酸碱性对雾化施液CMP氧化锆陶瓷的影响

采用精细雾化施液CMP这一抛光工艺对氧化锆陶瓷进行抛光,实验研究了抛光液中具有代表性的酸碱调节剂对抛光氧化锆陶瓷材料去除率、表面形貌和表面粗糙度的影响及酸碱性对精细雾化施液分散稳定性的影响.结果表明:针对精细雾化液抛光工艺配制的二氧化硅抛光液在碱性环境中分散稳定性更好,虽然酸性抛光液对材料去除率更高,但酸对氧化锆陶瓷表面腐蚀性过大,不宜抛光氧化锆陶瓷;有机碱作为调节剂抛光后的表面质量明显优于无机碱及无机酸、有机酸;乙二胺配置的碱性抛光液精细雾化后抛光氧化锆陶瓷可获得优质超光滑低损伤表面及较高加工效率,表面粗糙度Rq为1.67 nm,材料去除率达182.23 nm/min.     

LBO晶体超光滑表面抛光机理

胶体SiO2抛光LBO晶体获得无损伤的超光滑表面,结合前人对抛光机理的认识,探讨了超光滑表面抛光的材料去除机理,分析了化学机械抛光中的原子级材料去除机理.在此基础上,对胶体SiO2抛光LBO晶体表面材料去除机理和超光滑表面的形成进行了详细的描述,研究抛光液的pH值与材料去除率和表面粗糙度的关系.LBO晶体超光滑表面抛光的材料去除机理是抛光液与晶体表面的活泼原子层发生化学反应形成过渡的软质层,软质层在磨料和抛光盘的作用下很容易被无损伤的去除.酸性条件下,随抛光液pH值的减小抛光材料的去除率增大;抛光液pH值为4时,获得最好的表面粗糙度.     

抛光加工参数对KDP晶体材料去除和表面质量的影响

针对软脆易潮解KDP功能晶体材料的加工难点,提出了一种基于潮解原理的无磨料化学机械抛光新方法,研制了一种非水基无磨料抛光液,该抛光液结构为油包水型微乳液.通过控制抛光液中的含水量可以方便地控制KDP晶体静态蚀刻率和抛光过程中材料的去除率.实验中还研究了不同加工参数对晶体材料去除率和已加工表面质量的影响.该抛光液的设计为易潮解晶体的超精密抛光加工提供了一条新的技术途径.     

雾化施液同质硬脆晶体互抛CMP工艺研究

探究了雾化施液同质硬脆晶体互抛CMP工艺抛光单晶硅片的可行性,分析其材料去除机理.试验采用传统的化学机械抛光CMP和雾化施液同质硬脆晶体互抛CMP,使用三种含有不同成分的抛光液对硅片进行抛光,对抛光前后的硅片进行称重比较两种工艺方法的材料去除率;通过扫面探针显微镜观察硅片的表面形貌,对其表面粗糙度进行分析.使用雾化施液同质硬脆晶体互抛CMP工艺对硅片进行抛光时,硅片表面材料去除率随着抛光压力的增大而增大,抛光压力为9 psi时达到最大为711 nm/min,高于传统化学机械抛光的630 nm/min;对两种工艺抛光后的硅片进行扫描分析得出雾化施液化学机械抛光工艺抛光后的硅片表面粗糙度为3.8 nm,低于传统化学机械抛光工艺的6.8 nm.雾化施液同质硬脆晶体互抛CMP工艺抛光硅片是可行的,优于传统化学机械抛光工艺,具有材料去除率高、抛光效果好、节约成本以及绿色环保的优点.     

碲锌镉晶体高效低损伤CMP工艺研究

本文采用新型的自行研制的化学机械抛光液,对碲锌镉晶体进行了化学机械抛光方法的尝试性试验,并分析了在化学机械抛光(CMP)过程中抛光垫的硬度、磨料的种类、氧化剂、抛光液的pH值对表面质量和材料去除率的影响,提出适合软脆功能晶体碲锌镉的高效低损伤抛光工艺.结果表明,采用自行研制的带有硝酸的化学机械抛光液,在pH优化值为2.5时,15 min即可获得Ra为0.67 nm的超光滑无损伤表面,大大提高了加工效率和精度.     

影响化学机械抛光4H导电SiC晶片表面质量的关键参数研究

选用二氧化硅抛光液抛光4H导电SiC晶片表面,探究影响SiC晶片表面质量的关键参数,获得更高的去除效率和表面质量.实验结果表明,SiC表面的氧化是氢氧根离子和双氧水共同作用的结果.保持压力不变并增加氢氧根离子或双氧水的含量,SiC表面去除速率先增加后保持不变.在更大的压力下增加氢氧根离子的含量,SiC表面的抛光去除速率进一步增加.通过优化的抛光参数,SiC表面的抛光去除速率达到142 nm/h.进一步研究结果表明,保持化学机械抛光过程中氧化作用与机械作用相匹配,是获得高抛光效率和良好的表面质量的关键.表面缺陷检测仪(Candela)和原子力显微镜(AFM)的测试结果表明,SiC抛光片表面无划痕,粗糙度达到0.06 nm.外延后总缺陷密度小于1个/cm2,粗糙度达到0.16 nm.     

不同磨料对蓝宝石晶片化学机械抛光的影响研究

本文制备了几种含不同磨料(SiC、Al2O3不同粒径SiO2)的抛光液,通过纳米粒度仪分析磨料粒径分布,采用原子力显微镜观察磨料的粒径大小.研究了不同磨料对蓝宝石晶片化学机械抛光(CMP)的影响,利用原子力显微镜检测抛光前后蓝宝石晶片表面粗糙度.实验结果表明,在相同的条件下,采用SiC、Al2O3作为磨料时,材料去除速率与表面粗糙度均不理想;而采用含1;粒径为110 nm SiO2的抛光液,材料的去除速率最高为41.6 nm/min,表面粗糙度Ra=2.3 nm;采用含1;粒径为80 nm SiO2的抛光液,材料的去除速率为36.5 nm/min,表面粗糙度最低Ra=1.2 nm.     

离子束作用下KDP晶体表面粗糙度研究

为了避免传统加工过程对KDP( Potassium dihydrogen phosphate)晶体表面产生损伤、嵌入杂质等降低晶体抗激光损伤阈值的不利因素,文章探索采用离子束抛光技术实现KDP晶体的加工.本文主要分析了离子束抛光作用下KDP晶体表面粗糙度的演变过程,采用垂直入射和倾斜45°入射两种方式研究KDP晶体表面粗糙度,利用倾斜45°入射的加工方式提高了KDP晶体的表面质量,其表面均方根粗糙度值由初始的3.07 nm减小到了1.95 nm,实验结果验证了离子束抛光加工KDP晶体的可行性.     

硬盘微晶玻璃基板化学机械抛光研究

利用自制的抛光液对硬盘微晶玻璃基板进行化学机械抛光.研究了抛光压力、SiO2浓度、pH和氧化剂过硫酸铵浓度等因素对材料去除速率MRR和表面粗糙度Ra的影响,系统分析了微晶玻璃抛光工艺过程中的影响因素,优化抛光工艺条件,利用原子力显微镜检测抛光后微晶玻璃的表面粗糙度.结果表明:当抛光盘转速为100 r/min、抛光液流量为25 mL/min、抛光压力为9.4 kPa、SiO2浓度为8wt;、pH=8、过硫酸铵浓度为2wt;时,能够得到较高的去除速率(MRR=86.2 nm/min)和较低表面粗糙度(Ra=0.1 nm).     

微纳水溶解抛光工艺参数对KDP晶体面粗糙度影响的试验研究

微纳水溶解抛光与计算机控制光学表面成形(CCOS)小工具抛光技术相结合,是针对大尺寸易溶于水的KDP晶体元件的一种有效加工方法.本文针对小工具抛光中行星运动方式及水溶解抛光工艺特点,为揭示各抛光工艺参数对KDP晶体表面粗糙度的影响规律,对晶体进行均匀抛光,并以抛光头转速比和转速、自转和公转方向、抛光载荷、抛光头直径、抛光液含水量为参变量,得到了最优抛光参数:抛光头公转自转反向,转速100r/min;抛光液含水量7.5;(质量分数);使用较大尺寸抛光头(工件尺寸的十分之一至五分之一).     

A review of measurement of thermophysical properties of silicon melt

Measurements of thermophysical properties of Si melt and supplementary study of X-ray scattering/diffraction by the authors' group were reviewed. The values obtained differed variously from those of literature. Density was 2–3% larger, surface tension 20–30% smaller, viscosity up to 40% larger, electrical conductivity 8% smaller, spectral emissivity more or less in good agreement with literature values, and thermal diffusivity a few percent larger. An anomalous density jump was found near the melting point. Surface tension and viscosity also showed anomaly. A strange time-dependent change of density was observed over 3 h after melting. X-ray analyses suggested a slight change in local atom ordering, but showed no sign of cluster formation. An addition of 0.1 at% gallium caused the density jump to disappear, while that of boron caused no change. An EXAFS study of the former melt indicated a strong interaction between Ga and Si atoms as if molecules of GaSi₃ existed. The implications of the measured properties are a possibility of soft-turbulence in an Si melt in a relatively large crucible, a more complicated manner of intake of oxygen depleted molten Si from the free surface region to underneath the growing crystal, and a relaxation of the melt after melting arising from trapped gas species.     

Effect of alumina on enthalpy of mixing of mixed alkali silicate glasses

The enthalpy of mixing of mixed alkali (Na₂O and K₂O) silicate glasses containing various concentrations of alumina was determined using an ion-exchange equilibrium method. For glasses with a constant alkali concentration, the enthalpy of mixing was found to become less negative with alumina addition. Consistent with our previous results on the enthalpy of mixing of alumina-free mixed alkali silicate glasses, the magnitude of enthalpy of mixing exhibited a good correlation with the molar volume mismatch of the corresponding two single alkali glasses as well as with the extent of conductivity mixed alkali effect, e.g. excess activation energy of conductivity, ΔE. The reduction of the magnitude of the enthalpy of mixing with alumina addition can be attributed to the reduction of non-bridging oxygen and ionic field strength. Combining the present results with results obtained earlier, the magnitude of the enthalpy of mixing for all mixed alkali (Na₂O and K₂O) silicate glasses with and without alumina was expressed by a simple function of a modified Tobolsky parameter, which takes into account the alkali concentration and the difference in cation-to-effective anion distances. The enthalpy of mixing data of the mixed alkali glasses was then compared with reported experimental data on the conductivity of mixed alkali aluminosilicate glasses. What appears to be conflicting experimental data can be understood in terms of the magnitude of the enthalpy of mixing and we can conclude that the mixed alkali effect is closely correlated with the negative enthalpy of mixing.     

Mesomorphism Dependence on the Position of Substitution of a Pair of Esters

A novel homologous series of ethylene derivatives of thermotropic liquid crystals has been synthesized. The methoxy to octyloxy derivatives are nematogenic, the decyloxy to tetradecyloxy derivatives are smectogenic, in addition to nematogenic, and the hexadecyloxy homologue is smectogenic only. All the members of the series are enantiotropically mesogenic. Thermotropic behavior was determined by an optical polarizing microscope equipped with a heating stage and Differential Scanning Calorimetry (DSC) study. Analytical and spectral data confirm the molecular structures of homologues (infrared, nuclear magnetic resonance, mass spectra, X-ray, and DSC data). Textures of the nematic phase are threaded or Schlieren and that of smectic phase are focal conic fan-shaped of smectic A or C. Transition curves of the phase diagram behave in a normal manner except one or two deviations from the normal trend. The mesophase range (Sm+N) varies from 3°C to 44°C. The average thermal stability for smectic is 93°C and that for nematic 117.4°C. The LC behavior of the novel series is compared with a structurally similar known series.     

立方晶系晶体本征铁弹相变序参量的选取

在本征铁弹相变的软模理论的基础上,依据弹性本构关系和居里原理,给出了立方晶系晶体所有可能的自发应变的种类,研究了立方晶系晶体本征铁弹相变序参量的选取问题.以Th群和Oh群为例,阐明了不同类的序参量导致晶体对称性变化相同的的原因,提出了该情况下序参量选取的“就少不就多”的原则.得到了发生本征铁弹相变时所有可能的序参量及晶体的对称性的变化.     

On the influence of structural features of DNA on the possibility of metabolic transfer of electrons

Abstract

A fragment of a DNA molecule is considered as one of the channels of metabolic electron transfer. The heterogeneity of the complementary chains is effectively taken into account. This made it possible to find the speed of the electron injected into the DNA conduction band and the current density that it creates. Estimates of electron mobility in nucleic acid chains are made. They were an order of magnitude smaller than that of typical semiconductors. For the specific conductivity of nucleic acid chains, estimates provide a conductivity of one to two orders of magnitude lower than in graphite.     

Features of transformations in REE-containing systems of nitrate precursors in preparatory processes of formation of multifunctional oxide materials

Abstract

The complex study provides a reliable idea of ??the trends in the joint behavior of structural components in the water-salt systems of nitrate precursors of REE, alkaline, alkaline earth metals in the preparatory stages of the processes of forming multicomponent oxide polyfunctional materials on their basis with thermal activation. Stages of such transformations are revealed; The regularities of complex and phase formation in systems and factors influencing them are determined; A number of physicochemical properties of the intermediate phases formed - coordination lanthanides nitrates: their composition, types of compounds, atomic-crystalline structure, regularities of transformations during heat treatment were studied.     

原位氮化法制备TiN纳米粉体

用溶胶凝胶法合成的纳米TiO2粉体作为原料,将该粉体在氨气中进行原位氮化制备了TiN纳米粉体.用XRD,TEM,化学分析等手段对合成的TiN纳米粉体的物相组成、形貌、成分进行了分析.实验分析表明:在1000℃和1100℃下分别氮化5h,可以制备粒径大约为40nm和80nm的TiN粉体,其TiN的含量分别为95.40;和98.37;;而在1000℃条件下氮化时间减少到2h时,TiN的含量仅为58.36;.氮化温度和氮化时间是合成纳米TiN的重要因素,提高合成温度和延长氮化时间均可形成纯度较高的TiN纳米粉体,但延长氮化时间更有利于获得粒径小的氮化钛粉体.     

Growth and characterization of semicarbazone of cyclohexanone

A new organic single crystal of semicarbazone of cyclohexanone (SCCH) has been synthesized and grown as a bulk single crystal by low temperature solution growth technique for the first time in the literature. The grown crystal has been confirmed by X‐ray diffraction and proton nuclear magnetic resonance spectral analyses and also characterized by FT‐ir and FT‐Raman studies. Thermal properties of the grown crystals were studied by thermogravimetric and differential thermal analyses. Optical transmittance was studied by ultraviolet‐visible spectrum and the second harmonic generation property was tested by using Q switched Nd: YAG laser as a source. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Influence of density of states on optical properties of GaSe thin film

A systematic investigation on the effect of substrate temperature on the structure, optical absorption and density of states of vacuum evaporated gallium monoselenide (GaSe) thin films is reported. The X‐ray diffraction analysis shows an occurrence of amorphous to polycrystalline transformation in the films deposited at higher‐temperature substrates (573K). The compositional analysis is made with Auger Electron Spectroscopy (AES). The thickness of the film (175nm) is measured by a multiple beam interferometery. Optical characteristics of the GaSe sample have been analyzed using spectrophotometer in the photon energy range of 1.0 ‐ 4 eV. The absorption mechanism has been recognized and the allowed indirect as well as forbidden direct transitions have been found. As‐deposited films show two indirect and allowed transitions due to spin‐orbit splitting of the valence band, as reported here for the first time. Low field conduction have enabled us to determine the density of states in amorphous and poly‐GaSe films. The amorphous and polycrystalline GaSe thin films have localized states density values of N (E_F) = 1.686 × 10¹⁷ cm^‐3 eV^‐1 and 1.257 × 10¹⁵ cm^‐3 eV^‐1 respectively. The experimental results are interpreted in terms of variations in the density of localized states due to progressive decrease of the unsaturated bonds during deposition. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

电子显微分析在表征纳米晶体化学组分中的应用

纳米材料的化学组分及含量影响其光、电、声、热、磁等物理性能,电子显微分析是表征纳米晶体化学组分的重要方法之一.本文综述了X-射线能谱(EDS)、X-射线波谱(WDS)、电子能量损失谱(EELS)和选区电子衍射(SAED)等现代电子显微分析技术在表征纳米晶体化学组分、形貌、尺寸和结构等方面的应用及其研究进展,并比较了这些分析方法存在的差异,提出了其应用中存在的不足及今后的研发方向.