflowers exhibit sharper end after annealing. The optical absorption study illustrates that the optical band gap energy has been decrease from 2.0 eV to 1.75 eV with annealing. Finally, applicability of synthesized thin films has been checked for PEC property. The J-V curves revealed that synthesized thin film photoanodes are suitable for PEC cell application. As well, used simple, economical method has great potential for synthesis of various thin film materials.     

Chemical deposition of semiconducting cadmium selenide quantum dots in thin film form and investigation of their optical and electrical properties

Cadmium selenide quantum dots with cubic crystal structure are chemically deposited in thin film form using selenosulfate as a precursor for selenide ions and ammonia buffer with double role: as a ligand and as a pH value controller. The optical band gap energies of as-deposited and thermally treated cadmium selenide thin films, calculated within the framework of parabolic approximation for the dispersion relation, on the basis of equations which arise from the Fermi's golden rule for electronic transitions from valence to conduction band, are 2.08 and 1.77 eV, correspondingly. The blue shift of band gap energy of 0.34 eV for as-deposited thin films with respect to the bulk value is due to the quantum size effects (i.e., nanocrystals behave as quantum dots) and this finding is in agreement with the theoretical predictions. During the thermal treatment the nanocrystals are sintered, the increase of crystal size being in correlation with the decrease of band gap energy. The annealed thin films are practically non-quantized. From the resistance-temperature measurements, on the basis of the dependence of ln(R/Ω) vs 1/T in the region of intrinsic conduction, the thermal band gap energy (at 0 K) of 1.85 eV was calculated.     

Electrical,optical, and structural characterization of p‐type N‐doped SnO thin films prepared by thermal oxidation of sputtered SnNx thin films

We present a study of electrical and optical properties of nitrogen‐doped tin oxide thin films deposited on glass by the DC Magnetron Sputtering method. The deposition conditions to obtain p‐type thin films were a relative partial pressure between 7% and 11% (N₂ and/or O₂), a total working pressure of 1.8 mTorr and a plasma power of 30 W. The deposited thin films were oxidized after annealing at 250°C for 30 minutes. X‐ray diffraction results showed that the as‐deposited thin films exhibit a Sn tetragonal structure, and after annealing, they showed SnO tetragonal structure. X‐ray photoelectron spectroscopy results showed the presence of nitrogen in the samples before and after annealing. The measured physical parameters of the thin films were optical band gap between 1.92 and 2.68 eV, resistivity between 0.52 and 5.46 Ωcm, a concentration of p‐type carriers between 10¹⁸ and 10¹⁹ cm^?3, and a Hall mobility between 0.1 and 1.94 cm²V^?1s^?1. These thin films were used to fabricate p‐type thin film transistors.     

Wide Band Gap Transparent Polymer-Inorganic Composite Thin Films by Dip-Coating Method: Preparation and Characterizations

Wide band gap transparent polymer-inorganic (PVA-ZnO) composite thin films were prepared by the dip-coating method. Functional groups and metal oxide vibrations were found from Fourier transform-infrared spectroscopy. The elements Zn and O were confirmed from energy dispersive X-ray spectroscopy. The X-ray diffraction patterns revealed that the sharp diffraction peaks correspond to the hexagonal wurtzite structure of ZnO in the PVA matrix. Scanning electron microscopy images showed that the ZnO nanoparticles are randomly distributed throughout the entire film surface. The optical study reveals that the transmittance was more than 85% with very low absorption and wide band gap energy (4.03 to 3.95 eV). The obtained results indicate that the high transmittance, very low absorption, and wide band gap energy of the prepared dip-coated composite thin films make them suitable for use in transparent optoelectronic device applications in the near future.     

Structural and optical properties of TiO2 thin films prepared by spin coating

Transparent semiconducting thin films of titanium oxide (TiO₂) were deposited on glass substrates by the sol–gel method and spin-coating technique. The physical properties of the prepared films were studied as a function of the number of spun-cast layers. The microstructure and surface morphology of the TiO₂ films were characterized by X-ray diffraction (XRD) and atomic force microscopy (AFM), with respect to the film thickness. The XRD analysis reveals that the films are polycrystalline with an anatase crystal structure and a preferred grain orientation in the (101) direction. The morphological properties were investigated by AFM, which shows a porous morphology structure for the films. The optical properties of the films were characterized by UV–Visible spectrophotometry, which shows that the films are highly transparent in the visible region and their transparency is slightly influenced by the film thickness, with an average value above 80 %. The dependence of the refractive index (n), extinction coefficient (k), and absorption coefficient (α) of the films on the wavelength was investigated. A shift in the optical band gap energy of the films from 3.75 to 3.54 eV, as a function of the film thickness, has been observed.